公开(公告)号：US5347100A

公开(公告)日：1994-09-13

申请号：US857658

申请日：1992-03-26

申请人： Takuya Fukuda ,  Michio Ohue ,  Fumiyuki Kanai ,  Atsuyoshi Koike ,  Katsuaki Saito ,  Kazuo Suzuki

发明人： Takuya Fukuda ,  Michio Ohue ,  Fumiyuki Kanai ,  Atsuyoshi Koike ,  Katsuaki Saito ,  Kazuo Suzuki

IPC分类号： H01L21/768 ,  H01L23/532 ,  B23K9/00 ,  B44C1/22

CPC分类号： H01L21/76801 ,  H01L21/76834 ,  H01L23/5329 ,  H01L2924/0002

摘要： Disclosed are a semiconductor device comprising a semiconductor substrate, a first metal connection layers, a first substrate oxide layer having a specific form, and a second connection pattern layer; a process for producing the device; and a microwave plasma treatment apparatus having gas feed ports in a specific position. The highly reliable semiconductor devices can be produced at a high rate at high yields.

摘要翻译： 公开了一种半导体器件，包括半导体衬底，第一金属连接层，具有特定形式的第一衬底氧化物层和第二连接图案层; 一种生产该装置的方法; 以及具有特定位置的气体供给口的微波等离子体处理装置。 高可靠性的半导体器件可以以高产率高产率生产。

公开(公告)号：US5496410A

公开(公告)日：1996-03-05

申请号：US29054

申请日：1993-03-10

申请人： Takuya Fukuda ,  Michio Ohue ,  Kazuo Suzuki

发明人： Takuya Fukuda ,  Michio Ohue ,  Kazuo Suzuki

IPC分类号： C23C14/54 ,  C23C16/44 ,  C23C16/448 ,  C23C16/455 ,  C23C16/50 ,  C23C16/511 ,  C30B25/14 ,  H01J37/32 ,  H01L21/31 ,  C23C16/00

CPC分类号： H01J37/3244 ,  C23C16/4401 ,  C23C16/4481 ,  C23C16/455 ,  C23C16/511

摘要： In a plasma processing apparatus which forms a gaseous raw material into a plasma by using electron cyclotron resonance and processes a substrate, leading-edge opening portions of an introduction tube into which a gaseous raw material is introduced are formed in the inner wall surface of the container in such a way that they do not project within the vacuum container. A heater is wound around the introduction pipe so that the opening portions thereof can be heated. With this construction, even if a gaseous raw material which is a liquid or solid at normal temperature and normal pressure is made to flow, the gaseous raw material can be prevented from being liquefied or solidified in the opening portions of the introduction pipe, and the opening portions of the introduction pipe can be prevented from being clogged. In addition, since there are no projections within the vacuum container, the propagation of microwaves is not impeded, making it possible to uniformity process the substrate.

摘要翻译： 在通过使用电子回旋共振将气态原料形成等离子体并处理基板的等离子体处理装置中，在其内壁面上形成导入气体原料的导入管的前端开口部 容器，使得它们不在真空容器内投影。 加热器缠绕在引入管周围，使得其开口部分能够被加热。 利用这种结构，即使使常温常压下的液体或固体的气体原料流动，也可以防止气体原料在导入管的开口部分液化或凝固， 能够防止导入管的开口部堵塞。 此外，由于在真空容器内没有凸起，所以不妨碍微波的传播，能够使基板均匀化。

公开(公告)号：US5162633A

公开(公告)日：1992-11-10

申请号：US372716

申请日：1989-06-27

申请人： Tadasi Sonobe ,  Kazuo Suzuki ,  Takuya Fukuda ,  Michio Ohue

发明人： Tadasi Sonobe ,  Kazuo Suzuki ,  Takuya Fukuda ,  Michio Ohue

IPC分类号： C23C14/34 ,  C23C16/511 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31 ,  H05B6/80

CPC分类号： H01J37/32678 ,  H01J37/32192 ,  H01J37/32238 ,  H01J37/32697 ,  H05B6/80

摘要： The present invention relates to a plasma treatment apparatus for making plasma surface processing of a specimen such as thin-film formation, etching, sputtering or plasma oxidation by use of plasma produced through microwave discharge. In a specimen chamber provided with a specimen table for holding at least one specimen thereon, a microwave is introduced from a direction intersecting a magnetic line of force so as to propagate in the longitudinal direction of an ECR region or in a direction along the plane of the ECR region. Since the microwave is introduced from the transverse direction of the specimen chamber, the provision of a microwave introducing window at an upper portion of the specimen chamber is not required and hence a counter electrode for applying an electric field to the specimen can be disposed at the upper portion of the specimen chamber, thereby making it possible to apply a uniform electric field to the specimen so that the specimen is subjected to a uniform treatment.

