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公开(公告)号：US07166184B2
公开(公告)日：2007-01-23
申请号：US10778947
申请日：2004-02-16
申请人： Akihiko Nakamura , Taiichiro Aoki , Seiji Ohishi , Tamotsu Sasaki
发明人： Akihiko Nakamura , Taiichiro Aoki , Seiji Ohishi , Tamotsu Sasaki
CPC分类号： G03F7/3021 , Y10S134/902
摘要： A multi-stage type processing apparatus which can be positioned in a limited space without having a complicated driving mechanism, includes processing units which are stacked in a multi-stage state in the vertical direction. Each processing unit has a cup surrounding a substrate and a chuck for retaining and rotating a substrate, and the cup can be elevated and lowered with respect to the chuck. A cylinder unit is contracted and thereby all the cups are unitarily lowered, so that the top surface of the chuck is located in a slightly upper position with respect to the top surface of the cup. In this state, a substrate is mounted on the chuck and attracted. Next, the cylinder unit is extended and thereby all the cups are unitarily elevated so as to accommodate the substrate therein. In this state, developing liquid is dropped from a nozzle for developing liquid onto the center of the substrate, and a motor is driven to rotate the chuck (the substrate) via a drive shaft and a timing belt to allow the developing liquid to cover the entire surface of the substrate.
摘要翻译： 可以定位在有限空间中而不具有复杂驱动机构的多级型处理装置包括在垂直方向上以多级状态堆叠的处理单元。 每个处理单元具有围绕基板的杯和用于保持和旋转基底的卡盘，并且杯可以相对于卡盘升高和降低。 气缸单元收缩，从而所有的杯子一体地降低，使得卡盘的顶表面相对于杯的顶表面位于较高的位置。 在这种状态下，将基板安装在卡盘上并被吸引。 接下来，气缸单元延伸，从而所有的杯子一体地升高，以便容纳衬底。 在这种状态下，显影液从用于显影液的喷嘴滴落到基板的中心，驱动马达驱动以通过驱动轴和同步皮带旋转卡盘（基板），以使显影液覆盖 基片的整个表面。
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公开(公告)号：US08449945B2
公开(公告)日：2013-05-28
申请号：US13364739
申请日：2012-02-02
申请人： Seiji Ohishi , Akihiko Nakamura
发明人： Seiji Ohishi , Akihiko Nakamura
IPC分类号： B05D3/12
CPC分类号： H01L21/6715 , B05D1/002 , B05D1/42 , Y10S134/902
摘要： A coating method, which uses a coating apparatus including a rotatable tray having a recessed portion for accommodating a substrate and rotatable together with the substrate, a nozzle for supplying a coating liquid, and an applicator for spreading the coating liquid, includes the steps of placing a substrate into the recessed portion of the tray, positioning the nozzle over a non-recessed portion of the upper surface of the tray, supplying a coating liquid from the nozzle, and forming a coating liquid pool only on the non-recessed portion of the upper surface of the tray, moving the applicator in a horizontal direction while maintaining a certain distance with respect to the upper surface of the substrate for spreading the coating liquid of the coating liquid pool over the entire upper surface of the substrate, and releasing the substrate from the recessed portion of the tray.
摘要翻译： 一种涂布方法，其使用包括可旋转托盘的涂布装置，该托盘具有用于容纳基材的凹部并与基底一起旋转的涂布装置，用于供给涂布液的喷嘴和用于涂布涂布液的涂布器的步骤包括以下步骤： 基板进入托盘的凹部，将喷嘴定位在托盘的上表面的非凹部上，从喷嘴供给涂布液，并且仅在所述托盘的非凹部上形成涂布液池 托盘的上表面，沿着水平方向移动施加器，同时相对于基板的上表面保持一定距离，以将涂液池的涂布液涂覆在基板的整个上表面上，并释放基板 从托盘的凹陷部分。
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公开(公告)号：US08132526B2
公开(公告)日：2012-03-13
申请号：US12584103
申请日：2009-08-31
申请人： Seiji Ohishi , Akihiko Nakamura
发明人： Seiji Ohishi , Akihiko Nakamura
IPC分类号： B05C5/02
CPC分类号： H01L21/6715 , B05D1/002 , B05D1/42 , Y10S134/902
摘要： A coating apparatus comprises a tray, a nozzle for supplying a coating liquid, and a squeegee which serves as an applicator for spreading a coating liquid. The tray has a recessed portion into which a substrate is placed, and a spinner chuck is provided in the recessed portion. In the spinner chuck, a chuck for attracting the substrate is attached to the upper end of a spinner shaft which can be lifted and lowered, and the upper surface of the chuck and the bottom surface of the recessed portion are arranged to be in the same plane in a state where the spinner shaft is lowered to the lowest position. The nozzle is positioned above a non-recessed portion of the tray and supplies a coating liquid only onto a non-recessed portion of the upper surface of the tray to form a coating liquid pool, and the applicator is relatively movable in a horizontal direction in a state of maintaining a certain distance with respect to the upper surface of the substrate accommodated into the recessed portion and spreads the coating liquid of the coating liquid pool from the non-recessed portion of the upper surface of the tray over the entire upper surface of the substrate.
