公开(公告)号：US20120267550A1

公开(公告)日：2012-10-25

申请号：US13449030

申请日：2012-04-17

申请人： Sjoerd Nicolaas Lambertus DONDERS ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Martinus Cornelis Maria Verhagen ,  Olav Waldemar Vladimir Frijns ,  Gerrit Van Donk ,  Henk Jan Van Gerner

发明人： Sjoerd Nicolaas Lambertus DONDERS ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Martinus Cornelis Maria Verhagen ,  Olav Waldemar Vladimir Frijns ,  Gerrit Van Donk ,  Henk Jan Van Gerner

IPC分类号： F28D15/00 ,  F25B29/00 ,  G21K5/08 ,  F28F27/00

CPC分类号： G03F7/70858 ,  F28D15/0266

摘要： A conditioning system for conditioning a part of a lithographic apparatus, includes an evaporator positioned in thermal contact with the part for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser for removing heat from the fluid inside the condenser; fluid lines arranged between the evaporator and the condenser to form a fluid circuit; a pump arranged in the circuit to circulate the fluid in the circuit; an accumulator to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger to transfer heat from or to fluid inside the accumulator; a temperature sensor to provide a signal representative of the fluid temperature; and a controller to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger based on the signal.

摘要翻译： 用于调节光刻设备的一部分的调节系统包括：蒸发器，其定位成与部件热接触，用于通过蒸发器内部的流体的蒸发从部件中提取热量; 用于从冷凝器内的流体中除去热量的冷凝器; 布置在蒸发器和冷凝器之间以形成流体回路的流体管线; 布置在电路中以使流体循环的电路中的泵; 储液器以保持流体，其中所述蓄液器与所述回路流体连通，并且包括热交换器以将热量从所述蓄能器内部流体传递到流体; 温度传感器，用于提供表示流体温度的信号; 以及控制器，通过基于该信号调节由热交换器传递的热量来维持电路内的流体的基本上恒定的温度。

公开(公告)号：US08610089B2

公开(公告)日：2013-12-17

申请号：US13449030

申请日：2012-04-17

申请人： Sjoerd Nicolaas Lambertus Donders ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Martinus Cornelis Maria Verhagen ,  Olav Waldemar Vladimir Frijns ,  Gerrit Van Donk ,  Henk Jan Van Gerner

发明人： Sjoerd Nicolaas Lambertus Donders ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Martinus Cornelis Maria Verhagen ,  Olav Waldemar Vladimir Frijns ,  Gerrit Van Donk ,  Henk Jan Van Gerner

IPC分类号： H01J5/00

CPC分类号： G03F7/70858 ,  F28D15/0266

摘要： A conditioning system for conditioning a part of a lithographic apparatus, includes an evaporator positioned in thermal contact with the part for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser for removing heat from the fluid inside the condenser; fluid lines arranged between the evaporator and the condenser to form a fluid circuit; a pump arranged in the circuit to circulate the fluid in the circuit; an accumulator to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger to transfer heat from or to fluid inside the accumulator; a temperature sensor to provide a signal representative of the fluid temperature; and a controller to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger based on the signal.

摘要翻译： 用于调节光刻设备的一部分的调节系统包括：蒸发器，其定位成与部件热接触，用于通过蒸发器内部的流体的蒸发从部件中提取热量; 用于从冷凝器内的流体中除去热量的冷凝器; 布置在蒸发器和冷凝器之间以形成流体回路的流体管线; 布置在电路中以使流体循环的电路中的泵; 储液器以保持流体，其中所述蓄液器与所述回路流体连通，并且包括热交换器以将热量从所述蓄能器内部流体传递到流体; 温度传感器，用于提供表示流体温度的信号; 以及控制器，通过基于该信号调节由热交换器传递的热量来维持电路内的流体的基本上恒定的温度。

公开(公告)号：US06781673B2

公开(公告)日：2004-08-24

申请号：US09934698

申请日：2001-08-23

申请人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine ,  Martinus Hendrikus Antonius Leenders ,  Henri Gerard Cato Werij ,  Hugo Matthieu Visser ,  Gerrit-Jan Heerens ,  Erik Leonardus Ham ,  Hans Meiling ,  Erik Roelof Loopstra ,  Sjoerd Nicolaas Lambertus Donders

发明人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine ,  Martinus Hendrikus Antonius Leenders ,  Henri Gerard Cato Werij ,  Hugo Matthieu Visser ,  Gerrit-Jan Heerens ,  Erik Leonardus Ham ,  Hans Meiling ,  Erik Roelof Loopstra ,  Sjoerd Nicolaas Lambertus Donders

IPC分类号： G03B2762

CPC分类号： G03F7/70558 ,  G03F7/70741 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70983

摘要： In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.

摘要翻译： 在光刻投影装置中，通过使用电磁场的粒子屏蔽物将诸如掩模的物体与杂散颗粒屏蔽。 这些场可以是均匀的电场，不均匀的电场或光学微风。 颗粒屏蔽固定在面罩支架而不是面罩上。

公开(公告)号：US09632419B2

公开(公告)日：2017-04-25

申请号：US14346530

申请日：2012-08-23

申请人： Jan Bernard Plechelmus Van Schoot ,  Vadim Yevgenyevich Banine ,  Olav Waldemar Vladimir Frijns ,  Hermanus Kreuwel ,  Johannes Hubertus Josephina Moors ,  Uwe Bruno Heini Stamm ,  Gerardus Hubertus Petrus Maria Swinkels ,  Ivo Vanderhallen ,  Andrei Mikhailovich Yakunin

发明人： Jan Bernard Plechelmus Van Schoot ,  Vadim Yevgenyevich Banine ,  Olav Waldemar Vladimir Frijns ,  Hermanus Kreuwel ,  Johannes Hubertus Josephina Moors ,  Uwe Bruno Heini Stamm ,  Gerardus Hubertus Petrus Maria Swinkels ,  Ivo Vanderhallen ,  Andrei Mikhailovich Yakunin

IPC分类号： G03B27/32 ,  G03B27/52 ,  G03B27/54 ,  G03F7/20 ,  H05G2/00

CPC分类号： G03F7/70058 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

摘要： A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.

