公开(公告)号：US08088548B2

公开(公告)日：2012-01-03

申请号：US11876793

申请日：2007-10-23

申请人： Francis M. Houlihan ,  Shinji Miyazaki ,  Mark O. Neisser ,  Alberto D. Dioses ,  Joseph E. Oberlander

发明人： Francis M. Houlihan ,  Shinji Miyazaki ,  Mark O. Neisser ,  Alberto D. Dioses ,  Joseph E. Oberlander

IPC分类号： G03F7/11 ,  G03F7/039

CPC分类号： C07C211/05 ,  C07C55/08 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/091 ,  G03F7/095

摘要： Developable bottom antireflective coating compositions are provided.

摘要翻译： 提供可开发的底部抗反射涂料组合物。

公开(公告)号：US20110086312A1

公开(公告)日：2011-04-14

申请号：US12576622

申请日：2009-10-09

申请人： Ralph R. Dammel ,  Srinivasan Chakrapani ,  Munirathna Padmanaban ,  Shinji Miyazaki ,  Edward W. Ng ,  Takanori Kudo ,  Alberto D. Dioses ,  Francis M. Houlihan

发明人： Ralph R. Dammel ,  Srinivasan Chakrapani ,  Munirathna Padmanaban ,  Shinji Miyazaki ,  Edward W. Ng ,  Takanori Kudo ,  Alberto D. Dioses ,  Francis M. Houlihan

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： G03F7/091

摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent of structure (7), and optionally, a photoacid generator and/or an acid and/or a thermal acid generator, where structure (7) is wherein W is selected from (C1-C30) linear, branched or cyclic alkyl moiety, substituted or unsubstituted (C3-C40) alicyclic hydrocarbon moiety and substituted is or unsubstituted (C3-C40) cycloalkylalkylene moiety; R is selected from C1-C10 linear or branched alkylene and n≧2. The invention further relates to a process for using such a composition.

摘要翻译： 本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，结构式（7）的乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂，其中结构（7）其中W选自（C1 -C 30）直链，支链或环状的烷基部分，取代或未取代的（C 3 -C 40）脂环烃部分和取代的或未取代的（C 3 -C 40）环烷基亚烷基部分; R选自C1-C10直链或支链亚烷基，n≥2。 本发明还涉及使用这种组合物的方法。

公开(公告)号：US08632948B2

公开(公告)日：2014-01-21

申请号：US12570923

申请日：2009-09-30

申请人： Munirathna Padmanaban ,  Srinivasan Chakrapani ,  Francis M. Houlihan ,  Shinji Miyazaki ,  Edward Ng ,  Mark O. Neisser

发明人： Munirathna Padmanaban ,  Srinivasan Chakrapani ,  Francis M. Houlihan ,  Shinji Miyazaki ,  Edward Ng ,  Mark O. Neisser

IPC分类号： G03F7/039 ,  G03F7/30 ,  C08F20/20

CPC分类号： G03F7/091

摘要： The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.

摘要翻译： 本发明涉及能够在碱性水溶液中通过显影形成图案的可光成像抗反射涂料组合物，其包含（i）可溶于涂布溶剂中的聚合物A，其包含发色团，交联部分和任选的可裂解基团， 在酸或热条件下产生有助于聚合物在碱性水溶液中的溶解度的功能; （ii）至少一种光致酸发生剂; （iii）交联剂; （iv）任选的热酸产生剂; （v）聚合物B，其在显影前可溶于碱性水溶液，其中聚合物B与聚合物A不可混溶并可溶于涂布溶剂中; （vi）涂料溶剂组合物，和（vii）任选的猝灭剂。 本发明还涉及用于对抗反射涂层进行成像的方法。

公开(公告)号：US20110076626A1

公开(公告)日：2011-03-31

申请号：US12570923

申请日：2009-09-30

申请人： Munirathna Padmanaban ,  Srinivasan Chakrapani ,  Francis M. Houlihan ,  Shinji Miyazaki ,  Edward Ng ,  Mark O. Neisser

发明人： Munirathna Padmanaban ,  Srinivasan Chakrapani ,  Francis M. Houlihan ,  Shinji Miyazaki ,  Edward Ng ,  Mark O. Neisser

IPC分类号： G03F7/00 ,  G03C1/00

CPC分类号： G03F7/091

摘要： The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.

摘要翻译： 本发明涉及能够在碱性水溶液中通过显影形成图案的可光成像抗反射涂料组合物，其包含（i）可溶于涂布溶剂中的聚合物A，其包含发色团，交联部分和任选的可裂解基团， 在酸或热条件下产生有助于聚合物在碱性水溶液中的溶解度的功能; （ii）至少一种光致酸发生剂; （iii）交联剂; （iv）任选的热酸产生剂; （v）聚合物B，其在显影前可溶于碱性水溶液，其中聚合物B与聚合物A不可混溶并可溶于涂布溶剂中; （vi）涂料溶剂组合物，和（vii）任选的猝灭剂。 本发明还涉及用于对抗反射涂层进行成像的方法。

