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    Door for Drum Type Washing Machines
    1.
    发明申请
    Door for Drum Type Washing Machines 审中-公开
    鼓式洗衣机门

    公开(公告)号：US20070256459A1

    公开(公告)日：2007-11-08

    申请号：US10556344

    申请日：2005-07-08

    申请人： Seong No Yoon ,  Bong Sang Lee ,  Sung Rak Gong ,  Bo Yeon Kim ,  Seong Lee ,  Dae Hee Kwon

    发明人： Seong No Yoon ,  Bong Sang Lee ,  Sung Rak Gong ,  Bo Yeon Kim ,  Seong Lee ,  Dae Hee Kwon

    IPC分类号： A47H33/00

    CPC分类号： D06F37/28

    摘要： Disclosed herein is a door for drum type washing machines wherein a decorative band is permanently attached to a door frame by means of improved engagement between the decorative band and the door frame. The door comprises a door frame formed by injection molding, and a decorative band inserted in a mold by an insert injection method when the door frame is formed by injection molding such that the decorative band is attached to the front surface of the door frame.

    摘要翻译： 本文公开了一种用于滚筒式洗衣机的门，其中装饰带通过改进的装饰带和门框架之间的接合永久地附接到门框。 该门包括通过注射成型形成的门框，以及当通过注射模制形成门框时，通过插入注射法插入模具中的装饰带，使得装饰带附接到门框的前表面。

    Washing machine
    2.
    发明申请
    Washing machine 审中-公开
    洗衣机

    公开(公告)号：US20060254319A1

    公开(公告)日：2006-11-16

    申请号：US11404118

    申请日：2006-04-14

    申请人： Hye Yong Park ,  Bo Yeon Kim ,  Dae Kwon ,  Hyun Kim ,  Seong Lee

    发明人： Hye Yong Park ,  Bo Yeon Kim ,  Dae Kwon ,  Hyun Kim ,  Seong Lee

    IPC分类号： D06F37/00

    CPC分类号： D06F37/266

    摘要： A washing machine is provided. The washing machine includes a rear cabinet cover, a front cabinet cover, and a gasket. The rear cabinet cover includes a rear fabric opening through which fabrics pass. The front cabinet cover is disposed at a front side of the rear cabinet cover and includes a front fabric opening corresponding to the rear fabric opening. The gasket includes a screening portion for covering a periphery of the rear fabric opening.

    摘要翻译： 提供洗衣机。 洗衣机包括后机柜盖，前机柜盖和垫圈。 后机柜盖包括织物通过的后织物开口。 前机柜盖设置在后机柜盖的前侧，并且包括对应于后织物开口的前织物开口。 垫圈包括用于覆盖后织物开口的周边的遮蔽部分。

    Film donor device for laser induced thermal imaging
    3.
    发明申请
    Film donor device for laser induced thermal imaging 失效
    用于激光诱导热成像的薄膜供体装置

    公开(公告)号：US20070046762A1

    公开(公告)日：2007-03-01

    申请号：US11511153

    申请日：2006-08-28

    申请人： Tae Min Kang ,  Jin Kim ,  Mu Kim ,  Sun Kim ,  Noh Kwak ,  Sang Lee ,  Seong Lee ,  Seung Lee ,  Sok Noh ,  Jin Seong ,  Myung Song ,  Yeun Sung ,  Byeong Yoo

    发明人： Tae Min Kang ,  Jin Kim ,  Mu Kim ,  Sun Kim ,  Noh Kwak ,  Sang Lee ,  Seong Lee ,  Seung Lee ,  Sok Noh ,  Jin Seong ,  Myung Song ,  Yeun Sung ,  Byeong Yoo

    IPC分类号： B41J2/38

    CPC分类号： B41M5/265 ,  B41M5/38221 ,  H01L51/0013

    摘要： A laser induced thermal imaging (LITI) apparatus and a method of making an electronic device using the same are disclosed. The LITI apparatus includes a chamber, a substrate support, a contact frame, and a laser source or oscillator. The LITI apparatus transfers a transferable layer from a film donor device onto a surface of an intermediate electronic device. The LITI apparatus uses a magnetic force to provide a close contact between the transferable layer and the surface of the intermediate device. The magnetic force is generated by magnetic materials formed in two components of the LITI apparatus that are spaced apart interposing transferable layer and the surface of the intermediate device. Magnets or magnetic materials are formed in the two following components of the LITI apparatus: 1) the intermediate device and the film donor device; 2) the intermediate device and the contact frame; 3) the substrate support and the film donor device; or 4) the substrate support and the contact frame.

