公开(公告)号：US20090004718A1

公开(公告)日：2009-01-01

申请号：US12224154

申请日：2007-05-09

申请人： Taek Lim ,  Jae-Yong Ko ,  Eun-Ju Lee ,  In-Sung Kim ,  Chang-Hong Lee

发明人： Taek Lim ,  Jae-Yong Ko ,  Eun-Ju Lee ,  In-Sung Kim ,  Chang-Hong Lee

IPC分类号： C12N11/04 ,  C12N1/20

CPC分类号： C12N1/20 ,  C08G2101/00 ,  C08G2290/00 ,  C08L75/04 ,  C12N1/16 ,  C08L2666/28

摘要： Disclosed is an antioxidant fermenting microorganism agent and a polyurethane foam including the same. The antioxidant fermenting microorganism agent is used to generate a substance that is capable of reducing an amount of volatile organic compounds generated from the polyurethane foam and has an antimicrobial ability. The polyurethane foam containing the antioxidant fermenting microorganism according to the present invention can be used as the material for the interior of a vehicle to protect humans from noxious substances causing sick car syndrome.

摘要翻译： 公开了一种抗氧化发酵微生物剂和包含其的聚氨酯泡沫体。 抗氧化剂发酵微生物剂用于产生能够减少由聚氨酯泡沫体产生的挥发性有机化合物的量并具有抗菌能力的物质。 含有根据本发明的抗氧化剂发酵微生物的聚氨酯泡沫体可以用作车辆内部的材料，以保护人类免受引起恶心综合征的有害物质的伤害。

公开(公告)号：US08287792B2

公开(公告)日：2012-10-16

申请号：US12657750

申请日：2010-01-27

申请人： Jeong-Hoon Lee ,  Jeong-Ho Yeo ,  Joo-On Park ,  In-Sung Kim ,  Doo-Hoon Goo ,  Jin-Hong Park ,  Chang-Min Park

发明人： Jeong-Hoon Lee ,  Jeong-Ho Yeo ,  Joo-On Park ,  In-Sung Kim ,  Doo-Hoon Goo ,  Jin-Hong Park ,  Chang-Min Park

IPC分类号： B29C59/00

CPC分类号： G03F7/0002 ,  B29C43/003 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00

摘要： In a method of forming fine patterns, a photocurable coating layer is formed on a substrate. A first surface of a template makes contact with the photocurable coating layer. The first surface of the template includes at least two first patterns having a first dispersion degree of sizes, and at least one portion of the first surface of the template includes a photo attenuation member. A light is irradiated onto the photocurable coating layer through the template to form a cured coating layer including second patterns having a second dispersion degree of sizes. The second patterns are generated from the first patterns and the second dispersion degree is less than the first dispersion degree. The template is separate from the cured coating layer. A size dispersion degree of the patterns used in a nanoimprint lithography process may be adjusted by the light attenuation member, so that the fine patterns may be formed to have an improved size dispersion degree.

摘要翻译： 在形成精细图案的方法中，在基板上形成光固化涂层。 模板的第一表面与光固化涂层接触。 模板的第一表面包括具有第一分散度大小的至少两个第一图案，并且模板的第一表面的至少一部分包括光衰减构件。 通过模板将光照射到可光固化涂层上，以形成具有第二分散度尺寸的第二图案的固化涂层。 从第一图案生成第二图案，第二色散度小于第一色散度。 模板与固化涂层分开。 可以通过光衰减部件调整在纳米压印光刻工艺中使用的图案的尺寸分散度，使得精细图案可以形成为具有改进的尺寸分散度。

公开(公告)号：US07635547B2

公开(公告)日：2009-12-22

申请号：US12114946

申请日：2008-05-05

申请人： In-Sung Kim ,  Ho-Chul Kim

发明人： In-Sung Kim ,  Ho-Chul Kim

IPC分类号： G03F9/00

CPC分类号： G03F1/20 ,  Y10S430/143

摘要： A stencil mask includes a membrane forming thin layer having membrane areas and a border area that limits the membrane areas. The membrane areas have a plurality of pattern areas which include an aperture through which particle beams can permeate and non-pattern areas interposed between the pattern areas. A main strut supports the membrane areas and is formed on the border area of the membrane forming thin layer. An auxiliary strut is formed in the non-pattern areas inside the membrane pattern area such that the auxiliary strut divides the membrane areas into plural divided membrane areas. The auxiliary strut supports the divided membrane areas.

