公开(公告)号：US20190258164A1

公开(公告)日：2019-08-22

申请号：US16333449

申请日：2017-08-22

Applicant: TORAY INDUSTRIES, INC.

Inventor： Yugo TANIGAKI ,  Akihiro ISHIKAWA ,  Kazuto MIYOSHI

IPC: G03F7/038 ,  G03F7/037 ,  G03F7/032 ,  G03F7/023 ,  G03F7/075 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  H01L51/00 ,  H01L27/32 ,  G02F1/1339 ,  G02F1/1335 ,  H01L51/52

Abstract: The present invention provides a negative-type photosensitive resin composition capable of obtaining a cured film suppressing generation of development residues caused by a pigment and having high sensitivity and excellent heat resistance and light blocking capability. A negative-type photosensitive resin composition contains an alkali-soluble resin (A), a radical-polymerizable compound (B), a photopolymerization initiator (C1), and a pigment (D1). In this resin composition, the radical-polymerizable compound (B) contains a flexible chain-containing radical-polymerizable compound (B1), the flexible chain-containing radical-polymerizable compound (B1) contains a compound having (I) a structure derived from a compound having at least three hydroxyl groups in the molecule, (II) at least three ethylenically unsaturated double bond groups, and (III) at least one aliphatic chain, the aliphatic chain has an average molecular weight of 40 to 500, and the content of the pigment (D1) is 5 to 70 mass % of the total solid content.

公开(公告)号：US20190302617A1

公开(公告)日：2019-10-03

申请号：US16302886

申请日：2017-06-27

Applicant: TORAY INDUSTRIES, INC.

Inventor： Shinichi MATSUKI ,  Yugo TANIGAKI ,  Kazuto MIYOSHI

IPC: G03F7/038 ,  C09B7/08

Abstract: The present invention provides a negative photosensitive resin composition that has high pigment dispersibility and stability and can reduce residues of unexposed portions during development. The present invention provides a negative photosensitive resin composition containing an (A) alkali-soluble resin, a (B) dispersant having an amine value exceeding 0, a (C) benzofuranone based organic pigment having an amide structure, a (D) radical polymerizable compound, and a (E) photoinitiator. In this negative photosensitive resin composition, the (A) alkali-soluble resin contains one or more selected from the group consisting of a (A1) polyimide, a (A2) polyimide precursor, a (A3) polybenzoxazole, and a (A4) polybenzoxazole precursor, and the (B) dispersant having an amine value exceeding 0 contains a (B1) dispersant including a repeating unit represented by general formula (2) and a repeating unit represented by general formula (3) and a (B2) dispersant that is an acrylic block copolymer having an amine value of 15 to 60 mgKOH/g and/or a (B3) dispersant having a urethane bond. (In general formula (2), R1 represents an alkylene group. R2 and R3, which may be the same or different, each represents hydrogen, an alkyl group or a hydroxyl group. x represents an integer of 0 to 20. However, when x is 0, at least one of R2 and R3 is an alkyl group. m represents an integer of 1 to 100. In general formula (3), n represents an integer of 1 to 100.)

公开(公告)号：US20180267405A1

公开(公告)日：2018-09-20

申请号：US15760756

申请日：2016-09-21

Applicant: TORAY INDUSTRIES, INC.

Inventor： Satoshi KAMEMOTO ,  Yugo TANIGAKI ,  Kazuto MIYOSHI

IPC: G03F7/038 ,  G03F7/004 ,  H01L27/32 ,  G03F7/16 ,  G03F7/20 ,  G03F7/26 ,  G03F7/40 ,  C08G69/32 ,  G03F7/031 ,  G03F7/037

CPC classification number: G03F7/0387 ,  C08G69/32 ,  C08G73/06 ,  G03F7/0007 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/031 ,  G03F7/037 ,  G03F7/105 ,  G03F7/16 ,  G03F7/20 ,  G03F7/26 ,  G03F7/40 ,  H01L27/3258 ,  H05B33/10 ,  H05B33/12 ,  H05B33/22

Abstract: The present invention provides a negative type colored photosensitive resin composition that serves to produce a cured film having a forward tapered shape. This negative type colored photosensitive resin composition includes an alkali-soluble resin (A), a photo initiator (B), a photo polymerizable compound (C), and a coloring agent (D), the alkali-soluble resin (A) containing a polyimide precursor, polybenzoxazole precursor, and/or a copolymer thereof (A-1), each resin (A-1) having a trifluoromethyl group in the backbone chain.