    摘要翻译： 公开了一种激光诱导热成像（LITI）装置和使用其的电子装置的制造方法。 LITI装置包括腔室，衬底支撑件，接触框架和激光源或振荡器。 LITI装置将可转移层从成膜剂装置转移到中间电子装置的表面上。 LITI装置使用磁力来提供可转移层与中间装置的表面之间的紧密接触。 磁力由形成在LITI装置的两个部件中的磁性材料产生，该两个部件是间隔开的中间转印层和中间装置的表面。 在LITI装置的以下两个部件中形成磁体或磁性材料：1）中间装置和薄膜供体装置; 2）中间装置和接触框架; 3）基底支撑体和薄膜供体装置; 或4）衬底支撑件和接触框架。

    Method for preparing unsaturated fatty acids
    4.
    发明申请
    Method for preparing unsaturated fatty acids 审中-公开
    不饱和脂肪酸的制备方法

    公开(公告)号：US20060229461A1

    公开(公告)日：2006-10-12

    申请号：US11388416

    申请日：2006-03-24

    申请人： Soon-Kee Sung ,  Jung Yi ,  Seong Lee

    发明人： Soon-Kee Sung ,  Jung Yi ,  Seong Lee

    IPC分类号： C07C51/43

    CPC分类号： C07C51/487 ,  C07C51/43 ,  C11C1/007 ,  C11C3/14 ,  C07C57/03 ,  C07C57/12

    摘要： Disclosed relates to a method for preparing unsaturated fatty acids and, more particularly, to a method for preparing unsaturated fatty acids in a high purity of at least 99% by isolating and purifying unsaturated fatty acids via a secondary nucleation mechanism using fatty acid-urea inclusion compounds.

    摘要翻译： 本发明涉及一种制备不饱和脂肪酸的方法，更具体地说，涉及通过使用脂肪酸 - 脲包合物通过二次成核机理分离和纯化不饱和脂肪酸，制备高纯度至少99％的不饱和脂肪酸的方法 化合物。

    Multi-path interference removing for wireless relay system apparatus and method using by same channel frequency
    5.
    发明申请
    Multi-path interference removing for wireless relay system apparatus and method using by same channel frequency 有权

    公开(公告)号：US20060013183A1

    公开(公告)日：2006-01-19

    申请号：US11124295

    申请日：2005-05-09

    申请人： Seong Lee ,  Ju Song ,  Hyun Kang

    发明人： Seong Lee ,  Ju Song ,  Hyun Kang

    IPC分类号： H04J1/00

    CPC分类号： H04B7/15564

    摘要： Embodies of peripheral a wireless relay system apparatus and method for a multi-path interference removing using by same channel frequency is shown and described, which purpose of the present invention is to overcome extension of service coverage and a dead spot with amplifying same channel frequency, a problem in doing the relay, system wireless relay system was a same frequency interference of RF (Radio Frequency) output is become feedback radiating from tx antenna to rx antenna of the relay system, the wireless relay system apparatus and method effectively eliminates the same frequency interference so that it can ensure an additional system gain and easy to set up relatively to general same frequency relay system.

    Drum washing machine
    6.
    发明申请
    Drum washing machine 审中-公开
    滚筒洗衣机

    公开(公告)号：US20050268667A1

    公开(公告)日：2005-12-08

    申请号：US11034983

    申请日：2005-01-14

    申请人： Seong Yoon ,  Bong Lee ,  Sung Gong ,  Bo Kim ,  Seong Lee ,  Dae Kwon

    发明人： Seong Yoon ,  Bong Lee ,  Sung Gong ,  Bo Kim ,  Seong Lee ,  Dae Kwon

    IPC分类号： B08B3/12 ,  D06F37/26 ,  D06F39/12

    CPC分类号： D06F39/12

    摘要： Disclosed is a drum washing machine comprising a top cover covering an upper surface of the washing machine, a panel frame provided on an upper front portion of the top cover, and at least one projecting member protruded rearward from the panel frame so as to support a front portion of the top cover.

