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公开(公告)号：US08332377B2
公开(公告)日：2012-12-11
申请号：US11469544
申请日：2006-09-01
申请人： Yong-Jae Kwak , Se Jin Cheon , Tae Hyeon Park , Sungwon Kim , Jang Won Seo , Beom Seok Seo
发明人： Yong-Jae Kwak , Se Jin Cheon , Tae Hyeon Park , Sungwon Kim , Jang Won Seo , Beom Seok Seo
IPC分类号： G06F17/30
CPC分类号： G06F17/30106
摘要： A method of controlling a search controller includes: monitoring a top level window which is activated on a top level among applications in execution; determining whether the monitored top level window corresponds to a File Open dialog box; attaching the search controller to the File Open dialog box, when the monitored top level window is determined as the File Open dialog box; retrieving a file corresponding to a query which is inputted from a user via the search controller, and outputting a file search result list via the search controller, the file search result list including the retrieved file; receiving a selection on a particular file, which is included in the file search result list, from the user; and transmitting path information associated with the particular file to the File Open dialog box.
摘要翻译： 一种控制搜索控制器的方法包括：监视在执行中的应用程序之间的顶层激活的顶级窗口; 确定所监视的顶层窗口是否对应于文件打开对话框; 将搜索控制器附加到“文件打开”对话框，当被监视的顶层窗口被确定为“文件打开”对话框时; 检索与通过搜索控制器从用户输入的查询相对应的文件，经由搜索控制器输出文件搜索结果列表，文件搜索结果列表包括检索文件; 从用户接收包含在文件搜索结果列表中的特定文件上的选择; 并将与特定文件相关联的路径信息发送到文件打开对话框。
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公开(公告)号：US20110318672A1
公开(公告)日：2011-12-29
申请号：US12824037
申请日：2010-06-25
申请人： Shem Ogadhoh , Raguraman Venkatesan , Kevin J. Hooker , Sungwon Kim , Bin Hu , Vivek Singh , Bikram Baidya , Prasad Narendra Atkar , Seongtae Jeong
发明人： Shem Ogadhoh , Raguraman Venkatesan , Kevin J. Hooker , Sungwon Kim , Bin Hu , Vivek Singh , Bikram Baidya , Prasad Narendra Atkar , Seongtae Jeong
摘要： Described herein is mask design and modeling for a set of masks to be successively imaged to print a composite pattern on a substrate, such as a semiconductor wafer. Further described herein is a method of double patterning a substrate with the set of masks. Also described herein is a method of correcting a drawn pattern of one of the mask levels based on a predicted pattern contour of the other of the mask levels. Also described herein is a method of modeling a resist profile contour for a mask level in which photoresist is applied onto a inhomogeneous substrate, as well as method of predicting a resist profile of a Boolean operation of two masks.
摘要翻译： 这里描述的是要连续成像以在诸如半导体晶片的衬底上打印复合图案的一组掩模的掩模设计和建模。 本文进一步描述的是使用该组掩模对衬底进行双重图案化的方法。 这里还描述了一种基于掩模级别中的另一个的预测图案轮廓来校正掩模级中的一个的绘制图案的方法。 本文还描述了一种对光致抗蚀剂施加到非均匀衬底上的掩模级的抗蚀剂轮廓轮廓建模方法，以及预测两个掩模的布尔运算的抗蚀剂轮廓的方法。
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3.发明授权公开(公告)号：US07853592B2
公开(公告)日：2010-12-14
申请号：US11584231
申请日：2006-10-20
申请人： Yong Jae Kwak , Se Jin Cheon , Tae Hyeon Park , Sungwon Kim , Jang Won Seo , Beom Seok Seo
发明人： Yong Jae Kwak , Se Jin Cheon , Tae Hyeon Park , Sungwon Kim , Jang Won Seo , Beom Seok Seo
CPC分类号： G06F17/30867
摘要： A visited website search system searching a website visited by a user. The visited website search system searching the website visited by the user includes: a mini web server installed in the local computer, receiving a search command with respect to data in the local computer from a web browser according to an HTTP protocol and providing a search result in a web document to the web browser; a searcher generating a search result by searching a website, corresponding to an query included in the search command, among the website visited by user and a web document generator generating the search result in the web document. Accordingly, the visited website by the user may be stably searched according to the HTTP protocol, similar to a web search.