公开(公告)号：US08900797B2

公开(公告)日：2014-12-02

申请号：US13627599

申请日：2012-09-26

申请人： Shigemasa Nakasugi ,  Shinji Miyazaki ,  Munirathna Padmanaban ,  Alberto D. Dioses

发明人： Shigemasa Nakasugi ,  Shinji Miyazaki ,  Munirathna Padmanaban ,  Alberto D. Dioses

IPC分类号： C07D251/38 ,  C07D213/69 ,  C07D213/70 ,  C07D239/60 ,  C07D251/30 ,  G03F7/004 ,  G03F7/20

CPC分类号： G03F7/038 ,  C07D251/30 ,  C07D251/38 ,  G03F7/091

摘要： The present invention provides a cross-linking agent capable of preventing formation of scum from a bottom anti-reflective coating, and also provides a composition for forming a bottom anti-reflection coating containing the agent. The cross-linking agent is a nitrogen-containing aromatic compound having at least one vinyloxy group or N-methoxymethylamide group, and the composition contains the cross-linking agent. The cross-linking agent of the formula (1) can be produced by reaction of a nitrogen-containing aromatic compound, a halogen compound having a vinyloxy group or N-methoxymethylamide group and a basic compound.

摘要翻译： 本发明提供能够防止从底部抗反射涂层形成浮渣的交联剂，并且还提供了用于形成含有该试剂的底部防反射涂层的组合物。 交联剂是具有至少一个乙烯基氧基或N-甲氧基甲基酰胺基的含氮芳香族化合物，该组合物含有交联剂。 式（1）的交联剂可以通过含氮芳族化合物，具有乙烯氧基的卤素化合物或N-甲氧基甲基酰胺基和碱性化合物的反应来制备。

公开(公告)号：US07575431B2

公开(公告)日：2009-08-18

申请号：US11822282

申请日：2007-07-03

申请人： Atsushi Endo ,  Yoshiyuki Fujita ,  Shinji Miyazaki

发明人： Atsushi Endo ,  Yoshiyuki Fujita ,  Shinji Miyazaki

IPC分类号： F27D1/00

CPC分类号： H01L21/67248 ,  F27B17/0025 ,  H01L21/67109 ,  H01L21/67115

摘要： A vertical heat processing apparatus for performing a heat process on a plurality of target substrates all together includes a vertical process container configured to accommodate the target substrates and having a transfer port at a bottom; a holder configured to support the target substrates at intervals in a vertical direction inside the process container; and a heater disposed around the process container, and configured to supply heat rays through a sidewall of the process container, so as to heat an interior of the process container. A thermal buffer member is disposed between the heater and a lower end side of the process container to surround the lower end side, and is configured to decrease transmissibility of the lower end side for heat rays between the heater and target substrates inside the process container.

摘要翻译： 一种垂直加热装置，用于对多个目标基板进行热处理，所述垂直加热装置一起包括垂直处理容器，其构造成容纳所述目标基板并且在底部具有转移口; 保持器，被构造成在处理容器内沿垂直方向间隔地支撑目标基板; 以及加热器，其设置在所述处理容器的周围，并且被配置为通过所述处理容器的侧壁提供热射线，以便加热所述处理容器的内部。 加热器和处理容器的下端侧之间设置有热缓冲部件，以包围下端侧，并且构造为降低加工器和加工容器内的目标基板之间的热线的下端侧的透射率。

公开(公告)号：US20060081181A1

公开(公告)日：2006-04-20

申请号：US11229841

申请日：2005-09-20

申请人： Shinji Miyazaki ,  Hiroki Fukushima

发明人： Shinji Miyazaki ,  Hiroki Fukushima

IPC分类号： C23C16/00

CPC分类号： C23C16/4405 ,  Y10S414/137 ,  Y10S414/138 ,  Y10S414/14

摘要： A clean gas circulates to pass through a loading area provided below a vertical heat treatment furnace. The clean gas unidirectionally flows through the loading area. After completion of wafer processing, a wafer boat lowers from the heat treatment furnace to the loading area, where the wafers are removed from the wafer boat. Subsequently, a clean gas jetting nozzle arranged in the loading area jets a clean gas toward the emptied wafer boat. Fragment of thin film which may readily peel off are blown away from the wafer boat, and are discharged out of the loading area together with the unidirectional flow. Thus, it is possible to avoid wafer contamination due to the unexpected peel-off of thin film fragments from the wafer boat.

