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公开(公告)号：US20110318672A1
公开(公告)日：2011-12-29
申请号：US12824037
申请日：2010-06-25
申请人： Shem Ogadhoh , Raguraman Venkatesan , Kevin J. Hooker , Sungwon Kim , Bin Hu , Vivek Singh , Bikram Baidya , Prasad Narendra Atkar , Seongtae Jeong
发明人： Shem Ogadhoh , Raguraman Venkatesan , Kevin J. Hooker , Sungwon Kim , Bin Hu , Vivek Singh , Bikram Baidya , Prasad Narendra Atkar , Seongtae Jeong
摘要： Described herein is mask design and modeling for a set of masks to be successively imaged to print a composite pattern on a substrate, such as a semiconductor wafer. Further described herein is a method of double patterning a substrate with the set of masks. Also described herein is a method of correcting a drawn pattern of one of the mask levels based on a predicted pattern contour of the other of the mask levels. Also described herein is a method of modeling a resist profile contour for a mask level in which photoresist is applied onto a inhomogeneous substrate, as well as method of predicting a resist profile of a Boolean operation of two masks.
摘要翻译： 这里描述的是要连续成像以在诸如半导体晶片的衬底上打印复合图案的一组掩模的掩模设计和建模。 本文进一步描述的是使用该组掩模对衬底进行双重图案化的方法。 这里还描述了一种基于掩模级别中的另一个的预测图案轮廓来校正掩模级中的一个的绘制图案的方法。 本文还描述了一种对光致抗蚀剂施加到非均匀衬底上的掩模级的抗蚀剂轮廓轮廓建模方法，以及预测两个掩模的布尔运算的抗蚀剂轮廓的方法。
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公开(公告)号：US08404403B2
公开(公告)日：2013-03-26
申请号：US12824037
申请日：2010-06-25
申请人： Shem Ogadhoh , Raguraman Venkatesan , Kevin J. Hooker , Sungwon Kim , Bin Hu , Vivek Singh , Bikram Baidya , Prasad Narendra Atkar , Seongtae Jeong
发明人： Shem Ogadhoh , Raguraman Venkatesan , Kevin J. Hooker , Sungwon Kim , Bin Hu , Vivek Singh , Bikram Baidya , Prasad Narendra Atkar , Seongtae Jeong
IPC分类号： G03F1/68
摘要： Described herein is mask design and modeling for a set of masks to be successively imaged to print a composite pattern on a substrate, such as a semiconductor wafer. Further described herein is a method of double patterning a substrate with the set of masks. Also described herein is a method of correcting a drawn pattern of one of the mask levels based on a predicted pattern contour of the other of the mask levels. Also described herein is a method of modeling a resist profile contour for a mask level in which photoresist is applied onto a inhomogeneous substrate, as well as method of predicting a resist profile of a Boolean operation of two masks.
摘要翻译： 这里描述的是要连续成像以在诸如半导体晶片的衬底上打印复合图案的一组掩模的掩模设计和建模。 本文进一步描述的是使用该组掩模对衬底进行双重图案化的方法。 这里还描述了一种基于掩模级别中的另一个的预测图案轮廓来校正掩模级中的一个的绘制图案的方法。 本文还描述了一种对光致抗蚀剂施加到非均匀衬底上的掩模级的抗蚀剂轮廓轮廓建模方法，以及预测两个掩模的布尔运算的抗蚀剂轮廓的方法。
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公开(公告)号：US08778605B2
公开(公告)日：2014-07-15
申请号：US13762083
申请日：2013-02-07
申请人： Shem Ogadhoh , Raguraman Venkatesan , Kevin J. Hooker , Sungwon Kim , Bin Hu , Vivek Singh , Bikram Baidya , Prasad Narendra Atkar , Seongtae Jeong
发明人： Shem Ogadhoh , Raguraman Venkatesan , Kevin J. Hooker , Sungwon Kim , Bin Hu , Vivek Singh , Bikram Baidya , Prasad Narendra Atkar , Seongtae Jeong
摘要： Described herein is mask design and modeling for a set of masks to be successively imaged to print a composite pattern on a substrate, such as a semiconductor wafer. Further described herein is a method of double patterning a substrate with the set of masks. Also described herein is a method of correcting a drawn pattern of one of the mask levels based on a predicted pattern contour of the other of the mask levels. Also described herein is a method of modeling a resist profile contour for a mask level in which photoresist is applied onto a inhomogeneous substrate, as well as method of predicting a resist profile of a Boolean operation of two masks.
