摘要:
A semiconductor device, including a dummy diffused layer in the upper part of a substrate, has its noise immunity improved. The dummy diffused layer is formed between analog and digital blocks to eliminate dishing, which usually occurs during a CMP process for defining STI regions. The surface of the dummy diffused layer is covered with an anti-silicidation film at least partially and a dummy gate electrode so as not to be silicided. The dummy gate electrode can be formed along with a normal gate electrode for a transistor.
摘要:
A semiconductor device, including a dummy diffused layer in the upper part of a substrate, has its noise immunity improved. The dummy diffused layer is formed between analog and digital blocks to eliminate dishing, which usually occurs during a CMP process for defining STI regions. The surface of the dummy diffused layer is covered with an anti-silicidation film at least partially and a dummy gate electrode so as not to be silicided. The dummy gate electrode can be formed along with a normal gate electrode for a transistor. Accordingly, there is no need to add any extra process step to the fabrication process.
摘要:
A semiconductor memory device comprises a plurality of memory cells each including a holding circuit for holding memory data, and a read-only output circuit for outputting a signal corresponding to the data held by the holding circuit. The read-only output circuit has a read drive transistor controlled in accordance with a signal held by the holding circuit. A gate length of the read drive transistor is longer than a gate length of a transistor included in the holding circuit. Alternatively, the read-only output circuit has a read access transistor controlled in accordance with a read word select signal, and a gate length of the read access transistor is longer than a gate length of a transistor included in the holding circuit.
摘要:
A semiconductor integrated circuit includes: a memory cell array including a plurality of SRAM memory cells; a characteristic measuring circuit including a plurality of transistor circuits connected in parallel; and a first terminal. The plurality of transistor circuits each include a first transistor configured in the same manner as one of transistors included in one of the SRAM memory cells. The first transistor is connected so as to control current between the first terminal and a node at a reference potential according to a voltage supplied to a gate of the first transistor.
摘要:
A first semiconductor region has a smaller width along a gate length direction than a second semiconductor region. In this case, the first semiconductor region has a larger width along a gate width direction than the second semiconductor region.
摘要:
A semiconductor memory includes a plurality of memory cells, each of which includes a first inverter connected to one of high-data retaining supply lines which constitute one of high-data retaining supply line pairs corresponding to the memory cell and a second inverter connected to the other one of the high-data retaining supply lines which constitute the corresponding high-data retaining supply line pair, an input and output of the second inverter being connected to an output and input of the first inverter, respectively. A selected high-data retaining supply circuit receives a signal determined according to an input data signal and address signal without the intervention of any of the bit lines which constitute the bit line pairs to drive the connected high-data retaining supply lines such that it has a potential corresponding to the received signal.
摘要:
Disclosed are a method for electrolytically coloring an aluminum material which is capable of coloring an anodic oxide film in a gray color and a gray-colored aluminum material obtained thereby. In a method for electrolytically coloring an aluminum material having the anodic oxide film formed on the surface thereof in an electrolytic coloring solution containing an inorganic metal salt, a strongly acidic electrolytic coloring solution containing sulfuric acid, stannous sulfate, nickel sulfate, and ammonium sulfate and having a pH of not more than 2.5 is used as the electrolytic coloring solution. Preferably the electrolytic coloring solution contains sulfuric acid at a concentration in the range of 3 to 30 g/liter, stannous sulfate at a concentration in the range of 0.1 to 3.0 g/liter, nickel sulfate at a concentration in the range of 10 to 100 g/liter, and ammonium sulfate at a concentration in the range of 20 to 100 g/liter. By this method, a gray-colored aluminum material possessed of an anodic oxide film colored in an achromatic or substantially achromatic gray color is obtained.
摘要:
In a semiconductor memory including word lines and bit lines arranged in a matrix and a plurality of memory cells provided at intersections of the word lines and the bit lines, a bit line precharge circuit is provided for controlling the potential of a low-data holding power supply coupled to memory cells provided on a corresponding one of the bit lines. In a write operation, the bit line precharge circuit controls the potential of a low-data holding power supply of a memory cell corresponding to a selected bit line to be higher than the potential of a low-data holding power supply of a memory cell corresponding to an unselected bit line.
摘要:
A semiconductor memory device having a hierarchical bit line structure includes memory cells and an amplification circuit for amplifying a signal read from one of the memory cells via a bit line. A cell N-well region in which the P-channel transistors of the memory cell are formed and an amplification-circuit N-well region in which the P-channel transistors of the amplification circuit are formed are formed continuously.
摘要:
An isolation insulating film is formed so that an active region of a first access transistor and a substrate contact region can be integrated with each other in a plan view. A dummy gate electrode is formed on the semiconductor substrate between the active region of the first access transistor and the substrate contact region. The dummy gate electrode is electrically connected to a P-type impurity region of the substrate contact region.