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1.发明授权公开(公告)号：US08084184B2
公开(公告)日：2011-12-27
申请号：US12323649
申请日：2008-11-26
申请人： Jong-Hyun Choung , Hong-Sick Park , Sun-Young Hong , Bong-Kyun Kim , Byeoung-Jin Lee , Byung-Uk Kim , Jong-Hyun Jeong , Suk-Il Yoon , Sung-Gun Shin , Soon-Beom Huh , Se-Hwan Jung , Doo-Young Jang
发明人： Jong-Hyun Choung , Hong-Sick Park , Sun-Young Hong , Bong-Kyun Kim , Byeoung-Jin Lee , Byung-Uk Kim , Jong-Hyun Jeong , Suk-Il Yoon , Sung-Gun Shin , Soon-Beom Huh , Se-Hwan Jung , Doo-Young Jang
CPC分类号： G03F7/425
摘要： A composition for removing a photoresist includes a) an amine compound having a cyclic amine and/or a diamine, b) a glycol ether compound, c) a corrosion inhibitor and d) a polar solvent. The composition further includes a stripping promoter. Further disclosed is a method of manufacturing an array substrate using the composition for removing a photoresist.
摘要翻译： 用于除去光致抗蚀剂的组合物包括a）具有环胺和/或二胺的胺化合物，b）二醇醚化合物，c）缓蚀剂和d）极性溶剂。 组合物还包括剥离促进剂。 进一步公开了使用除去光致抗蚀剂的组合物制造阵列基板的方法。
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2.发明申请COMPOSITION FOR PHOTORESIST STRIPPER AND METHOD OF FABRICATING THIN FILM TRANSISTOR ARRAY SUBSTRATE 有权光电子剥离器的组合物和制造薄膜晶体管阵列基板的方法公开(公告)号：US20100151610A1
公开(公告)日：2010-06-17
申请号：US12564019
申请日：2009-09-21
申请人： Jong-Hyun CHOUNG , Bong-Kyun KIM , Hong-Sick PARK , Sun-Young HONG , Young-Joo CHOI , Byeong-Jin LEE , Nam-Seok SUH , Byung-Uk KIM , Suk-Il YOON , Jong-Hyun JEONG , Sung-Gun SHIN , Soon-Beom HUH , Se-Hwan JUNG , Doo-Young JANG , Sun-Joo PARK , Oh-Hwan KWEON
发明人： Jong-Hyun CHOUNG , Bong-Kyun KIM , Hong-Sick PARK , Sun-Young HONG , Young-Joo CHOI , Byeong-Jin LEE , Nam-Seok SUH , Byung-Uk KIM , Suk-Il YOON , Jong-Hyun JEONG , Sung-Gun SHIN , Soon-Beom HUH , Se-Hwan JUNG , Doo-Young JANG , Sun-Joo PARK , Oh-Hwan KWEON
CPC分类号： G03F7/425 , H01L27/124 , H01L27/1288
摘要： A composition for a photoresist stripper and a method of fabricating a thin film transistor array substrate are provided according to one or more embodiments. In one or more embodiments, the composition includes about 5-30 weight % of a chain amine compound, about 0.5-10 weight % of a cyclic amine compound, about 10-80 weight % of a glycol ether compound, about 5-30 weight % of distilled water, and about 0.1-5 weight % of a corrosion inhibitor.