摘要翻译： 访问的网站搜索系统搜索用户访问的网站。 搜索用户访问的网站的访问网站搜索系统包括：安装在本地计算机中的小型web服务器，根据HTTP协议从web浏览器接收关于本地计算机中的数据的搜索命令，并提供搜索结果 在Web浏览器的Web文档中; 搜索者通过在由用户访问的网站和在web文档中生成搜索结果的web文档生成器之间搜索与搜索命令中包括的查询相对应的网站来生成搜索结果。 因此，与网络搜索类似，可以根据HTTP协议来稳定地搜索用户访问的网站。
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4.发明授权Mask layout patterns for closely spaced primitives in phase shift photolithography masks 有权在相移光刻掩模中用于紧密间隔的基元的掩模布局图案公开(公告)号：US09122169B2
公开(公告)日：2015-09-01
申请号：US13977638
申请日：2011-12-29
申请人： Bin Hu , Vivek K. Singh , Sungwon Kim , Chulwoo Oh , Mehmet E. Yavuz
发明人： Bin Hu , Vivek K. Singh , Sungwon Kim , Chulwoo Oh , Mehmet E. Yavuz
摘要： Improved mask layout patterns are described for closely spaced primitives in phase shift photolithography masks. In one example, at least a portion of a photolithography mask layout is decomposed into primitives. Jogs are identified from among the primitives, the jogs being characterized by three adjacent corners. E-fields are determined for the identified jogs and are applied to synthesize an electric field at a substrate. The mask layout is corrected using the synthesized electric field and a printed wafer pattern is calculated.
摘要翻译： 在相移光刻掩模中描述了用于紧密间隔的基元的改进的掩模布局图案。 在一个示例中，光刻掩模布局的至少一部分被分解为基元。 从原始图像中识别出慢跑，其特征在于三个相邻角落。 为识别的点动确定电场，并且被应用于在衬底处合成电场。 使用合成电场校正掩模布局，并计算印刷晶片图案。
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公开(公告)号：US08380814B2
公开(公告)日：2013-02-19
申请号：US11543343
申请日：2006-10-04
申请人： Yong-Jae Kwak , Se Jin Cheon , Tae Hyeon Park , Sungwon Kim , Jang Won Seo , Beom Seok Seo
发明人： Yong-Jae Kwak , Se Jin Cheon , Tae Hyeon Park , Sungwon Kim , Jang Won Seo , Beom Seok Seo
IPC分类号： G06F15/16
CPC分类号： G06F17/30884
摘要： An automatic favorites registration method and system which can automatically register a website address of a particular website when a local computer accesses the particular website, and also can adjustably determine whether to add the website address to favorites by avoiding an unconditional automatic registration of the website address to the favorites and considering a user's access trend. According to the present disclosure, there is provided an automatic favorites registration method and system which can automatically register a website which a local computer accesses, and also can register only an additional website which is determined to be optimal for a user's convenience, or maintain a favorites registration of the website according to the user's recent search trend.
摘要翻译： 一种自动收藏登记方法和系统，当本地计算机访问特定网站时，可以自动注册特定网站的网站地址，并且还可以通过避免网站地址的无条件自动注册来可调整地确定是否将网站地址添加到收藏夹 考虑到用户的访问趋势。 根据本公开，提供了一种自动收藏登记方法和系统，其可以自动注册本地计算机访问的网站，并且还可以仅注册为了用户方便而被确定为最佳的附加网站，或者维护 根据用户最近的搜索趋势，网站的最爱注册。
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公开(公告)号：US20100273999A1
公开(公告)日：2010-10-28
申请号：US12775843
申请日：2010-05-07
申请人： Kyeong-Eun Jung , Alexei Kayushin , Moon Hee Kim , Kyung-Il Kim , Sungwon Kim , Yumi Ji
发明人： Kyeong-Eun Jung , Alexei Kayushin , Moon Hee Kim , Kyung-Il Kim , Sungwon Kim , Yumi Ji
CPC分类号： C07H21/02 , C07H1/00 , C07H19/067 , C07H19/10 , C07H19/167 , C07H19/20
摘要： The present invention provides a method for preparing nucleotide oligomers, including (a) coupling a nucleotide dimer or nucleotide trimer to a nucleoside attached to solid supports or to universal solid supports as a starting material; (b) sequentially coupling nucleotide monomers to the resulting structures of Step (a) to prepare a nucleotide oligomer; and (c) removing the nucleotide oligomers from the solid supports.The method of the present invention provides nucleotide oligomers having 15-20% higher purity than the conventional art. The present invention enables the efficient and inexpensive synthesis of nucleotide oligomers with high purity within a shorter period of time.
