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公开(公告)号：US08728917B2
公开(公告)日：2014-05-20
申请号：US13403346
申请日：2012-02-23
CPC分类号： B82Y30/00 , B82Y40/00 , C01B32/162
摘要： A carbon nanotube forming method including providing a target substrate to be processed, a catalytic metal layer being formed on a surface of the target substrate; producing catalytic fine metal particles whose surfaces are oxidized by action of an oxygen plasma on the catalytic metal layer at a temperature T1; and activating the oxidized surfaces of the catalytic fine metal particles by reducing the oxidized surfaces of the catalytic fine metal particles by action of a hydrogen plasma on the catalytic fine metal particles at a temperature T2 higher than the temperature T1. The method further includes growing a carbon nanotube on the activated catalytic fine metal particles by thermal CVD at a temperature T3.
摘要翻译： 一种碳纳米管形成方法，包括提供待加工的靶基板，在所述靶基板的表面上形成催化金属层; 产生催化金属微粒，其表面在温度T1下在催化金属层上通过氧等离子体的作用而被氧化; 以及在高于温度T1的温度T2下，通过氢等离子体在催化金属微粒上的还原催化金属微粒的氧化表面来活化催化金属微粒的氧化表面。 该方法还包括在温度T3下通过热CVD在活化的催化金属微粒上生长碳纳米管。
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公开(公告)号：US20120220106A1
公开(公告)日：2012-08-30
申请号：US13403346
申请日：2012-02-23
IPC分类号： H01L21/20 , H01L21/268 , B82Y40/00
CPC分类号： B82Y30/00 , B82Y40/00 , C01B32/162
摘要： A carbon nanotube forming method including providing a target substrate to be processed, a catalytic metal layer being formed on a surface of the target substrate; producing catalytic fine metal particles whose surfaces are oxidized by action of an oxygen plasma on the catalytic metal layer at a temperature T1; and activating the oxidized surfaces of the catalytic fine metal particles by reducing the oxidized surfaces of the catalytic fine metal particles by action of a hydrogen plasma on the catalytic fine metal particles at a temperature T2 higher than the temperature T1. The method further includes growing a carbon nanotube on the activated catalytic fine metal particles by thermal CVD at a temperature T3.
摘要翻译： 一种碳纳米管形成方法，包括提供待加工的靶基板，在所述靶基板的表面上形成催化金属层; 产生催化金属微粒，其表面在温度T1下在催化金属层上通过氧等离子体的作用而被氧化; 以及在高于温度T1的温度T2下，通过氢等离子体在催化金属微粒上的还原催化金属微粒的氧化表面来活化催化金属微粒的氧化表面。 该方法还包括在温度T3下通过热CVD在活化的催化金属微粒上生长碳纳米管。
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公开(公告)号：US09212420B2
公开(公告)日：2015-12-15
申请号：US12730088
申请日：2010-03-23
申请人： Eric M. Lee , Raymond Nicholas Vrtis , Mark Leonard O'Neill , Patrick Timothy Hurley , Jacques Faguet , Takashi Matsumoto , Osayuki Akiyama
发明人： Eric M. Lee , Raymond Nicholas Vrtis , Mark Leonard O'Neill , Patrick Timothy Hurley , Jacques Faguet , Takashi Matsumoto , Osayuki Akiyama
CPC分类号： C23C16/30 , C23C16/18 , C23C16/401 , C23C16/4557 , C23C16/46 , C23C16/56
摘要： A chemical vapor deposition (CVD) method for depositing a thin film on a surface of a substrate is described. The CVD method comprises disposing a substrate on a substrate holder in a process chamber, and introducing a process gas to the process chamber, wherein the process gas comprises a chemical precursor. The process gas is exposed to a non-ionizing heat source separate from the substrate holder to cause decomposition of the chemical precursor. A thin film is deposited upon the substrate.
摘要翻译： 描述了用于在衬底的表面上沉积薄膜的化学气相沉积（CVD）方法。 CVD方法包括将衬底设置在处理室中的衬底保持器上，并将工艺气体引入到处理室中，其中工艺气体包括化学前体。 处理气体暴露于与基板保持器分离的非电离热源以引起化学前体的分解。 薄膜沉积在基底上。
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公开(公告)号：US20110232567A1
公开(公告)日：2011-09-29
申请号：US12731467
申请日：2010-03-25
申请人： Jozef Brcka , Osayuki Akiyama
发明人： Jozef Brcka , Osayuki Akiyama
CPC分类号： C23C16/4405 , B08B7/0035 , C23C16/46 , C23C16/503 , C23C16/52 , H01J37/32091 , H01J37/32165 , H01J37/32449 , H01J37/32862 , H01J37/32889
摘要： A method of operating a filament assisted chemical vapor deposition (FACVD) system. The method includes depositing a film on a substrate in a reactor of the FACVD system. During the depositing, a DC power is supplied to a heater assembly to thermally decompose a film forming material. The method also includes cleaning the heater assembly, or an interior surface of the reactor, or both. During the cleaning, an alternating current is supplied to the heater assembly to energize a cleaning media into a plasma.
摘要翻译： 一种操作细丝辅助化学气相沉积（FACVD）系统的方法。 该方法包括在FACVD系统的反应器中的衬底上沉积膜。 在沉积期间，向加热器组件供应直流电力以热分解成膜材料。 该方法还包括清洁加热器组件或反应器的内表面，或两者。 在清洁期间，向加热器组件供应交流电，以将清洁介质激励到等离子体中。
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