Nonvolatile memory device and manufacturing method
    1.
    发明授权
    Nonvolatile memory device and manufacturing method 有权
    非易失存储器件及其制造方法

    公开(公告)号:US08384061B2

    公开(公告)日:2013-02-26

    申请号:US12745190

    申请日:2008-11-06

    摘要: A nonvolatile memory device of the present invention includes a substrate (1), first wires (3), first resistance variable elements (5) and lower electrodes (6) of first diode elements which are filled in first through-holes (4), respectively, second wires (11) which cross the first wires 3 perpendicularly to the first wires 3, respectively, and each of which includes a semiconductor layer (7) of a first diode elements, a conductive layer (8) and a semiconductor layer (10) of a second diode elements which are stacked together in this order, second resistance variable elements (16) and upper electrodes (14) of second diode elements which are filled into second through holes (13), respectively, and third wires (17), and the conductive layer (8) of each second wires (11) also serves as the upper electrode of the first diode elements (9) and the lower electrode of the second diode elements (15).

    摘要翻译: 本发明的非易失性存储器件包括填充在第一通孔(4)中的基片(1),第一布线(3),第一电阻可变元件(5)和第一二极管元件的下电极(6) 分别与第一布线3分别垂直于第一布线3交叉的第二布线(11),每条布线包括第一二极管元件的半导体层(7),导电层(8)和半导体层( 10)分别被填充到第二通孔(13)中的第二电阻可变元件(16)和第二二极管元件的上电极(14)以及第三电线(17) ),并且每个第二布线(11)的导电层(8)也用作第一二极管元件(9)的上电极和第二二极管元件(15)的下电极。

    NONVOLATILE MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
    2.
    发明申请
    NONVOLATILE MEMORY DEVICE AND MANUFACTURING METHOD THEREOF 有权
    非易失性存储器件及其制造方法

    公开(公告)号:US20100264393A1

    公开(公告)日:2010-10-21

    申请号:US12747060

    申请日:2008-12-02

    IPC分类号: H01L45/00 H01L21/02

    摘要: A nonvolatile memory device of the present invention comprises a substrate (1), first wires (3), first filling constituents (5) filled into first through-holes (4), respectively, second wires (11) which cross the first wires (3) perpendicularly to the first wires (3), respectively, each of the second wires (11) including a plurality of layers including a resistance variable layer (6) of each of first resistance variable elements, a conductive layer (7) and a resistance variable layer (8) of each of second resistance variable elements which are stacked together in this order, second filling constituents (14) filled into second through-holes (13), respectively, and third wires (15), and the conductive layer (7) of the second wires (11) serves as the electrodes of the first resistance variable elements (9) and the electrodes of the second resistance variable elements (10).

    摘要翻译: 本发明的非易失性存储装置包括基板(1),第一布线(3),分别填充到第一通孔(4)中的第一填充构件(5),分别穿过第一布线 3)分别垂直于第一导线(3),每个第二导线(11)包括多个层,包括第一电阻可变元件中的每一个的电阻变化层(6),导电层(7)和 按顺序堆叠在一起的第二电阻可变元件的电阻变化层(8),分别填充到第二通孔(13)中的第二填充组分(14)和第三导线(15),以及导电层 第二电线(11)的电极(7)用作第一电阻可变元件(9)的电极和第二电阻可变元件(10)的电极。

    Nonvolatile memory device and manufacturing method thereof
    3.
    发明授权
    Nonvolatile memory device and manufacturing method thereof 有权
    非易失存储器件及其制造方法

    公开(公告)号:US08198618B2

    公开(公告)日:2012-06-12

    申请号:US12747060

    申请日:2008-12-02

    IPC分类号: H01L29/02

    摘要: A nonvolatile memory device of the present invention comprises a substrate (1), first wires (3), first filling constituents (5) filled into first through-holes (4), respectively, second wires (11) which cross the first wires (3) perpendicularly to the first wires (3), respectively, each of the second wires (11) including a plurality of layers including a resistance variable layer (6) of each of first resistance variable elements, a conductive layer (7) and a resistance variable layer (8) of each of second resistance variable elements which are stacked together in this order, second filling constituents (14) filled into second through-holes (13), respectively, and third wires (15), and the conductive layer (7) of the second wires (11) serves as the electrodes of the first resistance variable elements (9) and the electrodes of the second resistance variable elements (10).