摘要翻译： 根据一个或多个实施方案提供了用于光致抗蚀剂剥离剂的组合物和制造薄膜晶体管阵列基板的方法。 在一个或多个实施方案中，组合物包含约5-30重量％的链胺化合物，约0.5-10重量％的环胺化合物，约10-80重量％的二醇醚化合物，约5-30重量％ ％的蒸馏水和约0.1-5重量％的腐蚀抑制剂。
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公开(公告)号：US20090084406A1
公开(公告)日：2009-04-02
申请号：US12214658
申请日：2008-06-20
申请人： Ji Sun Lee , Hong Sick Park , Jong Hyun Choung , Sun Young Hong , Bong Kyun Kim , Byeong Jin Lee , Byung Uk Kim , Jong Hyun Jeong , Suk Il Yoon , Seong Bae Kim , Sung Gun Shin , Soon Beom Huh , Se Hwan Jung , Doo Young Jang
发明人： Ji Sun Lee , Hong Sick Park , Jong Hyun Choung , Sun Young Hong , Bong Kyun Kim , Byeong Jin Lee , Byung Uk Kim , Jong Hyun Jeong , Suk Il Yoon , Seong Bae Kim , Sung Gun Shin , Soon Beom Huh , Se Hwan Jung , Doo Young Jang
CPC分类号： G03F7/425
摘要： The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.
摘要翻译： 本发明提供了一种剥离组合物和剥离方法，其能够在形成基板上的滤色器或有机绝缘膜的过程中发现缺陷时容易地剥离形成在基板上的着色抗蚀剂或有机绝缘膜，以重新使用基板 。 在一个实施方案中，汽提组合物包含约0.5至约45重量％的氢氧化物化合物，约10至约89重量％的亚烷基二醇烷基醚化合物，约5至约45重量％的烷醇胺化合物和约0.01至约5重量％的 无机盐化合物。 有利地，可以在不损坏底部基板的薄膜晶体管的同时进行剥离处理，同时移除彩色抗蚀剂或有机绝缘膜。
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公开(公告)号：US20110206829A1
公开(公告)日：2011-08-25
申请号：US13101973
申请日：2011-05-05
申请人： Ji Sun LEE , Hong Sick PARK , Jong Hyun CHOUNG , Sun Young HONG , Bong Kyun KIM , Byeong Jin LEE , Byung Uk KIM , Jong Hyun JEONG , Suk Il YOON , Seong Bae KIM , Sung Gun SHIN , Soon Beom HUH , Se Hwan JUNG , Doo Young JANG
发明人： Ji Sun LEE , Hong Sick PARK , Jong Hyun CHOUNG , Sun Young HONG , Bong Kyun KIM , Byeong Jin LEE , Byung Uk KIM , Jong Hyun JEONG , Suk Il YOON , Seong Bae KIM , Sung Gun SHIN , Soon Beom HUH , Se Hwan JUNG , Doo Young JANG
CPC分类号： G03F7/425
摘要： The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.
摘要翻译： 本发明提供了一种剥离组合物和剥离方法，其能够在形成基板上的滤色器或有机绝缘膜的过程中发现缺陷时容易地剥离形成在基板上的着色抗蚀剂或有机绝缘膜，以重新使用基板 。 在一个实施方案中，汽提组合物包含约0.5至约45重量％的氢氧化物化合物，约10至约89重量％的亚烷基二醇烷基醚化合物，约5至约45重量％的烷醇胺化合物和约0.01至约5重量％的 无机盐化合物。 有利地，可以在不损坏底部基板的薄膜晶体管的同时进行剥离处理，同时移除彩色抗蚀剂或有机绝缘膜。
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5.发明授权Composition for photoresist stripper and method of fabricating thin film transistor array substrate 有权用于光致抗蚀剂剥离剂的组合物和制造薄膜晶体管阵列基板的方法公开(公告)号：US07956393B2
公开(公告)日：2011-06-07
申请号：US12564019
申请日：2009-09-21
申请人： Jong-Hyun Choung , Bong-Kyun Kim , Hong-Sick Park , Sun-Young Hong , Young-Joo Choi , Byeong-Jin Lee , Nam-Seok Suh , Byung-Uk Kim , Suk-Il Yoon , Jong-Hyun Jeong , Sung-Gun Shin , Soon-Beom Huh , Se-Hwan Jung , Doo-Young Jang , Sun-Joo Park , Oh-Hwan Kweon
发明人： Jong-Hyun Choung , Bong-Kyun Kim , Hong-Sick Park , Sun-Young Hong , Young-Joo Choi , Byeong-Jin Lee , Nam-Seok Suh , Byung-Uk Kim , Suk-Il Yoon , Jong-Hyun Jeong , Sung-Gun Shin , Soon-Beom Huh , Se-Hwan Jung , Doo-Young Jang , Sun-Joo Park , Oh-Hwan Kweon
IPC分类号： H01L31/062 , H01L31/113
CPC分类号： G03F7/425 , H01L27/124 , H01L27/1288
摘要： A composition for a photoresist stripper and a method of fabricating a thin film transistor array substrate are provided according to one or more embodiments. In one or more embodiments, the composition includes about 5-30 weight % of a chain amine compound, about 0.5-10 weight % of a cyclic amine compound, about 10-80 weight % of a glycol ether compound, about 5-30 weight % of distilled water, and about 0.1-5 weight % of a corrosion inhibitor.
