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公开(公告)号:US20230098085A1
公开(公告)日:2023-03-30
申请号:US17794658
申请日:2021-02-08
Applicant: TORAY INDUSTRIES, INC.
Inventor: Satoshi KAMEMOTO , Yusuke KOMORI , Kazuto MIYOSHI
IPC: H10K71/00 , H10K59/122 , G03F7/039 , G03F7/38
Abstract: An object of the present invention is to provide an organic EL display device which does not undergo the decrease in luminance or pixel shrinkage and has excellent long-term reliability. The present invention is an organic EL display device constituting a cured product of a photosensitive resin composition containing an alkali-soluble resin (A) and a naphthoquinone diazide sulfonic acid ester compound (B), wherein an intensity ratio I(S)/I(TOTAL) is 0.0001 or more and 0.008 or less, where I(S) is a negative secondary ion intensity of sulfur, and I(TOTAL) is a sum total of negative secondary ion intensities of carbon, oxygen, fluorine, silicon and sulfur obtained by time-of-flight secondary ion mass spectrometry of the cured product. Alternatively, the present invention is a method for producing the cured product.
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公开(公告)号:US20180019290A1
公开(公告)日:2018-01-18
申请号:US15546153
申请日:2016-03-07
Applicant: TORAY INDUSTRIES, INC.
Inventor: Takeshi ARAI , Satoshi KAMEMOTO , Kazuto MIYOSHI
Abstract: The purpose is to provide an organic EL display device which has good sensitivity and is free from the occurrence of luminance decrease or pixel shrinkage, thereby having excellent long-term reliability. In order to achieve the above-described purpose, provided is the following configuration. Namely, an organic EL display device wherein an insulating layer formed on a first electrode is a cured film obtained by curing a photosensitive resin composition; and the residual amount of acid anhydrides contained in the cured film is from 0.003 to 0.04 (inclusive) when the residual amount of aromatic rings contained in the cured film is taken as 1 (the reference value).
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公开(公告)号:US20210011381A1
公开(公告)日:2021-01-14
申请号:US17015387
申请日:2020-09-09
Applicant: TORAY INDUSTRIES, INC.
Inventor: Yugo TANIGAKI , Satoshi KAMEMOTO , Kazuto MIYOSHI
IPC: G03F7/038 , G03F7/037 , C08F285/00 , G03F7/032 , C08F283/04 , C08G73/10 , G03F7/033 , C08F283/12 , C08G73/22 , C08F265/06 , C09D179/08 , C08L51/00 , G03F7/004 , C09K11/06 , G03F7/105 , H01L51/50 , G03F7/028 , G03F7/075 , G03F7/20
Abstract: To provide an alkaline developable negative-type photosensitive resin composition from which a cured film that has a high-resolution and low-taper pattern shape and that are excellent in heat resistance and light blocking property can be obtained. A negative-type photosensitive resin composition is characterized by containing an (A1) first resin, a (A2) second resin, a (C) photopolymerization initiator, and a (D) coloring agent, wherein the (A1) first resin is an (A1-1) polyimide and/or an (A1-2) polybenzo-oxazole, and wherein the (A2) second resin is one or more species selected from a (A2-1) polyimide precursor, a (A2-2) polybenzo-oxazole precursor, a (A2-3) polysiloxane, a (A2-4) cardo based resin, and an (A2-5) acrylic resin, and wherein a content ratio of the (A1) first resin in a total of 100 mass % of the (A1) first resin and the (A2) second resin is within the range of 25 to 90 mass %.
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公开(公告)号:US20180017867A1
公开(公告)日:2018-01-18
申请号:US15547704
申请日:2016-03-16
Applicant: TORAY INDUSTRIES, INC.
Inventor: Satoshi KAMEMOTO , Yusuke KOMORI , Kazuto MIYOSHI
IPC: G03F7/039 , G03F7/004 , G03F7/023 , G03F7/075 , H01L29/49 , H01L21/28 , G03F7/20 , G03F7/16 , G03F7/40 , H01L27/12 , H01L51/00 , G02F1/1368 , H01L27/32 , G02F1/1333
CPC classification number: H01L33/56 , G02F1/133305 , G02F1/133345 , G03F7/0048 , G03F7/0226 , G03F7/0233 , G03F7/0755 , G03F7/40 , H01L27/1248 , H01L29/786 , H01L51/05
Abstract: The purpose of the present invention is to provide a photosensitive resin composition for thin film transistors, a cured film of which generates an extremely small amount of an outgas, and which is capable of forming an insulating layer for thin film transistors having excellent drive performance. In order to achieve the above-described purpose, the present invention has the configuration described below. Namely, a photosensitive resin composition for thin film transistors, which contains (A) an alkali-soluble resin having an amide group and/or an imide group, (B) a photosensitive compound and (C) organic solvents, and wherein the content of an organic solvent having nitrogen atoms in the organic solvents (C) is 1% by mass or less relative to the total mass of the organic solvents.
