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公开(公告)号：US11726399B2
公开(公告)日：2023-08-15
申请号：US17556681
申请日：2021-12-20
Inventor： Pei-Cheng Hsu , Ching-Huang Chen , Hung-Yi Tsai , Ming-Wei Chen , Ta-Cheng Lien , Hsin-Chang Lee
IPC: G03F1/24
CPC classification number: G03F1/24
Abstract: A reflective mask includes a substrate, a reflective multilayer disposed on the substrate, a capping layer disposed on the reflective multilayer, and an absorber layer disposed on the capping layer. The absorber layer includes one or more alternating pairs of a first Cr based layer and a second Cr based layer different from the first Cr based layer.
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公开(公告)号：US10036951B2
公开(公告)日：2018-07-31
申请号：US14726317
申请日：2015-05-29
Inventor： Pei-Cheng Hsu , Chih-Cheng Lin , Hsin-Chang Lee , Ta-Cheng Lien , Anthony Yen
CPC classification number: G03F1/64 , G03F7/70741
Abstract: A method for fabricating a pellicle assembly for a lithography process includes fabricating a pellicle frame including a sidewall having a porous material. In some embodiments, the pellicle frame is subjected to an anodization process to form the porous material. The porous material includes a plurality of pore channels extending, in a direction perpendicular to an exterior surface of the sidewall, from the exterior surface to an interior surface of the sidewall. In various embodiments, a pellicle membrane is formed, and the pellicle membrane is attached to the pellicle frame such that the pellicle membrane is suspended by the pellicle frame. Some embodiments disclosed herein further provide a system including a membrane and a pellicle frame that secures the membrane across the pellicle frame. In some examples, a portion of the pellicle frame includes a porous material, where the porous material includes the plurality of pore channels.
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公开(公告)号：US09535317B2
公开(公告)日：2017-01-03
申请号：US14582459
申请日：2014-12-24
Inventor： Pei-Cheng Hsu , Chih-Cheng Lin , Ta-Cheng Lien , Wei-Shiuan Chen , Hsin-Chang Lee , Anthony Yen
Abstract: A method for forming a lithography mask includes forming a capping layer on a reflective multilayer layer, the capping layer comprising a first material, forming a patterned patterning layer on the capping layer, and introducing a secondary material into the capping layer, the secondary material having an atomic number that is smaller than 15.
Abstract translation: 一种形成光刻掩模的方法包括在反射多层层上形成覆盖层，封盖层包括第一材料，在封盖层上形成图案化图案层，并将次材料引入覆盖层中，第二材料具有 小于15的原子序数。
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公开(公告)号：US09244341B2
公开(公告)日：2016-01-26
申请号：US14630487
申请日：2015-02-24
Inventor： Hsin-Chang Lee , Chia-Jen Chen , Pei-Cheng Hsu , Anthony Yen
CPC classification number: G03F1/76 , G03F1/24 , G03F1/38 , G03F1/44 , G03F1/50 , G03F1/68 , G03F1/70 , G06F17/5068
Abstract: A photomask having a machine-readable identifying mark and suitable for manufacturing integrated circuit devices and a method for forming the photomask and identifying mark are disclosed. An exemplary embodiment includes receiving a design layout corresponding to a pattern to be formed on a photomask blank. A specification of an identifying code is also received along with the photomask blank, which includes a substrate, a reflective layer, and an absorptive layer. A first patterning is performed using the design layout. A second patterning is performed using the specification of the identifying code.
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公开(公告)号：US12050399B2
公开(公告)日：2024-07-30
申请号：US17318315
申请日：2021-05-12
Inventor： Hsin-Chang Lee , Pei-Cheng Hsu , Ta-Cheng Lien , Li-Jui Chen , Tsai-Sheng Gau , Chin-Hsiang Lin
IPC: G03F1/64 , H01L21/033
CPC classification number: G03F1/64 , H01L21/0337
Abstract: A method for preparing a pellicle assembly includes reducing the thickness of one or more initial membrane(s) to obtain a pellicle membrane. The pellicle membrane is then affixed to a mounting frame to obtain the pellicle assembly. Compressive pressure can be applied to reduce the thickness of the initial membrane(s). Alternatively, the thickness can be reduced by stretching the initial membrane(s) to obtain an extended membrane. A mounting frame is then affixed to a portion of the extended membrane. The mounting frame and the portion of the extended membrane are then separated from the remainder of the extended membrane to obtain the pellicle assembly. The resulting pellicle assemblies include a pellicle membrane that is attached to a mounting frame. The pellicle membrane can be formed from nanotubes and has a combination of high transmittance, low deflection, and small pore size.