公开(公告)号：US20190218396A1

公开(公告)日：2019-07-18

申请号：US16327162

申请日：2017-08-22

Applicant: TORAY INDUSTRIES, INC.

Inventor： Akihiro ISHIKAWA ,  Yugo TANIGAKI ,  Kazuto MIYOSHI

IPC: C09B67/08 ,  G03F7/004 ,  G03F7/023 ,  C08K5/00 ,  C08K5/1535 ,  C08K5/3417 ,  C08L79/08 ,  C08K3/22 ,  C08K3/36 ,  C09B67/46 ,  C09B5/62 ,  C09B29/40 ,  C09B57/00

Abstract: Provided is a black pigment that enables pattern formation of pixel division layer while suppressing generation of development residue. The black pigment comprises (a) a core containing at least one organic black pigment selected from the group consisting of benzodifuranone-based black pigments, perylene-based black pigments, azo-based black pigments, and isomers thereof and (b) a coating layer containing silica and/or a metal oxide and/or a metal hydroxide.

公开(公告)号：US20180356729A1

公开(公告)日：2018-12-13

申请号：US16075864

申请日：2017-03-15

Applicant: TORAY INDUSTRIES, INC.

Inventor： Yugo TANIGAKI ,  Daisuke SAKII ,  Satoshi KAMEMOTO

IPC: G03F7/037 ,  G03F7/004 ,  H05B33/22 ,  H05K3/28

CPC classification number: G03F7/037 ,  G03F7/004 ,  G03F7/0047 ,  G03F7/027 ,  H01L51/50 ,  H05B33/12 ,  H05B33/22 ,  H05K3/287

Abstract: To provide a negative-type photosensitive resin composition that is highly sensitive and capable of formation of a low-taper pattern shape and that is capable of providing a cured film that is excellent in heat resistance. A negative-type photosensitive resin composition contains an (A) alkali-soluble resin, a (B) radical polymerizable compound, and a (C) photo initiator, the negative-type photosensitive resin composition being characterized in that the (A) alkali-soluble resin contains one or more species of resins selected from a (A-1) polyimide, a (A-2) polybenzoxazole, a (A-3) polyimide precursor, a (A-4) polybenzoxazole precursor, a (A-5) polysiloxane, and a (A-6) cardo based resin, and that the (B) radical polymerizable compound contains a compound having five ethylenic unsaturated bond groups in a (B-1) molecule, in an amount within the range of 51 to 99 mass %.

公开(公告)号：US20210191264A1

公开(公告)日：2021-06-24

申请号：US16759140

申请日：2018-10-26

Applicant: TORAY INDUSTRIES, INC.

Inventor： Yugo TANIGAKI ,  Kazuto MIYOSHI

IPC: G03F7/031 ,  C08G73/10 ,  G03F7/038 ,  G03F7/037 ,  C09B67/22 ,  H01L27/32 ,  H01L51/56 ,  H01L51/52

Abstract: An object of the invention is to provide a cured film which is high in sensitivity, capable of forming a pattern in a low-taper shape after development, capable of the change in pattern opening width between before and after thermal curing, an excellent in light-blocking property, and a negative photosensitive resin composition that forms the film. The negative photosensitive resin composition contains an (A) alkali-soluble resin, a (C1) photo initiator, and a (Da) black colorant, where the (A) alkali-soluble resin contains a (A1) first resin including one or more selected from the group consisting of a (A1-1) polyimide, a (A1-2) polyimide precursor, a (A1-3) polybenzoxazole, and a (A1-4) polybenzoxazole precursor, and has a structural unit having a fluorine atom at a specific ratio, and the (C1) photo initiator contains an (C1-1) oxime ester-based photo initiator that has a specific structure.

公开(公告)号：US20210011381A1

公开(公告)日：2021-01-14

申请号：US17015387

申请日：2020-09-09

Applicant: TORAY INDUSTRIES, INC.

Inventor： Yugo TANIGAKI ,  Satoshi KAMEMOTO ,  Kazuto MIYOSHI

IPC: G03F7/038 ,  G03F7/037 ,  C08F285/00 ,  G03F7/032 ,  C08F283/04 ,  C08G73/10 ,  G03F7/033 ,  C08F283/12 ,  C08G73/22 ,  C08F265/06 ,  C09D179/08 ,  C08L51/00 ,  G03F7/004 ,  C09K11/06 ,  G03F7/105 ,  H01L51/50 ,  G03F7/028 ,  G03F7/075 ,  G03F7/20

