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    EUV light source
    1.
    发明申请
    EUV light source 有权
    EUV光源

    公开(公告)号：US20070158596A1

    公开(公告)日：2007-07-12

    申请号：US11647007

    申请日：2006-12-27

    申请人： I. Oliver ,  William Partlo ,  Igor Fomenkov ,  Alexander Ershov ,  Norbert Bowering ,  John Viatella ,  Dave Myers

    发明人： I. Oliver ,  William Partlo ,  Igor Fomenkov ,  Alexander Ershov ,  Norbert Bowering ,  John Viatella ,  Dave Myers

    IPC分类号： G01J3/10

    CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    摘要： An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape having a focus; the shell having a sufficient size and thermal mass to carry operating heat away from the multilayer reflector and to radiate the heat from the surface of the shell on a side of the shell opposite from the focus. The material of the shell may comprise a material selected from a group which may comprise silicon carbide, silicon, Zerodur or ULE glass, aluminum, beryllium, molybdenum, copper and nickel. The apparatus and method may comprise at least one radiative heater directed at the shell to maintain the steady state temperature of the shell within a selected range of operating temperatures.

    摘要翻译： 描述了可以包括可以包括等离子体形成室的等离子体产生的极紫外（“EUV”）光源多层收集器的装置和方法; 等离子体形成室内的壳体，具有焦点的收集器形状; 壳体具有足够的尺寸和热质量以将工作热量从多层反射器散开，并且在壳体的与焦点相对的一侧上从壳体的表面辐射热量。 壳的材料可以包括选自可以包括碳化硅，硅，Zerodur或ULE玻璃，铝，铍，钼，铜和镍的组的材料。 装置和方法可以包括指向壳体的至少一个辐射加热器，以将壳体的稳态温度维持在所选择的工作温度范围内。

    EUV light source
    2.
    发明申请
    EUV light source 有权

    公开(公告)号：US20050199829A1

    公开(公告)日：2005-09-15

    申请号：US10900839

    申请日：2004-07-27

    申请人： William Partlo ,  Norbert Bowering ,  Alexander Ershov ,  Igor Fomenkov ,  David Myers ,  Ian Oliver ,  John Viatella ,  Robert Jacques

    发明人： William Partlo ,  Norbert Bowering ,  Alexander Ershov ,  Igor Fomenkov ,  David Myers ,  Ian Oliver ,  John Viatella ,  Robert Jacques

    IPC分类号： G03F7/20 ,  G21K1/06 ,  H01J35/20 ,  H05G2/00 ,  H01J65/04

    CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    摘要： An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

    EUV light source
    3.
    发明授权
    EUV light source 有权
    EUV光源

    公开(公告)号：US07323703B2

    公开(公告)日：2008-01-29

    申请号：US11647007

    申请日：2006-12-27

    申请人： I. Roger Oliver ,  William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Norbert Bowering ,  John Viatella ,  David W. Myers

    发明人： I. Roger Oliver ,  William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Norbert Bowering ,  John Viatella ,  David W. Myers

    IPC分类号： H01J35/20

    CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    摘要： An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape having a focus; the shell having a sufficient size and thermal mass to carry operating heat away from the multilayer reflector and to radiate the heat from the surface of the shell on a side of the shell opposite from the focus. The material of the shell may comprise a material selected from a group which may comprise silicon carbide, silicon, Zerodur or ULE glass, aluminum, beryllium, molybdenum, copper and nickel. The apparatus and method may comprise at least one radiative heater directed at the shell to maintain the steady state temperature of the shell within a selected range of operating temperatures.

    摘要翻译： 描述了可以包括可以包括等离子体形成室的等离子体产生的极紫外（“EUV”）光源多层收集器的装置和方法; 等离子体形成室内的壳体，具有焦点的收集器形状; 壳体具有足够的尺寸和热质量以将工作热量从多层反射器散开，并且在壳体的与焦点相对的一侧上从壳体的表面辐射热量。 壳的材料可以包括选自可以包括碳化硅，硅，Zerodur或ULE玻璃，铝，铍，钼，铜和镍的组的材料。 装置和方法可以包括指向壳体的至少一个辐射加热器，以将壳体的稳态温度维持在所选择的工作温度范围内。

    VERY HIGH POWER LASER CHAMBER OPTICAL IMPROVEMENTS
    5.
    发明申请
    VERY HIGH POWER LASER CHAMBER OPTICAL IMPROVEMENTS 审中-公开
    非常大的功率激光室光学改进

    公开(公告)号：US20120307858A1

    公开(公告)日：2012-12-06

    申请号：US13588170

    申请日：2012-08-17

    申请人： Hong Ye ,  Alex Ershov ,  Rajasekhar Rao ,  Daniel Brown ,  Slava Rokitski ,  Rong (Lauren) Liu ,  Ray Cybulski ,  James J. Ferrell ,  Robert Bergstedt ,  John Viatella ,  Thomas Duffey

    发明人： Hong Ye ,  Alex Ershov ,  Rajasekhar Rao ,  Daniel Brown ,  Slava Rokitski ,  Rong (Lauren) Liu ,  Ray Cybulski ,  James J. Ferrell ,  Robert Bergstedt ,  John Viatella ,  Thomas Duffey

    IPC分类号： H01S3/083 ,  G02B5/04

    CPC分类号： G02B5/04 ,  G02B5/12 ,  H01S3/0057 ,  H01S3/0346 ,  H01S3/081 ,  H01S3/225

    摘要： An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.