    摘要翻译: 本发明的非易失性存储装置包括基板(1),第一布线(3),分别填充到第一通孔(4)中的第一填充构件(5),分别穿过第一布线 3)分别垂直于第一导线(3),每个第二导线(11)包括多个层,包括第一电阻可变元件中的每一个的电阻变化层(6),导电层(7)和 按顺序堆叠在一起的第二电阻可变元件的电阻变化层(8),分别填充到第二通孔(13)中的第二填充组分(14)和第三导线(15),以及导电层 第二电线(11)的电极(7)用作第一电阻可变元件(9)的电极和第二电阻可变元件(10)的电极。

    NONVOLATILE MEMORY DEVICE AND MANUFACTURING MEHTOD THEREOF
    4.
    发明申请
    NONVOLATILE MEMORY DEVICE AND MANUFACTURING MEHTOD THEREOF 有权
    非易失性存储器件及其制造方法

    公开(公告)号:US20100258779A1

    公开(公告)日:2010-10-14

    申请号:US12745190

    申请日:2008-11-06

    IPC分类号: H01L45/00 H01L21/02

    摘要: A nonvolatile memory device of the present invention includes a substrate (1), first wires (3), first resistance variable elements (5) and lower electrodes (6) of first diode elements which are filled in first through-holes (4), respectively, second wires (11) which cross the first wires 3 perpendicularly to the first wires 3, respectively, and each of which includes a semiconductor layer (7) of a first diode elements, a conductive layer (8) and a semiconductor layer (10) of a second diode elements which are stacked together in this order, second resistance variable elements (16) and upper electrodes (14) of second diode elements which are filled into second through holes (13), respectively, and third wires (17), and the conductive layer (8) of each second wires (11) also serves as the upper electrode of the first diode elements (9) and the lower electrode of the second diode elements (15).

    摘要翻译: 本发明的非易失性存储器件包括填充在第一通孔(4)中的基片(1),第一布线(3),第一电阻可变元件(5)和第一二极管元件的下电极(6) 分别与第一布线3分别垂直于第一布线3交叉的第二布线(11),每条布线包括第一二极管元件的半导体层(7),导电层(8)和半导体层( 10)分别被填充到第二通孔(13)中的第二电阻可变元件(16)和第二二极管元件的上电极(14)以及第三电线(17) ),并且每个第二布线(11)的导电层(8)也用作第一二极管元件(9)的上电极和第二二极管元件(15)的下电极。

    Variable resistance nonvolatile memory device
    5.
    发明授权
    Variable resistance nonvolatile memory device 有权
    可变电阻非易失性存储器件

    公开(公告)号:US08687409B2

    公开(公告)日:2014-04-01

    申请号:US13639120

    申请日:2012-05-30

    IPC分类号: G11C11/00

    摘要: A variable resistance nonvolatile memory device including memory cells provided at cross-points of first signal lines and second signal lines, each memory cell including a variable resistance element and a current steering element connected to the variable resistance element in series, the variable resistance nonvolatile memory device including a write circuit, a row selection circuit, and a column selection circuit, wherein the write circuit: sequentially selects blocks in an order starting from a block farthest from at least one of the row selection circuit and the column selection circuit and finishing with a block closest to the at least one of the row selection circuit and the column selection circuit; and performs, for each of the selected blocks, initial breakdown on each memory cell included in the selected block.

    摘要翻译: 一种可变电阻非易失性存储器件,包括设置在第一信号线和第二信号线的交叉点处的存储单元,每个存储单元包括可变电阻元件和连接到可变电阻元件串联的电流操舵元件,可变电阻非易失性存储器 包括写入电路,行选择电路和列选择电路的装置,其中写入电路:从与行选择电路和列选择电路中的至少一个最远的块开始的顺序顺序地选择块,并且以 最靠近行选择电路和列选择电路中的至少一个的块; 并且对于每个所选择的块,对包括在所选择的块中的每个存储器单元执行初始故障。

    CROSS POINT VARIABLE RESISTANCE NONVOLATILE MEMORY DEVICE AND METHOD OF READING THEREBY
    6.
    发明申请
    CROSS POINT VARIABLE RESISTANCE NONVOLATILE MEMORY DEVICE AND METHOD OF READING THEREBY 有权
    交叉点可变电阻非易失性存储器件及其读取方法

    公开(公告)号:US20130077384A1

    公开(公告)日:2013-03-28

    申请号:US13636169

    申请日:2012-04-27

    IPC分类号: G11C11/21

    摘要: A cross point variable resistance nonvolatile memory device including: a cross point memory cell array having memory cells each of which is placed at a different one of cross points of bit lines and word lines; a word line decoder circuit that selects at least one of the memory cells from the memory cell array; a read circuit that reads data from the selected memory cell; an unselected word line current source that supplies a first constant current; and a control circuit that controls the reading of the data from the selected memory cell, wherein the control circuit controls the word line decoder circuit, the read circuit, and the unselected word line current source so that when the read circuit reads data, the first constant current is supplied to an unselected word line.

