公开(公告)号：US5754370A

公开(公告)日：1998-05-19

申请号：US893446

申请日：1997-07-11

申请人： Tatsumi Tsuchiya ,  Seiji Nakagawa ,  Tatsushi Yoshida ,  Yasuhiro Mita

发明人： Tatsumi Tsuchiya ,  Seiji Nakagawa ,  Tatsushi Yoshida ,  Yasuhiro Mita

IPC分类号： G11B5/60 ,  G11B5/48 ,  G11B21/00 ,  G11B21/16 ,  G11B21/21 ,  G11B3/10

CPC分类号： G11B5/4806 ,  G11B21/00 ,  G11B21/16 ,  G11B5/4826

摘要： The present invention provides a new tab structure for a head suspension assembly in a magnetic storage system. In the prior art method of assembly, a harness temporarily holds a wire assembly. The present invention eliminates the need for the harness, thereby reducing the number of parts and steps as well as improving productivity and quality. A flexure of a suspension assembly must be manufactured very precisely. The present invention provides a new tab structure either integral with or separate from the flexure. Wires bridge over to an extension on the tab structure at a predetermined distance from the end of the load beam. Positioning holes, using the extreme flatness of the tab structure, align the wires with the bonding pads of a head. The suspension assembly is subsequently bonded to the head, and the unwanted tab structure is removed to complete the head suspension assembly.

摘要翻译： 本发明提供了一种用于磁存储系统中的磁头悬挂组件的新的凸片结构。 在现有技术的组装方法中，线束暂时保持线组件。 本发明消除了对线束的需要，从而减少了部件和步骤的数量，并且提高了生产率和质量。 必须非常精确地制造悬架组件的弯曲。 本发明提供了与弯曲部一体或与挠曲件分离的新的凸片结构。 导线在距离负载梁的端部预定距离处跨接到翼片结构上的延伸部。 使用突片结构的极度平坦度的定位孔将导线与头部的接合垫对准。 悬挂组件随后结合到头部，并且去除不需要的翼片结构以完成头部悬挂组件。

公开(公告)号：US06628380B1

公开(公告)日：2003-09-30

申请号：US09897183

申请日：2001-07-02

申请人： Masashi Fujimori ,  Kenji Itoh ,  Toru Koike ,  Yuhsuke Matsumoto ,  Seiji Nakagawa ,  Tatsumi Tsuchiya ,  Tatsushi Yoshida

发明人： Masashi Fujimori ,  Kenji Itoh ,  Toru Koike ,  Yuhsuke Matsumoto ,  Seiji Nakagawa ,  Tatsumi Tsuchiya ,  Tatsushi Yoshida

IPC分类号： G01N2100

CPC分类号： G01N21/8806 ,  G11B5/4806

摘要： A jig for inspecting the appearance of small parts with an optical microscope, the jig is equipped with a base, having an upper flat surface which becomes a mounting stage of the optical microscope, and is also provided with a member for moving the upper flat surface at least in a direction approximately parallel to a direction of an optical axis of an objective lens of the optical microscope in order to focus the optical microscope on an inspection portion of the small parts mounted on the upper flat surface. The jig is also equipped with an inspection-object supporting portion, provided with a member for supporting the small parts at the predetermined portion on the base. Furthermore, the jig is equipped with reflecting mirrors which have a mirrorlike surface with an inclined angle of approximately 45 degrees to the upper flat surface of the base.

摘要翻译： 一种用光学显微镜检查小部件的外观的夹具，该夹具具有基部，具有成为光学显微镜的安装台的上部平坦面，并且还设置有用于使上部平坦面 至少在与光学显微镜的物镜的光轴的方向大致平行的方向上，以将光学显微镜聚焦在安装在上平坦表面上的小部件的检查部分上。 该夹具还配备有检查对象支撑部，该检查对象支撑部设置有用于在基部上的预定部分处支撑小部件的部件。 此外，夹具配备有反射镜，反射镜具有与基座的上平坦表面大约45度的倾斜角的镜面。

公开(公告)号：US07803720B2

公开(公告)日：2010-09-28

申请号：US12019981

申请日：2008-01-25

申请人： Seiji Nakagawa

发明人： Seiji Nakagawa

IPC分类号： H01L21/31

CPC分类号： G03F7/162 ,  H01L21/312 ,  H01L21/6715

摘要： A coating system and method of coating semiconductor wafers is disclosed that is able to maintain a wet condition on the outer portion of the semiconductor wafer to provide ease of spreading for a photo-resist or anti-reflective coating (ARC) that is being dispensed. The system can include a plurality of nozzles on a movable arm. A first nozzle dispenses a pre-wet solvent onto the semiconductor wafer. A second nozzle then dispenses the photo-resist or ARC coating onto the semiconductor wafer. A third nozzle dispenses additional pre-wet solvent onto the outer edge of the semiconductor wafer as the photo-resist or ARC coating is being dispensed. The nozzles dispense solutions onto the semiconductor wafer as it rotates. The system produces semiconductor wafers with few coating defects and uses less photo-resist or ARC coating.