    摘要翻译： 所公开的主题的一个方面包括减少由以下至少之一组成的光束反向棱镜的激光吸收的方法：增加第一入射点和倒角之间的第一距离，其中第一入射点在 在棱镜的第一反射面和第二反射面之间形成棱镜的第一反射面和倒角，其中倒角具有倒角面; 增加第二入射点和倒角之间的第二距离，其中第二入射点在棱镜的第二反射表面上; 并且增加棱镜倒角的倒角表面的反射率。 还公开了一种确定光学部件的主切割的方法。 还公开了包括至少一个初级切割光学部件的激光器。

    High throughput solar cell ablation system
    6.
    发明授权
    High throughput solar cell ablation system 有权
    高通量太阳能电池消融系统

    公开(公告)号：US08263899B2

    公开(公告)日：2012-09-11

    申请号：US12829275

    申请日：2010-07-01

    申请人： Gabriel Harley ,  Thomas Pass ,  Peter John Cousins ,  John Viatella

    发明人： Gabriel Harley ,  Thomas Pass ,  Peter John Cousins ,  John Viatella

    IPC分类号： B23K26/067

    CPC分类号： B23K26/40 ,  B23K26/067 ,  B23K26/082 ,  B23K26/0823 ,  B23K2103/50 ,  H01L31/02168 ,  H01L31/022441 ,  H01L31/0682 ,  H01L31/18 ,  H01L31/202 ,  Y02E10/52 ,  Y02E10/547

    摘要： A solar cell is formed using a solar cell ablation system. The ablation system includes a single laser source and several laser scanners. The laser scanners include a master laser scanner, with the rest of the laser scanners being slaved to the master laser scanner. A laser beam from the laser source is split into several laser beams, with the laser beams being scanned onto corresponding wafers using the laser scanners in accordance with one or more patterns. The laser beams may be scanned on the wafers using the same or different power levels of the laser source.

    摘要翻译： 使用太阳能电池消融系统形成太阳能电池。 消融系统包括单个激光源和几个激光扫描仪。 激光扫描仪包括主激光扫描仪，其余的激光扫描仪从属于主激光扫描仪。 来自激光源的激光束被分成几个激光束，根据一个或多个图案，使用激光扫描仪将激光束扫描到相应的晶片上。 可以使用激光源的相同或不同功率水平在晶片上扫描激光束。

    LPP EUV drive laser input system
    9.
    发明申请
    LPP EUV drive laser input system 失效
    LPP EUV驱动激光输入系统

    公开(公告)号：US20060289806A1

    公开(公告)日：2006-12-28

    申请号：US11168785

    申请日：2005-06-28

    申请人： Rodney Simmons ,  John Viatella ,  Jerzy Hoffman ,  R. Webb ,  Alexander Bykanov ,  Oleh Khodykin

    发明人： Rodney Simmons ,  John Viatella ,  Jerzy Hoffman ,  R. Webb ,  Alexander Bykanov ,  Oleh Khodykin

    IPC分类号： G21G4/00

    CPC分类号： H05G2/001

    摘要： A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall; a drive laser entrance window in the chamber wall; a drive laser entrance enclosure intermediate the entrance window and a plasma initiation site within the chamber and comprising an entrance enclosure distal end opening; at least one aperture plate intermediate the distal opening and the entrance window comprising at least one drive laser passage aperture. The at least one aperture plate may comprise at least two aperture plates comprising a first aperture plate and a second aperture plate defining an aperture plate interim space. The at least one drive laser aperture passage may comprise at least two drive laser aperture passages. The laser passage aperture may define an opening large enough to let the drive laser beam pass without attenuation and small enough to substantially reduce debris passing through the laser passage aperture in the direction of the entrance window.

    摘要翻译： 公开了一种激光产生的等离子体（“LPP”）极紫外（“EUV”）光源及其操作方法，其可以包括具有室壁的EUV等离子体生产室; 在室壁中的驱动激光入口窗口; 在入口窗口中间的驱动激光入口外壳和腔室内的等离子体起始位置，并且包括入口外壳远端开口; 在远端开口和入口窗之间的至少一个孔板包括至少一个驱动激光通道孔。 至少一个孔板可以包括至少两个孔板，其包括限定孔板中间空间的第一孔板和第二孔板。 至少一个驱动激光孔通道可以包括至少两个驱动激光孔通道。 激光通道孔可以限定足够大的开口，使得驱动激光束通过而不衰减，并且足够小以基本上减少通过入口窗口方向的穿过激光通道孔的碎屑。