利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

7 条记录 (耗时 0.024 秒)

    SEQUENTIAL INFILTRATION SYNTHESIS FOR ADVANCED LITHOGRAPHY
    2.
    发明申请
    SEQUENTIAL INFILTRATION SYNTHESIS FOR ADVANCED LITHOGRAPHY 有权
    用于高级光刻的顺序浸润合成

    公开(公告)号：US20120241411A1

    公开(公告)日：2012-09-27

    申请号：US13427619

    申请日：2012-03-22

    申请人： Seth B. Darling ,  Jeffrey W. Elam ,  Yu-Chih Tseng ,  Qing Peng

    发明人： Seth B. Darling ,  Jeffrey W. Elam ,  Yu-Chih Tseng ,  Qing Peng

    IPC分类号： H01L21/3065 ,  C23F1/00

    CPC分类号： H01L21/3081 ,  B81C1/00428 ,  B81C2201/0149 ,  B82Y40/00 ,  G03F7/0041 ,  G03F7/405 ,  H01L21/0273 ,  H01L21/0274 ,  H01L21/0277 ,  H01L21/0279 ,  H01L21/3065 ,  H01L21/3086 ,  Y10T428/31522

    摘要： A plasma etch resist material modified by an inorganic protective component via sequential infiltration synthesis (SIS) and methods of preparing the modified resist material. The modified resist material is characterized by an improved resistance to a plasma etching or related process relative to the unmodified resist material, thereby allowing formation of patterned features into a substrate material, which may be high-aspect ratio features. The SIS process forms the protective component within the bulk resist material through a plurality of alternating exposures to gas phase precursors which infiltrate the resist material. The plasma etch resist material may be initially patterned using photolithography, electron-beam lithography or a block copolymer self-assembly process.

    摘要翻译： 通过连续渗透合成（SIS）由无机保护组分改性的等离子体蚀刻抗蚀剂材料和制备改性抗蚀剂材料的方法。 改进的抗蚀剂材料的特征在于相对于未改性的抗蚀剂材料具有改进的抗等离子体蚀刻或相关工艺的耐受性，从而允许将图案化特征形成到基底材料中，该基材可以是高纵横比特征。 SIS工艺通过对渗透抗蚀剂材料的气相前体的多次交替曝光而在体抗蚀材料内形成保护组分。 可以使用光刻，电子束光刻或嵌段共聚物自组装工艺来初始图案化等离子体蚀刻抗蚀剂材料。

    Ordered Nanoscale Domains by Infiltration of Block Copolymers
    3.
    发明申请
    Ordered Nanoscale Domains by Infiltration of Block Copolymers 有权
    嵌段共聚物渗透的有序纳米领域

    公开(公告)号：US20120046421A1

    公开(公告)日：2012-02-23

    申请号：US13209190

    申请日：2011-08-12

    申请人： Seth B. Darling ,  Jeffrey Elam ,  Yu-Chih Tseng ,  Qing Peng

    发明人： Seth B. Darling ,  Jeffrey Elam ,  Yu-Chih Tseng ,  Qing Peng

    IPC分类号： C08F8/42

    CPC分类号： C08G83/001 ,  C08F8/42 ,  H01G9/02 ,  H01J9/025 ,  H01L21/0271 ,  H01L51/4213 ,  H01L51/441 ,  H01M2/166 ,  H01M10/0565 ,  H01M2300/0082

    摘要： A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic feature s with patterned nanostructures defined by the configuration of the microdomain.

    摘要翻译： 通过渗透具有多个自组装的周期性聚合物微畴的嵌段共聚物支架来制备可调谐无机图案化纳米尺度的方法。 该方法可以使用与原子层沉积（ALD）相关的顺序渗透合成（SIS）。 该方法包括选择配置为与限定微区的共聚物单元选择性反应但与该共聚物的另一聚合物单元基本上不反应的金属前体。 选择性地在微区上形成可调谐的无机特征以形成金属前体和共反应物的杂化有机/无机复合材料。 可以任选地除去有机组分以获得具有由微区域的构型限定的图案化纳米结构的无机特征。

    Ordered nanoscale domains by infiltration of block copolymers
    4.
    发明授权
    Ordered nanoscale domains by infiltration of block copolymers 有权
    有序的纳米级域通过嵌段共聚物的渗透

    公开(公告)号：US09487600B2

    公开(公告)日：2016-11-08

    申请号：US13209190

    申请日：2011-08-12

    申请人： Seth B. Darling ,  Jeffrey Elam ,  Yu-Chih Tseng ,  Qing Peng

    发明人： Seth B. Darling ,  Jeffrey Elam ,  Yu-Chih Tseng ,  Qing Peng

    IPC分类号： C08F8/42

    CPC分类号： C08G83/001 ,  C08F8/42 ,  H01G9/02 ,  H01J9/025 ,  H01L21/0271 ,  H01L51/4213 ,  H01L51/441 ,  H01M2/166 ,  H01M10/0565 ,  H01M2300/0082

    摘要： A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic features with patterned nanostructures defined by the configuration of the microdomain.