摘要翻译： 本发明涉及一种等离子体处理装置，其用于通过使用通过微波放电产生的等离子体来进行诸如薄膜形成，蚀刻，溅射或等离子体氧化等试样的等离子体表面处理。 在设置有用于保持至少一个样本的样本台的样本室中，从与磁力线相交的方向引入微波，以沿ECR区域的纵向方向或沿着ECR区域的平面的方向传播微波 ECR地区。 由于微波从试样室的横向导入，因此不需要在试样室的上部设置微波导入窗，因此可以在试样室的上部设置用于向试样施加电场的对电极 从而能够对试样施加均匀的电场，使样品经受均匀的处理。

公开(公告)号：US5243259A

公开(公告)日：1993-09-07

申请号：US798901

申请日：1991-11-27

申请人： Junji Sato ,  Kazuo Suzuki ,  Shunichi Hirose ,  Takuya Fukuda ,  Satoru Todoroki

发明人： Junji Sato ,  Kazuo Suzuki ,  Shunichi Hirose ,  Takuya Fukuda ,  Satoru Todoroki

IPC分类号： H01L21/302 ,  H01J37/32 ,  H01L21/205 ,  H01L21/3065

CPC分类号： H01J37/32834 ,  H01J37/32192 ,  H01J37/32458 ,  H01J37/32678

摘要： The present invention relates to a microwave plasma processing apparatus for processing such as thin film formation, etching, sputtering, and plasma oxidation, etc., on a surface of a processing object by utilizing a high density plasma generated by electron cyclotron resonance. A vacuum vessel of the apparatus, in which a microwave transmitted by a microwave guide is utilized for converting gas supplied to the vacuum vessel to plasma for the plasma processing of the processing object placed in the vacuum vessel, is formed in, such manner that the interior space of the vacuum vessel extends beyond the outer periphery of magnetic field generating coils, and the extended portion of the vessel is provided with a gas outlet for connection with an evacuation apparatus to evacuate the interior of the vacuum vessel to a desired vacuum degree. Accordingly, preferable evacuating characteristics can be obtained even in a case when a large amount of the reaction gas is supplied to the vacuum vessel in order to process a large size processing object, because the vacuum vessel in which the processing object is placed can be connected with the evacuation apparatus through a space and the same effect as if the evacuation apparatus is directly connected with the vacuum vessel is realized.

摘要翻译： 微波等离子体处理装置技术领域本发明涉及利用电子回旋共振产生的高密度等离子体，在加工对象的表面上进行薄膜形成，蚀刻，溅射，等离子体氧化等处理的微波等离子体处理装置。 该装置的真空容器用微波导流器传输的微波用于将供给真空容器的气体转化为等离子体，用于放置在真空容器中的处理物体的等离子体处理，使得 真空容器的内部空间延伸超过磁场产生线圈的外周，并且容器的延伸部分设置有气体出口，用于与排气装置连接以将真空容器的内部抽空至期望的真空度。 因此，即使在将大量的反应气体供给到真空容器中以处理大型加工对象的情况下也可以获得优选的排气特性，因为可以连接处理对象物的真空容器 通过空间排出装置，实现与抽真空装置直接与真空容器连接的效果相同的效果。

公开(公告)号：US5433788A

公开(公告)日：1995-07-18

申请号：US131519

申请日：1993-10-04

申请人： Yasuhiro Mochizuki ,  Naohiro Momma ,  Shigeru Takahashi ,  Takuya Fukuda ,  Noboru Suzuki ,  Tadasi Sonobe ,  Kiyoshi Chiba ,  Kazuo Suzuki

发明人： Yasuhiro Mochizuki ,  Naohiro Momma ,  Shigeru Takahashi ,  Takuya Fukuda ,  Noboru Suzuki ,  Tadasi Sonobe ,  Kiyoshi Chiba ,  Kazuo Suzuki

