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公开(公告)号：US20130244024A1
公开(公告)日：2013-09-19
申请号：US13616538
申请日：2012-09-14
IPC分类号： C23F11/00
CPC分类号： C23F11/00 , C09D5/084 , C23C22/60 , C23C22/68 , Y10T428/259
摘要： Use of modified sheet silicates (a) in combination with at least one polycationic polymer (b) for protecting metallic surfaces against corrosion. Metallic surfaces which are protected against corrosion by means of modified sheet silicates (a) in combination with at least one polycationic polymer (b). Method of protecting metallic surfaces against corrosion, which comprises applying formulations to the metallic surface to be protected. Anticorrosion composition comprising modified sheet silicates (a) and at least one polycationic polymer (b).
摘要翻译： 改性片状硅酸盐（a）与至少一种聚阳离子聚合物（b）的组合用于保护金属表面免受腐蚀。 通过改性片状硅酸盐（a）与至少一种聚阳离子聚合物（b）的组合防止腐蚀的金属表面。 保护金属表面免受腐蚀的方法，其包括将制剂施用于待保护的金属表面。 包含改性硅酸盐（a）和至少一种聚阳离子聚合物（b）的防腐组合物。
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公开(公告)号：US20110151266A1
公开(公告)日：2011-06-23
申请号：US12958795
申请日：2010-12-02
摘要： The present invention relates to the use of oxidic nanoparticles having an average particle size of 2 to 2000 nm in combination with at least one polycationic polymer as corrosion protection for metallic surfaces and also to a method of protecting metallic surfaces from corrosion, comprising the steps of: i) providing a formulation comprising oxidic nanoparticles (a) and at least one polycationic polymer (b) and an application medium, ii) applying the formulation to the metallic surface that is to be protected, and iii) optionally drying and/or heat-treating the surface.
摘要翻译： 本发明涉及平均粒度为2〜2000nm的氧化纳米粒子与至少一种聚阳离子聚合物的组合作为金属表面的防腐蚀用途，以及保护金属表面免受腐蚀的方法，包括以下步骤： ：i）提供包含氧化性纳米颗粒（a）和至少一种聚阳离子聚合物（b）和施用介质的制剂，ii）将制剂施用于待保护的金属表面，和iii）任选地干燥和/或加热 去表面。
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3.发明授权Chemical mechanical polishing (CMP) composition comprising two types of corrosion inhibitors 有权包含两种类型的腐蚀抑制剂的化学机械抛光（CMP）组合物公开(公告)号：US09263296B2
公开(公告)日：2016-02-16
申请号：US14006744
申请日：2012-03-19
申请人： Bastian Noller , Michael Lauter , Albert Budiman Sugiharto , Yuzhuo Li , Kenneth Rushing , Diana Franz , Roland Böhn
发明人： Bastian Noller , Michael Lauter , Albert Budiman Sugiharto , Yuzhuo Li , Kenneth Rushing , Diana Franz , Roland Böhn
IPC分类号： H01L21/321 , C09G1/04 , C09G1/02 , H01L21/306 , C09K3/14
CPC分类号： H01L21/3212 , C09G1/02 , C09G1/04 , C09K3/1463 , H01L21/30625
摘要： A chemical-mechanical polishing (“CMP”) composition (P) comprising (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) at least one type of A/-heterocyclic compound as corrosion inhibitor, (C) at least one type of a further corrosion inhibitor selected from the group consisting of: (C1) an acetylene alcohol, and (C2) a salt or an adduct of (C2a) an amine, and (C2b) a carboxylic acid comprising an amide moiety, (D) at least one type of an oxidizing agent, (E) at least one type of a complexing agent, and (F) an aqueous medium.
摘要翻译： 包含（A）无机颗粒，有机颗粒或其混合物或复合物的化学机械抛光（“CMP”）组合物（P），（B）至少一种作为防腐剂的A / ）至少一种类型的另外的腐蚀抑制剂，其选自：（C1）炔属醇和（C2）（C2a）胺的盐或加合物，和（C2b）包含酰胺的羧酸 部分，（D）至少一种类型的氧化剂，（E）至少一种类型的络合剂，和（F）水性介质。
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公开(公告)号：US20130217231A1
公开(公告)日：2013-08-22
申请号：US13877798
申请日：2011-10-04
申请人： Bettina Drescher , Bastian Marten Noller , Christine Schmitt , Albert Budiman Sugiharto , Yuzhuo Li
发明人： Bettina Drescher , Bastian Marten Noller , Christine Schmitt , Albert Budiman Sugiharto , Yuzhuo Li
IPC分类号： C09K13/04 , H01L21/306 , C09K13/06
CPC分类号： C09K13/04 , C09G1/02 , C09K3/1409 , C09K3/1463 , C09K13/06 , H01L21/30625 , H01L21/3212
摘要： A chemical mechanical polishing (CMP) composition Abstract Use of a chemical mechanical polishing (CMP) composition comprising (A) inorganic particles, organic particles, or a mixture thereof, (B) a heteropolyacid or a salt thereof, (C) a salt comprising chloride, fluoride, bromide, or a mixture thereof as anion, and (D) an aqueous medium, for polishing a substrate comprising a self-passivating metal, germanium, nickel phosphorous (NiP), or a mixture thereof.
摘要翻译： 化学机械抛光（CMP）组合物摘要使用包含（A）无机颗粒，有机颗粒或其混合物的化学机械抛光（CMP）组合物，（B）杂多酸或其盐，（C） 氯化物，氟化物，溴化物或其混合物作为阴离子，和（D）水性介质，用于抛光包含自钝化金属，锗，镍磷（NiP）或其混合物的基材。
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