摘要翻译： 涂布装置包括托盘，用于供给涂布液的喷嘴和用作涂布液的涂布器的刮板。 托盘具有凹部，基底被放置在该凹部中，并且在凹部中设置旋转卡盘。 在旋转卡盘中，用于吸引基板的卡盘安装在可以升降的旋转轴的上端，并且卡盘的上表面和凹部的底面布置成相同 在旋转轴下降到最低位置的状态下。 喷嘴位于托盘的非凹陷部分的上方，并将涂布液仅提供到托盘上表面的非凹槽部分上以形成涂液池，并且涂布器可在水平方向上相对移动 相对于容纳在凹部中的基板的上表面保持一定距离的状态，并且将涂布液的涂布液从托盘的上表面的非凹部扩展到整个上表面的整个上表面 底物。
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公开(公告)号：US20100009084A1
公开(公告)日：2010-01-14
申请号：US12584103
申请日：2009-08-31
申请人： Seiji Ohishi , Akihiko Nakamura
发明人： Seiji Ohishi , Akihiko Nakamura
CPC分类号： H01L21/6715 , B05D1/002 , B05D1/42 , Y10S134/902
摘要： A coating apparatus comprises a tray, a nozzle for supplying a coating liquid, and a squeegee which serves as an applicator for spreading a coating liquid. The tray has a recessed portion into which a substrate is placed, and a spinner chuck is provided in the recessed portion. In the spinner chuck, a chuck for attracting the substrate is attached to the upper end of a spinner shaft which can be lifted and lowered, and the upper surface of the chuck and the bottom surface of the recessed portion are arranged to be in the same plane in a state where the spinner shaft is lowered to the lowest position. The nozzle is positioned above a non-recessed portion of the tray and supplies a coating liquid only onto a non-recessed portion of the upper surface of the tray to form a coating liquid pool, and the applicator is relatively movable in a horizontal direction in a state of maintaining a certain distance with respect to the upper surface of the substrate accommodated into the recessed portion and spreads the coating liquid of the coating liquid pool from the non-recessed portion of the upper surface of the tray over the entire upper surface of the substrate.
摘要翻译： 涂布装置包括托盘，用于供给涂布液的喷嘴和用作涂布液的涂布器的刮板。 托盘具有凹部，基底被放置在该凹部中，并且在凹部中设置旋转卡盘。 在旋转卡盘中，用于吸引基板的卡盘安装在可以升降的旋转轴的上端，并且卡盘的上表面和凹部的底面布置成相同 在旋转轴下降到最低位置的状态下。 喷嘴位于托盘的非凹陷部分的上方，并将涂布液仅提供到托盘上表面的非凹槽部分上以形成涂液池，并且涂布器可在水平方向上相对移动 相对于容纳在凹部中的基板的上表面保持一定距离的状态，并且将涂布液的涂布液从托盘的上表面的非凹部扩展到整个上表面的整个上表面 底物。
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公开(公告)号：US07611581B2
公开(公告)日：2009-11-03
申请号：US11288991
申请日：2005-11-29
申请人： Seiji Ohishi , Akihiko Nakamura
发明人： Seiji Ohishi , Akihiko Nakamura
IPC分类号： B05C5/02
CPC分类号： H01L21/6715 , B05D1/002 , B05D1/42 , Y10S134/902
摘要： A coating apparatus is provided in which a coating liquid supplied onto a surface of a substrate such as a semiconductor wafer and a glass substrate can be easily leveled so as to have a uniform thickness without any edge bead. The coating apparatus comprises a tray, a nozzle for supplying a coating liquid, and a squeegee which serves as an applicator for spreading a coating liquid. The tray has a recessed portion into which a substrate is placed, and a spinner chuck is provided in the recessed portion. In the spinner chuck, a chuck for attracting the substrate is attached to the upper end of a spinner shaft which can be lifted and lowered, and the upper surface of the chuck and the bottom surface of the recessed portion are arranged to be in the same plane in a state where the spinner shaft is lowered to the lowest position.
