Fuel filler structure for fuel tank

    公开(公告)号:US11167637B2

    公开(公告)日:2021-11-09

    申请号:US14390693

    申请日:2012-04-12

    IPC分类号: B60K15/04

    摘要: To obtain a fuel filler structure for a fuel tank wherein when causing an opening and closing valve to close, it can be ensured that the opening and closing valve does not rapidly rotate to a closed position in which it closes a fuel fill inlet, and when causing the opening and closing valve to open, the opening and closing valve can be opened with a small force. A fuel filler structure is equipped with a damper on the near side of a flapper valve in the insertion direction of a fuel nozzle. When the flapper valve rotates to an open position, the damper does not act on the flapper valve, and when the flapper valve rotates to a closed position, the damper acts on the flapper valve.

    Resist composition and method for producing resist pattern
    8.
    发明授权
    Resist composition and method for producing resist pattern 有权
    抗蚀剂组合物和抗蚀剂图案的制造方法

    公开(公告)号:US09291893B2

    公开(公告)日:2016-03-22

    申请号:US13281145

    申请日:2011-10-25

    IPC分类号: G03F7/004 G03F7/039 G03F7/20

    摘要: A resist composition contains; a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C24 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.

    摘要翻译: 抗蚀剂组合物含有 具有由式(aa)表示的结构单元的树脂和由式(ab)表示的结构单元; 和酸产生剂,其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键,任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C24脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

    Resist composition and method for producing resist pattern
    9.
    发明授权
    Resist composition and method for producing resist pattern 有权
    抗蚀剂组合物和抗蚀剂图案的制造方法

    公开(公告)号:US09229320B2

    公开(公告)日:2016-01-05

    申请号:US13196446

    申请日:2011-08-02

    IPC分类号: G03F7/004 G03F7/039 G03F7/20

    摘要: A resist composition contains; a resin having a structural unit derived from a compound represented by the formula (a); and an acid generator represented by the formula (B1). wherein R1 represents a hydrogen atom or a methyl group; A10 represents a single bond, an optionally substituted C1 to C6 alkanediyl group or a group represented by formula (a-1) defined in the specification; W1 represents an optionally substituted C4 to C36 alicyclic hydrocarbon group; A20 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; R2 in each occurrence independently represents a C1 to C12 perfluoroalkyl group; n represents 1 or 2; Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; Lb1 represents an optionally substituted C1 to C17 divalent aliphatic hydrocarbon group; Y represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; and Z+ represents an organic cation.

    摘要翻译: 抗蚀剂组合物含有 具有衍生自由式(a)表示的化合物的结构单元的树脂; 和由式(B1)表示的酸发生剂。 其中R1表示氢原子或甲基; A10表示单键,可以具有取代基的C1〜C6烷二基或由说明书中定义的式(a-1)表示的基团; W1表示任选取代的C4至C36脂环族烃基; A20每次独立地表示任选取代的C 1至C 6脂族烃基; R2各自独立地表示C1〜C12全氟烷基; n表示1或2; Q1和Q2独立地表示氟原子或C1〜C6全氟烷基; Lb1表示任选取代的C 1至C 17二价脂族烃基; Y表示任选取代的C 1至C 18脂族烃基; Z +表示有机阳离子。