公开(公告)号：US20200066485A1

公开(公告)日：2020-02-27

申请号：US16665357

申请日：2019-10-28

申请人： TEL Epion Inc.

发明人： Matthew C. Gwinn ,  Martin D. Tabat ,  Kenneth Regan ,  Allen J. Leith ,  Michael Graf

IPC分类号： H01J37/304 ,  H01J37/20 ,  H01J37/08 ,  H01J37/147

摘要： An apparatus and method for processing a workpiece with a beam is described. The apparatus includes a vacuum chamber having a beam-line for forming a particle beam and treating a workpiece with the particle beam, and a scanner for translating the workpiece through the particle beam. The apparatus further includes a scanner control circuit coupled to the scanner, and configured to control a scan property of the scanner, and a beam control circuit coupled to at least one beam-line component, and configured to control the beam flux of the particle beam according to a duty cycle for switching between at least two different states during processing.

公开(公告)号：US20180197715A1

公开(公告)日：2018-07-12

申请号：US15863732

申请日：2018-01-05

申请人： TEL Epion Inc.

发明人： Matthew C. Gwinn ,  Martin D. Tabat ,  Kenneth Regan ,  Allen J. Leith ,  Michael Graf

IPC分类号： H01J37/304 ,  H01J37/20 ,  H01J37/08 ,  H01J37/147

摘要： An apparatus and method for processing a workpiece with a beam is described. The apparatus includes a vacuum chamber having a beam-line for forming a particle beam and treating a workpiece with the particle beam, and a scanner for translating the workpiece through the particle beam. The apparatus further includes a scanner control circuit coupled to the scanner, and configured to control a scan property of the scanner, and a beam control circuit coupled to at least one beam-line component, and configured to control the beam flux of the particle beam according to a duty cycle for switching between at least two different states during processing.

公开(公告)号：US09540725B2

公开(公告)日：2017-01-10

申请号：US14696063

申请日：2015-04-24

申请人： TEL Epion Inc.

发明人： Kenneth Regan ,  Yan Shao ,  Robert K. Becker ,  Christopher K. Olsen

IPC分类号： H01L21/425 ,  C23C14/22 ,  H01L21/265 ,  H01L21/263 ,  H01L21/02 ,  H01L21/285 ,  H01J37/08 ,  H01J37/147 ,  H01J37/317 ,  C23C14/10

CPC分类号： C23C14/221 ,  C23C14/10 ,  H01J37/08 ,  H01J37/1477 ,  H01J37/317 ,  H01J37/3171 ,  H01J2237/0812 ,  H01L21/02271 ,  H01L21/0262 ,  H01L21/2633 ,  H01L21/26566 ,  H01L21/28556

摘要： Provided is a method of controlling a gas cluster ion beam (GCIB) system for processing structures on a substrate. A GCIB system comprises deflection plates for directing a GCIB towards a substrate, the GCIB system coupled to a substrate scanning device configured to move a substrate in three dimensions. The substrate is exposed to the GCIB while the substrate is being moved by the substrate scanning device. A controller is used to control a set of deflection operating parameters comprising a deflection angle φ, voltage differential of the deflection plates, frequency of the deflection plate power, beam current, substrate distance, pressure in the nozzle, gas flow rate in the process chamber, separation of beam burns, duration of the bean burn, and/or duty cycle of the beam deflector output.

摘要翻译： 提供了一种控制用于处理衬底上的结构的气体簇离子束（GCIB）系统的方法。 GCIB系统包括用于将GCIB引向衬底的偏转板，GCIB系统耦合到被配置成在三维中移动衬底的衬底扫描装置。 当衬底被衬底扫描装置移动时，衬底暴露于GCIB。 控制器用于控制一组偏转操作参数，包括偏转角φ，偏转板的电压差，偏转板功率的频率，光束电流，衬底距离，喷嘴中的压力，处理室中的气体流速 ，光束灼伤分离，豆烧的持续时间和/或光束偏转器输出的占空比。

公开(公告)号：US10861674B2

公开(公告)日：2020-12-08

申请号：US16665357

申请日：2019-10-28

申请人： TEL Epion Inc.

发明人： Matthew C. Gwinn ,  Martin D. Tabat ,  Kenneth Regan ,  Allen J. Leith ,  Michael Graf

IPC分类号： H01J37/304 ,  H01J37/20 ,  H01J37/08 ,  H01J37/147

摘要： An apparatus and method for processing a workpiece with a beam is described. The apparatus includes a vacuum chamber having a beam-line for forming a particle beam and treating a workpiece with the particle beam, and a scanner for translating the workpiece through the particle beam. The apparatus further includes a scanner control circuit coupled to the scanner, and configured to control a scan property of the scanner, and a beam control circuit coupled to at least one beam-line component, and configured to control the beam flux of the particle beam according to a duty cycle for switching between at least two different states during processing.

公开(公告)号：US20150332924A1

公开(公告)日：2015-11-19

申请号：US14696063

申请日：2015-04-24

申请人： TEL Epion Inc.

发明人： Kenneth Regan ,  Yan Shao ,  Robert K. Becker ,  Christopher K. Olsen

IPC分类号： H01L21/265 ,  H01L21/02 ,  H01L21/285 ,  H01L21/263

CPC分类号： C23C14/221 ,  C23C14/10 ,  H01J37/08 ,  H01J37/1477 ,  H01J37/317 ,  H01J37/3171 ,  H01J2237/0812 ,  H01L21/02271 ,  H01L21/0262 ,  H01L21/2633 ,  H01L21/26566 ,  H01L21/28556

摘要： Provided is a method of controlling a gas cluster ion beam (GCIB) system for processing structures on a substrate. A GCIB system comprises deflection plates for directing a GCIB towards a substrate, the GCIB system coupled to a substrate scanning device configured to move a substrate in three dimensions. The substrate is exposed to the GCIB while the substrate is being moved by the substrate scanning device. A controller is used to control a set of deflection operating parameters comprising a deflection angle φ, voltage differential of the deflection plates, frequency of the deflection plate power, beam current, substrate distance, pressure in the nozzle, gas flow rate in the process chamber, separation of beam burns, duration of the bean burn, and/or duty cycle of the beam deflector output.

摘要翻译： 提供了一种控制用于处理衬底上的结构的气体簇离子束（GCIB）系统的方法。 GCIB系统包括用于将GCIB引向衬底的偏转板，GCIB系统耦合到被配置成在三维中移动衬底的衬底扫描装置。 当衬底被衬底扫描装置移动时，衬底暴露于GCIB。 控制器用于控制一组偏转操作参数，包括偏转角＆phgr;偏转板的电压差，偏转板功率的频率，射束电流，衬底距离，喷嘴中的压力，过程中的气体流速 腔室，束灼伤的分离，豆烧的持续时间和/或束导流器输出的占空比。