摘要翻译： 根据一个或多个实施方案提供了用于光致抗蚀剂剥离剂的组合物和制造薄膜晶体管阵列基板的方法。 在一个或多个实施方案中，组合物包含约5-30重量％的链胺化合物，约0.5-10重量％的环胺化合物，约10-80重量％的二醇醚化合物，约5-30重量％ ％的蒸馏水和约0.1-5重量％的腐蚀抑制剂。
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6.发明申请COMPOSITION FOR REMOVING PHOTORESIST AND METHOD OF MANUFACTURING AN ARRAY SUBSTRATE USING THE SAME 有权用于去除光电元件的组合物和使用其制造阵列基板的方法公开(公告)号：US20090170037A1
公开(公告)日：2009-07-02
申请号：US12323649
申请日：2008-11-26
申请人： Jong-Hyun CHOUNG , Hong-Sick Park , Sun-Young Hong , Bong-Kyun Kim , Byeoung-Jin Lee , Byung-Uk Kim , Jong-Hyun Jeong , Suk-Il Yoon , Sung-Gun Shin , Soon-Beom Huh , Se-Hwan Jung , Doo-Young Jang
发明人： Jong-Hyun CHOUNG , Hong-Sick Park , Sun-Young Hong , Bong-Kyun Kim , Byeoung-Jin Lee , Byung-Uk Kim , Jong-Hyun Jeong , Suk-Il Yoon , Sung-Gun Shin , Soon-Beom Huh , Se-Hwan Jung , Doo-Young Jang
CPC分类号： G03F7/425
摘要： A composition for removing a photoresist includes a) an amine compound having a cyclic amine and/or a diamine, b) a glycol ether compound, c) a corrosion inhibitor and d) a polar solvent. The composition further includes a stripping promoter. Further disclosed is a method of manufacturing an array substrate using the composition for removing a photoresist.
摘要翻译： 用于除去光致抗蚀剂的组合物包括a）具有环胺和/或二胺的胺化合物，b）二醇醚化合物，c）缓蚀剂和d）极性溶剂。 组合物还包括剥离促进剂。 进一步公开了使用除去光致抗蚀剂的组合物制造阵列基板的方法。
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公开(公告)号：US08163095B2
公开(公告)日：2012-04-24
申请号：US13101973
申请日：2011-05-05
申请人： Ji Sun Lee , Hong Sick Park , Jong Hyun Choung , Sun Young Hong , Bong Kyun Kim , Byeong Jin Lee , Byung Uk Kim , Jong Hyun Jeong , Suk II Yoon , Seong Bae Kim , Sung Gun Shin , Soon Beom Huh , Se Hwan Jung , Doo Young Jang
发明人： Ji Sun Lee , Hong Sick Park , Jong Hyun Choung , Sun Young Hong , Bong Kyun Kim , Byeong Jin Lee , Byung Uk Kim , Jong Hyun Jeong , Suk II Yoon , Seong Bae Kim , Sung Gun Shin , Soon Beom Huh , Se Hwan Jung , Doo Young Jang
IPC分类号： C11D7/50
CPC分类号： G03F7/425
摘要： The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.
