METHOD AND APPARATUS FOR BEAM DEFLECTION IN A GAS CLUSTER ION BEAM SYSTEM
    1.
    发明申请
    METHOD AND APPARATUS FOR BEAM DEFLECTION IN A GAS CLUSTER ION BEAM SYSTEM 有权
    气体离子束系统中光束偏转的方法和装置

    公开(公告)号:US20150332924A1

    公开(公告)日:2015-11-19

    申请号:US14696063

    申请日:2015-04-24

    Applicant: TEL Epion Inc.

    Abstract: Provided is a method of controlling a gas cluster ion beam (GCIB) system for processing structures on a substrate. A GCIB system comprises deflection plates for directing a GCIB towards a substrate, the GCIB system coupled to a substrate scanning device configured to move a substrate in three dimensions. The substrate is exposed to the GCIB while the substrate is being moved by the substrate scanning device. A controller is used to control a set of deflection operating parameters comprising a deflection angle φ, voltage differential of the deflection plates, frequency of the deflection plate power, beam current, substrate distance, pressure in the nozzle, gas flow rate in the process chamber, separation of beam burns, duration of the bean burn, and/or duty cycle of the beam deflector output.

    Abstract translation: 提供了一种控制用于处理衬底上的结构的气体簇离子束(GCIB)系统的方法。 GCIB系统包括用于将GCIB引向衬底的偏转板,GCIB系统耦合到被配置成在三维中移动衬底的衬底扫描装置。 当衬底被衬底扫描装置移动时,衬底暴露于GCIB。 控制器用于控制一组偏转操作参数,包括偏转角&phgr;偏转板的电压差,偏转板功率的频率,射束电流,衬底距离,喷嘴中的压力,过程中的气体流速 腔室,束灼伤的分离,豆烧的持续时间和/或束导流器输出的占空比。

    PRE-ALIGNED NOZZLE/SKIMMER
    2.
    发明申请
    PRE-ALIGNED NOZZLE/SKIMMER 审中-公开
    预对准喷嘴/ SKIMMER

    公开(公告)号:US20140123457A1

    公开(公告)日:2014-05-08

    申请号:US14151151

    申请日:2014-01-09

    Applicant: TEL Epion Inc.

    Abstract: A method of assembling a nozzle/skimmer module includes coupling a nozzle assembly and skimmer cartridge assembly in a rigid tandem configuration to more accurately control the formation of the Gas Cluster Ion Beam (GCIB). The nozzle/skimmer module is pre-aligned before installation in a production GCIB processing system to more accurately position the GCIB.

    Abstract translation: 组装喷嘴/撇渣器模块的方法包括以刚性串联构造联接喷嘴组件和撇渣器组件以更准确地控制气体簇离子束(GCIB)的形成。 喷嘴/撇渣器模块在安装到生产GCIB处理系统之前进行预对准,以更准确地定位GCIB。

    GCIB nozzle assembly
    3.
    发明授权
    GCIB nozzle assembly 有权
    GCIB喷嘴总成

    公开(公告)号:US09343259B2

    公开(公告)日:2016-05-17

    申请号:US14815265

    申请日:2015-07-31

    Applicant: TEL Epion Inc.

    Abstract: A nozzle assembly used for performing gas cluster ion beam (GCIB) etch processing of various materials is described. In particular, the nozzle assembly includes two or more conical nozzles that are aligned such that they are both used to generate the same GCIB. The first conical nozzle may include the throat that initially forms the GCIB and the second nozzle may form a larger conical cavity that may be appended to the first conical nozzle. A transition region may be disposed between the two conical nozzles that may substantially cylindrical and slightly larger than the largest diameter of the first conical nozzle.

    Abstract translation: 描述了用于进行各种材料的气体簇离子束(GCIB)蚀刻处理的喷嘴组件。 特别地,喷嘴组件包括两个或更多个锥形喷嘴,其被对准,使得它们都用于产生相同的GCIB。 第一锥形喷嘴可以包括最初形成GCIB的喉部,并且第二喷嘴可以形成可以附着到第一锥形喷嘴的更大的锥形空腔。 过渡区域可以设置在两个锥形喷嘴之间,其可以基本上圆柱形并稍微大于第一锥形喷嘴的最大直径。

    GCIB NOZZLE ASSEMBLY
    4.
    发明申请
    GCIB NOZZLE ASSEMBLY 有权
    GCIB喷嘴总成

    公开(公告)号:US20160042909A1

    公开(公告)日:2016-02-11

    申请号:US14815265

    申请日:2015-07-31

    Applicant: TEL Epion Inc.

    Abstract: A nozzle assembly used for performing gas cluster ion beam (GCIB) etch processing of various materials is described. In particular, the nozzle assembly includes two or more conical nozzles that are aligned such that they are both used to generate the same GCIB. The first conical nozzle may include the throat that initially forms the GCIB and the second nozzle may form a larger conical cavity that may be appended to the first conical nozzle. A transition region may be disposed between the two conical nozzles that may substantially cylindrical and slightly larger than the largest diameter of the first conical nozzle.