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公开(公告)号:US20180356727A1
公开(公告)日:2018-12-13
申请号:US16075306
申请日:2017-03-08
Applicant: TORAY INDUSTRIES, INC.
Inventor: Yuta SHUTO , Satoshi KAMEMOTO , Kazuto MIYOSHI
CPC classification number: G03F7/0226 , G03F7/004 , G03F7/023 , G03F7/039 , G03F7/162 , G03F7/168 , G03F7/20 , G03F7/2004 , G03F7/322 , G03F7/40 , H01L23/49894 , H01L27/3258 , H01L51/50 , H05B33/10 , H05B33/22
Abstract: The invention provides a cured film and a positive type photosensitive resin composition unlikely to cause a decrease in light emission luminance or shrinkage of pixels and high in long term reliability.[Solution] The invention provides a cured film comprising a cured product of a photosensitive resin composition including an alkali-soluble resin (a), a photoacid generating agent (b), at least one compound (c) selected from the group consisting of cyclic amides, cyclic ureas, and derivatives thereof, and a thermal crosslinking agent (d), the thermal crosslinking agent (d) containing an epoxy compound, oxetanyl compound, isocyanate compound, acidic group-containing alkoxymethyl compound, and/or acidic group-containing methylol compound, and the total content of the compound (c) in the cured film being 0.005 mass % or more and 5 mass % or less. The photosensitive resin composition comprises the alkali-soluble resin (a), photoacid generating agent (b), compound (c), thermal crosslinking agent (d), and an organic solvent (e), the compound (c) accounting for 0.1 part by mass or more and 15 parts by mass or less relative to 100 parts by mass of the alkali-soluble resin (a), and the organic solvent (e) accounting for 100 to 3,000 parts by mass relative thereto.
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6.
公开(公告)号:US20180267405A1
公开(公告)日:2018-09-20
申请号:US15760756
申请日:2016-09-21
Applicant: TORAY INDUSTRIES, INC.
Inventor: Satoshi KAMEMOTO , Yugo TANIGAKI , Kazuto MIYOSHI
IPC: G03F7/038 , G03F7/004 , H01L27/32 , G03F7/16 , G03F7/20 , G03F7/26 , G03F7/40 , C08G69/32 , G03F7/031 , G03F7/037
CPC classification number: G03F7/0387 , C08G69/32 , C08G73/06 , G03F7/0007 , G03F7/0046 , G03F7/0048 , G03F7/031 , G03F7/037 , G03F7/105 , G03F7/16 , G03F7/20 , G03F7/26 , G03F7/40 , H01L27/3258 , H05B33/10 , H05B33/12 , H05B33/22
Abstract: The present invention provides a negative type colored photosensitive resin composition that serves to produce a cured film having a forward tapered shape. This negative type colored photosensitive resin composition includes an alkali-soluble resin (A), a photo initiator (B), a photo polymerizable compound (C), and a coloring agent (D), the alkali-soluble resin (A) containing a polyimide precursor, polybenzoxazole precursor, and/or a copolymer thereof (A-1), each resin (A-1) having a trifluoromethyl group in the backbone chain.
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7.
公开(公告)号:US20170334837A1
公开(公告)日:2017-11-23
申请号:US15670447
申请日:2017-08-07
Applicant: TORAY INDUSTRIES, INC.
Inventor: Yusuke KOMORI , Satoshi KAMEMOTO , Kazuto MIYOSHI
IPC: C07C235/64 , C08G73/14 , H01L51/00 , G03F7/40 , G03F7/32 , C08G69/42 , G03F7/037 , G03F7/031 , G03F7/023 , G03F7/004 , G03F7/039 , G03F7/20 , H01L27/32
CPC classification number: C07C235/64 , C07C233/80 , C08G69/32 , C08G69/42 , C08G73/1039 , C08G73/1042 , C08G73/1053 , C08G73/106 , C08G73/1082 , C08G73/14 , C08G73/18 , C08G73/22 , C08G75/32 , C09D177/10 , C09D179/04 , C09D179/08 , G03F7/0048 , G03F7/0233 , G03F7/0236 , G03F7/031 , G03F7/037 , G03F7/038 , G03F7/039 , G03F7/2004 , G03F7/322 , G03F7/40 , H01L27/3258 , H01L51/0035 , H01L2227/323 , C08K5/136
Abstract: Provided are a photosensitive resin composition which has excellent pattern processabilities (high sensitivity and high resolution) and is excellent in chemical resistance and thermal resistance after thermally treated; a heat-resistant resin or heat-resistant resin precursor used for the composition; and a diamine compound which is a raw material of the resin and the precursor. The diamine compound is a diamine compound represented by a general formula (1).