摘要翻译： 这里描述的是要连续成像以在诸如半导体晶片的衬底上打印复合图案的一组掩模的掩模设计和建模。 本文进一步描述的是使用该组掩模对衬底进行双重图案化的方法。 这里还描述了一种基于掩模级别中的另一个的预测图案轮廓来校正掩模级中的一个的绘制图案的方法。 本文还描述了一种对光致抗蚀剂施加到非均匀衬底上的掩模级的抗蚀剂轮廓轮廓建模方法，以及预测两个掩模的布尔运算的抗蚀剂轮廓的方法。
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4.发明授权Mask layout patterns for closely spaced primitives in phase shift photolithography masks 有权在相移光刻掩模中用于紧密间隔的基元的掩模布局图案公开(公告)号：US09122169B2
公开(公告)日：2015-09-01
申请号：US13977638
申请日：2011-12-29
申请人： Bin Hu , Vivek K. Singh , Sungwon Kim , Chulwoo Oh , Mehmet E. Yavuz
发明人： Bin Hu , Vivek K. Singh , Sungwon Kim , Chulwoo Oh , Mehmet E. Yavuz
摘要： Improved mask layout patterns are described for closely spaced primitives in phase shift photolithography masks. In one example, at least a portion of a photolithography mask layout is decomposed into primitives. Jogs are identified from among the primitives, the jogs being characterized by three adjacent corners. E-fields are determined for the identified jogs and are applied to synthesize an electric field at a substrate. The mask layout is corrected using the synthesized electric field and a printed wafer pattern is calculated.
摘要翻译： 在相移光刻掩模中描述了用于紧密间隔的基元的改进的掩模布局图案。 在一个示例中，光刻掩模布局的至少一部分被分解为基元。 从原始图像中识别出慢跑，其特征在于三个相邻角落。 为识别的点动确定电场，并且被应用于在衬底处合成电场。 使用合成电场校正掩模布局，并计算印刷晶片图案。
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5.发明申请MASK LAYOUT PATTERNS FOR CLOSELY SPACED PRIMITIVES IN PHASE SHIFT PHOTOLITHOGRAPHY MASKS 有权相位移动胶片面罩中的封闭空白对象的屏蔽图案公开(公告)号：US20140302427A1
公开(公告)日：2014-10-09
申请号：US13977638
申请日：2011-12-29
申请人： Bin Hu , Vivek K. Singh , Sungwon Kim , Chulwoo Oh , Mehmet E. Yavuz
发明人： Bin Hu , Vivek K. Singh , Sungwon Kim , Chulwoo Oh , Mehmet E. Yavuz
IPC分类号： G03F1/68
摘要： Improved mask layout patterns are described for closely spaced primitives in phase shift photolithography masks. In one example, at least a portion of a photolithography mask layout is decomposed into primitives. Jogs are identified from among the primitives, the jogs being characterized by three adjacent corners. E-fields are determined for the identified jogs and are applied to synthesize an electric field at a substrate. The mask layout is corrected using the synthesized electric field and a printed wafer pattern is calculated.