    Abstract translation: 描述了用于进行各种材料的气体簇离子束(GCIB)蚀刻处理的喷嘴组件。 特别地,喷嘴组件包括两个或更多个锥形喷嘴,其被对准,使得它们都用于产生相同的GCIB。 第一锥形喷嘴可以包括最初形成GCIB的喉部,并且第二喷嘴可以形成可以附着到第一锥形喷嘴的更大的锥形空腔。 过渡区域可以设置在两个锥形喷嘴之间,其可以基本上圆柱形并稍微大于第一锥形喷嘴的最大直径。

    Low contamination scanner for GCIB system
    5.
    发明授权
    Low contamination scanner for GCIB system 有权
    GCIB系统低污染扫描仪

    公开(公告)号:US09029808B2

    公开(公告)日:2015-05-12

    申请号:US14444791

    申请日:2014-07-28

    Applicant: TEL Epion Inc.

    Abstract: Disclosed are an apparatus, system, and method for scanning a substrate or other workpiece through a gas-cluster ion beam (GCIB), or any other type of ion beam. The workpiece scanning apparatus is configured to receive and hold a substrate for irradiation by the GCIB and to scan it through the GCIB in two directions using two movements: a reciprocating fast-scan movement, and a slow-scan movement. The slow-scan movement is actuated using a servo motor and a belt drive system, the belt drive system being configured to reduce the failure rate of the workpiece scanning apparatus. The apparatus further includes shields and other features for reducing process contamination resulting from scattering of the GCIB from the scanning apparatus.

    Abstract translation: 公开了一种用于通过气体簇离子束(GCIB)或任何其它类型的离子束扫描衬底或其它工件的装置,系统和方法。 工件扫描装置被配置为接收和保持用于GCIB照射的基板,并且通过两次运动通过GCIB在两个方向上进行扫描:往复式快速扫描运动和慢扫描运动。 使用伺服电动机和皮带驱动系统来驱动缓慢扫描运动,所述皮带驱动系统被配置为降低工件扫描装置的故障率。 该装置还包括屏蔽件和其它特征,用于减少GCIB从扫描装置散射而产生的工艺污染。

    Method and apparatus for beam deflection in a gas cluster ion beam system
    6.
    发明授权
    Method and apparatus for beam deflection in a gas cluster ion beam system 有权
    气体簇离子束系统中光束偏转的方法和装置

    公开(公告)号:US09540725B2

    公开(公告)日:2017-01-10

    申请号:US14696063

    申请日:2015-04-24

    Applicant: TEL Epion Inc.

    Abstract: Provided is a method of controlling a gas cluster ion beam (GCIB) system for processing structures on a substrate. A GCIB system comprises deflection plates for directing a GCIB towards a substrate, the GCIB system coupled to a substrate scanning device configured to move a substrate in three dimensions. The substrate is exposed to the GCIB while the substrate is being moved by the substrate scanning device. A controller is used to control a set of deflection operating parameters comprising a deflection angle φ, voltage differential of the deflection plates, frequency of the deflection plate power, beam current, substrate distance, pressure in the nozzle, gas flow rate in the process chamber, separation of beam burns, duration of the bean burn, and/or duty cycle of the beam deflector output.

    Abstract translation: 提供了一种控制用于处理衬底上的结构的气体簇离子束(GCIB)系统的方法。 GCIB系统包括用于将GCIB引向衬底的偏转板,GCIB系统耦合到被配置成在三维中移动衬底的衬底扫描装置。 当衬底被衬底扫描装置移动时,衬底暴露于GCIB。 控制器用于控制一组偏转操作参数,包括偏转角φ,偏转板的电压差,偏转板功率的频率,光束电流,衬底距离,喷嘴中的压力,处理室中的气体流速 ,光束灼伤分离,豆烧的持续时间和/或光束偏转器输出的占空比。

    Pre-aligned nozzle/skimmer
    7.
    发明授权
    Pre-aligned nozzle/skimmer 有权
    预排列喷嘴/撇渣器

    公开(公告)号:US09305746B2

    公开(公告)日:2016-04-05

    申请号:US14151151

    申请日:2014-01-09

    Applicant: TEL Epion Inc.

    Abstract: A method of assembling a nozzle/skimmer module includes coupling a nozzle assembly and skimmer cartridge assembly in a rigid tandem configuration to more accurately control the formation of the Gas Cluster Ion Beam (GCIB). The nozzle/skimmer module is pre-aligned before installation in a production GCIB processing system to more accurately position the GCIB.

    Abstract translation: 组装喷嘴/撇渣器模块的方法包括以刚性串联构造联接喷嘴组件和撇渣器组件以更准确地控制气体簇离子束(GCIB)的形成。 喷嘴/撇渣器模块在安装到生产GCIB处理系统之前进行预对准,以更准确地定位GCIB。

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