摘要翻译： 模板掩模包括具有膜区域的膜形成薄层和限制膜区域的边界区域。 膜区域具有多个图案区域，其包括孔径，颗粒束可穿过该孔，并且插入在图案区域之间的非图案区域。 主支柱支撑膜区域并形成在膜形成薄层的边界区域上。 在膜图案区域内的非图案区域中形成辅助支柱，使得辅助支柱将膜区域分成多个分隔的膜区域。 辅助支柱支撑分隔膜区域。

公开(公告)号：US20050003278A1

公开(公告)日：2005-01-06

申请号：US10827556

申请日：2004-04-19

申请人： Chan Hwang ,  In-Sung Kim ,  Young-Seog Kang

发明人： Chan Hwang ,  In-Sung Kim ,  Young-Seog Kang

IPC分类号： H01L21/027 ,  G03C5/00 ,  G03F1/00 ,  G03F1/36 ,  G03F9/00

CPC分类号： G03F1/36

摘要： A photomask includes a transparent substrate, and a plurality of light-shielding patterns repeatedly aligned on the transparent substrate in two dimensions. Each of the light-shielding patterns has length and width measurements that differ from each other. Further, the photomask includes at least one through hole penetrating a portion of each of the light-shielding patterns to expose the transparent substrate.

摘要翻译： 光掩模包括透明基板和在二维上在透明基板上重复对准的多个遮光图案。 每个遮光图案具有彼此不同的长度和宽度测量值。 此外，光掩模包括贯穿每个遮光图案的一部分的至少一个通孔，以露出透明基板。

公开(公告)号：US07384711B2

公开(公告)日：2008-06-10

申请号：US10827513

申请日：2004-04-19

申请人： In-Sung Kim ,  Ho-Chul Kim

发明人： In-Sung Kim ,  Ho-Chul Kim

IPC分类号： G03F9/00

CPC分类号： G03F1/20 ,  Y10S430/143

摘要： A stencil mask includes a membrane forming thin layer having membrane areas and a border area that limits the membrane areas. The membrane areas have a plurality of pattern areas which include an aperture through which particle beams can permeate and non-pattern areas interposed between the pattern areas. A main strut supports the membrane areas and is formed on the border area of the membrane forming thin layer. An auxiliary strut is formed in the non-pattern areas inside the membrane pattern area such that the auxiliary strut divides the membrane areas into plural divided membrane areas. The auxiliary strut supports the divided membrane areas.

摘要翻译： 模板掩模包括具有膜区域的膜形成薄层和限制膜区域的边界区域。 膜区域具有多个图案区域，其包括孔径，颗粒束可穿过该孔，并且插入在图案区域之间的非图案区域。 主支柱支撑膜区域并形成在膜形成薄层的边界区域上。 在膜图案区域内的非图案区域中形成辅助支柱，使得辅助支柱将膜区域分成多个分隔的膜区域。 辅助支柱支撑分隔膜区域。

公开(公告)号：US08158958B2

公开(公告)日：2012-04-17

申请号：US12732960

申请日：2010-03-26

申请人： In-Sung Kim ,  Jooon Park ,  Doo-Hoo Goo ,  Jeong-Hoon Lee ,  Chang-Min Park

发明人： In-Sung Kim ,  Jooon Park ,  Doo-Hoo Goo ,  Jeong-Hoon Lee ,  Chang-Min Park

IPC分类号： G01T1/04

CPC分类号： G03F7/70941 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/44 ,  G03F1/70 ,  G03F7/70433

摘要： A flare evaluation method includes: extracting DC flare reference data using a preliminary measurement pattern mask and a dummy mask having an open region in which a preliminary measurement pattern is formed; providing a plurality of flare gauge sets including an opaque pad, a measurement pattern, and a flare pattern, the measure pattern being disposed at an inside of the opaque pad to measure strength of a flare, the flare pattern being disposed at an outside of the opaque pad to generate the flare; and detecting a change of a photo resist measurement pattern caused by the flare pattern and the measurement pattern for each of the flare gauge sets, wherein an outer radius of the flare pattern increases by a predetermined amount depending on the flare gauge set.

摘要翻译： 闪光评估方法包括：使用初步测量图案掩模和具有形成初步测量图案的开放区域的虚拟掩模来提取DC闪光参考数据; 提供多个包括不透明衬垫，测量图案和耀斑图案的扩口仪，所述测量图案设置在所述不透明衬垫的内侧，以测量耀斑的强度，所述耀斑图案设置在所述不透明衬垫的外侧 不透明垫产生耀斑; 并且检测由每个所述火炬仪的所述火炬图案和所述测量图案引起的光致抗蚀剂测量图案的变化，其中所述耀斑图案的外半径根据所述张力计集合而增加预定量。

公开(公告)号：US20110294074A1

公开(公告)日：2011-12-01

申请号：US13149030

申请日：2011-05-31

申请人： Ji-Eun LEE ,  In-Sung Kim ,  Jeong-Ho Yeo ,  Chang-Min Park ,  Je-Bum Yoon

发明人： Ji-Eun LEE ,  In-Sung Kim ,  Jeong-Ho Yeo ,  Chang-Min Park ,  Je-Bum Yoon

IPC分类号： G03F7/20

CPC分类号： H01L21/76898 ,  G03F7/70391

摘要： An exposure apparatus and an exposing method using the apparatus. The exposure apparatus includes a photomask having a plurality of optical sources attached to a substrate.