摘要翻译： 公开了涂覆系统和涂覆半导体晶片的方法，其能够在半导体晶片的外部部分上保持湿润状态，以便于正在分配的光刻胶或抗反射涂层（ARC）的铺展性。 系统可以在可动臂上包括多个喷嘴。 第一喷嘴将预湿溶剂分配到半导体晶片上。 然后，第二喷嘴将光刻胶或ARC涂层分配到半导体晶片上。 当分配光刻胶或ARC涂层时，第三个喷嘴将另外的预湿溶剂分配到半导体晶片的外边缘上。 喷嘴在旋转时将溶液分配到半导体晶片上。 该系统生产具有很少涂层缺陷的半导体晶片，并且使用较少的光刻胶或ARC涂层。

公开(公告)号：US07457741B2

公开(公告)日：2008-11-25

申请号：US11091480

申请日：2005-03-29

申请人： Seiji Nakagawa ,  Kiyoshi Fujimoto ,  Yoh-ichi Fujisaka ,  Yosuke Okamoto

发明人： Seiji Nakagawa ,  Kiyoshi Fujimoto ,  Yoh-ichi Fujisaka ,  Yosuke Okamoto

IPC分类号： G10L21/00 ,  H04R25/00

CPC分类号： G10L21/0364

摘要： A device (1) for transmitting speech information to the human body, comprising: a microphone (2) for inputting speech from an external source; a speech signal processor (20) that produces a consonant-clarified signal based on the input speech signal; a carrier signal generator (6) that produces a carrier signal; an amplitude modulator (8) that modulates the amplitude of the carrier signal based on the consonant-clarified signal; and a vibrator (12) that transmits mechanical vibrations based on the amplitude-modulated output signal; the speech signal processor (20) comprising: a consonant extracting unit that extracts the consonant parts from the speech signal; and a repetition processing unit that adds the extracted consonant parts to the speech signal to produce a consonant-clarified signal in which each of the consonant parts of the speech signal is repeated two or more times. This speech information transmitting device realizes good discriminability of speech information.

摘要翻译： 一种用于向人体发送语音信息的装置（1），包括：麦克风（2），用于从外部源输入语音; 语音信号处理器（20），其基于所述输入语音信号产生辅音澄清信号; 载波信号发生器（6），其产生载波信号; 振幅调制器（8），其基于所述辅音清晰的信号来调制载波信号的幅度; 以及基于调幅输出信号传递机械振动的振动器（12）; 语音信号处理器（20）包括：辅音提取单元，从语音信号中提取辅音部分; 以及重复处理单元，其将提取的辅音部分添加到语音信号，以产生其中语音信号的每个辅音部分重复两次或更多次的辅音澄清信号。 该语音信息发送装置实现语音信息的良好判别性。

公开(公告)号：US07088224B2

公开(公告)日：2006-08-08

申请号：US10792779

申请日：2004-03-05

申请人： Seiji Nakagawa ,  Masahiko Yamaguchi

发明人： Seiji Nakagawa ,  Masahiko Yamaguchi

IPC分类号： H04B3/36

CPC分类号： H04R25/606

摘要： An audio information transmitting apparatus for transmitting audio information to a human body, comprises an audio signal generating unit in which an audio signal is generated based on inputted audio, an audio information recognizing unit in which the audio signal is recognized as audio information, a vibration signal generating unit in which a vibration signal is generated based on the audio information, a vibration transmitter for transmitting mechanical vibration based on the vibration signal, wherein the vibration signal generating unit modulates a carrier signal having a predetermined frequency based on a predetermined pulse-like pattern corresponding to the audio information so as to generate the vibration signal.

摘要翻译： 一种用于向人体发送音频信息的音频信息发送装置包括：音频信号生成单元，其中基于输入的音频生成音频信号;音频信息识别单元，其中音频信号被识别为音频信息;振动 信号发生单元，其中基于所述音频信息产生振动信号;振动发送器，用于基于所述振动信号发送机械振动，其中所述振动信号产生单元基于预定的脉冲状调制具有预定频率的载波信号 模式对应于音频信息，以产生振动信号。

公开(公告)号：US20080199596A1

公开(公告)日：2008-08-21

申请号：US11677240

申请日：2007-02-21

申请人： Seiji Nakagawa

发明人： Seiji Nakagawa

IPC分类号： B05D1/02

CPC分类号： B05B15/50 ,  B05B14/00

摘要： A system and method for dispensing fluid onto a surface during a manufacturing process. A fluid storage container holds a chemical, such as resist, used in a semiconductor lithography process. When not dispensing the chemical over the surface of a wafer, a pump and nozzle dispense the chemical into a dedicated dispense receptacle. A drain and pump may return the contents of the dispense receptacle to the fluid storage container for reuse.

