Miniaturized fluid manipulation system

    公开(公告)号:US10702869B2

    公开(公告)日:2020-07-07

    申请号:US15705730

    申请日:2017-09-15

    Abstract: A fluidic testing platform and methods of its operation are described. The fluidic cartridge includes a first fluidic channel and a wheel assembly coupled to the first fluidic channel. The wheel assembly includes a center portion coupled to the first fluidic channel and designed to deliver fluid through one or more second fluidic channels that radiate outward from the center portion. The wheel assembly also includes a third fluidic channel arranged in a closed loop and one or more capillaries coupled to an outer surface of the third fluidic channel and arranged to radiate outward from the center portion. The wheel assembly is designed to rotate such that fluid is forced outward from the center portion through the one or more capillaries.

    Area optimized series gate layout structure for FINFET array
    6.
    发明授权
    Area optimized series gate layout structure for FINFET array 有权
    FINFET阵列的面积优化系列门极布局结构

    公开(公告)号:US08719759B1

    公开(公告)日:2014-05-06

    申请号:US13778403

    申请日:2013-02-27

    CPC classification number: G06F17/5068

    Abstract: The present disclosure relates to a method of optimizing the area of series gate layout structures for FinFET devices. The method analyzes an integrated chip (IC) layout to determine a first gate material density along a first direction and to separately determine a second gate material density along a second direction based upon the first gate material density. A number of series gate stages for a FinFET (field effect transistor) device having a gate length along the second direction, is chosen based upon the second gate material density and one or more device performance parameters of the FinFET device. By analyzing the density of gate material in separate directions, the effective length of the gate of the FinFET can be increased without increasing the size of the transistor array.

    Abstract translation: 本公开内容涉及一种优化FinFET器件的串联栅极布局结构的面积的方法。 该方法分析集成芯片(IC)布局以确定沿着第一方向的第一栅极材料密度,并且基于第一栅极材料密度沿着第二方向单独地确定第二栅极材料密度。 基于FinFET器件的第二栅极材料密度和一个或多个器件性能参数来选择用于具有沿着第二方向的栅极长度的FinFET(场效应晶体管)器件的多个串联栅极级。 通过分析栅极材料在不同方向上的密度,可以增加FinFET的栅极的有效长度,而不增加晶体管阵列的尺寸。

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