摘要翻译： 在相移光刻掩模中描述了用于紧密间隔的基元的改进的掩模布局图案。 在一个示例中，光刻掩模布局的至少一部分被分解为基元。 从原始图像中识别出慢跑，其特征在于三个相邻角落。 为识别的点动确定电场，并且被应用于在衬底处合成电场。 使用合成电场校正掩模布局，并计算印刷晶片图案。
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公开(公告)号：US08332377B2
公开(公告)日：2012-12-11
申请号：US11469544
申请日：2006-09-01
申请人： Yong-Jae Kwak , Se Jin Cheon , Tae Hyeon Park , Sungwon Kim , Jang Won Seo , Beom Seok Seo
发明人： Yong-Jae Kwak , Se Jin Cheon , Tae Hyeon Park , Sungwon Kim , Jang Won Seo , Beom Seok Seo
IPC分类号： G06F17/30
CPC分类号： G06F17/30106
摘要： A method of controlling a search controller includes: monitoring a top level window which is activated on a top level among applications in execution; determining whether the monitored top level window corresponds to a File Open dialog box; attaching the search controller to the File Open dialog box, when the monitored top level window is determined as the File Open dialog box; retrieving a file corresponding to a query which is inputted from a user via the search controller, and outputting a file search result list via the search controller, the file search result list including the retrieved file; receiving a selection on a particular file, which is included in the file search result list, from the user; and transmitting path information associated with the particular file to the File Open dialog box.
摘要翻译： 一种控制搜索控制器的方法包括：监视在执行中的应用程序之间的顶层激活的顶级窗口; 确定所监视的顶层窗口是否对应于文件打开对话框; 将搜索控制器附加到“文件打开”对话框，当被监视的顶层窗口被确定为“文件打开”对话框时; 检索与通过搜索控制器从用户输入的查询相对应的文件，经由搜索控制器输出文件搜索结果列表，文件搜索结果列表包括检索文件; 从用户接收包含在文件搜索结果列表中的特定文件上的选择; 并将与特定文件相关联的路径信息发送到文件打开对话框。
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7.发明授权公开(公告)号：US07853592B2
公开(公告)日：2010-12-14
申请号：US11584231
申请日：2006-10-20
申请人： Yong Jae Kwak , Se Jin Cheon , Tae Hyeon Park , Sungwon Kim , Jang Won Seo , Beom Seok Seo
发明人： Yong Jae Kwak , Se Jin Cheon , Tae Hyeon Park , Sungwon Kim , Jang Won Seo , Beom Seok Seo
CPC分类号： G06F17/30867
摘要： A visited website search system searching a website visited by a user. The visited website search system searching the website visited by the user includes: a mini web server installed in the local computer, receiving a search command with respect to data in the local computer from a web browser according to an HTTP protocol and providing a search result in a web document to the web browser; a searcher generating a search result by searching a website, corresponding to an query included in the search command, among the website visited by user and a web document generator generating the search result in the web document. Accordingly, the visited website by the user may be stably searched according to the HTTP protocol, similar to a web search.
摘要翻译： 访问的网站搜索系统搜索用户访问的网站。 搜索用户访问的网站的访问网站搜索系统包括：安装在本地计算机中的小型web服务器，根据HTTP协议从web浏览器接收关于本地计算机中的数据的搜索命令，并提供搜索结果 在Web浏览器的Web文档中; 搜索者通过在由用户访问的网站和在web文档中生成搜索结果的web文档生成器之间搜索与搜索命令中包括的查询相对应的网站来生成搜索结果。 因此，与网络搜索类似，可以根据HTTP协议来稳定地搜索用户访问的网站。
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公开(公告)号：US08901289B2
公开(公告)日：2014-12-02
申请号：US12775843
申请日：2010-05-07
申请人： Kyeong-Eun Jung , Alexei Kayushin , Moon Hee Kim , Kyung-Il Kim , Sungwon Kim , Yumi Ji
发明人： Kyeong-Eun Jung , Alexei Kayushin , Moon Hee Kim , Kyung-Il Kim , Sungwon Kim , Yumi Ji
IPC分类号： C07H21/02 , C07H19/167 , C07H19/067 , C07H19/10 , C07H19/20
CPC分类号： C07H21/02 , C07H1/00 , C07H19/067 , C07H19/10 , C07H19/167 , C07H19/20
摘要： The present invention provides a method for preparing nucleotide oligomers, including (a) coupling a nucleotide dimer or nucleotide trimer to a nucleoside attached to solid supports or to universal solid supports as a starting material; (b) sequentially coupling nucleotide monomers to the resulting structures of Step (a) to prepare a nucleotide oligomer; and (c) removing the nucleotide oligomers from the solid supports.The method of the present invention provides nucleotide oligomers having 15-20% higher purity than the conventional art. The present invention enables the efficient and inexpensive synthesis of nucleotide oligomers with high purity within a shorter period of time.