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公开(公告)号:US20180356729A1
公开(公告)日:2018-12-13
申请号:US16075864
申请日:2017-03-15
Applicant: TORAY INDUSTRIES, INC.
Inventor: Yugo TANIGAKI , Daisuke SAKII , Satoshi KAMEMOTO
CPC classification number: G03F7/037 , G03F7/004 , G03F7/0047 , G03F7/027 , H01L51/50 , H05B33/12 , H05B33/22 , H05K3/287
Abstract: To provide a negative-type photosensitive resin composition that is highly sensitive and capable of formation of a low-taper pattern shape and that is capable of providing a cured film that is excellent in heat resistance. A negative-type photosensitive resin composition contains an (A) alkali-soluble resin, a (B) radical polymerizable compound, and a (C) photo initiator, the negative-type photosensitive resin composition being characterized in that the (A) alkali-soluble resin contains one or more species of resins selected from a (A-1) polyimide, a (A-2) polybenzoxazole, a (A-3) polyimide precursor, a (A-4) polybenzoxazole precursor, a (A-5) polysiloxane, and a (A-6) cardo based resin, and that the (B) radical polymerizable compound contains a compound having five ethylenic unsaturated bond groups in a (B-1) molecule, in an amount within the range of 51 to 99 mass %.
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公开(公告)号:US20180011404A1
公开(公告)日:2018-01-11
申请号:US15712864
申请日:2017-09-22
Applicant: TORAY INDUSTRIES, INC.
Inventor: Keika HASHIMOTO , Satoshi KAMEMOTO , Kazuto MIYOSHI
CPC classification number: G03F7/0387 , C08G8/12 , C08G69/26 , C08G73/1007 , C08G73/1017 , C08G73/1039 , C08G73/106 , C08G73/1082 , C08G73/14 , C08G73/22 , C08G77/14 , C09D179/08 , C09D183/06 , G03F7/0007 , G03F7/0226 , G03F7/0233 , G03F7/027 , G03F7/0757 , G03F7/105 , H01L27/3244 , H01L27/3274 , H01L51/5284 , C08L61/06
Abstract: The invention aims to provide a photosensitive colored resin composition and a heat resistant colored resin film produced therefrom that has the function of absorbing light in the shorter visible wavelength range with high sensitivity to serve effectively as planarizing film, insulation layer, and barrier rib used in organic luminescence apparatuses and display elements and the function of reducing external light reflection. The photosensitive colored resin composition includes an alkali-soluble resin (a), a photosensitive compound (b), and a compound (c) having an absorption maximum in the wavelength range of 400 nm or more and less than 490 nm, the photosensitive compound (b) containing a photosensitive compound (b1), the photosensitive compound (b1) being such that its maximum absorption wavelength in the range of 350 nm or more and 450 nm or less is located within the wavelength range of 350 nm or more and 390 nm or less.
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公开(公告)号:US20170293224A1
公开(公告)日:2017-10-12
申请号:US15507933
申请日:2015-09-14
Applicant: TORAY INDUSTRIES, INC.
Inventor: Satoshi KAMEMOTO , Takeshi ARAI , Kazuto MIYOSHI
CPC classification number: G03F7/0233 , C08K5/22 , C08L101/00 , G03F7/039 , H01L27/3246 , H01L27/3258 , H01L27/3262 , H01L27/3276 , H01L2227/323 , H05B33/22
Abstract: An object of the present invention is to provide an organic EL display device which causes neither decrease in emission luminance nor pixel shrinkage and is excellent in long-term reliability. The present invention is directed to an organic EL display device including an insulating layer formed on a first electrode of the organic EL display device and constituted of a cured film obtained from a positive type photosensitive resin composition containing (A) an alkali-soluble resin, (B) an o-quinonediazide compound and (C) an organic solvent, wherein the mole ratio S/C obtained when a section of the cured film is measured is greater than or equal to 0.003 and less than or equal to 0.008.
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