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    Gas discharge laser chamber improvements
    2.
    发明申请
    Gas discharge laser chamber improvements 有权

    公开(公告)号：US20050226301A1

    公开(公告)日：2005-10-13

    申请号：US10815387

    申请日：2004-03-31

    申请人： William Partlo ,  Yoshiho Amada ,  James Carmichael ,  Timothy Dyer ,  Walter Gillespie ,  Bryan Moosman ,  Richard Morton ,  Curtis Rettig ,  Brian Strate ,  Thomas Steiger ,  Fedor Trintchouk ,  Richard Ujazdowski

    发明人： William Partlo ,  Yoshiho Amada ,  James Carmichael ,  Timothy Dyer ,  Walter Gillespie ,  Bryan Moosman ,  Richard Morton ,  Curtis Rettig ,  Brian Strate ,  Thomas Steiger ,  Fedor Trintchouk ,  Richard Ujazdowski

    IPC分类号： H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/22 ,  H01S3/225

    CPC分类号： H01S3/036 ,  H01S3/0384 ,  H01S3/041 ,  H01S3/0971 ,  H01S3/225

    摘要： A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial jitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.

    LPP EUV light source
    4.
    发明申请
    LPP EUV light source 失效
    LPP EUV光源

    公开(公告)号：US20050205811A1

    公开(公告)日：2005-09-22

    申请号：US10979919

    申请日：2004-11-01

    申请人： William Partlo ,  Daniel Brown ,  Igor Fomenkov ,  Norbert Bowering ,  Curtis Rettig ,  Joseph MacFarlane ,  Alexander Ershov ,  Bjorn Hansson

    发明人： William Partlo ,  Daniel Brown ,  Igor Fomenkov ,  Norbert Bowering ,  Curtis Rettig ,  Joseph MacFarlane ,  Alexander Ershov ,  Bjorn Hansson

    IPC分类号： G01J1/00 ,  G03F7/20 ,  H01J65/04 ,  H05G2/00

    CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

    摘要： An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with an initial target irradiation pulse to form an EUV generating plasma having an emission region emitting in-band EUV light; a laser plasma irradiation pulse generating mechanism irradiating the plasma with a plasma irradiation pulse after the initial target irradiation pulse so as to compress emission material in the plasma toward the emission region of the plasma. The plasma irradiation pulse may comprise a laser pulse having a wavelength that is sufficiently longer than a wavelength of the initial target irradiation pulse to have an associated lower critical density resulting in absorption occurring within the plasma in a region of the plasma defined by the wavelength of the plasma irradiation pulse sufficiently separated from an initial target irradiation site to achieve compression of the emission material, and the may compress the emission region. The laser plasma irradiation pulse may produce an aerial mass density in the ablating cloud of the plasma sufficient to confine the favorably emitting plasma for increased conversion efficiency. The deposition region for the plasma irradiation pulse may be is removed enough from the initial target surface so as to insure compression of the favorably emitting plasma. A high conversion efficiency laser produced plasma extreme ultraviolet (“EUV”) light source may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with a target irradiation pulse to form an EUV generating plasma emitting in-band EUV light; a plasma tamper substantially surrounding the plasma to constrain the expansion of the plasma.

    摘要翻译： 描述了一种用于在LPP EUV光源中有效且有效地提供等离子体照射激光脉冲的装置和方法，其可以包括用初始目标照射脉冲照射等离子体引发目标的激光初始靶照射脉冲发生机构以形成产生EUV的等离子体 具有发射带内EUV光的发射区域; 激光等离子体照射脉冲发生机构在初始目标照射脉冲之后用等离子体照射脉冲照射等离子体，以将等离子体中的发射材料压缩到等离子体的发射区域。 等离子体照射脉冲可以包括具有足够长于初始靶照射脉冲的波长的波长的激光脉冲，以具有相关联的较低的临界密度，从而在由等离子体的波长定义的等离子体的区域内的等离子体内发生吸收 等离子体照射脉冲从初始目标照射位置充分分离，以实现发射材料的压缩，并且可以压缩发射区域。 激光等离子体照射脉冲可以在等离子体的消融云中产生足够的空气质量密度以限制有利的发射等离子体以提高转换效率。 可以从初始目标表面去除等离子体照射脉冲的沉积区域，以确保有利地发射等离子体的压缩。 高转换效率的激光产生的等离子体极紫外（“EUV”）光源可以包括激光初始靶照射脉冲发生机构，用目标照射脉冲照射等离子体引发目标，以形成产生EUV的发射等离子体的带内EUV光; 等离子体篡改基本上围绕等离子体以约束等离子体的膨胀。

    Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
    7.
    发明申请
    Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source 有权
    用于偏转等离子体产生的离子以防止离子到达EUV光源的内部组件的系统和方法

    公开(公告)号：US20050279946A1

    公开(公告)日：2005-12-22

    申请号：US11148021

    申请日：2005-06-08

    申请人： Curtis Rettig ,  Jerzy Hoffman ,  Ernesto Vargas

    发明人： Curtis Rettig ,  Jerzy Hoffman ,  Ernesto Vargas

    IPC分类号： G02B5/00 ,  G03F7/20 ,  G21C11/00 ,  H01J1/50

    CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70983 ,  H05G2/001

    摘要： A system is disclosed for protecting an internal EUV light source component from ions generated at a plasma formation site. In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one of the foil plate surfaces. In another aspect, an electrostatic grid may be positioned for interaction with ions to reduce ion energy, and a magnetic field may be used to deflect the reduced energy ions onto paths wherein the ions do not strike the internal component. In yet another aspect, a grid may be connected to a circuit tuned to a resonant frequency to reduce ion energy. For example, the resonant frequency may be substantially equal to an inverse of a time difference between the time when electrons reach the grid and a subsequent time when ions reach the grid.

    摘要翻译： 公开了一种用于保护内部EUV光源组分免于在等离子体形成部位产生的离子的系统。 在一个方面，该系统可以包括多个箔板和用于产生磁场以将离子偏转到箔片板表面之一中的装置。 在另一方面，可以定位静电栅格以与离子相互作用以减少离子能量，并且可以使用磁场来将还原能离子偏转到其中离子不撞击内部部件的路径上。 在另一方面，网格可以连接到调谐到谐振频率的电路以减少离子能量。 例如，谐振频率可以基本上等于电子到达电网的时间与离子到达电网的后续时间之间的时间差的倒数。