MASK AND OPTICAL FILTER MANUFACTURING APPARATUS INCLUDING THE SAME
    9.
    发明申请
    MASK AND OPTICAL FILTER MANUFACTURING APPARATUS INCLUDING THE SAME 有权
    掩模和光学滤波器制造设备,包括它们

    公开(公告)号:US20130114055A1

    公开(公告)日:2013-05-09

    申请号:US13393522

    申请日:2011-07-26

    IPC分类号: G03F1/42 G03B27/72

    摘要: A mask and an optical filter manufacturing apparatus having the same are provided. The optical filter manufacturing apparatus includes a roll used in a roll-to-roll process, a base film wound around the roll, a light source that generates light for exposure, a polarizing plate that is installed at an emission side of the light source and polarizes light generated from the light source, and a mask that causes a pattern to be formed on the base film and includes a plurality of guide slits that are opened to have a predetermined thickness and a predetermined width. According to the present invention, the entire surface of the base film can be irradiated with a uniform light quantity. Thus, a pattern can be uniformly formed on the base film, the quality of a product can be improved, and the characteristics of the base film can be accurately realized.

    摘要翻译: 提供了一种掩模和具有该掩模的滤光器制造装置。 光学滤波器制造装置包括卷绕处理中使用的卷,卷绕在卷上的基膜,产生用于曝光的光的光源,安装在光源的发射侧的偏光板和 使从光源产生的光偏振,以及在基膜上形成图案的掩模,并且包括打开以具有预定厚度和预定宽度的多个引导狭缝。 根据本发明,可以以均匀的光量照射基膜的整个表面。 因此,可以在基膜上均匀地形成图案,可以提高产品的质量,并且可以准确地实现基膜的特性。