公开(公告)号：US09897930B2

公开(公告)日：2018-02-20

申请号：US13057583

申请日：2009-07-22

申请人： Leonid Aizikovitch Sjmaenok ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Denis Alexandrovich Glushkov ,  Andrei Mikhailovich Yakunin

发明人： Leonid Aizikovitch Sjmaenok ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Denis Alexandrovich Glushkov ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20

CPC分类号： G03F7/70958 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G03F7/70916

摘要： A lithographic apparatus includes an optical element that includes an oriented carbon nanotube sheet. The optical element has an element thickness in the range of about 20-500 nm and has a transmission for EUV radiation having a wavelength in the range of about 1-20 nm of at least about 20% under perpendicular irradiation with the EUV radiation.

公开(公告)号：US08373846B2

公开(公告)日：2013-02-12

申请号：US12553368

申请日：2009-09-03

申请人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors

发明人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： H05G2/006 ,  G03F7/70033 ,  G03F7/70891 ,  G03F7/70916 ,  G21K1/06 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.

公开(公告)号：US20110188014A1

公开(公告)日：2011-08-04

申请号：US13058776

申请日：2009-07-30

申请人： Vadim Yevgenyevich Banine ,  Erik Roelof ,  Johannes Hubertus Josephina Moors

发明人： Vadim Yevgenyevich Banine ,  Erik Roelof ,  Johannes Hubertus Josephina Moors

IPC分类号： G03B27/54

CPC分类号： G03F7/70916 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70883 ,  G03F7/70908 ,  G03F7/70983 ,  H05G2/003

摘要： A lithographic apparatus includes a radiation source configured to produce extreme ultraviolet radiation, the radiation source including a chamber in which a plasma is generated; a collector mirror configured to reflect radiation emitted by the plasma; and a debris mitigation system including a gas supply system configured to supply a first gas flow toward the plasma, the first gas flow being selected to thermalize debris generated by the plasma, and a plurality of gas manifolds arranged at a location proximate the collector mirror, the gas manifolds configured to supply a second gas flow in the chamber, the second gas flow being directed toward the plasma to prevent thermalized debris from depositing on the collector mirror.

摘要翻译： 光刻设备包括被配置为产生极紫外辐射的辐射源，所述辐射源包括其中产生等离子体的室; 收集器反射镜，被配置为反射等离子体发射的辐射; 以及包括气体供应系统的碎片减缓系统，所述气体供应系统被配置为朝向所述等离子体供应第一气流，所述第一气流被选择为热等离子体产生的碎屑，以及布置在靠近所述收集器反射镜的位置处的多个气体歧管， 所述气体歧管被构造成在所述室中提供第二气流，所述第二气流指向所述等离子体以防止热碎屑沉积在所述收集器反射镜上。

公开(公告)号：US07897110B2

公开(公告)日：2011-03-01

申请号：US11311623

申请日：2005-12-20

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

IPC分类号： G01N7/00

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。

公开(公告)号：US07459690B2

公开(公告)日：2008-12-02

申请号：US11432365

申请日：2006-05-12

申请人： Jan Evert Van Der Werf ,  Mark Kroon ,  Wilhelmus Cornelis Keur ,  Vadim Yevgenyevich Banine ,  Hans Van Der Laan ,  Johannes Hubertus Josephina Moors ,  Erik Roelof Loopstra

发明人： Jan Evert Van Der Werf ,  Mark Kroon ,  Wilhelmus Cornelis Keur ,  Vadim Yevgenyevich Banine ,  Hans Van Der Laan ,  Johannes Hubertus Josephina Moors ,  Erik Roelof Loopstra

IPC分类号： G01J1/42

CPC分类号： G03F7/70558 ,  G01J1/58 ,  G03F7/70741 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70983

摘要： A radiation sensor for use with a lithographic apparatus is disclosed, the radiation sensor comprising a radiation-sensitive material which converts incident radiation of wavelength λ1 into secondary radiation; and sensing means capable of detecting the secondary radiation emerging from said layer.

摘要翻译： 公开了一种用于光刻设备的辐射传感器，辐射传感器包括将波长λ1的入射辐射转换成次级辐射的辐射敏感材料; 以及能够检测从所述层出现的二次辐射的感测装置。

公开(公告)号：US20080011967A1

公开(公告)日：2008-01-17

申请号：US11486386

申请日：2006-07-14

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Wouter Anton Soer

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Wouter Anton Soer

IPC分类号： G03F7/20

CPC分类号： G03F7/70925 ,  G03F7/70916

摘要： A lithographic apparatus includes a radiation source and an object with a first surface which is configured to retain metal contaminants. This surface has the function of a getter. The first surface is arranged substantially outside the region traversed by the radiation beam generated by the radiation source during lithographic processing. The first surface may further be used to retain volatile contaminants generated in a cleaning method.

摘要翻译： 光刻设备包括辐射源和具有构造成保持金属污染物的第一表面的物体。 该表面具有吸气剂的功能。 在光刻处理期间，第一表面基本上布置在由辐射源产生的辐射束穿过的区域的外侧。 第一表面可以进一步用于保持在清洁方法中产生的挥发性污染物。