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    BICYCLIC HETEROCYCLIC COMPOUND
    7.
    发明申请
    BICYCLIC HETEROCYCLIC COMPOUND 审中-公开
    双相杂环化合物

    公开(公告)号：US20100113391A1

    公开(公告)日：2010-05-06

    申请号：US12596643

    申请日：2008-04-17

    申请人： Yuji Koga ,  Takao Okuda ,  Takashi Kamikubo ,  Michihito Kageyama ,  Hiroyuki Moritomo

    发明人： Yuji Koga ,  Takao Okuda ,  Takashi Kamikubo ,  Michihito Kageyama ,  Hiroyuki Moritomo

    IPC分类号： A61K31/695 ,  C07D215/22 ,  C07D239/80 ,  C07F7/02 ,  C07D243/14 ,  A61K31/47 ,  A61K31/517 ,  A61K31/5513 ,  A61P7/02

    CPC分类号： C07D217/24 ,  C07D239/96 ,  C07D243/14 ,  C07D401/06 ,  C07D403/12 ,  C07D405/04 ,  C07D405/06 ,  C07D413/06 ,  C07D417/06

    摘要： [Problem]Provided is a compound, which exhibits a P2Y12 inhibitory action and is useful as a medical drug, particularly, as a platelet aggregation inhibitor.[Means for Solution]The inventors have eagerly investigated P2Y12 inhibitors. As a result, the inventors have found that a bicyclic heterocyclic compound such as quinazolinedione, isoquinolone, and the like having an amino group substituted with lower alkyl, cycloalkyl, or lower alkylene-cycloalkyl at the specific position exhibits an excellent platelet aggregation inhibitory action, thereby completing the present invention. Since the compound of the invention exhibits excellent P2Y12 inhibitory action and platelet aggregation inhibitory action, it is useful as a platelet aggregation inhibitor.

    摘要翻译： [问题]提供了表现出P2Y12抑制作用的化合物，可用作医药，特别是作为血小板聚集抑制剂。 解决方法本发明人急切地研究P2Y12抑制剂。 结果发现，在具体位置具有被低级烷基，环烷基或低级亚烷基 - 环烷基取代的氨基的喹唑啉二酮，异喹诺酮等双环杂环化合物显示优异的血小板聚集抑制作用， 从而完成了本发明。 由于本发明化合物表现出优异的P2Y12抑制作用和血小板聚集抑制作用，因此作为血小板聚集抑制剂是有用的。

    Writing method of charged particle beam, support apparatus of charged particle beam writing apparatus, writing data generating method and program-recorded readable recording medium
    9.
    发明授权
    Writing method of charged particle beam, support apparatus of charged particle beam writing apparatus, writing data generating method and program-recorded readable recording medium 有权
    带电粒子束的写入方法，带电粒子束写入装置的支持装置，写入数据生成方法和程序记录的可读记录介质

    公开(公告)号：US07495243B2

    公开(公告)日：2009-02-24

    申请号：US11682494

    申请日：2007-03-06

    申请人： Takashi Kamikubo

    发明人： Takashi Kamikubo

    IPC分类号： G03F7/20 ,  H01J3/14 ,  H01J37/302

    CPC分类号： H01J37/3026 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174

    摘要： A charged particle beam writing method includes inputting design pattern data, virtually dividing a writing area to be written with the design pattern data into a plurality of small areas in a mesh-like manner, calculating a pattern density in each of the plurality of small areas based on the design pattern data, calculating a resizing amount for each pattern density in a case of irradiating a charged particle beam at an isofocal dose, resizing a dimension of the design pattern data in each of the plurality of small areas, based on the resizing amount in each of the plurality of small areas, and writing a resized design pattern on a target workpiece with the isofocal dose corresponding to the pattern density which was calculated before the resizing in each of the plurality of small areas.

    摘要翻译： 带电粒子束写入方法包括输入设计图案数据，将以设计图案数据写入的写入区域虚拟地分成多个小区域，以网格状方式计算多个小区域中的图案密度 基于设计图案数据，在以异焦点剂量照射带电粒子束的情况下，计算每个图案密度的调整量，基于调整尺寸来调整多个小区域中的每一个中的设计图案数据的尺寸 在多个小区域的每一个区域中的量，并且将具有对应于在多个小区域中的每个小区域中调整大小之前计算的图案密度的等效剂量的目标工件上的调整尺寸的设计图案写入。

    CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD
    10.
    发明申请
    CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD 审中-公开
    充电颗粒光束书写装置和方法

    公开(公告)号：US20080265174A1

    公开(公告)日：2008-10-30

    申请号：US12103321

    申请日：2008-04-15

    申请人： Makoto HIRAMOTO ,  Takashi Kamikubo ,  Shuichi Tamamushi

    发明人： Makoto HIRAMOTO ,  Takashi Kamikubo ,  Shuichi Tamamushi

    IPC分类号： H01J3/26

    CPC分类号： H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3023 ,  H01J37/3174 ,  H01J2237/0209 ,  H01J2237/3045 ,  H01J2237/30461

    摘要： A charged particle beam writing apparatus includes an unit configured to irradiate a beam, a deflector configured to deflect the beam, a stage, on which a target is placed, configured to perform moving continuously, an lens configured to focus the beam onto the target, an unit configured to calculate a correction amount for correcting positional displacement of the beam on a surface of the target resulting from a first magnetic field caused by the lens and a second magnetic field caused by an eddy current generated by the first magnetic field and the moving of the stage, an unit configured to calculate a correction position where the positional displacement on the surface of the target has been corrected using the correction amount, and an unit configured to control the deflector so that the beam may be deflected onto the correction position.

    摘要翻译： 带电粒子束写入装置包括被配置为照射光束的单元，被配置为使光束偏转的偏转器，配置有目标的台阶，其被配置为连续地进行移动;配置成将光束聚焦到目标上的透镜， 被配置为计算校正量，用于校正由由透镜引起的第一磁场产生的目标表面上的光束的位置偏移和由由第一磁场和移动的所产生的涡流引起的第二磁场 所述单元被配置为使用所述校正量来计算已经校正了所述目标的表面上的位置偏移的校正位置，以及被配置为控制所述偏转器使得所述光束可能偏转到所述校正位置的单元。