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公开(公告)号：US5488868A
公开(公告)日：1996-02-06
申请号：US251688
申请日：1994-05-31
CPC分类号： G01L23/18 , G01L19/0681 , G01L9/0052 , G01L9/006
摘要： A diaphragm portion 20 causes deflection, when high-temperature fluid pressure acts on the pressure sensing surface A of the diaphragm portion 20. This deflection is transmitted via pressure transmitting members 7, 8 to a deflection sensing member 6 which generates an electric signal in response to a pressure received.The diaphragm portion 20 has a recess portion 21 at its center. The recess portion 21 is symmetrical about a central axis of the diaphragm portion 20. A tip end of the pressure transmitting member 7 is brought into contact with the recess portion 21 at a central point. A tapered portion 2d of the diaphragm 20 has a thickness of t.sub.3 which is not larger than the thickness t.sub.1 of an outer peripheral portion 2b or t.sub.2 of a central bottom portion 2c. Furthermore, a heat insulating plate can be provided on the diaphragm to protect the surface A of the diaphragm portion from heat radiation of high-temperature fluid.
摘要翻译： 当高温流体压力作用在隔膜部分20的压力感测表面A上时，隔膜部分20引起偏转。该偏转通过压力传递部件7,8传递到偏转感测部件6，偏转感测部件6响应于电信号 受到压力。 隔膜部20在其中心具有凹部21。 凹部21与隔膜部20的中心轴对称。压力传递部件7的前端在中心点与凹部21接触。 隔膜20的锥形部分2d具有不大于中心底部2c的外周部分2b或t2的厚度t1的t3的厚度。 此外，可以在隔膜上设置绝热板，以保护隔膜部分的表面A免受高温流体的热辐射。
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公开(公告)号：US20140347744A1
公开(公告)日：2014-11-27
申请号：US14116602
申请日：2012-05-09
申请人： Kouichi Kajiyama , Makoto Hatanaka
发明人： Kouichi Kajiyama , Makoto Hatanaka
CPC分类号： G02B3/06 , B23K26/0648 , B23K26/0665 , B23K26/0734 , B23K26/388 , B23K26/389 , C03B33/04 , C03B33/093 , G02B27/0927 , G02B27/0966 , G02B2003/0093
摘要： A member having an arbitrary shape having a closed curve can be easily subjected to laser processing within a short time. A lens and a laser processing apparatus equipped with the lens are for cutting a material to be cut into a member having an arbitrary shape having a closed curve and include a convex cylindrical lens which is molded to have a closed path so that a line that connects vertices of a cylindrical surface of the convex cylindrical lens has the same form as the arbitrary shape having the closed curve.
摘要翻译： 具有闭合曲线的任意形状的构件可以在短时间内容易地进行激光加工。 配备有透镜的透镜和激光加工装置用于将要切割的材料切割成具有闭合曲线的任意形状的构件，并且包括凸形柱面透镜，其被模制成具有闭合路径，使得连接 凸柱面透镜的圆柱形表面的顶点具有与具有闭合曲线的任意形状相同的形状。
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公开(公告)号：US09310531B2
公开(公告)日：2016-04-12
申请号：US14116602
申请日：2012-05-09
申请人： Kouichi Kajiyama , Makoto Hatanaka
发明人： Kouichi Kajiyama , Makoto Hatanaka
IPC分类号： G02B3/06 , C03B33/04 , C03B33/09 , B23K26/06 , B23K26/073 , G02B27/09 , B23K26/38 , G02B3/00
CPC分类号： G02B3/06 , B23K26/0648 , B23K26/0665 , B23K26/0734 , B23K26/388 , B23K26/389 , C03B33/04 , C03B33/093 , G02B27/0927 , G02B27/0966 , G02B2003/0093
摘要： A member having an arbitrary shape having a closed curve can be easily subjected to laser processing within a short time. A lens and a laser processing apparatus equipped with the lens are for cutting a material to be cut into a member having an arbitrary shape having a closed curve and include a convex cylindrical lens which is molded to have a closed path so that a line that connects vertices of a cylindrical surface of the convex cylindrical lens has the same form as the arbitrary shape having the closed curve.
摘要翻译： 具有闭合曲线的任意形状的构件可以在短时间内容易地进行激光加工。 配备有透镜的透镜和激光加工装置用于将要切割的材料切割成具有闭合曲线的任意形状的构件，并且包括凸形柱面透镜，其被模制成具有闭合路径，使得连接 凸柱面透镜的圆柱形表面的顶点具有与具有闭合曲线的任意形状相同的形状。
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公开(公告)号：US20130342820A1
公开(公告)日：2013-12-26
申请号：US14001863
申请日：2012-02-02
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G02B3/0056 , G03F7/70275 , G03F7/70358
摘要： A light-exposure device is provided with a microlens array on which is arranged with a prescribed regularity a plurality of microlenses on which exposure light transmitted through a light source and a mask is introduced to resolve an upright equal-magnification image on a substrate. Upon reaching a prescribed position, the substrate is irradiated with pulsed laser light from the light source, and the substrate is successively exposed, and after the entire area of the exposure region of the substrate is exposed, a relative positional relationship between the microlens array and the mask is successively switched in a vertical direction by an amount of a horizontal pitch of the microlenses, and a subsequent exposure is performed. Exposure with high precision and high resolution can thereby be performed with a short exposure cycle time.
