公开(公告)号：US5935283A

公开(公告)日：1999-08-10

申请号：US857448

申请日：1997-05-16

Applicant: Joseph D. Sweeney ,  Prakash V. Arya ,  Mark Holst ,  Scott Lane

Inventor： Joseph D. Sweeney ,  Prakash V. Arya ,  Mark Holst ,  Scott Lane

IPC: B01D45/00 ,  B01D53/14 ,  B01J4/00 ,  B01J4/04 ,  B01J8/00 ,  B01J8/20 ,  B01J8/22 ,  B01J19/00 ,  B01J19/26 ,  C23C16/44 ,  C30B25/14 ,  B01D35/00 ,  B01D51/00 ,  B65G53/18

CPC classification number: B01D45/00 ,  B01D53/14 ,  B01J19/002 ,  B01J19/26 ,  B01J8/003 ,  B01J8/20 ,  B01J8/22 ,  C23C16/4412 ,  C30B25/14 ,  B01J2219/00065 ,  B01J2219/00094 ,  B01J2219/00135 ,  B01J2219/00164 ,  B01J2219/00252 ,  B01J2219/00268

Abstract: A clog-resistant inlet structure for introducing a particulate solids-containing and/or solids-Forming gas stream to a gas processing system. The structure is composed of a gas-permeable wall enclosing a gas flow path, and an outer annular jacket circumscribing the gas-permeable wall to define an annular gas reservoir therebetween. The clog-resistant inlet structure is constructed, arranged, and operated so as to introduce a gas into the annular gas reservoir during the flow of the particulate solids-containing and/or solids-forming gas stream to a gas processing system through such inlet structure at a pressure sufficient to combat the deposition or formation of solids on the interior surface of the gas-permeable wall. The inlet structure may further optionally include a downstream annular section in which the wall surface bounding the gas stream is blanketed with a falling liquid film, to combat solids deposition or formation on the blanketed wall surface.

Abstract translation: 用于将含颗粒固体和/或固体形成气流引入气体处理系统的阻塞入口结构。 该结构由包围气体流动路径的气体可渗透的壁和围绕气体可渗透壁的外部环形套管组成，以在其间限定环形气体储存器。 阻塞入口结构被构造，布置和操作，以便在通过这种入口结构将含颗粒固体和/或固体形成气流流动到气体处理系统期间将气体引入到环形储气器中 在足以抵抗气体可渗透壁的内表面上沉积或形成固体的压力下。 入口结构可进一步可选地包括下游环形部分，其中用落下的液体膜覆盖包围气流的壁面，以抵抗覆盖的壁表面上的固体沉积或形成。

公开(公告)号：US07695700B2

公开(公告)日：2010-04-13

申请号：US11745428

申请日：2007-05-07

Applicant: Mark Holst ,  Kent Carpenter ,  Scott Lane ,  Prakash V. Arya

Inventor： Mark Holst ,  Kent Carpenter ,  Scott Lane ,  Prakash V. Arya

IPC: B01D53/34 ,  B01D53/38 ,  B01D53/68

CPC classification number: B01D47/06 ,  B01D53/14 ,  B01D53/1456 ,  B01D53/68 ,  B01D2258/0216 ,  C23C16/4412 ,  Y02C20/30

Abstract: An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

Abstract translation: 一种废气处理系统，用于处理来自半导体制造业务的废气等气体流出物。 废气流处理系统包括预氧化处理单元，其可以例如包括洗涤器，氧化单元如电热氧化器，以及后氧化处理单元，例如湿式或干式洗涤器。 本发明的废气流处理系统可以利用集成的氧化剂，骤冷和湿式洗涤器组件，以从废气流中减少有害或不希望的组分。 可以通过高效率的入口结构来提供处理系统中气流的气体或液体覆盖。

公开(公告)号：US06322756B1

公开(公告)日：2001-11-27

申请号：US09307058

申请日：1999-05-07

Applicant: Jose I. Arno ,  Mark Holst ,  Kent Carpenter ,  Scott Lane

Inventor： Jose I. Arno ,  Mark Holst ,  Kent Carpenter ,  Scott Lane

IPC: B01D5334

CPC classification number: B01D53/14 ,  B01D53/50 ,  B01D53/56 ,  B01D53/62 ,  B01D53/68 ,  B01D53/70 ,  B01D2251/104 ,  C23C16/4412 ,  Y02C20/30

Abstract: An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises an oxidation unit to which an oxygen-containing gas such as ozone may be added, with input of energy (e.g., thermal, radio frequency, electrical, microwave, etc.), to effect oxidation of oxidizable species in the effluent, such as halocompounds (e.g., chlorofluorocarbons, perfluorocarbons), CO, NF3, nitrogen oxides, and sulfur oxides). The effluent gas stream treatment system may include a wet scrubber associated with the oxygen-containing gas source, so that the gas stream is contacted with the oxygen-containing gas during the wet scrubbing operation, to enhance removal of oxidizable species in the gas stream during treatment.

