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    Discharge produced plasma EUV light source
    3.
    发明申请
    Discharge produced plasma EUV light source 失效

    公开(公告)号：US20070023711A1

    公开(公告)日：2007-02-01

    申请号：US11493945

    申请日：2006-07-26

    申请人： Igor Fomenkov ,  William Partlo ,  Gerry Blumenstock ,  Nortbert Bowering ,  I. Oliver ,  Xiaojiang Pan ,  Rodney Simmons

    发明人： Igor Fomenkov ,  William Partlo ,  Gerry Blumenstock ,  Nortbert Bowering ,  I. Oliver ,  Xiaojiang Pan ,  Rodney Simmons

    IPC分类号： G01J3/10

    CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70825 ,  G03F7/70891 ,  G03F7/70908 ,  G03F7/70916 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  H01S3/005 ,  H01S3/225 ,  H05G2/005 ,  H05H1/06

    摘要： An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber. The source may comprise a tuned electrically conductive electrode comprising: a differentially doped ceramic material doped in a first region to at least select electrical conductivity and in a second region at least to select thermal conductivity. The first region may be at or near the outer surface of the electrode structure and the ceramic material may be SiC or alumina and the dopant is BN or a metal oxide, including SiO or TiO2. The source may comprise a moveable electrode assembly mount operative to move the electrode assembly mount from a replacement position to an operating position, with the moveable mount on a bellows. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members. The shells may be biased with a voltage. The debris shield may be fabricated using off focus laser radiation. The anode may be cooled with a hollow interior defining two coolant passages or porous metal defining the passages. The debris shield may be formed of pluralities of large, intermediate and small fins attached either to a mounting ring or hub or to each other with interlocking tabs that provide uniform separation and strengthening and do not block any significant amount of light.

    EUV light source
    4.
    发明申请
    EUV light source 有权
    EUV光源

    公开(公告)号：US20070158596A1

    公开(公告)日：2007-07-12

    申请号：US11647007

    申请日：2006-12-27

    申请人： I. Oliver ,  William Partlo ,  Igor Fomenkov ,  Alexander Ershov ,  Norbert Bowering ,  John Viatella ,  Dave Myers

    发明人： I. Oliver ,  William Partlo ,  Igor Fomenkov ,  Alexander Ershov ,  Norbert Bowering ,  John Viatella ,  Dave Myers

    IPC分类号： G01J3/10

    CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    摘要： An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape having a focus; the shell having a sufficient size and thermal mass to carry operating heat away from the multilayer reflector and to radiate the heat from the surface of the shell on a side of the shell opposite from the focus. The material of the shell may comprise a material selected from a group which may comprise silicon carbide, silicon, Zerodur or ULE glass, aluminum, beryllium, molybdenum, copper and nickel. The apparatus and method may comprise at least one radiative heater directed at the shell to maintain the steady state temperature of the shell within a selected range of operating temperatures.

    摘要翻译： 描述了可以包括可以包括等离子体形成室的等离子体产生的极紫外（“EUV”）光源多层收集器的装置和方法; 等离子体形成室内的壳体，具有焦点的收集器形状; 壳体具有足够的尺寸和热质量以将工作热量从多层反射器散开，并且在壳体的与焦点相对的一侧上从壳体的表面辐射热量。 壳的材料可以包括选自可以包括碳化硅，硅，Zerodur或ULE玻璃，铝，铍，钼，铜和镍的组的材料。 装置和方法可以包括指向壳体的至少一个辐射加热器，以将壳体的稳态温度维持在所选择的工作温度范围内。