    摘要翻译: 一种交叉点可变电阻非易失性存储器件,包括:具有存储单元的交叉点存储单元阵列,每个存储单元位于位线和字线的交叉点的不同位置; 字线解码器电路,从存储单元阵列中选择至少一个存储单元; 从所选择的存储单元读取数据的读取电路; 提供第一恒定电流的未选字线电流源; 以及控制电路,其控制来自所选择的存储单元的数据的读取,其中所述控制电路控制所述字线解码器电路,所述读取电路和所述未选字线电流源,使得当所述读取电路读取数据时,所述第一 恒定电流被提供给未选择的字线。

    Nonvolatile variable resistance memory element writing method, and nonvolatile variable resistance memory device
    7.
    发明授权
    Nonvolatile variable resistance memory element writing method, and nonvolatile variable resistance memory device 有权
    非易失性可变电阻存储元件写入方法和非易失性可变电阻存储器件

    公开(公告)号:US08305795B2

    公开(公告)日:2012-11-06

    申请号:US12999019

    申请日:2010-04-27

    IPC分类号: G11C11/00

    摘要: To provide a variable resistance element writing method that, even when a variable resistance element has a possibility of becoming a half LR state, can ensure a maximum resistance change window by correcting the variable resistance element to a normal low resistance state. In a method of writing data to a variable resistance element (10a) that reversibly changes between a high resistance state and a low resistance state according to a polarity of an applied voltage, as a voltage applied to an upper electrode (11) with respect to a lower electrode (14t): a positive voltage is applied in a high resistance writing step (405) to set the variable resistance element (10a) to a high resistance state (401); a negative voltage is applied in a low resistance writing step (406, 408) to set the variable resistance element (10a) to a low resistance state (403, 402); and a positive voltage is applied in a low resistance stabilization writing step (404) after the negative voltage is applied in the low resistance writing step (408), thereby setting the variable resistance element (10a) through the low resistance state to the high resistance state (401).

    摘要翻译: 为了提供可变电阻元件写入方法,即使当可变电阻元件具有成为半LR状态的可能性时,通过将可变电阻元件校正为正常的低电阻状态来确保最大电阻变化窗口。 在根据施加电压的极性将数据写入到可变电阻元件(10a)的方法中,可变电阻元件(10a)根据施加电压的极性在高电阻状态和低电阻状态之间可逆地变化,作为施加到上电极(11)的电压相对于 下电极(14t):在高电阻写入步骤(405)中施加正电压以将可变电阻元件(10a)设置为高电阻状态(401); 在低电阻写入步骤(406,408)中施加负电压以将可变电阻元件(10a)设置为低电阻状态(403,402); 并且在低电阻写入步骤(408)中施加负电压之后,在低电阻稳定写入步骤(404)中施加正电压,从而将可变电阻元件(10a)设置为低电阻状态为高电阻 州(401)。

    VARIABLE RESISTANCE NONVOLATILE MEMORY DEVICE
    8.
    发明申请
    VARIABLE RESISTANCE NONVOLATILE MEMORY DEVICE 有权
    可变电阻非易失性存储器件

    公开(公告)号:US20110122680A1

    公开(公告)日:2011-05-26

    申请号:US13054312

    申请日:2010-04-14

    IPC分类号: G11C11/21

    摘要: A nonvolatile resistance variable memory device (100) includes memory cells (M11, M12, . . . ) in each of which a variable resistance element (R11, R12, . . . ) including a variable resistance layer placed between and in contact with a first electrode and a second electrode, and a current steering element (D11, D12, . . . ) including a current steering layer placed between and in contact with a third electrode and a fourth electrode, are connected in series, and the device is driven by a first LR drive circuit (105a1) via a current limit circuit (105b) to decrease resistance of the variable resistance element while the device is driven by a second HR drive circuit (105a2) to increase resistance of the variable resistance element, thus using the current limit circuit (105b) to make a current for decreasing resistance of the variable resistance element lower than a current for increasing resistance of the variable resistance element.