摘要翻译： 清洁气体循环通过垂直热处理炉下方的装载区域。 清洁气体单向流过装载区域。 在晶片处理完成之后，晶片舟从热处理炉降低到从晶片舟皿移除晶片的装载区域。 随后，布置在装载区域中的清洁气体喷射喷嘴将清洁气体朝排空的晶片舟喷射。 容易剥离的薄膜碎片从晶舟上吹走，并与单向流一起排出装载区域。 因此，可以避免由于来自晶片舟皿的薄膜碎片的意外剥离而造成的晶片污染。

公开(公告)号：US6044044A

公开(公告)日：2000-03-28

申请号：US106089

申请日：1998-06-29

申请人： Shinji Miyazaki ,  Hiroyasu Inoue ,  Jiro Yoshinari

发明人： Shinji Miyazaki ,  Hiroyasu Inoue ,  Jiro Yoshinari

IPC分类号： G11B11/10 ,  G11B11/105 ,  G11B11/00

CPC分类号： G11B11/10515 ,  G11B11/10584 ,  G11B11/10586

摘要： A magneto-optical recording medium comprises a substrate, and a magnetic multilayer 4 on a surface side thereof. The magnetic multilayer comprises an amplifying layer A.sub.1 and a recording layer R.sub.2 which are laminated together and are each a magnetic layer. A nonmagnetic intermediate layer I.sub.12 is interleaved between the amplifying layer A.sub.1 and the recording layer R.sub.2 to couple them magnetostatically. The nonmagnetic intermediate layer I.sub.12 is made up of a metal oxide and has a thickness of 2 to 30 nm. The magnetic field intensity needed for magnetic field modulation reading or light modulation reading can be lowered.

摘要翻译： 磁光记录介质包括基板和表面侧上的磁性多层体4。 磁性层叠体包括层压在一起并分别为磁性层的放大层A1和记录层R2。 非磁性中间层I12在放大层A1和记录层R2之间进行交织，使其静磁耦合。 非磁性中间层I12由金属氧化物构成，厚度为2〜30nm。 可以降低磁场调制读取或光调制读取所需的磁场强度。

公开(公告)号：US5674637A

公开(公告)日：1997-10-07

申请号：US360964

申请日：1994-12-21

申请人： Shinji Miyazaki ,  Jiro Yoshinari ,  Koji Kobayashi

发明人： Shinji Miyazaki ,  Jiro Yoshinari ,  Koji Kobayashi

IPC分类号： G11B5/66

CPC分类号： G11B5/66 ,  Y10S428/90

摘要： A magnetic recording medium having excellent electromagnetic characteristics, still characteristics and cupping resistance, reduced rust generation and increased durability, comprises a non-magnetic substrate and a magnetic layer formed thereon by oblique deposition, the magnetic layer being composed of at least two ferromagnetic metal thin films containing Co and Ni as main components, in which the Co content of the thin film closest to the substrate is less than 70 atomic per cent and the Co content of the film farthest from the substrate is 75 atomic per cent or more.

摘要翻译： 具有优异的电磁特性，静电特性和耐拔罐性，减少生锈和提高耐久性的磁记录介质包括非磁性基板和通过倾斜沉积在其上形成的磁性层，磁性层由至少两个铁磁性金属薄层 含有Co和Ni作为主要成分的膜，其中最接近基底的薄膜的Co含量小于70原子％，并且离基材最远的膜的Co含量为75原子％以上。

公开(公告)号：US5637153A

公开(公告)日：1997-06-10

申请号：US429159

申请日：1995-04-26

申请人： Reiji Niino ,  Yoshiyuki Fujita ,  Hideki Lee ,  Yasuo Imamura ,  Toshiharu Nishimura ,  Yuuichi Mikata ,  Shinji Miyazaki ,  Takahiko Moriya ,  Katsuya Okumura ,  Hitoshi Kato

发明人： Reiji Niino ,  Yoshiyuki Fujita ,  Hideki Lee ,  Yasuo Imamura ,  Toshiharu Nishimura ,  Yuuichi Mikata ,  Shinji Miyazaki ,  Takahiko Moriya ,  Katsuya Okumura ,  Hitoshi Kato

IPC分类号： C23C16/24 ,  C23C16/40 ,  C23C16/44 ,  B08B7/00 ,  B08B9/00

CPC分类号： C23C16/24 ,  C23C16/405 ,  C23C16/4405 ,  C23C16/4412

摘要： After a polysilicon film is formed on a wafer, a cleaning gas containing ClF.sub.3 at 10 to 50 vol % is supplied into a reaction tube and an exhaust pipe system at a flow rate of 3000 to 3500 SCCM, so as to remove a polysilicon-based film deposited on an inner wall surface of the reaction tube, the surface of a member incorporated in the reaction tube, and an inner wall surface of the exhaust pipe system while the film forming process, by etching using ClF.sub.3. The cleaning gas is supplied while the temperature in the reaction tube is maintained at 450.degree. C. or higher, and in a pressure condition set at the maintained temperature such that an etching rate of the polysilicon-based film by the cleaning gas is higher than an etching rate of silicon which is the material of the reaction tube or the member incorporated in the reaction tube.

摘要翻译： 在晶片上形成多晶硅膜之后，将含有10〜50体积％的ClF 3的清洗气体以3000〜3500SCCM的流量供给反应管和排气管系，以除去多晶硅 通过使用ClF 3的蚀刻，沉积在反应管的内壁表面上的薄膜，在反应管中结合的构件的表面和排气管系统的内壁表面。 在将反应管中的温度保持在450℃以上，在设定为维持温度的压力条件下，通过清洗气体使多晶硅系膜的蚀刻速度高于 作为反应管的材料或结合在反应管中的构件的硅的蚀刻速率。