公开(公告)号：US20130068500A1

公开(公告)日：2013-03-21

申请号：US13701675

申请日：2011-06-03

申请人： Sun-Joo Park ,  Joon-Hee Lee ,  Dong-Jin Seo

发明人： Sun-Joo Park ,  Joon-Hee Lee ,  Dong-Jin Seo

IPC分类号： H01B3/30

CPC分类号： H01B3/306 ,  H01B3/305 ,  H01B7/0216 ,  H01B7/292

摘要： The present invention provides an insulated wire having a conductor and at least two insulating coating layers formed surrounding the conductor, wherein the insulating coating layers comprises the outermost layer thereof, which has a thickness in the range of 20 to 50% based on the total thickness of the insulating coating layers and comprises a polyimide resin; and a base insulating coating layer in contact with the conductor, which has a thickness in a range of 50 to 80% based on the total thickness of the insulating coating layers and comprises a polyamide-imide resin having an adhesion-improving agent. The insulated wire of the present invention has insulating coating layers having superior coating adhesion as well as good heat-resistance.

摘要翻译： 本发明提供了一种绝缘电线，其具有导体和围绕导体形成的至少两个绝缘涂层，其中绝缘涂层包括其最外层，其厚度基于总厚度为20至50％ 的绝缘涂层，并且包括聚酰亚胺树脂; 以及与所述导体接触的基底绝缘涂层，其基于所述绝缘涂层的总厚度具有在50至80％的范围内的厚度，并且包括具有粘合性改进剂的聚酰胺 - 酰亚胺树脂。 本发明的绝缘电线具有优异的涂层密合性和良好的耐热性的绝缘涂层。

公开(公告)号：US20120247806A1

公开(公告)日：2012-10-04

申请号：US13432433

申请日：2012-03-28

申请人： Hyung-Sam CHOI ,  Joon-Hee Lee ,  Ki-Hong Park ,  Sun-Joo Park

发明人： Hyung-Sam CHOI ,  Joon-Hee Lee ,  Ki-Hong Park ,  Sun-Joo Park

IPC分类号： H01B3/30 ,  C08K5/544 ,  B82Y30/00

CPC分类号： C08G73/14 ,  C09D7/62 ,  C09D7/67 ,  C09D7/68 ,  C09D179/08 ,  C08K3/36

摘要： Disclosed is an insulating varnish composition including polyamideimide resin and 1 to 40 parts by weight of surface-treated silica in a sol state per 100 parts by weight of the polyamideimide resin. An insulated layer formed using the insulating varnish composition may have excellent corona discharge resistance, thereby preventing the insulation breakdown.

摘要翻译： 公开了一种绝缘漆组合物，其包含聚酰胺酰亚胺树脂和1至40重量份的溶胶状态的表面处理二氧化硅，每100重量份的聚酰胺酰亚胺树脂。 使用绝缘漆组合物形成的绝缘层可以具有优异的电晕放电电阻，从而防止绝缘击穿。

公开(公告)号：US08603867B2

公开(公告)日：2013-12-10

申请号：US13439418

申请日：2012-04-04

申请人： Bong-Kyun Kim ,  Shin-Il Choi ,  Hong-Sick Park ,  Wang-Woo Lee ,  Seok-Jun Jang ,  Byung-Uk Kim ,  Sun-Joo Park ,  Suk-Il Yoon ,  Jong-Hyun Jeong ,  Soon-Beom Hur

发明人： Bong-Kyun Kim ,  Shin-Il Choi ,  Hong-Sick Park ,  Wang-Woo Lee ,  Seok-Jun Jang ,  Byung-Uk Kim ,  Sun-Joo Park ,  Suk-Il Yoon ,  Jong-Hyun Jeong ,  Soon-Beom Hur

IPC分类号： H01L21/312

CPC分类号： G03F7/425 ,  H01L21/31133 ,  H01L27/1288 ,  H01L29/66765

摘要： A composition for removing a photoresist, the composition including about 1% by weight to about 10% by weight of tetramethyl ammonium hydroxide (“TMAH”), about 1% by weight to about 10% by weight of an alkanol amine, about 50% by weight to about 70% by weight of a glycol ether compound, about 0.01% by weight to about 1% by weight of a triazole compound, about 20% by weight to about 40% by weight of a polar solvent, and water, each based on a total weight of the composition.

摘要翻译： 用于除去光致抗蚀剂的组合物，该组合物包含约1重量％至约10重量％的四甲基氢氧化铵（“TMAH”），约1重量％至约10重量％的烷醇胺，约50重量％ 约70重量％的二醇醚化合物，约0.01重量％至约1重量％的三唑化合物，约20重量％至约40重量％的极性溶剂和水，各自 基于组合物的总重量。

公开(公告)号：US07956393B2

公开(公告)日：2011-06-07

申请号：US12564019

申请日：2009-09-21

申请人： Jong-Hyun Choung ,  Bong-Kyun Kim ,  Hong-Sick Park ,  Sun-Young Hong ,  Young-Joo Choi ,  Byeong-Jin Lee ,  Nam-Seok Suh ,  Byung-Uk Kim ,  Suk-Il Yoon ,  Jong-Hyun Jeong ,  Sung-Gun Shin ,  Soon-Beom Huh ,  Se-Hwan Jung ,  Doo-Young Jang ,  Sun-Joo Park ,  Oh-Hwan Kweon

发明人： Jong-Hyun Choung ,  Bong-Kyun Kim ,  Hong-Sick Park ,  Sun-Young Hong ,  Young-Joo Choi ,  Byeong-Jin Lee ,  Nam-Seok Suh ,  Byung-Uk Kim ,  Suk-Il Yoon ,  Jong-Hyun Jeong ,  Sung-Gun Shin ,  Soon-Beom Huh ,  Se-Hwan Jung ,  Doo-Young Jang ,  Sun-Joo Park ,  Oh-Hwan Kweon

IPC分类号： H01L31/062 ,  H01L31/113

CPC分类号： G03F7/425 ,  H01L27/124 ,  H01L27/1288

摘要： A composition for a photoresist stripper and a method of fabricating a thin film transistor array substrate are provided according to one or more embodiments. In one or more embodiments, the composition includes about 5-30 weight % of a chain amine compound, about 0.5-10 weight % of a cyclic amine compound, about 10-80 weight % of a glycol ether compound, about 5-30 weight % of distilled water, and about 0.1-5 weight % of a corrosion inhibitor.

摘要翻译： 根据一个或多个实施方案提供了用于光致抗蚀剂剥离剂的组合物和制造薄膜晶体管阵列基板的方法。 在一个或多个实施方案中，组合物包含约5-30重量％的链胺化合物，约0.5-10重量％的环胺化合物，约10-80重量％的二醇醚化合物，约5-30重量％ ％的蒸馏水和约0.1-5重量％的腐蚀抑制剂。