摘要:
An object is to provide a photoelectric conversion element having a side surface with different taper angles by conducting etching of a photoelectric conversion layer step-by-step. A pin photodiode has a high response speed compared with a pn photodiode but has a disadvantage of large dark current. One cause of the dark current is considered to be conduction through an etching residue which is generated in etching and deposited on a side surface of the photoelectric conversion layer. Leakage current of the photoelectric conversion element is reduced by forming a structure in which a side surface has two different tapered shapes, which conventionally has a uniform surface, so that the photoelectric conversion layer has a side surface of a p-layer and a side surface of an n-layer, which are not in the same plane.
摘要:
An object is to provide a photoelectric conversion element having a side surface with different taper angles by conducting etching of a photoelectric conversion layer step-by-step. A pin photodiode has a high response speed compared with a pn photodiode but has a disadvantage of large dark current. One cause of the dark current is considered to be conduction through an etching residue which is generated in etching and deposited on a side surface of the photoelectric conversion layer. Leakage current of the photoelectric conversion element is reduced by forming a structure in which a side surface has two different tapered shapes, which conventionally has a uniform surface, so that the photoelectric conversion layer has a side surface of a p-layer and a side surface of an n-layer, which are not in the same plane.
摘要:
The present invention reduces the amount of lead used in a display device and improves its long-term moisture resistance. This display device includes: a panel (1b) provided with a hole (11) formed therein; a phosphate glass member (13); and a tube (12) mounted on the panel (1b) via the glass member (13) so as to cover the hole (11). The glass member (13) is bonded to at least a partial area of the inner wall surface of the tube (12) and to a partial area of the panel (1b), so that the entire periphery of the end face of the tube (12) located on the side of the hole (13) is in contact with the panel (1b).
摘要:
One object is to provide excellent electric characteristics of an end portion of a single crystal semiconductor layer having a tapered shape. An embrittled region is formed in a single crystal semiconductor substrate by irradiating the single crystal semiconductor substrate with accelerated ions. Then, the single crystal semiconductor substrate and a base substrate are bonded to each other with an insulating film interposed therebetween and a first single crystal semiconductor layer is formed over the base substrate with the insulating film interposed therebetween by separating the single crystal semiconductor substrate at the embrittled region. After that, a second single crystal semiconductor layer having a tapered end portion is formed by performing dry etching on the first single crystal semiconductor layer, and etching is performed on the end portion of the second single crystal semiconductor layer in a state where a potential on the base substrate side is a ground potential.
摘要:
A plasma display panel of the present invention includes display electrodes and address electrodes that cross each other. The electrode to be covered with the first dielectric layer contains at least one selected from silver and copper. The first glass contains Bi2O3. The first glass further contains 0 to 4 wt % of MoO3 and 0 to 4 wt % of WO3, and the total of the contents of MoO3 and WO3 that are contained in the first glass is in a range of 0.1 to 8 wt %. The first glass may contain, as components thereof: 0 to 15 wt % SiO2; 10 to 50 wt % B2O3; 15 to 50 wt % ZnO; 0 to 10 wt % Al2O3; 2 to 40 wt % Bi2O3; 0 to 5 wt % MgO; 5 to 38 wt % CaO+SrO+BaO; 0 to 4 wt % MoO3; and 0 to 4 wt % WO3, and the total of the contents of MoO3 and WO3 that are contained in the first glass is in the range of 0.1 to 8 wt %.
摘要:
A glass composition for covering electrodes of the present invention contains: 0 to 15 wt % SiO2; 10 to 50 wt % B2O3; 15 to 50 wt % ZnO; 0 to 10 wt % Al2O3; 2 to 40 wt % Bi2O3; 0 to 5 wt % MgO; 5 to 38 wt % CaO+SrO+BaO; 0 to 0.1 wt % Li2O+Na2O+K2O; 0 to 4 wt % MoO3; and 0 to 4 wt % WO3, and the total of the contents of MoO3 and WO3 is in the range of 0.1 to 8 wt %. The glass composition for covering electrodes of the present invention may contain: 0 to 2 wt % SiO2; 10 to 50 wt % B2O3; 15 to 50 wt % ZnO; 0 to 10 wt % Al2O3; 2 to 40 wt % Bi2O3; 0 to 5 wt % MgO; 5 to 38 wt % CaO+SrO+BaO; 0 to 4 wt % MoO3; and 0 to 4 wt % WO3, and the total of the contents of MoO3 and WO3 may be in the range of 0.1 to 8 wt %.
摘要翻译:本发明的覆盖电极用玻璃组合物含有:0〜15重量%的SiO 2; 10至50重量%B 2 O 3 3; 15〜50wt%的ZnO; 0至10重量%的Al 2 O 3 3; 2至40重量%的Bi 2 O 3 3; 0〜5重量%的MgO; 5〜38重量%CaO + SrO + BaO; 0〜0.1重量%Li 2 O + Na 2 O + K 2 O; 0至4wt%MoO 3 3; 和0至4重量%的WO 3,MoO 3 3和WO 3 3的含量的总和在0.1至8的范围内 重量%。 本发明的覆盖电极用玻璃组合物可以含有0〜2重量%的SiO 2, 10至50重量%B 2 O 3 3; 15〜50wt%的ZnO; 0至10重量%的Al 2 O 3 3; 2至40重量%的Bi 2 O 3 3; 0〜5重量%的MgO; 5〜38重量%CaO + SrO + BaO; 0至4wt%MoO 3 3; 和0〜4重量%的WO 3,MoO 3 3和WO 3的含量的总和可以在0.1〜 8重量%。
摘要:
An imaging apparatus includes an optical source configured to emit an electromagnetic wave, a wave dividing unit configured to divide the wave from the optical source into a first and a second wave beam, a probe optical source configured to emit a probe beam, a probe-beam dividing unit configured to divide the probe beam into a first and a second probe beam, a first crystal on which the first crystal is irradiated through an object and the first probe beam is incident, a second crystal on which the second crystal is irradiated through an object and the second probe beam is incident, an interference unit configured to allow the first probe beam from the first crystal to interfere with the second probe beam from the second crystal, and an image pickup device configured to capture an interference figure between the first and the second probe beam.