摘要翻译： 一种使用该装置的曝光装置和曝光方法。 曝光装置包括具有附接到基板的多个光源的光掩模。

公开(公告)号：US20100258744A1

公开(公告)日：2010-10-14

申请号：US12732960

申请日：2010-03-26

申请人： In-Sung Kim ,  Jooon Park ,  Doo-Hoo Goo ,  Jeong-Hoon Lee ,  Chang-Min Park

发明人： In-Sung Kim ,  Jooon Park ,  Doo-Hoo Goo ,  Jeong-Hoon Lee ,  Chang-Min Park

IPC分类号： G01T1/00

CPC分类号： G03F7/70941 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/44 ,  G03F1/70 ,  G03F7/70433

摘要： A flare evaluation method includes: extracting DC flare reference data using a preliminary measurement pattern mask and a dummy mask having an open region in which a preliminary measurement pattern is formed; providing a plurality of flare gauge sets including an opaque pad, a measurement pattern, and a flare pattern, the measure pattern being disposed at an inside of the opaque pad to measure strength of a flare, the flare pattern being disposed at an outside of the opaque pad to generate the flare; and detecting a change of a photo resist measurement pattern caused by the flare pattern and the measurement pattern for each of the flare gauge sets, wherein an outer radius of the flare pattern increases by a predetermined amount depending on the flare gauge set.

摘要翻译： 闪光评估方法包括：使用初步测量图案掩模和具有形成初步测量图案的开放区域的虚拟掩模来提取DC闪光参考数据; 提供多个包括不透明衬垫，测量图案和耀斑图案的扩口仪，所述测量图案设置在所述不透明衬垫的内侧，以测量耀斑的强度，所述耀斑图案设置在所述不透明衬垫的外侧 不透明垫产生耀斑; 并且检测由每个所述火炬仪的所述火炬图案和所述测量图案引起的光致抗蚀剂测量图案的变化，其中所述耀斑图案的外半径根据所述张力计集合而增加预定量。

公开(公告)号：US20100190340A1

公开(公告)日：2010-07-29

申请号：US12657750

申请日：2010-01-27

申请人： Jeong-Hoon Lee ,  Jeong-Ho Yeo ,  Joo-On Park ,  In-Sung Kim ,  Doo-Hoon Goo ,  Jin-Hong Park ,  Chang-Min Park

发明人： Jeong-Hoon Lee ,  Jeong-Ho Yeo ,  Joo-On Park ,  In-Sung Kim ,  Doo-Hoon Goo ,  Jin-Hong Park ,  Chang-Min Park

IPC分类号： H01L21/306 ,  B29C43/00 ,  C23F1/00

CPC分类号： G03F7/0002 ,  B29C43/003 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00

摘要： In a method of forming fine patterns, a photocurable coating layer is formed on a substrate. A first surface of a template makes contact with the photocurable coating layer. The first surface of the template includes at least two first patterns having a first dispersion degree of sizes, and at least one portion of the first surface of the template includes a photo attenuation member. A light is irradiated onto the photocurable coating layer through the template to form a cured coating layer including second patterns having a second dispersion degree of sizes. The second patterns are generated from the first patterns and the second dispersion degree is less than the first dispersion degree. The template is separate from the cured coating layer. A size dispersion degree of the patterns used in a nanoimprint lithography process may be adjusted by the light attenuation member, so that the fine patterns may be formed to have an improved size dispersion degree.

摘要翻译： 在形成精细图案的方法中，在基板上形成光固化涂层。 模板的第一表面与光固化涂层接触。 模板的第一表面包括具有第一分散度大小的至少两个第一图案，并且模板的第一表面的至少一部分包括光衰减构件。 通过模板将光照射到可光固化涂层上，以形成具有第二分散度尺寸的第二图案的固化涂层。 从第一图案生成第二图案，第二色散度小于第一色散度。 模板与固化涂层分开。 可以通过光衰减部件调整在纳米压印光刻工艺中使用的图案的尺寸分散度，使得精细图案可以形成为具有改进的尺寸分散度。

公开(公告)号：US07361433B2

公开(公告)日：2008-04-22

申请号：US10827556

申请日：2004-04-19

申请人： Chan Hwang ,  In-Sung Kim ,  Young-Seog Kang

发明人： Chan Hwang ,  In-Sung Kim ,  Young-Seog Kang

IPC分类号： G03F1/00

CPC分类号： G03F1/36

摘要： A photomask includes a transparent substrate, and a plurality of light-shielding patterns repeatedly aligned on the transparent substrate in two dimensions. Each of the light-shielding patterns has length and width measurements that differ from each other. Further, the photomask includes at least one through hole penetrating a portion of each of the light-shielding patterns to expose the transparent substrate.

摘要翻译： 光掩模包括透明基板和在二维上在透明基板上重复对准的多个遮光图案。 每个遮光图案具有彼此不同的长度和宽度测量值。 此外，光掩模包括贯穿每个遮光图案的一部分的至少一个通孔，以露出透明基板。