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21 条记录 (耗时 0.029 秒)

    Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition
    6.
    发明授权
    Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition 有权
    光敏性或辐射敏感性树脂组合物，以及使用相同组成的光化射线敏感或辐射敏感膜和图案形成方法

    公开(公告)号：US08846293B2

    公开(公告)日：2014-09-30

    申请号：US13431736

    申请日：2012-03-27

    申请人： Yusuke Iizuka ,  Akinori Shibuya ,  Naohiro Tango ,  Shohei Kataoka

    发明人： Yusuke Iizuka ,  Akinori Shibuya ,  Naohiro Tango ,  Shohei Kataoka

    IPC分类号： G03F7/004 ,  G03F7/38 ,  G03F7/039 ,  G03F7/075 ,  G03F7/20

    CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2041 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

    摘要： The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains (A) a resin capable of increasing the solubility in an alkaline developer by the action of an acid, and (C) at least one selected from the group of compounds represented by the following formula (ZI-3), (ZI-4) or (ZI-5) and capable of generating an acid upon irradiation of actinic rays or radiation, wherein the resin (A) contains at least one repeating unit having a group capable of decomposing by the action of an acid to leave a leaving group having a ring structure, and the leaving group having a ring structure has at least one of a polar group as a substituent and a polar atom as a part of the ring structure, and a compound derived from the leaving group having a ring structure has a logP value of not less than 0 and less than 2.8.

    摘要翻译： 本发明的光化射线敏感性或辐射敏感性树脂组合物含有（A）能够通过酸作用增加在碱性显影剂中的溶解性的树脂，（C）选自化合物组中的至少一种 由下式（ZI-3），（ZI-4）或（ZI-5）表示，并且能够在光化射线或辐射照射时产生酸，其中树脂（A）含有至少一个具有 能够通过酸的作用分解离开具有环结构的离去基团的基团，具有环结构的离去基团具有作为取代基的极性基团和作为环结构的一部分的极性原子中的至少一种 ，衍生自具有环结构的离去基团的化合物的logP值不小于0且小于2.8。

    ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH
    10.
    发明申请
    ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH 审中-公开
    抗紫外线或辐射敏感性树脂组合物及其形成方法

    公开(公告)号：US20130130178A1

    公开(公告)日：2013-05-23

    申请号：US13807623

    申请日：2011-08-26

    申请人： Yusuke Iizuka ,  Akinori Shibuya

    发明人： Yusuke Iizuka ,  Akinori Shibuya

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/004 ,  C08F12/20 ,  C08F12/22 ,  C08L25/18 ,  C09D133/062 ,  C09D133/16 ,  C09D143/04 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/20 ,  G03F7/2041

    摘要： Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (B) containing at least either a fluorine atom or a silicon atom, the resin (B) containing any of repeating units of general formulae (I-1) and (I-2) below: Wherein each of R1s independently represents a hydrogen atom, an alkyl group or a halogen atom, X1 represents a bivalent organic group, X2 represents a single bond or a bivalent organic group, each of Ar1s independently represents a monovalent aromatic ring group, Ar2 represents a bivalent aromatic ring group, and each of L's independently represents a single bond or a bivalent organic group.

    摘要翻译： 本发明提供包含含有至少含有氟原子或硅原子的树脂（B）的光化射线或辐射敏感性树脂组合物，所述树脂（B）含有通式（I-1）和 （I-2）：其中R1各自独立地表示氢原子，烷基或卤素原子，X1表示二价有机基团，X2表示单键或二价有机基团，Ar1各自独立地表示一价 芳环基团，Ar 2表示二价芳环基团，L 1各自独立地表示单键或二价有机基团。