IPC分类号： C23C16/511 ,  H01J37/32 ,  H05H1/46 ,  C23C16/50

CPC分类号： H01J37/32192 ,  C23C16/511 ,  H01J37/32678 ,  H05H1/46

摘要： A plasma treatment apparatus for forming a thin film on a substrate in a vacuum vessel includes a magnetic field generator which can be positioned inside or outside the vacuum vessel, and a microwave source. The magnetic field strength is controllable such that an electron cyclotron resonance (ECR) area is defined near the substrate. The magnetic field generator can be arranged so that plasma and reactive gas introduction ports are on the microwave introduction side of the ECR area and the substrate is on the opposite side of the ECR area. Alternatively, a gas introduction port can be positioned such that reactive gas is introduced into the ECR area or onto the substrate.

摘要翻译： 用于在真空容器中的基板上形成薄膜的等离子体处理装置包括可位于真空容器内部或外部的磁场发生器和微波源。 磁场强度是可控制的，使得在衬底附近限定电子回旋共振（ECR）区域。 磁场发生器可以布置成等离子体和反应性气体引入口位于ECR区域的微波引入侧，衬底位于ECR区域的相对侧。 或者，可以将气体引入口定位成使得反应气体被引入到ECR区域或衬底上。

公开(公告)号：US4876983A

公开(公告)日：1989-10-31

申请号：US145371

申请日：1988-01-19

申请人： Takuya Fukuda ,  Yasuhiro Mochizuki ,  Naohiro Momma ,  Shigeru Takahashi ,  Noboru Suzuki ,  Tadasi Sonobe ,  Kiyosi Chiba ,  Kazuo Suzuki

发明人： Takuya Fukuda ,  Yasuhiro Mochizuki ,  Naohiro Momma ,  Shigeru Takahashi ,  Noboru Suzuki ,  Tadasi Sonobe ,  Kiyosi Chiba ,  Kazuo Suzuki

IPC分类号： C23C16/511 ,  H01J37/32

CPC分类号： H01J37/32192 ,  C23C16/511 ,  H01J37/32678

摘要： A plasma operation apparatus utilizes plasma generated by a microwave cooperative with a magnetic field as to perform a surface operation on a specimen such as semiconductor substrates, such as, for example, thin film deposition, etching, sputtering and plasma oxidation. The apparatus particularly takes advantage of electron cyclotron resonance and is suitable for performing highly efficient and high-quality plasma operations.

公开(公告)号：US5353818A

公开(公告)日：1994-10-11

申请号：US172729

申请日：1993-12-27

申请人： Kazuo Suzuki ,  Masahiro Sumise ,  Kazuo Suzuki

发明人： Kazuo Suzuki ,  Masahiro Sumise ,  Kazuo Suzuki

IPC分类号： A45C13/00 ,  A45D40/22 ,  A45D33/24

CPC分类号： A45C13/008 ,  A45D40/22 ,  A45D2200/051

摘要： A cover is pivotably attached to a case body. Male thread portions of a multiple thread and unthreaded portions are alternately formed on a peripheral wall of a cosmetic container section of the case body. A ring is rotatably attached to the cover and externally fitted to the peripheral wall. The ring has female thread portions of a multiple thread intermittently formed. The female and male thread portions are engageable and disengageable. An inner cover made of an elastic material is attached to the lower portion of the cover so that the inner cover is brought into press contact with an open edge of the peripheral wall. A space is formed between the cover and the inner cover so that the inner cover is elastically deformed and expanded. When the female and the male thread portions are engaged with each other and the ring is rotated to a closed position, the cover approaches the case body so that the inner cover is brought into press contact with the open edge of the peripheral wall. When the temperature within the cosmetic container section is increased, the inner cover is elastically expanded upwards to increase the volume within the cosmetic container section. Thus, an increase in pressure within the cosmetic container section is suppressed.

