公开(公告)号：US10985007B2

公开(公告)日：2021-04-20

申请号：US16157541

申请日：2018-10-11

Applicant: SEMES CO., LTD.

Inventor： Kwangsup Kim

IPC: H01L21/02 ,  B05C5/00 ,  B05C11/00 ,  H01L21/67

Abstract: Disclosed are a substrate treating apparatus and a method for inspecting a treatment liquid nozzle. The substrate treating apparatus includes a support member configured to support a substrate, a treatment liquid nozzle configured to discharge a treatment liquid to the substrate located on the support member, a light source configured to irradiate light to a point of the substrate, to which the treatment liquid is discharged, a camera configured to photograph the point of the substrate, to which the treatment liquid is discharged, and a controller configured to determine, through an image captured by the camera, whether a crown is generated when the treatment liquid collides with the substrate.

公开(公告)号：US11338578B2

公开(公告)日：2022-05-24

申请号：US17079029

申请日：2020-10-23

Applicant: SEMES CO., LTD.

Inventor： Kwangsup Kim ,  Dongok Ahn ,  Junho Oh ,  Ji Hoon Yoo ,  Myeong Jun Lim

IPC: B41J2/045

Abstract: An inspection module is disclosed for inspecting a droplet from an ink jet head. The inspection module includes a sensor located under the ink jet head and measuring a distance between the droplet and the sensor in real time; a variable lens changing an operating distance based on the measured distance of the sensor; and a camera for capturing an image of the droplet. The inspection module further includes a droplet inspecting part inspecting the droplet image captured by the camera.

公开(公告)号：US20190111450A1

公开(公告)日：2019-04-18

申请号：US16157541

申请日：2018-10-11

Applicant: SEMES CO., LTD.

Inventor： Kwangsup Kim

IPC: B05C11/00 ,  B05C5/00

Abstract: Disclosed are a substrate treating apparatus and a method for inspecting a treatment liquid nozzle. The substrate treating apparatus includes a support member configured to support a substrate, a treatment liquid nozzle configured to discharge a treatment liquid to the substrate located on the support member, a light source configured to irradiate light to a point of the substrate, to which the treatment liquid is discharged, a camera configured to photograph the point of the substrate, to which the treatment liquid is discharged, and a controller configured to determine, through an image captured by the camera, whether a crown is generated when the treatment liquid collides with the substrate.

公开(公告)号：US11600593B2

公开(公告)日：2023-03-07

申请号：US16658469

申请日：2019-10-21

Applicant: SEMES CO., LTD.

Inventor： Hanglim Lee ,  Jungsuk Goh ,  Kwangsup Kim ,  Doyeon Kim ,  Minyoung Kim ,  Jihoon Park ,  Yungi Kim ,  Do Heon Kim ,  Choonghyun Lee ,  Hyo Seok Lee ,  Soo Ill Jang

IPC: H01L23/00 ,  H01L21/67

Abstract: Disclosed are a die bonding apparatus, a substrate bonding apparatus, a die bonding method, and a substrate bonding method that are capable of bonding a die to a substrate or bonding substrates together without using a bonding medium such as an adhesion film and a solder bump. The die bonding method includes hydrophilizing a bonding surface of the die, by plasma processing, forming a liquid film on a bonding area of the substrate, by supplying a liquid including water to the bonding area of the substrate, pre-bonding the die to the substrate by bringing the die into contact with the liquid film, and post-bonding one or more dies to the substrate at the same time, by performing heat treatment in a state in which the one or more dies are pre-bonded to the substrate.

公开(公告)号：US10471457B2

公开(公告)日：2019-11-12

申请号：US15010242

申请日：2016-01-29

Applicant: Semes Co., Ltd

Inventor： Keunhwa Yang ,  Yoon Jong Ju ,  Kihoon Choi ,  Kwangsup Kim

IPC: H01L21/66 ,  B05C11/00 ,  B05B17/06 ,  B05B1/14 ,  B05B13/02 ,  B05B14/44

Abstract: A substrate treating apparatus includes a treatment unit including a container, and a support member in the interior of the container to support a substrate, the treatment unit being configured to treat the substrate a nozzle unit having a treatment liquid nozzle for supplying a treatment liquid to the substrate provided in the treatment unit and an inspection unit that inspects whether the treatment liquid is normally discharged from the treatment liquid nozzle. The nozzle further includes a nozzle driver that moves the treatment liquid nozzle from a process position at which the substrate is treated by the treatment unit and an inspection position at which the treatment liquid nozzle is inspected by the inspection unit.

公开(公告)号：US20160221021A1

公开(公告)日：2016-08-04

申请号：US15010242

申请日：2016-01-29

Applicant: Semes Co., Ltd.

Inventor： Keunhwa Yang ,  Yoon Jong Ju ,  Kihoon Choi ,  Kwangsup Kim

IPC: B05C5/02 ,  H04N7/18 ,  H04N5/225 ,  B05B1/14

CPC classification number: B05B17/0623 ,  B05B1/14 ,  B05B13/0228 ,  B05B14/44

Abstract: Disclosed are an inspection unit, an inspection method, and a substrate treating apparatus including the same. A substrate treating apparatus includes a treatment unit including a container, and a support member situated in the interior of the container to support a substrate, the treatment unit being configured to treat the substrate a nozzle unit having a treatment liquid nozzle for supplying a treatment liquid to the substrate provided in the treatment unit and an inspection unit that inspects whether the treatment liquid is normally discharged from the treatment liquid nozzle. The nozzle further includes a nozzle driver that moves the treatment liquid nozzle from a process position at which the substrate is treated by the treatment unit and an inspection position at which the treatment liquid nozzle is inspected by the inspection unit. The inspection unit includes a plate of a transparent material, a photographing member situated below the plate, a light source member that irradiates light onto a path of the treatment liquid discharged from the treatment liquid nozzle towards the plate at the inspection position, and a determination member that determines whether the treatment liquid is normally discharged, from an image photographed by the photographing member.

Abstract translation: 公开了一种检查单元，检查方法和包括该检查单元的基板处理设备。 基板处理装置包括处理单元，该处理单元包括容器和位于容器内部以支撑基板的支撑构件，所述处理单元被配置为处理所述基板，所述喷嘴单元具有用于供应处理液体的处理液喷嘴 到设置在处理单元中的基板和检查处理液是否从处理液喷嘴正常排出的检查单元。 喷嘴还包括喷嘴驱动器，其将处理液喷嘴从处理单元处理的处理位置和检查单元检查处理液喷嘴的检查位置移动。 检查单元包括透明材料板，位于板下方的拍摄构件，将光从处理液喷嘴排出的处理液的路径向检查位置朝向板照射的光源构件， 从拍摄部件拍摄的图像判定处理液是否正常地排出的部件。