公开(公告)号：US20060108119A1

公开(公告)日：2006-05-25

申请号：US10995980

申请日：2004-11-23

Applicant: Thomas Bailey ,  James Chambers

Inventor： Thomas Bailey ,  James Chambers

IPC: E21B33/035

CPC classification number: E21B33/085 ,  Y10S285/92

Abstract: A latch assembly is connectable to a riser. A rotating control device can be positioned with the riser, sealing the rotating control device with the latch assembly and removably latching the rotating control device to the latch assembly and to the riser. The latch assembly can be remotely actuated. The latch assembly can provide an auxiliary safety mechanism to provide a backup actuation mechanism to unlatch the rotating control device from the latch assembly. The latch assembly can be bolted to the riser. Alternately, the latch assembly can be latched with the riser using a similar latching mechanism as used to latch the latch assembly to the rotating control device. A pressure transducer protector assembly can protect a transducer for monitoring wellbore pressure in the riser. A remote indicator panel can indicate the status of the latch assembly.

公开(公告)号：US20060102387A1

公开(公告)日：2006-05-18

申请号：US11284308

申请日：2005-11-21

Applicant: Darryl Bourgoyne ,  Don Hannegan ,  Thomas Bailey ,  James Chambers ,  Timothy Wilson

Inventor： Darryl Bourgoyne ,  Don Hannegan ,  Thomas Bailey ,  James Chambers ,  Timothy Wilson

IPC: E21B15/02

CPC classification number: E21B23/006 ,  E21B21/001 ,  E21B21/08 ,  E21B33/085 ,  E21B2021/006

Abstract: A holding member provides for releasably positioning a rotating control head assembly in a subsea housing. The holding member engages an internal formation in the subsea housing to resist movement of the rotating control head assembly relative to the subsea housing. The rotating control head assembly is sealed with the subsea housing when the holding member engages the internal formation. An extendible portion of the holding member assembly extrudes an elastomer between an upper portion and a lower portion of the internal housing to seal the rotating control head assembly with the subsea housing. Pressure relief mechanisms release excess pressure in the subsea housing and a pressure compensation mechanism pressurize bearings in the bearing assembly at a predetermined pressure.

Abstract translation: 保持构件用于将旋转的控制头组件可释放地定位在海底外壳中。 保持构件接合海底外壳内的内部结构，以抵抗旋转控制头组件相对于海底外壳的移动。 当保持构件接合内部结构时，旋转控制头组件被海底壳体密封。 保持构件组件的可延伸部分在弹性体的内部壳体的上部和下部之间挤压弹性体，以与海底壳体密封旋转的控制头组件。 压力释放机构释放海底外壳中的过压，并且压力补偿机构以预定的压力对轴承组件中的轴承加压。

公开(公告)号：US20060144622A1

公开(公告)日：2006-07-06

申请号：US11366078

申请日：2006-03-02

Applicant: Thomas Bailey ,  James Chambers ,  Don Hannegan ,  Mark Gravouia

Inventor： Thomas Bailey ,  James Chambers ,  Don Hannegan ,  Mark Gravouia

IPC: E21B17/10

CPC classification number: E21B33/085 ,  E21B36/001 ,  E21B47/10 ,  F16J15/324 ,  F16K41/046

Abstract: A system and method for reducing repairs to radial seals used in a rotating control head used while drilling is disclosed. Also, a system and method to detect leaks in the rotating control head and a latching system to latch the rotating control head to a housing is disclosed.

Abstract translation: 公开了一种用于减少在钻孔时使用的旋转控制头中使用的径向密封维修的系统和方法。 此外，公开了一种用于检测旋转控制头中的泄漏的系统和方法，以及用于将旋转控制头锁定到壳体的闩锁系统。

公开(公告)号：US20050241833A1

公开(公告)日：2005-11-03

申请号：US11123329

申请日：2005-05-06

Applicant: Thomas Bailey ,  James Chambers ,  Mark Gravouia

Inventor： Thomas Bailey ,  James Chambers ,  Mark Gravouia

IPC: E21B33/08 ,  E21B33/06

CPC classification number: F16J15/3224 ,  E21B33/085 ,  F16J15/025 ,  F16J15/3208 ,  F16J15/3216 ,  F16J15/3236

Abstract: A seal assembly for use with a rotating control head is provided. The seal assembly includes a rotatable member and a cavity formed between the rotatable member and a tubular radially inwardly disposed from the rotatable member. The cavity having a first surface and a second surface. The seal assembly further includes a seal member having a first end and a second end disposed between the first surface and the second surface of the cavity and sealable with the tubular between the first and the second ends due to deformation of the seal member.