摘要翻译： 曝光装置设置有微透镜阵列，其上以规定的规则排列多个微透镜，在该微透镜上引入透过光源和掩模的曝光光，以解析基板上的直立等倍放大图像。 在达到规定位置时，用来自光源的脉冲激光对衬底进行照射，然后依次露出衬底，并且在衬底的曝光区域的整个区域暴露之后，微透镜阵列与微透镜阵列之间的相对位置关系 该掩模在垂直方向依次切换微透镜的水平间距的量，然后进行随后的曝光。 从而能够以短的曝光周期时间进行高精度，高分辨率的曝光。
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5.发明授权Contact structure for connector array and electronic appliance having the same 有权连接器阵列的接触结构和具有相同的电子设备公开(公告)号：US07077657B2
公开(公告)日：2006-07-18
申请号：US11073565
申请日：2005-03-08
申请人： Makoto Hatanaka
发明人： Makoto Hatanaka
IPC分类号： H01R12/00
CPC分类号： B60T8/3675
摘要： A contact structure for electrically connecting a spring-loaded connector array and a pad array, the spring-loaded connector array having a plurality of spring-loaded connectors arranged in parallel with each other and the pad array having a plurality of pads arranged so as to come in contact with the plurality of connectors. A tip of a first connector of the plurality of spring-loaded connectors has an initial position that is axially offset from an initial position of a tip of a second connector of the plurality of spring-loaded connectors. A first pad of the plurality of pads that is arranged to come in contact with the first connector is axially offset from a second pad of the plurality of pads.
摘要翻译： 一种用于电连接弹簧加载连接器阵列和焊盘阵列的接触结构，所述弹簧加载的连接器阵列具有彼此平行布置的多个弹簧加载的连接器，并且所述焊盘阵列具有多个焊盘，所述多个焊盘被布置成 与多个连接器接触。 多个弹簧加载的连接器的第一连接器的尖端具有从多个弹簧加载的连接器的第二连接器的尖端的初始位置轴向偏移的初始位置。 布置成与第一连接器接触的多个焊盘中的第一焊盘从多个焊盘的第二焊盘轴向偏移。
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6.发明授权Assembling structure for pressure sensor integrally formed with electromagnetic valve 失效与电磁阀一体形成的压力传感器组装结构公开(公告)号：US07066196B2
公开(公告)日：2006-06-27
申请号：US11208605
申请日：2005-08-23
申请人： Makoto Hatanaka
发明人： Makoto Hatanaka
IPC分类号： F16K31/06
CPC分类号： F16K31/0675 , B60T8/3675 , H05K1/18 , H05K2201/1003 , H05K2201/10151 , H05K2201/1053 , Y10T137/0402 , Y10T137/5987 , Y10T137/8326
摘要： In an assembling structure for assembling a pressure sensor device to a solenoid, the pressure sensor device comprises a pressure sensor and an electromagnetic valve, and the solenoid is electrically connected to an electrical circuit device and has a cylindrical inner space. The pressure sensor device is detachably inserted into the cylindrical inner space of the solenoid. The pressure sensor has a first set of terminals, whereas a second set of terminals is provided to the solenoid, wherein the first set of the terminals is respectively and electrically connected to the second set of the terminals through spring contact.
摘要翻译： 在用于将压力传感器装置组装到螺线管的组装结构中，压力传感器装置包括压力传感器和电磁阀，并且螺线管电连接到电路装置并且具有圆柱形内部空间。 压力传感器装置可拆卸地插入到螺线管的圆柱形内部空间中。 压力传感器具有第一组端子，而第二组端子设置在螺线管上，其中第一组端子分别通过弹簧接触电连接到第二组端子。
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公开(公告)号：US09086514B2
公开(公告)日：2015-07-21
申请号：US13877653
申请日：2011-09-12
CPC分类号： G02B3/0037 , G02B3/0062 , G02B26/0875 , G03F7/70258 , G03F7/70275
摘要： A scanning exposure apparatus uses a plurality of microlens arrays to project a mask exposure pattern onto a substrate. A CCD line camera detects an image on the substrate at this time, and using a first-layer pattern on the substrate as a reference pattern, detects whether or not the mask exposure pattern matches the reference pattern. In a case in which the patterns do not match, the microlens array is tilted from a direction that is parallel to the substrate, and the mask exposure pattern is made to match the reference pattern by using the microlens array to adjust the exposure area on the substrate. When the exposure pattern deviates from the reference pattern, it is thereby possible to detect the deviation during exposure and to prevent an exposure pattern misregistration, thereby enhancing the precision of the exposure pattern in an overlay exposure.