    摘要翻译: 一种非易失性电阻可变存储器件(100)包括存储单元(M11,M12 ...),每个存储单元包括可变电阻元件(R11,R12 ...),该可变电阻元件(R11,R12 ...) 第一电极和第二电极,以及包括放置在第三电极和第四电极之间并与第三电极和第四电极接触的电流导向层的电流导向元件(D11,D12 ...)串联连接,并且驱动该装置 通过第一LR驱动电路(105a1)经由限流电路(105b),以在器件被第二HR驱动电路(105a2)驱动时降低可变电阻元件的电阻,以增加可变电阻元件的电阻,从而使用 电流限制电路(105b),用于使可变电阻元件的电阻降低的电流低于用于增加可变电阻元件的电阻的电流。

    NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND READ METHOD FOR THE SAME
    9.
    发明申请
    NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND READ METHOD FOR THE SAME 有权
    非易失性半导体存储器件及其读取方法

    公开(公告)号:US20130148406A1

    公开(公告)日:2013-06-13

    申请号:US13700329

    申请日:2012-07-11

    IPC分类号: G11C13/00

    摘要: A cross point nonvolatile memory device capable of suppressing sneak-current-caused reduction in sensitivity of detection of a resistance value of a memory element is provided. The device includes perpendicular bit and word lines; a cross-point cell array including memory cells each having a resistance value reversibly changing between at least two resistance states according to electrical signals, arranged on cross-points of the word and bit lines; an offset detection cell array including an offset detection cell having a resistance higher than that of the memory cell in a high resistance state, the word lines being shared by the offset detection cell array; a read circuit (a sense amplifier) that determines a resistance state of a selected memory cell based on a current through the selected bit line; and a current source which supplies current to the offset detection cell array in a read operation period.

    摘要翻译: 提供一种能够抑制潜流引起的对存储元件的电阻值的检测灵敏度的降低的交叉点非易失性存储装置。 该设备包括垂直位和字线; 交叉点单元阵列,其包括存储单元,每个存储单元具有电阻值,该电阻值根据电信号在至少两个电阻状态之间可逆地改变;布置在字和位线的交叉点上; 偏移检测单元阵列,包括在高电阻状态下具有高于存储单元的电阻的偏移检测单元,所述字线由偏移检测单元阵列共享; 读取电路(读出放大器),其基于通过所选位线的电流确定所选存储单元的电阻状态; 以及在读取操作时段中向偏移检测单元阵列提供电流的电流源。

    Writing method for variable resistance nonvolatile memory element, and variable resistance nonvolatile memory device
    10.
    发明授权
    Writing method for variable resistance nonvolatile memory element, and variable resistance nonvolatile memory device 有权
    可变电阻非易失性存储元件和可变电阻非易失性存储器件的写入方法

    公开(公告)号:US08325508B2

    公开(公告)日:2012-12-04

    申请号:US13001905

    申请日:2010-06-08

    IPC分类号: G11C11/00

    摘要: A writing method optimum for a variable resistance element which can maximize an operation window of the variable resistance element is provided. The writing method is performed for a variable resistance element that reversibly changes between a high resistance state and a low resistance state depending on a polarity of an applied voltage pulse. The writing method includes a preparation step (S50) and a writing step (S51, S51a, S51b). At the preparation step (S50), resistance values of the variable resistance element are measured by applying voltage pulses of voltages that are gradually increased to the variable resistance element, thereby determining the first voltage V1 for starting high resistance writing and the second voltage V2 having a maximum resistance value. At the HR writing step (S51a), a voltage pulse having a voltage Vp that is equal to or higher than the first voltage V1 and equal to or lower than the second voltage V2 is applied to the variable resistance element, thereby changing the variable resistance element from the low resistance state (S52) to the high resistance state (S53).

    摘要翻译: 提供了一种最佳可变电阻元件的写入方法,其可以使可变电阻元件的操作窗口最大化。 对于根据施加的电压脉冲的极性在高电阻状态和低电阻状态之间可逆地变化的可变电阻元件执行写入方法。 写入方法包括准备步骤(S50)和写入步骤(S51,S51a,S51b)。 在准备步骤(S50)中,通过向可变电阻元件施加逐渐增加的电压的电压脉冲来测量可变电阻元件的电阻值,从而确定用于开始高电阻写入的第一电压V1和具有 最大电阻值。 在HR写入步骤(S51a)中,将具有等于或高于第一电压V1并且等于或低于第二电压V2的电压Vp的电压脉冲施加到可变电阻元件,从而改变可变电阻 元件从低电阻状态(S52)到高电阻状态(S53)。