Abstract translation: 一种废气处理系统，用于处理来自半导体制造业务的废气等气体流出物。 废气流处理系统包括氧化单元，可以加入诸如臭氧的含氧气体，输入能量（例如，热，射频，电，微波等），以实现可氧化物质的氧化 （如氯氟烃，全氟化碳），CO，NF3，氮氧化物和硫氧化物）。 废气流处理系统可以包括与含氧气体源相关联的湿式洗涤器，使得在湿式洗涤操作期间气流与含氧气体接触，以增强气流中可氧化物质的去除 治疗。

公开(公告)号：US5851293A

公开(公告)日：1998-12-22

申请号：US708256

申请日：1996-09-06

Applicant: Scott Lane ,  Dinesh Shah ,  Ronald Colman ,  Liam R. Heading ,  Eric Simpson

Inventor： Scott Lane ,  Dinesh Shah ,  Ronald Colman ,  Liam R. Heading ,  Eric Simpson

IPC: B01D53/74 ,  B01J3/00 ,  C23C16/44 ,  C23C16/00

CPC classification number: C23C16/4412 ,  B01D53/74 ,  B01J3/002

Abstract: A flow stabilization system for damping pressure variations in a process discharging an effluent gas stream, in which the process is pressure-sensitive and downstream pressure variations can adversely affect the upstream process, said system comprising a motive fluid driver constructed and arranged to receive the effluent gas stream from the process, and means for sensing a flow characteristic of the effluent gas stream and responsively adjusting the flow of the effluent gas stream to damp pressure fluctuations in the process. The flow stabilization system may further comprise: (i) a variable frequency drive for motively operating the motive fluid driver at a correspondingly variable rotational speed; (ii) a pressure transducer monitor for monitoring the flow characteristic of the effluent gas stream and generating a pressure transduced signal; and (iii) a proportional integral derivative controller coupled in pressure transduced signal-receiving relationship with the pressure transducer monitor, and responsive to the pressure transduced signal to correspondingly adjust the variable frequency drive and responsively selectively drive the motive fluid driver to damp pressure fluctuations in the process. The system has applicability to stabilizing pressure-sensitive processes such as vapor phase coating and reaction processes in semiconductor manufacturing.

Abstract translation: 一种流动稳定系统，用于阻止排放废气流的过程中的压力变化，其中所述过程是压力敏感的和下游的压力变化可能不利地影响上游过程，所述系统包括构造和布置成接收流出物的动力流体驱动器 来自该过程的气流，以及用于感测流出气流的流动特征的装置，并且响应地调节流出气流的流量以减轻该过程中的压力波动。 流动稳定系统还可以包括：（i）可变频率驱动器，用于以相应可变的转速动态地操作动力流体驱动器; （ii）压力传感器监测器，用于监测废气流的流动特性并产生压力传导信号; 和（iii）比例积分微分控制器，其与压力传感器监测器耦合在压力传导的信号接收关系中，并且响应于压力转换信号来相应地调节变频驱动器并且响应地选择性地驱动运动流体驱动器以减轻压力波动 的过程。 该系统适用于稳定压敏工艺，例如半导体制造中的气相涂覆和反应过程。

公开(公告)号：US5846275A

公开(公告)日：1998-12-08

申请号：US778386

申请日：1996-12-31

Applicant: Scott Lane ,  Mark Holst

Inventor： Scott Lane ,  Mark Holst

IPC: B01D45/00 ,  B01D53/14 ,  B01J4/00 ,  B01J4/04 ,  B01J8/00 ,  B01J8/20 ,  B01J8/22 ,  B01J19/00 ,  B01J19/26 ,  C23C16/44 ,  C30B25/14 ,  B01D35/00 ,  B01D51/00 ,  B65G53/18

CPC classification number: C30B25/14 ,  B01D45/00 ,  B01D53/14 ,  B01J19/002 ,  B01J19/26 ,  B01J8/003 ,  B01J8/20 ,  B01J8/22 ,  C23C16/4412 ,  B01J2219/00065 ,  B01J2219/00094 ,  B01J2219/00135 ,  B01J2219/00164 ,  B01J2219/00252 ,  B01J2219/00268