摘要翻译： 扫描曝光装置使用多个微透镜阵列将掩模曝光图案投影到基板上。 CCD行摄像机此时检测衬底上的图像，并且使用衬底上的第一层图案作为参考图案，检测掩模曝光图案是否与参考图案匹配。 在图案不匹配的情况下，微透镜阵列从平行于衬底的方向倾斜，并且通过使用微透镜阵列使掩模曝光图案与参考图案相匹配，以调整曝光区域 基质。 当曝光图案偏离参考图案时，由此可以检测曝光期间的偏差并防止曝光图案重合，从而提高曝光图案在重叠曝光中的精度。
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公开(公告)号：US20140152968A1
公开(公告)日：2014-06-05
申请号：US14232733
申请日：2012-07-23
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G02B3/00 , G02B3/0056 , G02B3/0062 , G02B3/0075 , G02B7/00 , G02B27/0961 , G03F7/70275
摘要： In this microlens array, unitary microlens arrays are respectively stacked onto an upper surface and lower surface of a glass plate, and each of the unitary microlens arrays is supported by an upper plate and a lower plate. Marks for alignment are formed on each of the unitary microlens arrays and on the glass plate, and the unitary microlens arrays and the glass plate are stacked onto each other aligned by these marks. This makes it possible to prevent ununiform exposure in scanning exposure using a plurality of microlens arrays.
摘要翻译： 在这种微透镜阵列中，单位微透镜阵列分别堆叠在玻璃板的上表面和下表面上，并且每个单一微透镜阵列由上板和下板支撑。 用于对准的标记形成在每个单一微透镜阵列和玻璃板上，并且整体微透镜阵列和玻璃板彼此堆叠，由这些标记对准。 这使得可以防止使用多个微透镜阵列的扫描曝光中的不均匀曝光。
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公开(公告)号：US20130188161A1
公开(公告)日：2013-07-25
申请号：US13877653
申请日：2011-09-12
IPC分类号： G02B3/00
CPC分类号： G02B3/0037 , G02B3/0062 , G02B26/0875 , G03F7/70258 , G03F7/70275
摘要： A scanning exposure apparatus uses a plurality of microlens arrays to project a mask exposure pattern onto a substrate. A CCD line camera detects an image on the substrate at this time, and using a first-layer pattern on the substrate as a reference pattern, detects whether or not the mask exposure pattern matches the reference pattern. In a case in which the patterns do not match, the microlens array is tilted from a direction that is parallel to the substrate, and the mask exposure pattern is made to match the reference pattern by using the microlens array to adjust the exposure area on the substrate. When the exposure pattern deviates from the reference pattern, it is thereby possible to detect the deviation during exposure and to prevent an exposure pattern misregistration, thereby enhancing the precision of the exposure pattern in an overlay exposure.
摘要翻译： 扫描曝光装置使用多个微透镜阵列将掩模曝光图案投影到基板上。 CCD行摄像机此时检测衬底上的图像，并且使用衬底上的第一层图案作为参考图案，检测掩模曝光图案是否与参考图案匹配。 在图案不匹配的情况下，微透镜阵列从平行于衬底的方向倾斜，并且通过使用微透镜阵列使掩模曝光图案与参考图案相匹配，以调整曝光区域 基质。 当曝光图案偏离参考图案时，由此可以检测曝光期间的偏差并防止曝光图案重合，从而提高曝光图案在重叠曝光中的精度。
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10.发明申请Contact structure for connector array and electronic appliance having the same 有权连接器阵列的接触结构和具有相同的电子设备公开(公告)号：US20050202729A1
公开(公告)日：2005-09-15
申请号：US11073565
申请日：2005-03-08
申请人： Makoto Hatanaka
发明人： Makoto Hatanaka
IPC分类号： G01L19/00 , H01R13/24 , H01R13/64 , H01R13/642
CPC分类号： B60T8/3675
摘要： A contact structure for electrically connecting a spring-loaded connector array and a pad array, the spring-loaded connector array having a plurality of spring-loaded connectors arranged in parallel with each other and the pad array having a plurality of pads arranged so as to come in contact with the plurality of connectors. A tip of a first connector of the plurality of spring-loaded connectors has an initial position that is axially offset from an initial position of a tip of a second connector of the plurality of spring-loaded connectors. A first pad of the plurality of pads that is arranged to come in contact with the first connector is axially offset from a second pad of the plurality of pads.
摘要翻译： 一种用于电连接弹簧加载连接器阵列和焊盘阵列的接触结构，所述弹簧加载的连接器阵列具有彼此平行布置的多个弹簧加载的连接器，并且所述焊盘阵列具有多个焊盘，所述多个焊盘被布置成 与多个连接器接触。 多个弹簧加载的连接器的第一连接器的尖端具有从多个弹簧加载的连接器的第二连接器的尖端的初始位置轴向偏移的初始位置。 布置成与第一连接器接触的多个焊盘中的第一焊盘从多个焊盘的第二焊盘轴向偏移。
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