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公开(公告)号:US20100321650A1
公开(公告)日:2010-12-23
申请号:US12869560
申请日:2010-08-26
申请人: THEODORUS PETRUS MARIA CADEE , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Mana Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Comelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人: THEODORUS PETRUS MARIA CADEE , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Mana Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Comelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号: G03B27/52
CPC分类号: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
摘要翻译: 描述了一种光刻设备,其具有液体供应系统,该液体供应系统被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间,布置成基本上容纳该空间内的液体的阻挡构件,以及一个或多个元件 以控制和/或补偿来自基底的液体的蒸发。
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2.Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor 有权
标题翻译: 涉及加热器和温度传感器的平版印刷设备和设备制造方法公开(公告)号:US09268242B2
公开(公告)日:2016-02-23
申请号:US12869560
申请日:2010-08-26
申请人: Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Mana Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人: Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Mana Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号: G03F7/20
CPC分类号: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
摘要翻译: 描述了一种光刻设备,其具有液体供应系统,其被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间,布置成基本上容纳该空间内的液体的阻挡构件和加热器。
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公开(公告)号:US20120113402A1
公开(公告)日:2012-05-10
申请号:US13288831
申请日:2011-11-03
申请人: Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Comelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人: Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Comelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号: G03B27/52
CPC分类号: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
摘要翻译: 描述了一种光刻设备,其具有液体供应系统,该液体供应系统被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间,布置成基本上容纳该空间内的液体的阻挡构件,以及一个或多个元件 以控制和/或补偿来自基底的液体的蒸发。
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4.Lithographic apparatus and device manufacturing method involving a heater 有权
标题翻译: 涉及加热器的平版印刷设备和设备制造方法公开(公告)号:US09188880B2
公开(公告)日:2015-11-17
申请号:US13288831
申请日:2011-11-03
申请人: Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人: Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号: G03F7/20
CPC分类号: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
摘要翻译: 描述了一种光刻设备,其具有液体供应系统,其配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间,布置成基本上容纳空间内的液体的阻挡构件和加热器。
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5.Lithographic apparatus and device manufacturing method having liquid evaporation control 有权
标题翻译: 具有液体蒸发控制的平版印刷设备和器件制造方法公开(公告)号:US07804575B2
公开(公告)日:2010-09-28
申请号:US11205325
申请日:2005-08-17
申请人: Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人: Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号: G03B27/52
CPC分类号: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
摘要翻译: 描述了一种光刻设备,其具有液体供应系统,该液体供应系统被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间,布置成基本上容纳该空间内的液体的阻挡构件,以及一个或多个元件 以控制和/或补偿来自基底的液体的蒸发。
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公开(公告)号:US07304715B2
公开(公告)日:2007-12-04
申请号:US10917535
申请日:2004-08-13
申请人: Theodorus Petrus Maria Cadee , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov , Marco Koert Stavenga , Martin Frans Pierre Smeets , Aschwin Lodewijk Hendricus Johannes Van Meer , Bart Leonard Peter Schoondermark , Patricius Aloysius Jacobus Tinnemans , Stoyan Nihtianov
发明人: Theodorus Petrus Maria Cadee , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov , Marco Koert Stavenga , Martin Frans Pierre Smeets , Aschwin Lodewijk Hendricus Johannes Van Meer , Bart Leonard Peter Schoondermark , Patricius Aloysius Jacobus Tinnemans , Stoyan Nihtianov
CPC分类号: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要: A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.
摘要翻译: 公开了一种光刻设备。 该装置包括配置成调节辐射束的照明系统和构造成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述设备还包括被构造成保持基板的基板台,配置成将图案化的辐射束投影到基板的目标部分上的投影系统,配置成至少部分地填充投影系统和基板之间的空间的液体供应系统 具有液体,被布置成基本上容纳空间内的液体的密封构件以及用于控制和/或补偿浸没液体从基底蒸发的元件。
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公开(公告)号:US07196768B2
公开(公告)日:2007-03-27
申请号:US10972754
申请日:2004-10-26
申请人: Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Edwin Van Gompel
发明人: Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Edwin Van Gompel
CPC分类号: H01L21/67109 , G03F7/70341 , G03F7/707 , G03F7/70783 , G03F7/70875
摘要: A lithographic apparatus includes a substrate support that is constructed to support a substrate, and a projection system that is configured to project a patterned radiation beam onto a target portion of the substrate. The substrate support is arranged to move the substrate along a predetermined trajectory of subsequently targeted target portions of the substrate. The substrate support includes a duct configuration for providing thermal stabilization to the substrate. The duct configuration is arranged to duct thermally stabilizing media in the support, and to substantially duct the media away from a part of the substrate support that supports the target portion via parts of the substrate support that support previously targeted portions of the substrate, so as to keep subsequently targeted target portions thermally stable.