摘要翻译： 本发明提供了制备核苷酸寡聚体的方法，包括（a）将核苷酸二聚体或核苷酸三聚体与连接至固体支持物的核苷或作为起始材料的通用固体支持物偶联; （b）顺序地将核苷酸单体与步骤（a）的所得结构偶联以制备核苷酸寡聚物; 和（c）从固体支持物中除去核苷酸寡聚体。 本发明的方法提供了具有比常规技术高15-20％的核苷酸寡聚物。 本发明能够在更短的时间内高效且廉价地合成具有高纯度的核苷酸低聚物。
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公开(公告)号：US08901289B2
公开(公告)日：2014-12-02
申请号：US12775843
申请日：2010-05-07
申请人： Kyeong-Eun Jung , Alexei Kayushin , Moon Hee Kim , Kyung-Il Kim , Sungwon Kim , Yumi Ji
发明人： Kyeong-Eun Jung , Alexei Kayushin , Moon Hee Kim , Kyung-Il Kim , Sungwon Kim , Yumi Ji
IPC分类号： C07H21/02 , C07H19/167 , C07H19/067 , C07H19/10 , C07H19/20
CPC分类号： C07H21/02 , C07H1/00 , C07H19/067 , C07H19/10 , C07H19/167 , C07H19/20
摘要： The present invention provides a method for preparing nucleotide oligomers, including (a) coupling a nucleotide dimer or nucleotide trimer to a nucleoside attached to solid supports or to universal solid supports as a starting material; (b) sequentially coupling nucleotide monomers to the resulting structures of Step (a) to prepare a nucleotide oligomer; and (c) removing the nucleotide oligomers from the solid supports.The method of the present invention provides nucleotide oligomers having 15-20% higher purity than the conventional art. The present invention enables the efficient and inexpensive synthesis of nucleotide oligomers with high purity within a shorter period of time.
摘要翻译： 本发明提供了制备核苷酸寡聚体的方法，包括（a）将核苷酸二聚体或核苷酸三聚体与连接至固体支持物的核苷或作为起始材料的通用固体支持物偶联; （b）顺序地将核苷酸单体与步骤（a）的所得结构偶联以制备核苷酸寡聚物; 和（c）从固体支持物中除去核苷酸寡聚体。 本发明的方法提供了具有比常规技术高15-20％的核苷酸寡聚物。 本发明能够在更短的时间内高效且廉价地合成具有高纯度的核苷酸低聚物。
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公开(公告)号：US20070079254A1
公开(公告)日：2007-04-05
申请号：US11469544
申请日：2006-09-01
申请人： Yong-Jae Kwak , Se Jin Cheon , Tae Hyeon Park , Sungwon Kim , Jang Won Seo , Beom Seok Seo
发明人： Yong-Jae Kwak , Se Jin Cheon , Tae Hyeon Park , Sungwon Kim , Jang Won Seo , Beom Seok Seo
IPC分类号： G06F17/30
CPC分类号： G06F17/30106
摘要： A method of controlling a search controller includes: monitoring a top level window which is activated on a top level among applications in execution; determining whether the monitored top level window corresponds to a File Open dialog box; attaching the search controller to the File Open dialog box, when the monitored top level window is determined as the File Open dialog box; retrieving a file corresponding to a query which is inputted from a user via the search controller, and outputting a file search result list via the search controller, the file search result list including the retrieved file; receiving a selection on a particular file, which is included in the file search result list, from the user; and transmitting path information associated with the particular file to the File Open dialog box.