摘要翻译： 提供一种涂布装置，其中供应到诸如半导体晶片和玻璃基板的基板的表面上的涂布液可以容易地平整，以便具有均匀的厚度而没有任何边缘珠。 涂布装置包括托盘，用于供给涂布液的喷嘴和用作涂布液的涂布器的刮板。 托盘具有凹部，基底被放置在该凹部中，并且在凹部中设置旋转卡盘。 在旋转卡盘中，用于吸引基板的卡盘安装在可以升降的旋转轴的上端，并且卡盘的上表面和凹部的底面布置成相同 在旋转轴下降到最低位置的状态下。
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公开(公告)号：US20060115992A1
公开(公告)日：2006-06-01
申请号：US11288991
申请日：2005-11-29
申请人： Seiji Ohishi , Akihiko Nakamura
发明人： Seiji Ohishi , Akihiko Nakamura
IPC分类号： H01L21/31 , B05D3/12 , H01L21/469
CPC分类号： H01L21/6715 , B05D1/002 , B05D1/42 , Y10S134/902
摘要： A coating apparatus is provided in which a coating liquid supplied onto a surface of a substrate such as a semiconductor wafer and a glass substrate can be easily leveled so as to have a uniform thickness without any edge bead. The coating apparatus comprises a tray, a nozzle for supplying a coating liquid, and a squeegee which serves as an applicator for spreading a coating liquid. The tray has a recessed portion into which a substrate is placed, and a spinner chuck is provided in the recessed portion. In the spinner chuck, a chuck for attracting the substrate is attached to the upper end of a spinner shaft which can be lifted and lowered, and the upper surface of the chuck and the bottom surface of the recessed portion are arranged to be in the same plane in a state where the spinner shaft is lowered to the lowest position.
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公开(公告)号：US09129999B2
公开(公告)日：2015-09-08
申请号：US12514193
申请日：2007-10-12
申请人： Yasumasa Iwata , Akihiko Nakamura
发明人： Yasumasa Iwata , Akihiko Nakamura
CPC分类号： H01L21/6708 , H01L21/02057
摘要： The treatment device 100 of the present invention is a treatment device for carrying out treatment to a treatment object 18 whose treatment surface includes a second treatment surface 18b and a first treatment surface 18a surrounding the second treatment surface 18b, the treatment device including: a table section 10 for placing the treatment object 18 thereon; and a first feeding section 24 for feeding a first treatment liquid to an approximate boundary between the first and the second treatment surfaces 18a, 18b and a second feeding section 46 for feeding a second treatment liquid to the second treatment surface 18b. Thus, the present invention provides a treatment device, a treatment method, and a surface treatment jig, each of the treatment device and the treatment method being capable of carrying out independent treatments to a treatment surface and an exposed surface surrounding the treatment surface, respectively.
摘要翻译： 本发明的处理装置100是对处理对象18进行处理的处理装置，处理对象18的处理面包括第二处理面18b和围绕第二处理面18b的第一处理面18a，处理装置包括： 用于将处理对象18放置在其上的部分10; 以及用于将第一处理液体供给到第一处理用表面18a，第二处理用面18b之间的大致边界的第一供给部24以及向第二处理面18b供给第二处理液的第二供给部46。 因此，本发明提供一种处理装置，处理方法和表面处理夹具，每个处理装置和处理方法能够分别对处理表面和处理表面周围的暴露表面进行独立处理 。
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公开(公告)号：US08701734B2
公开(公告)日：2014-04-22
申请号：US12453816
申请日：2009-05-22
申请人： Akihiko Nakamura
发明人： Akihiko Nakamura
IPC分类号： B32B38/10 , H01L21/687
CPC分类号： H01L21/68728 , H01L21/67011 , H01L21/67092 , H01L21/6838 , Y10T156/11 , Y10T156/1111 , Y10T156/1137 , Y10T156/1168 , Y10T156/1179 , Y10T156/1184 , Y10T156/1939 , Y10T156/1944 , Y10T156/1961 , Y10T156/1967
摘要： A separating apparatus according to the present invention includes a clamp for gripping an outer peripheral end of a supporting plate. The clamp grips the outer peripheral end of the supporting plate and separates the supporting plate from a wafer by gripping the supporting plate. This makes it possible to separate a supporting plate from a wafer without breaking the wafer. With this, a supporting plate can be separated from a wafer to which the supporting plate has been attached, without breaking the wafer.