Abstract translation: 提供了一种用于旋转控制头的密封组件。 密封组件包括可旋转构件和形成在可旋转构件和从可旋转构件径向向内布置的管状物之间的空腔。 空腔具有第一表面和第二表面。 密封组件还包括密封构件，密封构件具有第一端和设置在空腔的第一表面和第二表面之间的第二端，并且由于密封构件的变形而可与第一和第二端之间的管状物密封。

公开(公告)号：US20100008190A1

公开(公告)日：2010-01-14

申请号：US12500566

申请日：2009-07-09

Applicant: Kevin L. Gray ,  Thomas F. Bailey ,  James Chambers

Inventor： Kevin L. Gray ,  Thomas F. Bailey ,  James Chambers

IPC: E21B47/18

CPC classification number: E21B33/085 ,  E21B3/02 ,  E21B7/12 ,  E21B17/01 ,  E21B21/08 ,  E21B33/064 ,  E21B47/00 ,  E21B47/06 ,  E21B47/065 ,  E21B47/12 ,  E21B47/122 ,  G01V11/002

Abstract: The present invention generally relates to an apparatus and a method of transmitting data from a rotating control device. In one aspect, a method of transmitting data from a rotating control device coupled to an offshore drilling unit is provided. The method includes the step of generating data relating to a parameter associated with the rotating control device. The method further includes the step of transmitting the data from a transmitting assembly coupled to the rotating control device to a receiving assembly positioned proximate the transmitting assembly. Additionally, the method includes the step of transmitting the data from the receiving assembly to the offshore drilling unit. In another aspect, a data gathering and transmitting system for use with a rotating control device coupled to an offshore drilling unit is provided. In a further aspect, a method for transmitting data generated in a rotating control device coupled to a riser is provided.

Abstract translation: 本发明一般涉及从旋转控制装置发送数据的装置和方法。 一方面，提供一种从耦合到海上钻井单元的旋转控制装置传送数据的方法。 该方法包括生成与旋转控制装置相关的参数有关的数据的步骤。 该方法还包括将数据从耦合到旋转控制装置的发送组件传送到靠近发射组件定位的接收组件的步骤。 此外，该方法包括将数据从接收组件传送到海上钻井单元的步骤。 在另一方面，提供了一种与耦合到海上钻井单元的旋转控制装置一起使用的数据收集和传送系统。 在另一方面，提供一种用于传送在连接到提升管的旋转控制装置中产生的数据的方法。

公开(公告)号：US20080068926A1

公开(公告)日：2008-03-20

申请号：US11691481

申请日：2007-03-26

Applicant: James Chambers ,  Henry Bass ,  Kenneth Gilbert ,  Daniel Kleinert

Inventor： James Chambers ,  Henry Bass ,  Kenneth Gilbert ,  Daniel Kleinert

IPC: G01S15/88 ,  G03B42/06

CPC classification number: G03B42/06 ,  G01S15/96

Abstract: A system for assessing underwater biomass that comprises a frame that can float and hold the system on a body of water; a transducer that emits and receives wave signals; a motor box, that positions the transducer below a water line; a control unit to allow a user to operate the system and view results obtained from the system; an electronics housing that receives a CPU board that communicates with and relays information to and from, the control unit; and a communication device to facilitate communication between the control unit and the CPU board.