摘要翻译： 本发明提供了制备核苷酸寡聚体的方法，包括（a）将核苷酸二聚体或核苷酸三聚体与连接至固体支持物的核苷或作为起始材料的通用固体支持物偶联; （b）顺序地将核苷酸单体与步骤（a）的所得结构偶联以制备核苷酸寡聚物; 和（c）从固体支持物中除去核苷酸寡聚体。 本发明的方法提供了具有比常规技术高15-20％的核苷酸寡聚物。 本发明能够在更短的时间内高效且廉价地合成具有高纯度的核苷酸低聚物。
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公开(公告)号：US20070079254A1
公开(公告)日：2007-04-05
申请号：US11469544
申请日：2006-09-01
申请人： Yong-Jae Kwak , Se Jin Cheon , Tae Hyeon Park , Sungwon Kim , Jang Won Seo , Beom Seok Seo
发明人： Yong-Jae Kwak , Se Jin Cheon , Tae Hyeon Park , Sungwon Kim , Jang Won Seo , Beom Seok Seo
IPC分类号： G06F17/30
CPC分类号： G06F17/30106
摘要： A method of controlling a search controller includes: monitoring a top level window which is activated on a top level among applications in execution; determining whether the monitored top level window corresponds to a File Open dialog box; attaching the search controller to the File Open dialog box, when the monitored top level window is determined as the File Open dialog box; retrieving a file corresponding to a query which is inputted from a user via the search controller, and outputting a file search result list via the search controller, the file search result list including the retrieved file; receiving a selection on a particular file, which is included in the file search result list, from the user; and transmitting path information associated with the particular file to the File Open dialog box.
摘要翻译： 一种控制搜索控制器的方法包括：监视在执行中的应用程序之间的顶层激活的顶级窗口; 确定所监视的顶层窗口是否对应于文件打开对话框; 将搜索控制器附加到“文件打开”对话框，当被监视的顶层窗口被确定为“文件打开”对话框时; 检索与通过搜索控制器从用户输入的查询相对应的文件，经由搜索控制器输出文件搜索结果列表，文件搜索结果列表包括检索文件; 从用户接收包含在文件搜索结果列表中的特定文件上的选择; 并将与特定文件相关联的路径信息发送到文件打开对话框。
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公开(公告)号：US08463965B2
公开(公告)日：2013-06-11
申请号：US13157061
申请日：2011-06-09
申请人： Dongwon Park , Sunghoon Kim , Sungwon Kim , Chongho Lee
发明人： Dongwon Park , Sunghoon Kim , Sungwon Kim , Chongho Lee
CPC分类号： G06F3/147
摘要： An iDP interface test method includes transmitting test clocks to an iDP sink device; determining whether or not a link clock lock operation in the iDP sink device is successful based on a measurement result of an HPD signal when a clock lock operation for the test clocks is performed; transmitting test data and arbitrary video data to the iDP sink device if the link clock lock operation in the iDP sink device is successful; determining whether or not a symbol lock operation in the iDP sink device is successful when the symbol lock operation for the test data and the arbitrary video data is performed; and comparing a count result with a predetermined reference value, and determining link stability of the iDP sink device based on the comparison result.
摘要翻译： iDP接口测试方法包括将测试时钟发送到iDP宿设备; 当执行用于测试时钟的时钟锁定操作时，基于HPD信号的测量结果，确定iDP宿设备中的链路时钟锁定操作是否成功; 如果iDP宿设备中的链路时钟锁定操作成功，则将测试数据和任意视频数据发送到iDP宿设备; 当执行测试数据和任意视频数据的符号锁定操作时，确定iDP宿设备中的符号锁定操作是否成功; 以及将计数结果与预定参考值进行比较，并且基于比较结果确定iDP宿设备的链路稳定性。
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