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6 条记录 (耗时 0.058 秒)

    Developable bottom anti-reflective coating
    1.
    发明授权
    Developable bottom anti-reflective coating 有权
    可开发的底部防反射涂层

    公开(公告)号：US08900797B2

    公开(公告)日：2014-12-02

    申请号：US13627599

    申请日：2012-09-26

    申请人： Shigemasa Nakasugi ,  Shinji Miyazaki ,  Munirathna Padmanaban ,  Alberto D. Dioses

    发明人： Shigemasa Nakasugi ,  Shinji Miyazaki ,  Munirathna Padmanaban ,  Alberto D. Dioses

    IPC分类号： C07D251/38 ,  C07D213/69 ,  C07D213/70 ,  C07D239/60 ,  C07D251/30 ,  G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/038 ,  C07D251/30 ,  C07D251/38 ,  G03F7/091

    摘要： The present invention provides a cross-linking agent capable of preventing formation of scum from a bottom anti-reflective coating, and also provides a composition for forming a bottom anti-reflection coating containing the agent. The cross-linking agent is a nitrogen-containing aromatic compound having at least one vinyloxy group or N-methoxymethylamide group, and the composition contains the cross-linking agent. The cross-linking agent of the formula (1) can be produced by reaction of a nitrogen-containing aromatic compound, a halogen compound having a vinyloxy group or N-methoxymethylamide group and a basic compound.

    摘要翻译： 本发明提供能够防止从底部抗反射涂层形成浮渣的交联剂，并且还提供了用于形成含有该试剂的底部防反射涂层的组合物。 交联剂是具有至少一个乙烯基氧基或N-甲氧基甲基酰胺基的含氮芳香族化合物，该组合物含有交联剂。 式（1）的交联剂可以通过含氮芳族化合物，具有乙烯氧基的卤素化合物或N-甲氧基甲基酰胺基和碱性化合物的反应来制备。

    Positive-Working Photoimageable Bottom Antireflective Coating
    2.
    发明申请
    Positive-Working Photoimageable Bottom Antireflective Coating 审中-公开
    正面照相底部防反射涂层

    公开(公告)号：US20110086312A1

    公开(公告)日：2011-04-14

    申请号：US12576622

    申请日：2009-10-09

    申请人： Ralph R. Dammel ,  Srinivasan Chakrapani ,  Munirathna Padmanaban ,  Shinji Miyazaki ,  Edward W. Ng ,  Takanori Kudo ,  Alberto D. Dioses ,  Francis M. Houlihan

    发明人： Ralph R. Dammel ,  Srinivasan Chakrapani ,  Munirathna Padmanaban ,  Shinji Miyazaki ,  Edward W. Ng ,  Takanori Kudo ,  Alberto D. Dioses ,  Francis M. Houlihan

    IPC分类号： G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/091

    摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent of structure (7), and optionally, a photoacid generator and/or an acid and/or a thermal acid generator, where structure (7) is wherein W is selected from (C1-C30) linear, branched or cyclic alkyl moiety, substituted or unsubstituted (C3-C40) alicyclic hydrocarbon moiety and substituted is or unsubstituted (C3-C40) cycloalkylalkylene moiety; R is selected from C1-C10 linear or branched alkylene and n≧2. The invention further relates to a process for using such a composition.

    摘要翻译： 本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，结构式（7）的乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂，其中结构（7）其中W选自（C1 -C 30）直链，支链或环状的烷基部分，取代或未取代的（C 3 -C 40）脂环烃部分和取代的或未取代的（C 3 -C 40）环烷基亚烷基部分; R选自C1-C10直链或支链亚烷基，n≥2。 本发明还涉及使用这种组合物的方法。

    Mixed solvent system for positive photoresists
    5.
    发明授权
    Mixed solvent system for positive photoresists 失效
    正性光致抗蚀剂的混合溶剂体系

    公开(公告)号：US06391514B1

    公开(公告)日：2002-05-21

    申请号：US09642128

    申请日：2000-08-18

    申请人： J. Neville Eilbeck ,  Alberto D. Dioses

    发明人： J. Neville Eilbeck ,  Alberto D. Dioses

    IPC分类号： G03F7023

    CPC分类号： G03F7/0048

    摘要： A photosensitive positive working composition suitable for use as a photoresist, which comprises an admixture of at least one film forming resin; at least one photosensitizer; and a photoresist solvent mixture containing more than 50 weight percent of an alkylene glycol alkyl ether and less than 50 weight percent of either an alkyl alkoxy propionate or an alkyl amyl ketone, and a process for producing such a photoresist composition.

    摘要翻译： 适合用作光致抗蚀剂的感光性正性工作组合物，其包含至少一种成膜树脂的混合物; 至少一种光敏剂; 和含有大于50重量％的亚烷基二醇烷基醚和小于50重量％的烷基烷氧基丙酸酯或烷基戊基酮的光致抗蚀剂溶剂混合物，以及制备这种光致抗蚀剂组合物的方法。

    Novolak resin mixtures and photosensitive compositions comprising the same
    6.
    发明授权
    Novolak resin mixtures and photosensitive compositions comprising the same 失效
    酚醛清漆树脂混合物和包含它们的光敏组合物

    公开(公告)号：US06733949B2

    公开(公告)日：2004-05-11

    申请号：US10120893

    申请日：2002-04-11

    申请人： J. Neville Eilbeck ,  Alberto D. Dioses

    发明人： J. Neville Eilbeck ,  Alberto D. Dioses

    IPC分类号： G03F7023

    CPC分类号： G03F7/0236 ,  C08K5/08 ,  C08L61/06 ,  C08L2666/16

    摘要： Disclosed is an alkali-soluble, film-forming novolak resin mixture containing at least two novolak resins, each novolak resin containing the addition-condensation reaction product of at least one phenolic compound with at least one aldehyde source, wherein the phenolic compound for first novolak resin contains 90-100 mole % of meta-cresol, and the phenolic compound for the second novolak resin contains less than 50 mole % of meta-cresol. Also disclosed is a photosensitive composition, containing an admixture of: a) the above-mentioned novolak resin mixture; b) at least one o-quinone photoactive compound; and c) at least one photoresist solvent. Also disclosed is a method for producing a microelectronic device by forming an image on a substrate, which involves: a) providing the above-mentioned photosensitive composition; b) thereafter, coating a suitable substrate with the photoresist composition from step a); c) thereafter, heat treating the coated substrate until substantially all of the solvent is removed; image-wise exposing the coated substrate; and then removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.

    摘要翻译： 公开了含有至少两种酚醛清漆树脂的碱溶性成膜酚醛清漆树脂混合物，每种酚醛清漆树脂含有至少一种酚类化合物与至少一种醛源的加成缩合反应产物，其中用于第一酚醛清漆的酚类化合物 树脂含有90-100摩尔％的间甲酚，第二酚醛清漆树脂的酚类化合物含有小于50摩尔％的间甲酚。 还公开了含有以下混合物的光敏组合物：a）上述酚醛清漆树脂混合物; b）至少一种邻醌光敏化合物; 和c）至少一种光致抗蚀剂溶剂。 还公开了一种通过在衬底上形成图像来生产微电子器件的方法，其包括：a）提供上述光敏组合物; b）此后，用来自步骤a）的光致抗蚀剂组合物涂覆合适的基材; c）此后，对涂覆的基材进行热处理，直到基本上所有的溶剂被除去; 以成像方式曝光涂布的基材; 然后用合适的显影剂去除成像曝光或替代地涂覆的基底的未曝光区域。