摘要翻译： 盖可枢转地附接到壳体。 多个螺纹和无螺纹部分的阳螺纹部分交替地形成在壳体的化妆品容器部分的周壁上。 环可旋转地附接到盖并且外部装配到周壁。 该环具有间断地形成的多根螺纹的阴螺纹部分。 阴螺纹和阴螺纹部分可接合和脱离。 由弹性材料制成的内盖附接到盖的下部，使得内盖与周壁的开口边缘压接。 在盖和内盖之间形成空间，使得内盖弹性变形和膨胀。 当阴和阳螺纹部分彼此接合并且环旋转到关闭位置时，盖接近壳体，使得内盖与周壁的开口边缘压接。 当化妆品容器部分内的温度升高时，内盖弹性膨胀向上，以增加化妆品容器部分内的体积。 因此，抑制了化妆品容器部内的压力的增加。

公开(公告)号：US09296254B2

公开(公告)日：2016-03-29

申请号：US14015565

申请日：2013-08-30

申请人： Kazuo Suzuki ,  Hideyoshi Kawashima ,  Takayuki Sunagawa ,  Shinji Shimada

发明人： Kazuo Suzuki ,  Hideyoshi Kawashima ,  Takayuki Sunagawa ,  Shinji Shimada

IPC分类号： B44F1/04 ,  B32B27/00 ,  C08J7/06

CPC分类号： B32B23/02 ,  B32B27/00 ,  B32B37/02 ,  B32B2307/416 ,  B44F1/045 ,  C08J7/06 ,  Y10T428/24777 ,  Y10T428/24868

摘要： A molded resin product includes a substrate made of a transparent resin, opaque coating film disposed on rear surface of the substrate except for an area set aside for a patterned portion, a transparent resin material disposed in the area set aside for the patterned portion on the rear surface of the substrate, and an opaque reflection coating or a half-reflective coating laminated to the transparent resin material. Under this configuration, the patterned portion looks as if it pops up from the rear surface of the substrate. If a half-reflective coating is used, the pattern is visible through the half-reflective coating when the pattern is viewed from the rear surface of the lid of a molded resin product.

公开(公告)号：US09266385B2

公开(公告)日：2016-02-23

申请号：US13334576

申请日：2011-12-22

申请人： Kazuo Suzuki ,  Hideyoshi Kamashima ,  Takayuki Sunagawa ,  Shinji Shimada

发明人： Kazuo Suzuki ,  Hideyoshi Kamashima ,  Takayuki Sunagawa ,  Shinji Shimada

IPC分类号： B32B37/02 ,  B44F1/04 ,  B32B27/00 ,  C08J7/06

CPC分类号： B32B23/02 ,  B32B27/00 ,  B32B37/02 ,  B32B2307/416 ,  B44F1/045 ,  C08J7/06 ,  Y10T428/24777 ,  Y10T428/24868

摘要： A molded resin product includes a substrate made of a transparent resin, opaque coating film disposed on rear surface of the substrate except for an area set aside for a patterned portion, a transparent resin material disposed in the area set aside for the patterned portion on the rear surface of the substrate, and an opaque reflection coating or a half-reflective coating laminated to the transparent resin material. Under this configuration, the patterned portion looks as if it pops up from the rear surface of the substrate. If a half-reflective coating is used, the pattern is visible through the half-reflective coating when the pattern is viewed from the rear surface of the lid of a molded resin product.

公开(公告)号：US09238521B2

公开(公告)日：2016-01-19

申请号：US14091746

申请日：2013-11-27

申请人： Shigeru Hayakawa ,  Yoshiharu Kitamura ,  Kazuo Suzuki

发明人： Shigeru Hayakawa ,  Yoshiharu Kitamura ,  Kazuo Suzuki

IPC分类号： B65D8/04 ,  B65D1/40 ,  B65D1/02 ,  B65D83/00 ,  B05B11/00 ,  B29C49/00 ,  B29L31/00

CPC分类号： B65D1/40 ,  B05B11/0037 ,  B05B11/3047 ,  B29C49/00 ,  B29L2031/7158 ,  B65D1/0261 ,  B65D1/0276 ,  B65D1/0292 ,  B65D83/00 ,  B65D2231/008

摘要： Disclosed is a synthetic resin container provided with an inverting, foldback bottom wall that can maintain a stable, self-supporting position while being able to minimize the amount of residual contents, and that can be formed by blow-molding, etc., and maintain the favorable producibility or low cost of the past. The synthetic resin container is provided with a bottom wall that forms the bottom of the container, and a drum section that is united to the perimeter of the bottom wall and forms a filling space M for contents on the inside, and is a synthetic resin container wherein a raised bottom is formed by inverting and folding back said bottom wall toward said drum section. Said drum section has a lower peripheral wall that touches or approaches the outer wall part of said bottom wall and forms a self-supporting base by the inversion and folding back of said bottom wall.