摘要翻译： 一种用于在制造过程中将流体分配到表面上的系统和方法。 流体存储容器容纳用于半导体光刻工艺中的化学品，例如抗蚀剂。 当不将化学品分配在晶片的表面上时，泵和喷嘴将化学品分配到专用分配容器中。 排水和泵可以将分配容器的内容物返回流体储存容器以供重新使用。

公开(公告)号：US20080076077A1

公开(公告)日：2008-03-27

申请号：US11524291

申请日：2006-09-21

申请人： Seiji Nakagawa

发明人： Seiji Nakagawa

IPC分类号： G03F7/26

CPC分类号： G03F7/40 ,  H01L21/67109

摘要： Apparatuses and methods for heating semiconductor wafers with high temperature uniformity are described. In particular, rotation of the hot plate and/or wafer during heating operations such as the post exposure bake (PEB) can compensate for non-circular temperature gradients caused by the random generation of air currents and other non-uniform environmental conditions within the oven chamber. Temperature variations caused by these influences, while not easily corrected through zonal heater adjustment alone, are a major determinant of critical dimension control and consequently the overall semiconductor quality.

摘要翻译： 描述了用于加热具有高温均匀性的半导体晶片的装置和方法。 特别地，加热操作（例如后曝光烘烤（PEB））中的热板和/或晶片的旋转可以补偿由烤箱内随机产生气流和其它不均匀环境条件引起的非圆形温度梯度 房间。 由这些影响引起的温度变化，虽然不能单独通过区域加热器调节而不容易校正，是关键尺寸控制和总体半导体质量的主要决定因素。

公开(公告)号：US20080044739A1

公开(公告)日：2008-02-21

申请号：US11465185

申请日：2006-08-17

申请人： Kenji Konomi ,  Seiji Nakagawa

发明人： Kenji Konomi ,  Seiji Nakagawa

IPC分类号： G03C5/00 ,  G06F17/50 ,  G03F1/00

CPC分类号： G03F1/70 ,  G03F1/00

摘要： According to one aspect, a method is provided for preparing a photoresist mask set adapted to correct for critical dimension variations resulting from topography effects in a semiconductor device. A plurality of rules is established for correcting critical dimension variations resulting from topography effects associated with predetermined structural combinations. A photoresist mask set is then prepared according to rules corresponding to structural combinations present in a semiconductor device to be manufactured.

摘要翻译： 根据一个方面，提供了一种用于制备适于校正由半导体器件中的形貌效应引起的临界尺寸变化的光致抗蚀剂掩模组的方法。 建立了用于校正由与预定结构组合相关联的地形效应导致的临界尺寸变化的多个规则。 然后根据对应于要制造的半导体器件中存在的结构组合的规则制备光致抗蚀剂掩模组。

公开(公告)号：US07235490B2

公开(公告)日：2007-06-26

申请号：US10788216

申请日：2004-02-27

申请人： Yasuhiko Sato ,  Seiji Nakagawa ,  Jun Idebuchi ,  Motoya Kishida ,  Shuichi Taniguchi ,  Tsuyoshi Shibata

发明人： Yasuhiko Sato ,  Seiji Nakagawa ,  Jun Idebuchi ,  Motoya Kishida ,  Shuichi Taniguchi ,  Tsuyoshi Shibata

IPC分类号： H01L21/311

CPC分类号： H01L21/31144 ,  G03F7/09 ,  H01L21/0332

摘要： A method of manufacturing a semiconductor device comprises preparing a working film to be processed, forming an adhesion improving region on the working film for increasing an adhesion between the working film and a mask material containing carbon, forming the mask material on the working film, forming a resist pattern on the mask material, the mask material having a higher etching resistance for the working film than the resist pattern, transferring the pattern of the resist pattern onto the mask material, and etching the working film by using the mask material as a mask.

摘要翻译： 一种制造半导体器件的方法包括：制备待加工的工作薄膜，在工作薄膜上形成粘合改善区域，以增加工作薄膜和含有碳的掩模材料之间的粘附力，在工作薄膜上形成掩模材料，形成 在掩模材料上的抗蚀剂图案，掩模材料对抗蚀剂图案具有比工作膜更高的耐蚀刻性，将抗蚀剂图案的图案转印到掩模材料上，并且通过使用掩模材料作为掩模来蚀刻工作膜 。

公开(公告)号：US08073316B2

公开(公告)日：2011-12-06

申请号：US12023344

申请日：2008-01-31

申请人： Seiji Nakagawa

发明人： Seiji Nakagawa

IPC分类号： A21B2/00 ,  C23C16/00

CPC分类号： H01L21/67248

摘要： An oven is described that can more evenly heat the semiconductor wafer, even though the wafer may warp during heating. The oven may provide relatively uniform heating even though the type and location of warping may be unpredictable for any given wafer. The oven may have a heating surface divided into a plurality of heating zones that may each independently provide a given amount of heat to the wafer. The amount of heat provided by each zone may be determined using signals from sensors that sense the warping of the wafer.

摘要翻译： 描述了可以更均匀地加热半导体晶片的烘箱，即使在加热期间晶片可能翘曲。 即使对于任何给定的晶片来说，翘曲的类型和位置可能是不可预测的，烘箱可以提供相对均匀的加热。 烘箱可以具有被分成多个加热区域的加热表面，每个加热区域可以各自独立地向晶片提供给定量的热量。 可以使用来自感测晶片翘曲的传感器的信号确定每个区域提供的热量。