Abstract: A clog-resistant inlet structure for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system, including: a gas-permeable wall enclosing a gas flow path, and an outer annular jacket circumscribing the gas-permeable wall to define an annular gas reservoir therebetween; and a flow passage for introducing a gas into the annular gas reservoir during the flow of the particulate solids-containing and/or solids-forming gas stream to a gas processing system through such inlet structure at a pressure sufficient to cause the gas to permeate through the gas-permeable wall to combat the deposition or formation of solids on the interior surface of the gas-permeable wall. The inlet structure may further optionally include a downstream annular section in which the wall surface bounding the gas stream is blanketed with a falling liquid film, to combat solids deposition or formation on the blanketed wall surface.

Abstract translation: 一种用于将含颗粒固体和/或固体形成气流引入气体处理系统的阻塞入口结构，包括：封闭气体流动路径的气体可渗透壁，以及围绕气体可渗透的外部环形套管 壁以在其间限定环形气体储存器; 以及流动通道，用于在将含颗粒固体的和/或固体形成气体流通过这种入口结构流入气体处理系统期间将气体引入到环形气体储存器中，压力足以使气体渗透通过 气体渗透壁，用于抵抗气体可渗透壁的内表面上沉积或形成固体。 入口结构可进一步可选地包括下游环形部分，其中用落下的液体膜覆盖包围气流的壁面，以抵抗覆盖的壁表面上的固体沉积或形成。

公开(公告)号：US20140240753A1

公开(公告)日：2014-08-28

申请号：US13773069

申请日：2013-02-21

Applicant: Bret Anno ,  Ryan Brock ,  Gordon Molek ,  Jeff Henningson ,  Sean Patrick Winterberger ,  Robin West ,  Scott Lane ,  Jim Van Huis ,  Andy Pekarske

Inventor： Bret Anno ,  Ryan Brock ,  Gordon Molek ,  Jeff Henningson ,  Sean Patrick Winterberger ,  Robin West ,  Scott Lane ,  Jim Van Huis ,  Andy Pekarske

IPC: G06F3/12

CPC classification number: G06F3/1236 ,  G06F3/1206 ,  G06F3/1211 ,  G06F3/1222 ,  G06F3/1238 ,  G06F3/1243 ,  G06F3/1285 ,  G06F3/1287 ,  H04L63/029 ,  H04L63/08 ,  H04L63/0823 ,  H04L63/0869 ,  H04L63/166 ,  H04L63/168 ,  H04L67/125

Abstract: Methods, apparatuses, and computer program products are provided to facilitate connections between devices, such as a printer and a cloud-based server, and to implement an adaptive application framework. In the context of an apparatus, a printer is provided comprising communications circuitry configured to facilitate communications with a network; and processing circuitry configured to transmit a connection request to the network; receive requested connection parameters from the network; transmit printer connection parameters to the network; and establish a first secure connection between the printer and the network. The printer comprising processing circuitry further configured to receive requested connection parameters comprising at least a signed security certificate and a DNS name for a server on the network and to verify the signed security certificate and the DNS name for the server. The printer comprising processing circuitry further configured to transmit printer connection parameters comprising at least a signed security certificate for the printer. The printer comprising processing circuitry further configured to receive a request from the network to establish one or more communication channels over the first secure connection.

Abstract translation: 提供方法，装置和计算机程序产品以便于诸如打印机和基于云的服务器之类的设备之间的连接，并实现自适应应用框架。 在装置的上下文中，提供打印机，其包括被配置为便于与网络通信的通信电路; 以及处理电路，被配置为向网络发送连接请求; 从网络接收请求的连接参数; 将打印机连接参数传送到网络; 并建立打印机和网络之间的第一个安全连接。 所述打印机包括处理电路，其进一步被配置为接收所述请求的连接参数，所述连接参数至少包括所述网络上的服务器的签名安全证书和DNS名称，并验证所述服务器的签名的安全证书和DNS名称。 该打印机包括处理电路，其进一步被配置为发送打印机连接参数，该打印机连接参数至少包括用于打印机的签名的安全证书 所述打印机包括处理电路，其进一步被配置为从所述网络接收请求以在所述第一安全连接上建立一个或多个通信信道。

公开(公告)号：US20090010814A1

公开(公告)日：2009-01-08

申请号：US11838549

申请日：2007-08-14

Applicant: Mark Holst ,  Kent Carpenter ,  Scott Lane ,  Prakash V. Arya

Inventor： Mark Holst ,  Kent Carpenter ,  Scott Lane ,  Prakash V. Arya

IPC: B01D53/34

CPC classification number: B01D47/06 ,  B01D53/14 ,  B01D53/1456 ,  B01D53/68 ,  B01D2258/0216 ,  C23C16/4412 ,  Y02C20/30

