摘要:
A bipolar transistor in which the emitter possesses a double "mesa" structure so as to achieve the maximum avoidance of the phenomena of electron/hole recombinations that have a deleterious effect on the current gain. The double mesa emitter can be made out of an alternation of materials M.sub.I /M.sub.II having different types of behavior with respect to a pair of etching methods. These materials may be GaInP and GaAs.
摘要:
A semiconductor device for electron emission in a vacuum comprises a stack of two or more semi-conductor layers of N and P type according to sequence N/(P)/N forming a juxtaposition of two head-to-tail NP junctions, in materials belonging to the III-N family, two adjacent layers forming an interface. The semiconductor materials of the layers of the stack close to the vacuum, where the electrons reach a high energy, have a band gap Eg>c/2, where c is the electron affinity of the semiconductor material, the P-type semiconductor layer being obtained partially or completely, by doping impurities of acceptor type or by piezoelectric effect to exhibit a negative fixed charge in any interface between the layers, a positive bias potential applied to the stack supplying, to a fraction of electrons circulating in the stack, the energy needed for emission in the vacuum by an emissive zone of an output layer.
摘要翻译:用于真空中电子发射的半导体器件包括根据序列N /(P)/ N的两个或多个N型和P型半导体层的堆叠,形成两个头对尾NP结的并置,材料 属于III-N族,两个相邻的层形成界面。 靠近真空的堆叠层的半导体材料,其中电子达到高能量,具有带隙Eg> c / 2,其中c是半导体材料的电子亲和力,P型半导体层是 通过掺杂受体类型的杂质或通过压电效应来获得部分或完全地获得,以在层之间的任何界面中显示负的固定电荷,施加到堆叠的积极偏置电势提供给堆叠中循环的一部分电子, 需要通过输出层的发射区在真空中发射。
摘要:
The aim of the method is to prevent parasitic metallizations on the lateral walls of a raised pattern, which is used to self-align the electrode metallizations in a transistor. To this effect, a pair of semiconductor materials is introduced into the vertical pattern. These semiconductor materials react differently with respect to a pair of etching methods, so that a layer of one semiconductor material is etched to a greater extent than the other layer. The overhanging feature thus created interrupts the parasitic metallizations, if any, between the electrodes. The disclosed method can be applied to vertical structures.
摘要:
A semiconductor device for electron emission in a vacuum comprises a stack of two or more semi-conductor layers of N and P type according to sequence N/(P)/N forming a juxtaposition of two head-to-tail NP junctions, in materials belonging to the III-N family, two adjacent layers forming an interface. The semiconductor materials of the layers of the stack close to the vacuum, where the electrons reach a high energy, have a band gap Eg>c/2, where c is the electron affinity of the semiconductor material, the P-type semiconductor layer being obtained partially or completely, by doping impurities of acceptor type or by piezoelectric effect to exhibit a negative fixed charge in any interface between the layers, a positive bias potential applied to the stack supplying, to a fraction of electrons circulating in the stack, the energy needed for emission in the vacuum by an emissive zone of an output layer.
摘要翻译:用于真空中电子发射的半导体器件包括根据序列N /(P)/ N的两个或多个N型和P型半导体层的堆叠,形成两个头对尾NP连接的并置,材料 属于III-N族,两个相邻的层形成界面。 靠近真空的堆叠层的半导体材料,其中电子达到高能量,具有带隙Eg> c / 2,其中c是半导体材料的电子亲和力,P型半导体层是 通过掺杂受体类型的杂质或通过压电效应来获得部分或完全地获得,以在层之间的任何界面中显示负的固定电荷,施加到堆叠的积极偏置电势提供给堆叠中循环的一部分电子, 需要通过输出层的发射区在真空中发射。
摘要:
A semiconductor component that could be a power transistor type of component comprises mesa-structured elementary bipolar transistors. This component has a thick, metal heat sink of which a part (PI) takes the form of a bridge and a part is in contact with the substrate. The legs of the bridge lie on the entire unit constituted by the mesas. The heat sink made on the front face of the substrate may be connected to the rear face of the substrate comprising a ground plate. The discharging of the heat is thus appreciably fostered.
摘要:
Disclosed is a method for the etching of at least two layers of semiconductor materials having different natures, with a view to making a mesa for the self-alignment of the metallizations of a transistor. The heterojunction must comprise a first layer of a material containing As, which is etched by reactive ion etching, and a second layer of a material containing P which is etched chemically. Application to the making of HBT type vertical heterojunction transistors.
摘要:
A collector-up heterojunction bipolar transistor including, stacked on a substrate, an emitter layer, a base layer, and a collector layer. In this transistor the surface area of the base-emitter junction is of smaller dimensions than the surface area of the base-collector junction. Further, the material of the base layer exhibits a sensitivity of the electrical conductivity to ion implantation that is lower than the sensitivity of the electrical conductivity of the material of the emitter layer to the same ion implantation.
摘要:
Disclosed is a novel topology of monolithic, microwave amplifiers with high integration. This is a more compact topology, divided into a two-level or tree-like structure in which the division of the input signal is done firstly on each transistor Tij and, secondly, on each of the elementary transistors tijk of the transistors Tij. More specifically, the input line LE is divided into different basic lines li, each line li supplying lines lij distributed on either side of said lines li, a line lij then supplying a power transistor Tij. Application to microwave amplifiers.
摘要:
A semiconductor component of the heterojunction bipolar transistor type comprises, on a substrate, a collector, a base and a mesa-shaped emitter resting on the base. The bipolar transistor furthermore comprises electrically insulating elements in contact with the base and the flanks of the emitter mesa, said elements having a width of the same magnitude as the width of the mesa and providing the component with greater stability. Furthermore, a method for the manufacture of a component of this kind comprises in particular a step for the ion implantation of insulating ions through the constituent layer of the emitter mesa so as to define the electrically insulating elements.
摘要:
A semiconductor component of the heterojunction bipolar transistor type comprises, on a substrate, a collector, a base and a mesa-shaped emitter resting on the base. The bipolar transistor furthermore comprises electrically insulating elements in contact with the base and the flanks of the emitter mesa, said elements having a width of the same magnitude as the width of the mesa and providing the component with greater stability. Furthermore, a method for the manufacture of a component of this kind comprises in particular a step for the ion implantation of insulating ions through the constituent layer of the emitter mesa so as to define the electrically insulating elements.