摘要翻译： 本发明提供了一种剥离组合物和剥离方法，其能够在形成基板上的滤色器或有机绝缘膜的过程中发现缺陷时容易地剥离形成在基板上的着色抗蚀剂或有机绝缘膜，以重新使用基板 。 在一个实施方案中，汽提组合物包含约0.5至约45重量％的氢氧化物化合物，约10至约89重量％的亚烷基二醇烷基醚化合物，约5至约45重量％的烷醇胺化合物和约0.01至约5重量％的 无机盐化合物。 有利地，可以在不损坏底部基板的薄膜晶体管的同时进行剥离处理，同时移除彩色抗蚀剂或有机绝缘膜。
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公开(公告)号：US07968507B2
公开(公告)日：2011-06-28
申请号：US12214658
申请日：2008-06-20
申请人： Ji Sun Lee , Hong Sick Park , Jong Hyun Choung , Sun Young Hong , Bong Kyun Kim , Byeong Jin Lee , Byung Uk Kim , Jong Hyun Jeong , Suk Il Yoon , Seong Bae Kim , Sung Gun Shin , Soon Beom Huh , Se Hwan Jung , Doo Young Jang
发明人： Ji Sun Lee , Hong Sick Park , Jong Hyun Choung , Sun Young Hong , Bong Kyun Kim , Byeong Jin Lee , Byung Uk Kim , Jong Hyun Jeong , Suk Il Yoon , Seong Bae Kim , Sung Gun Shin , Soon Beom Huh , Se Hwan Jung , Doo Young Jang
IPC分类号： C11D7/06
CPC分类号： G03F7/425
摘要： The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.
摘要翻译： 本发明提供了一种剥离组合物和剥离方法，其能够在形成基板上的滤色器或有机绝缘膜的过程中发现缺陷时容易地剥离形成在基板上的着色抗蚀剂或有机绝缘膜，以重新使用基板 。 在一个实施方案中，汽提组合物包含约0.5至约45重量％的氢氧化物化合物，约10至约89重量％的亚烷基二醇烷基醚化合物，约5至约45重量％的烷醇胺化合物和约0.01至约5重量％的 无机盐化合物。 有利地，可以在不损坏底部基板的薄膜晶体管的同时进行剥离处理，同时移除彩色抗蚀剂或有机绝缘膜。
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公开(公告)号：US20110093887A1
公开(公告)日：2011-04-21
申请号：US12897340
申请日：2010-10-04
申请人： Doo-young JANG , Chang-sun KIM
发明人： Doo-young JANG , Chang-sun KIM
CPC分类号： G09G5/02 , G09G2320/0261 , G09G2320/028 , G09G2320/0285 , G09G2320/068
摘要： Disclosed are a display apparatus and a video processing method of the display apparatus, the display apparatus including a user interface (UI) generator which generates and outputs UI information to a display unit; a user selection unit which allows a user to select a view zone; a signal processor which processes a received video signal displayable through the display unit; and a controller which controls the UI generator to display a selection menu including at least one view zone item on the display unit if a control signal for adjusting the view zone is selected from the user selection unit, and controls the signal processor to change at least one of an image quality adjusting value and a grayscale value of the received video signal if the view zone item is selected through the selection menu.
摘要翻译： 公开了一种显示装置的显示装置和视频处理方法，该显示装置包括：生成UI信息并向显示单元输出UI信息的用户接口（UI）发生器; 用户选择单元，其允许用户选择视区; 处理通过所述显示单元可显示的接收视频信号的信号处理器; 以及控制器，如果从所述用户选择单元中选择了用于调整所述视区的控制信号，则控制所述UI生成器显示包括所述显示单元上的至少一个视区项目的选择菜单，并且控制所述信号处理器至少改变 如果通过选择菜单选择了视区项目，则接收的视频信号的图像质量调整值和灰度值中的一个。
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