摘要翻译： 一种控制搜索控制器的方法包括：监视在执行中的应用程序之间的顶层激活的顶级窗口; 确定所监视的顶层窗口是否对应于文件打开对话框; 将搜索控制器附加到“文件打开”对话框，当被监视的顶层窗口被确定为“文件打开”对话框时; 检索与通过搜索控制器从用户输入的查询相对应的文件，经由搜索控制器输出文件搜索结果列表，文件搜索结果列表包括检索文件; 从用户接收包含在文件搜索结果列表中的特定文件上的选择; 并将与特定文件相关联的路径信息发送到文件打开对话框。
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公开(公告)号：US08778605B2
公开(公告)日：2014-07-15
申请号：US13762083
申请日：2013-02-07
申请人： Shem Ogadhoh , Raguraman Venkatesan , Kevin J. Hooker , Sungwon Kim , Bin Hu , Vivek Singh , Bikram Baidya , Prasad Narendra Atkar , Seongtae Jeong
发明人： Shem Ogadhoh , Raguraman Venkatesan , Kevin J. Hooker , Sungwon Kim , Bin Hu , Vivek Singh , Bikram Baidya , Prasad Narendra Atkar , Seongtae Jeong
摘要： Described herein is mask design and modeling for a set of masks to be successively imaged to print a composite pattern on a substrate, such as a semiconductor wafer. Further described herein is a method of double patterning a substrate with the set of masks. Also described herein is a method of correcting a drawn pattern of one of the mask levels based on a predicted pattern contour of the other of the mask levels. Also described herein is a method of modeling a resist profile contour for a mask level in which photoresist is applied onto a inhomogeneous substrate, as well as method of predicting a resist profile of a Boolean operation of two masks.
摘要翻译： 这里描述的是要连续成像以在诸如半导体晶片的衬底上打印复合图案的一组掩模的掩模设计和建模。 本文进一步描述的是使用该组掩模对衬底进行双重图案化的方法。 这里还描述了一种基于掩模级别中的另一个的预测图案轮廓来校正掩模级中的一个的绘制图案的方法。 本文还描述了一种对光致抗蚀剂施加到非均匀衬底上的掩模级的抗蚀剂轮廓轮廓建模方法，以及预测两个掩模的布尔运算的抗蚀剂轮廓的方法。
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公开(公告)号：US20130149638A1
公开(公告)日：2013-06-13
申请号：US13762083
申请日：2013-02-07
申请人： Shem OGADHOH , Raguraman VENKATESAN , Kevin J. HOOKER , Sungwon KIM , Bin HU , Vivek SINGH , Bikram BAIDYA , Prasad NARENDRA ATKAR , Seongtae JEONG
发明人： Shem OGADHOH , Raguraman VENKATESAN , Kevin J. HOOKER , Sungwon KIM , Bin HU , Vivek SINGH , Bikram BAIDYA , Prasad NARENDRA ATKAR , Seongtae JEONG
摘要： Described herein is mask design and modeling for a set of masks to be successively imaged to print a composite pattern on a substrate, such as a semiconductor wafer. Further described herein is a method of double patterning a substrate with the set of masks. Also described herein is a method of correcting a drawn pattern of one of the mask levels based on a predicted pattern contour of the other of the mask levels. Also described herein is a method of modeling a resist profile contour for a mask level in which photoresist is applied onto a inhomogeneous substrate, as well as method of predicting a resist profile of a Boolean operation of two masks.
摘要翻译： 这里描述的是要连续成像以在诸如半导体晶片的衬底上打印复合图案的一组掩模的掩模设计和建模。 本文进一步描述的是使用该组掩模对衬底进行双重图案化的方法。 这里还描述了一种基于掩模级别中的另一个的预测图案轮廓来校正掩模级中的一个的绘制图案的方法。 本文还描述了一种对光致抗蚀剂施加到非均匀衬底上的掩模级的抗蚀剂轮廓轮廓建模方法，以及预测两个掩模的布尔运算的抗蚀剂轮廓的方法。
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