    摘要翻译： 通过渗透具有多个自组装的周期性聚合物微畴的嵌段共聚物支架来制备可调谐无机图案化纳米尺度的方法。 该方法可以使用与原子层沉积（ALD）相关的顺序渗透合成（SIS）。 该方法包括选择配置为与限定微区的共聚物单元选择性反应但与该共聚物的另一聚合物单元基本上不反应的金属前体。 选择性地在微区上形成可调谐的无机特征以形成金属前体和共反应物的杂化有机/无机复合材料。 可以任选地除去有机组分以获得由微区的构型定义的图案化纳米结构的无机特征。

    Spatially resolved imaging of opto-electrical property variations
    5.
    发明授权
    Spatially resolved imaging of opto-electrical property variations 有权
    光电性能变化的空间分辨成像

    公开(公告)号：US08836944B2

    公开(公告)日：2014-09-16

    申请号：US13629320

    申请日：2012-09-27

    申请人： Maxim Nikiforov ,  Seth B. Darling ,  Ozgun Suzer ,  Jeffrey Guest ,  Andreas Roelofs

    发明人： Maxim Nikiforov ,  Seth B. Darling ,  Ozgun Suzer ,  Jeffrey Guest ,  Andreas Roelofs

    IPC分类号： G01N21/01 ,  G01N21/55 ,  G01N21/59

    CPC分类号： G01N21/01 ,  G01N21/55 ,  G01N21/59 ,  H02S50/10

    摘要： Systems and methods for opto electric properties are provided. A light source illuminates a sample. A reference detector senses light from the light source. A sample detector receives light from the sample. A positioning fixture allows for relative positioning of the sample or the light source with respect to each other. An electrical signal device measures the electrical properties of the sample. The reference detector, sample detector and electrical signal device provide information that may be processed to determine opto-electric properties of the same.

    摘要翻译： 提供了光电特性的系统和方法。 光源照亮样品。 参考探测器感测来自光源的光。 样品检测器接收来自样品的光。 定位夹具允许样品或光源相对于彼此的相对定位。 电信号装置测量样品的电性能。 参考检测器，样品检测器和电信号装置提供可以被处理以确定其光电特性的信息。

    HYBRID SOLAR CELLS VIA UV-POLYMERIZATION OF POLYMER PRECURSOR
    7.
    发明申请
    HYBRID SOLAR CELLS VIA UV-POLYMERIZATION OF POLYMER PRECURSOR 有权
    通过聚合物前体的UV聚合制备的混合太阳能电池

    公开(公告)号：US20100078066A1

    公开(公告)日：2010-04-01

    申请号：US12489001

    申请日：2009-06-22

    申请人： Seth B. Darling ,  Sanja Tepavcevic ,  Tijana Rajh ,  Nada Dimitrijevic ,  Steven J. Sibener

    发明人： Seth B. Darling ,  Sanja Tepavcevic ,  Tijana Rajh ,  Nada Dimitrijevic ,  Steven J. Sibener

    IPC分类号： H01L51/46 ,  H01L51/48

    CPC分类号： H01L51/4226 ,  H01L51/0036 ,  Y02E10/549 ,  Y02P70/521

    摘要： A hybrid photovoltaic cell comprising a composite substrate of a nanotube or nanorod array of metal oxide infiltrated with a monomer precursor and subsequently polymerized in situ via UV irradiation. In an embodiment, the photovoltaic cell comprises an electron accepting TiO2 nanotube array infiltrated with a photo-sensitive electron donating conjugated polymer. The conjugated polymer may be formed in situ through UV irradiation polymerizing a monomer precursor such as 2,5-diiodothiophene (DIT).

    摘要翻译： 一种混合光伏电池，其包含纳米管或纳米棒阵列的金属氧化物的复合衬底，所述金属氧化物浸入单体前体中，随后通过UV照射原位聚合。 在一个实施方案中，光伏电池包括渗透有感光电子给予共轭聚合物的电子接受TiO 2纳米管阵列。 共轭聚合物可以通过UV照射原位形成聚合单体前体如2,5-二碘噻吩（DIT）。