摘要翻译: 光刻设备包括被构造为支撑衬底的衬底支撑件和被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统。 衬底支撑件布置成沿着衬底的随后靶向目标部分的预定轨迹移动衬底。 衬底支撑件包括用于向衬底提供热稳定性的管道构造。 导管构造被布置成将支撑体中的热稳定化介质导管,并且基本上通过支撑基板的先前目标部分的基板支撑件的支撑目标部分的基板支撑件的一部分基本上导管介质,以便 以保持随后的目标靶部分热稳定。
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公开(公告)号:US20060033898A1
公开(公告)日:2006-02-16
申请号:US11205325
申请日:2005-08-17
申请人: Theodorus Cadee , Johannes Jacobs , Nicolaas Kate , Erik Loopstra , Aschwin Lodewijk Vermeer , Jeroen Maria Mertens , Christianus De Mol , Marcel Hubertus Muitjens , Antonius Van Der Net , Joost Ottens , Johannes Quaedackers , Maria Reuhman-Huisken , Marco Stavenga , Patricius Tinnemans , Martinus Verhagen , Jacobus Johannus Hendricus Verspay , Frederik De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Smeets , Bart Schoondermark , Franciscus Janssen , Michel Riepen
发明人: Theodorus Cadee , Johannes Jacobs , Nicolaas Kate , Erik Loopstra , Aschwin Lodewijk Vermeer , Jeroen Maria Mertens , Christianus De Mol , Marcel Hubertus Muitjens , Antonius Van Der Net , Joost Ottens , Johannes Quaedackers , Maria Reuhman-Huisken , Marco Stavenga , Patricius Tinnemans , Martinus Verhagen , Jacobus Johannus Hendricus Verspay , Frederik De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Smeets , Bart Schoondermark , Franciscus Janssen , Michel Riepen
IPC分类号: G03B27/42
CPC分类号: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要: A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
摘要翻译: 公开了一种光刻设备,其具有液体供应系统,其配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间,布置成基本上容纳该空间内的液体的阻挡构件,以及一个或多个元件 以控制和/或补偿来自基底的液体的蒸发。
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9.
公开(公告)号:US07453063B2
公开(公告)日:2008-11-18
申请号:US11006819
申请日:2004-12-08
申请人: Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov
发明人: Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov
IPC分类号: H01J37/256 , H01L21/00 , G03B27/58
CPC分类号: G03F7/70875 , G03F7/70516 , G03F7/70616
摘要: A calibration substrate for use during calibration of a lithographic apparatus is disclosed. The calibration substrate includes a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface. The calibration substrate has a thermal expansion coefficient of less than about 1.0×10−6 K−1 to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.
摘要翻译: 公开了一种用于在光刻设备的校准期间使用的校准基板。 校准基板包括第一基本上平坦的表面,基本上平行于第一表面的第二基本上平坦的表面,以及将第一表面连接到第二表面的边缘。 校准基板的热膨胀系数小于约1.0×10 -6 -K -1,以减小由于在光刻设备中的基板的热变化引起的变形。
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10.Method of calibrating a lithographic apparatus and device manufacturing method 有权
标题翻译: 校准光刻设备的方法和器件制造方法公开(公告)号:US20070058152A1
公开(公告)日:2007-03-15
申请号:US11223209
申请日:2005-09-12
申请人: Koen Jacobus Zaal , Antonius De Kort , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Hermen Pen
发明人: Koen Jacobus Zaal , Antonius De Kort , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Hermen Pen
IPC分类号: G03B27/32
CPC分类号: G03F7/70341
摘要: In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using normal and reversed meanders. The two data sets can then be used to eliminate effects due to wafer cooling.
摘要翻译: 在浸没光刻设备的叠加性能的校准中,从使用正反转的蜿蜒的曝光获得两组覆盖数据。 然后可以使用两个数据集来消除由于晶片冷却引起的影响。
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