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Patent Agency Ranking
公开(公告)号：US12013632B2
公开(公告)日：2024-06-18
申请号：US17497337
申请日：2021-10-08
Inventor： Chue San Yoo , Chih-Chiang Tu , Chien-Cheng Chen , Jong-Yuh Chang , Kun-Lung Hsieh , Pei-Cheng Hsu , Hsin-Chang Lee , Yun-Yue Lin
Abstract: A pellicle includes a frame configured to attach to a photomask, wherein the frame includes a vent hole. The pellicle further includes a filter covering the vent hole, wherein the filter directly connects to an outer surface of the frame. The pellicle further includes a membrane extending over a top surface of the frame. The pellicle further includes a mount between the frame and the membrane, wherein the mount is attachable to the frame by an adhesive.
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公开(公告)号：US11789356B2
公开(公告)日：2023-10-17
申请号：US17461520
申请日：2021-08-30
Inventor： Hsin-Chang Lee , Pei-Cheng Hsu , Ta-Cheng Lien , Tzu Yi Wang
CPC classification number: G03F1/22 , G03F1/80 , H01J37/32009 , H01J2237/334
Abstract: In a method of manufacturing a photo mask, an etching mask layer having circuit patterns is formed over a target layer of the photo mask to be etched. The photo mask includes a backside conductive layer. The target layer is etched by plasma etching, while preventing active species of plasma from attacking the backside conductive layer.
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公开(公告)号：US11714350B2
公开(公告)日：2023-08-01
申请号：US17839266
申请日：2022-06-13
Inventor： Chun-Fu Yang , Pei-Cheng Hsu , Ta-Cheng Lien , Hsin-Chang Lee
CPC classification number: G03F1/82 , G03F7/2002
Abstract: A method includes placing a photomask having a contamination on a surface thereof in a plasma processing chamber. The contaminated photomask is plasma processed in the plasma processing chamber to remove the contamination from the surface. The plasma includes oxygen plasma or hydrogen plasma.
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公开(公告)号：US20220365421A1
公开(公告)日：2022-11-17
申请号：US17318315
申请日：2021-05-12
Inventor： Hsin-Chang Lee , Pei-Cheng Hsu , Ta-Cheng Lien , Li-Jui Chen , Tsai-Sheng Gau , Chin-Hsiang Lin
IPC: G03F1/64 , H01L21/033
Abstract: A method for preparing a pellicle assembly includes reducing the thickness of one or more initial membrane(s) to obtain a pellicle membrane. The pellicle membrane is then affixed to a mounting frame to obtain the pellicle assembly. Compressive pressure can be applied to reduce the thickness of the initial membrane(s). Alternatively, the thickness can be reduced by stretching the initial membrane(s) to obtain an extended membrane. A mounting frame is then affixed to a portion of the extended membrane. The mounting frame and the portion of the extended membrane are then separated from the remainder of the extended membrane to obtain the pellicle assembly. The resulting pellicle assemblies include a pellicle membrane that is attached to a mounting frame. The pellicle membrane can be formed from nanotubes and has a combination of high transmittance, low deflection, and small pore size.
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公开(公告)号：US20220365420A1
公开(公告)日：2022-11-17
申请号：US17318487
申请日：2021-05-12
Inventor： Pei-Cheng Hsu , Ta-Cheng Lien , Hsin-Chang Lee , Tsai-Sheng Gau , Chin-Hsiang Lin
IPC: G03F1/62
Abstract: A pellicle assembly includes a pellicle membrane and a conformal coating on an outer surface of the pellicle membrane. The pellicle membrane can be formed with multiple layers and has a combination of high transmittance, low deflection, and small pore size. The conformal coating is intended to protect the pellicle membrane from damage that can occur due to heat and hydrogen plasma created during EUV exposure.
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