Abstract: To provide an alkaline developable negative-type photosensitive resin composition from which a cured film that has a high-resolution and low-taper pattern shape and that are excellent in heat resistance and light blocking property can be obtained. A negative-type photosensitive resin composition is characterized by containing an (A1) first resin, a (A2) second resin, a (C) photopolymerization initiator, and a (D) coloring agent, wherein the (A1) first resin is an (A1-1) polyimide and/or an (A1-2) polybenzo-oxazole, and wherein the (A2) second resin is one or more species selected from a (A2-1) polyimide precursor, a (A2-2) polybenzo-oxazole precursor, a (A2-3) polysiloxane, a (A2-4) cardo based resin, and an (A2-5) acrylic resin, and wherein a content ratio of the (A1) first resin in a total of 100 mass % of the (A1) first resin and the (A2) second resin is within the range of 25 to 90 mass %.

公开(公告)号：US20200319549A1

公开(公告)日：2020-10-08

申请号：US16650700

申请日：2018-09-27

Applicant: TORAY INDUSTRIES, INC.

Inventor： Yugo TANIGAKI ,  Kazuto MIYOSHI

IPC: G03F7/004 ,  G03F7/075 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  C08G73/10 ,  C08G73/22 ,  C08G77/26 ,  G03F7/038 ,  H01L27/32 ,  H01L51/52 ,  G02F1/1339 ,  G02F1/1335 ,  G02F1/1362

Abstract: An object of the invention is to provide a cured film which is high in sensitivity, capable of forming a pattern in a low-taper shape, capable of the change in pattern opening width between before and after thermal curing, an excellent in light-blocking property, and a photosensitive resin composition that forms the film. The photosensitive resin composition contains an (A) alkali-soluble resin, a (C) photosensitive agent, a (Da) black colorant, and a (F) a cross-linking agent, where the (A) alkali-soluble resin contains a (A1) first resin including one or more selected from the group consisting of: a specific (A1-1) polyimide; a (A1-2) polyimide precursor; a (A1-3) polybenzoxazole; and a (A1-4) polybenzoxazole precursor, and contains a structural unit having a fluorine atom at a specific ratio, the content ratio of the (Da) black colorant is a specific ratio, and the (F) cross-linking agent contains an epoxy compound that has a specific structure, and/or an epoxy resin that has a specific structural unit.

公开(公告)号：US20200012191A1

公开(公告)日：2020-01-09

申请号：US16491039

申请日：2018-03-16

Applicant: TORAY INDUSTRIES, INC.

Inventor： Satoshi KAMEMOTO ,  Yugo TANIGAKI ,  Kazuto MIYOSHI

IPC: G03F7/037 ,  C08L79/08 ,  C08L33/10 ,  C08L57/00 ,  C08K3/04 ,  C08K5/00 ,  C08F2/48 ,  G03F1/00 ,  H01L51/50 ,  H05B33/10

Abstract: The present invention provides a photosensitive resin composition which has a light-blocking property, and at the same time, a high sensitivity, and has excellent half-tone characteristics. The present invention provides a photosensitive resin composition including an (A) alkali-soluble resin, a (B) radically polymerizable compound, a (C) photo initiator, and a (D) colorant, where the (A) alkali-soluble resin contains a polyimide, a polyimide precursor, a polybenzoxazole precursor, and/or a copolymer thereof, and the (B) radically polymerizable compound contains a (B-1) bifunctional or higher (meth)acrylic compound that has a glass transition temperature of 150° C. or higher as a homopolymer, and a (B-2) tetrafunctional or higher (meth)acrylic compound other than the (B-1).

公开(公告)号：US20190072851A1

公开(公告)日：2019-03-07

申请号：US16084866

申请日：2017-03-17

Applicant: TORAY INDUSTRIES, INC.

Inventor： Yugo TANIGAKI ,  Satoshi KAMEMOTO ,  Kazuto MIYOSHI

IPC: G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  G03F7/023 ,  H01L51/56 ,  H01L27/12 ,  H01L21/027 ,  G02F1/1339 ,  G02F1/1368 ,  G02F1/1335 ,  H01L27/32

Abstract: The present invention provides a negative type photosensitive resin composition having high sensitivity, excellent halftone characteristics, capability to form a small tapered pattern shape, and alkali-developability.The negative type photosensitive resin composition includes, as an alkali-soluble resin (A), at least a weakly acidic group-containing resin (A1) and an unsaturated group-containing resin (A2), the weakly acidic group-containing resin (A1) containing an acidic group having an acid dissociation constant in the range of 13.0 to 23.0 in dimethyl sulfoxide, and the unsaturated group-containing resin (A2) containing an ethylenically unsaturated double bond group.