    摘要翻译： 公开了一种滚筒洗衣机，其包括覆盖洗衣机的上表面的顶盖，设置在顶盖的上前部的面板框架和从面板框架向后突出的至少一个突出构件，以支撑 顶盖的前部。

    Method of manufacturing flash memory device
    7.
    发明申请
    Method of manufacturing flash memory device 审中-公开
    制造闪存设备的方法

    公开(公告)号：US20050106813A1

    公开(公告)日：2005-05-19

    申请号：US10745165

    申请日：2003-12-23

    申请人： Seong Lee ,  Sang Kwak ,  Sang Park

    发明人： Seong Lee ,  Sang Kwak ,  Sang Park

    IPC分类号： H01L21/76 ,  H01L21/336 ,  H01L21/461 ,  H01L21/8234 ,  H01L21/8247 ,  H01L27/08 ,  H01L27/088 ,  H01L27/10 ,  H01L27/105 ,  H01L27/115 ,  H01L29/788 ,  H01L29/792

    CPC分类号： H01L27/115 ,  H01L27/105 ,  H01L27/11526 ,  H01L27/11546

    摘要： Provided is a method of manufacturing a flash memory device. In a flash memory device using a self-aligned shallow trench isolation scheme, a buffer oxide layer is formed between a first polysilicon layer and a nitride layer. After a polishing process for forming a field oxide film is performed, a buffer oxide layer is used as an etch-prevention layer in the process of stripping the nitride layer and the buffer oxide layer is stripped in a cleaning process before a second polysilicon layer is deposited. It is thus possible not only to prevent phosphorous ions contained in an H3PO4 solution used in the process of stripping the nitride layer from diffusing into the grain boundary of the first polysilicon layer, but also to reduce the time when the first polysilicon layer is exposed to a HF cleaner used in the cleaning process before the second polysilicon layer is deposited. Therefore, the present invention has effects that it can enhance the properties of a gate oxide layer and a gate electrode by minimizing an attack of a fluorine radical contained in the HF cleaner against the first polysilicon layer.

    摘要翻译： 提供一种制造闪速存储器件的方法。 在使用自对准浅沟槽隔离方案的闪存器件中，在第一多晶硅层和氮化物层之间形成缓冲氧化物层。 在进行用于形成场氧化膜的抛光工艺之后，在剥离氮化物层的过程中使用缓冲氧化物层作为防蚀层，并且在第二多晶硅层为第二多晶硅层之前在清洁过程中剥离缓冲氧化物层 存放 因此，不仅可以防止在剥离氮化物层的过程中使用的H 3 PO 4·4溶液中所含的磷离子扩散到第一 而且在第二多晶硅层沉积之前也减少了第一多晶硅层暴露于清洁工艺中使用的HF清洁剂的时间。 因此，本发明具有通过使包含在HF清洁器中的氟自由基相对于第一多晶硅层的侵蚀最小化来提高栅极氧化物层和栅电极的性质的效果。

    Tungsten film coating method using tungsten oxide powders
    9.
    发明授权
    Tungsten film coating method using tungsten oxide powders 有权
    使用氧化钨粉末的钨膜涂覆方法

    公开(公告)号：US06821557B2

    公开(公告)日：2004-11-23

    申请号：US10340505

    申请日：2003-01-10

    申请人： Seong Lee ,  Moon-Hee Hong ,  Joon-Woong Noh ,  Eun-Pyo Kim ,  Yoon-Sik Park

    发明人： Seong Lee ,  Moon-Hee Hong ,  Joon-Woong Noh ,  Eun-Pyo Kim ,  Yoon-Sik Park

    IPC分类号： B05D112

    CPC分类号： C23C26/00

    摘要： Disclosed is a tungsten film coating method using tungsten oxide powders including the steps of contacting the tungsten oxide powders with a metal substrate and carrying out thermal reduction treatment thereon at a temperature of at least 650° C. under a hydrogen atmosphere just to coat the tungsten film on the metal substrate. Accordingly, the present invention enables to provide a simple method of coating a tungsten thin film on a metal substrate using the phenomenon of tungsten migration through vapor phase when thermal reduction treatment is carried out on tungsten oxide powders without using previous chemical or physical vapor depositions requiring expensive precision equipments or causing environmental pollution.

    摘要翻译： 公开了一种使用氧化钨粉末的钨膜涂覆方法，其包括以下步骤：使钨氧化物粉末与金属基底接触，并在氢气氛下在至少650℃的温度下对其进行热还原处理，以涂覆钨 薄膜在金属基板上。 因此，本发明能够提供一种在金属基板上涂覆钨薄膜的简单方法，该方法使用钨氧化物粉末进行热还原处理时，通过气相的钨迁移现象，而不需要先前的化学或物理气相沉积 昂贵的精密设备或造成环境污染。