摘要翻译： 根据本发明的分离装置包括夹持支撑板的外周端的夹具。 夹具夹持支撑板的外周端，并通过夹持支撑板将支撑板与晶片分离。 这使得可以在不破坏晶片的情况下将支撑板与晶片分离。 由此，支撑板可以与已经安装支撑板的晶片分离，而不会破坏晶片。
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公开(公告)号：US08277679B2
公开(公告)日：2012-10-02
申请号：US13024675
申请日：2011-02-10
申请人： Akihiko Nakamura , Keisuke Watanabe
发明人： Akihiko Nakamura , Keisuke Watanabe
IPC分类号： H01F1/147
CPC分类号： H01F1/14766 , B22F1/004 , B32B15/01 , C22C9/00 , C22C33/0257 , C22C38/02 , C22C38/04 , C22C38/34 , C22C38/38 , C22C2202/02 , H01F1/26 , H01F41/0246
摘要： The object of the present invention is to provide a composite magnetic material having well-balanced magnetic properties and chemical properties, and a magnetic element using thereof. Concretely, the present provides the composite magnetic material comprising a binder and a magnetic powder contains followings: Mn not less than 0.25 wt % and not larger than 3 wt %, Si not less than 1 wt % and not larger than 7 wt %, Cr not less than 2 wt % and not larger than 8 wt %, and the rest of Fe and inevitable impurities with respect to the total weight of a magnetic powder material, and a ratio of powder particles having the major/minor axis is not less than 2 is not larger than 5% of the total powder particles.
摘要翻译： 本发明的目的是提供具有良好平衡的磁性能和化学性质的复合磁性材料，以及使用它的磁性元件。 具体地，本发明提供了包含粘合剂的复合磁性材料和含有以下的磁性粉末：Mn不低于0.25重量％且不大于3重量％，Si不小于1重量％且不大于7重量％，Cr 不小于2重量％且不大于8重量％，其余的Fe和不可避免的杂质相对于磁粉末材料的总重量，并且具有主轴/短轴的粉末颗粒的比例不小于 2不大于总粉末颗粒的5％。
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公开(公告)号：US08181660B2
公开(公告)日：2012-05-22
申请号：US12322156
申请日：2009-01-29
CPC分类号： H01L21/67092 , H01L21/67017 , H01L21/67132 , Y10T156/1111 , Y10T156/1126 , Y10T156/1922
摘要： A treatment liquid permeation unit comprises: at least one vibration unit; and a vibration transmission unit for transmitting a vibration from the vibration unit. The vibration transmission unit is positioned between an adhesive with which a wafer is combined to a supporting plate or an adhesive adhered to a surface of the wafer and the vibration unit. A vibration from the vibration unit is transmitted via the vibration transmission unit. This promotes the treatment liquid for dissolving the adhesive to permeate the adhesive to which the treatment liquid is supplied. Therefore, the treatment liquid can more uniformly permeate the adhesive in a shorter time. This allows the treatment liquid for dissolving the adhesive to permeate the adhesive with which the wafer is combined to the supporting plate or to permeate the adhesive adhered to the surface of the wafer in a shorter time.
摘要翻译： 处理液体渗透单元包括：至少一个振动单元; 以及用于从振动单元传递振动的振动传递单元。 振动传递单元位于与晶片组合的粘合剂与粘合到晶片表面的粘合剂和振动单元之间。 来自振动单元的振动经由振动传递单元传递。 这促进了用于溶解粘合剂的处理液渗透到供应处理液的粘合剂。 因此，处理液可以在更短的时间内更均匀地渗透粘合剂。 这使得用于溶解粘合剂的处理液渗透到晶片与支撑板组合的粘合剂上，或者在更短的时间内渗透粘附到晶片表面的粘合剂。
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