Abstract: An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

Abstract translation: 一种废气处理系统，用于处理来自半导体制造业务的废气等气体流出物。 废气流处理系统包括预氧化处理单元，其可以例如包括洗涤器，氧化单元如电热氧化器，以及后氧化处理单元，例如湿式或干式洗涤器。 本发明的废气流处理系统可以利用集成的氧化剂，骤冷和湿式洗涤器组件，以从废气流中减少有害或不希望的组分。 可以通过高效率的入口结构来提供处理系统中气流的气体或液体覆盖。

公开(公告)号：US20080230714A1

公开(公告)日：2008-09-25

申请号：US11689572

申请日：2007-03-22

Applicant: Scott Lane

Inventor： Scott Lane

IPC: H01J27/02

CPC classification number: H01J37/3053 ,  H01J27/026 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/0812 ,  H01J2237/0825

Abstract: Embodiments of a gas cluster ion beam apparatus and methods for forming a gas cluster ion beam using a low-pressure process source are generally described herein. In one embodiment, the low-pressure process source is mixed with a high-pressure diluent source in a static pump to form a mixed source, from which a gas cluster jet is generated and ionized to form the gas cluster ion beam. Other embodiments may be described and claimed.

Abstract translation: 气体簇离子束装置的实施例和使用低压处理源形成气体簇离子束的方法在本文中一般地被描述。 在一个实施方案中，将低压过程源与静压泵中的高压稀释剂源混合以形成混合源，产生气体簇射流并离子化以形成气体团簇离子束。 可以描述和要求保护其他实施例。

公开(公告)号：US07670964B2

公开(公告)日：2010-03-02

申请号：US11689572

申请日：2007-03-22

Applicant: Scott Lane

Inventor： Scott Lane

IPC: H01L21/31

CPC classification number: H01J37/3053 ,  H01J27/026 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/0812 ,  H01J2237/0825

Abstract: Embodiments of a gas cluster ion beam apparatus and methods for forming a gas cluster ion beam using a low-pressure process source are generally described herein. In one embodiment, the low-pressure process source is mixed with a high-pressure diluent source in a static pump to form a mixed source, from which a gas cluster jet is generated and ionized to form the gas cluster ion beam. Other embodiments may be described and claimed.

Abstract translation: 气体簇离子束装置的实施例和使用低压处理源形成气体簇离子束的方法在本文中一般地被描述。 在一个实施方案中，将低压过程源与静压泵中的高压稀释剂源混合以形成混合源，产生气体簇射流并离子化以形成气体团簇离子束。 可以描述和要求保护其他实施例。

公开(公告)号：US20070236918A1

公开(公告)日：2007-10-11

申请号：US11733686

申请日：2007-04-10

Applicant: Scott Lane ,  Jeffrey Lane

Inventor： Scott Lane ,  Jeffrey Lane

IPC: F21V1/00 ,  F21V19/00 ,  F21V11/00 ,  F21V21/00

CPC classification number: F21V21/40 ,  F21S4/20 ,  F21V15/013 ,  F21V21/00 ,  F21W2121/00 ,  F21W2121/004 ,  G09F19/22

Abstract: The present invention encompasses a lighting apparatus comprising a rigid housing and a mounting handle coupled to the housing. The housing defines a channel into which a plurality of light sockets may be installed. The mounting handle defines an opening through which mounting hardware may extend to support the lighting apparatus on a building. The lighting apparatus may also have an installation handle coupled to the housing, with the installation handle defining an opening through which an installation tool may extend to assist in lifting the lighting apparatus during installation. In one embodiment, the present invention also includes a face plate coupled to the housing and positioned in front of the areas where the light sockets will extend. The face plate defines a plurality of openings that may be shaped in a decorative design or as letters.

Abstract translation: 本发明包括一种照明装置，其包括刚性壳体和联接到壳体的安装手柄。 壳体限定了可以安装多个灯插座的通道。 安装手柄限定开口，安装硬件可通过该开口延伸以支撑建筑物上的照明装置。 照明装置还可以具有联接到壳体的安装手柄，其中安装手柄限定开口，安装工具可以通过该开口延伸以有助于在安装期间提升照明装置。 在一个实施例中，本发明还包括联接到壳体并且定位在光插座将延伸的区域的前面的面板。 面板限定了可以以装饰设计或字母形状的多个开口。