Abstract translation: 一种用于评估水下生物质的系统，包括可将系统浮动并保持在水体上的框架; 发射和接收波信号的换能器; 电机箱，将换能器放置在水线下方; 控制单元，用于允许用户操作系统并查看从系统获得的结果; 电子外壳，其接收与控制单元通信和中继信息的CPU板; 以及促进控制单元和CPU板之间的通信的通信设备。

公开(公告)号：US20080057739A1

公开(公告)日：2008-03-06

申请号：US11924132

申请日：2007-10-25

Applicant: Luigi Colombo ,  James Chambers ,  Mark Visokay ,  Antonio Rotondaro

Inventor： Luigi Colombo ,  James Chambers ,  Mark Visokay ,  Antonio Rotondaro

IPC: H01L21/469

CPC classification number: H01L21/02318 ,  C23C16/56 ,  H01L21/02323 ,  H01L21/28185 ,  H01L21/28194 ,  H01L21/3143 ,  H01L21/31608 ,  H01L21/31616 ,  H01L21/31641 ,  H01L21/31645 ,  H01L21/318 ,  H01L29/518 ,  H01L29/78

Abstract: A method for improving high-κ gate dielectric film (104) properties. The high-κ film (104) is subjected to a two step anneal sequence. The first anneal is performed in a reducing ambient (106) with low partial pressure of oxidizer to promote film relaxation and increase by-product diffusion and desorption. The second anneal is performed in an oxidizing ambient (108) with a low partial pressure of reducer to remove defects and impurities.

Abstract translation: 一种改善高卡门电介质膜（104）性能的方法。 对高卡帕膜（104）进行两步退火处理。 第一退火在具有低分压氧化剂的还原环境（106）中进行，以促进膜弛豫并增加副产物扩散和解吸附。 第二次退火在具有低分压还原剂的氧化环境（108）中进行以除去缺陷和杂质。

公开(公告)号：US20060121744A1

公开(公告)日：2006-06-08

申请号：US11325823

申请日：2006-01-05

Applicant: Manuel Quevedo-Lopez ,  James Chambers ,  Luigi Colombo ,  Mark Visokay

Inventor： Manuel Quevedo-Lopez ,  James Chambers ,  Luigi Colombo ,  Mark Visokay

IPC: H01L21/31 ,  H01L21/8242

CPC classification number: H01L21/0234 ,  C23C16/401 ,  C23C16/405 ,  C23C16/56 ,  H01L21/02175 ,  H01L21/02181 ,  H01L21/02194 ,  H01L21/3105 ,  H01L21/31053 ,  H01L21/3143 ,  H01L21/3144 ,  H01L21/31604 ,  H01L21/31645 ,  H01L21/31691

Abstract: A system and method for manufacturing semiconductor devices with dielectric layers having a dielectric constant greater than silicon dioxide includes depositing a dielectric layer on a substrate and subjecting the dielectric layer to a plasma to reduce top surface roughness in the dielectric layer.

公开(公告)号：US20050282351A1

公开(公告)日：2005-12-22

申请号：US10874038

申请日：2004-06-22

Applicant: Manuel Quevedo-Lopez ,  James Chambers ,  Leif Olsen

Inventor： Manuel Quevedo-Lopez ,  James Chambers ,  Leif Olsen

IPC: H01L21/76 ,  H01L21/762 ,  H01L21/8238

CPC classification number: H01L29/7842 ,  H01L21/76224 ,  H01L21/823807 ,  H01L21/823878

Abstract: The present invention facilitates semiconductor fabrication by maintaining shape and density of an etch stop layer (206) during trench fill operations. The shape and density of the etch stop layer (206) is maintained by forming a protective alloy liner layer (310) on the etch stop layer (206) prior to trench fill operations. The protective alloy liner (310) is comprised of an alloy that is resistant to materials employed in the trench fill operations. As a result, clipping and/or damage to the etch stop layer (206) is mitigated thereby facilitating a subsequent planarization process that employs the etch stop layer (206). Additionally, selection of thickness and composition (1706) of the formed protective alloy (310) yields a stress amount and type (1704) that is applied to channel regions of unformed transistor devices, ultimately providing for an improvement in channel mobility.

Abstract translation: 本发明通过在沟槽填充操作期间保持蚀刻停止层（206）的形状和密度来促进半导体制造。 通过在沟槽填充操作之前在蚀刻停止层（206）上形成保护合金衬垫层（310）来保持蚀刻停止层（206）的形状和密度。 保护合金衬套（310）由对沟槽填充操作中使用的材料具有耐受性的合金构成。 结果，减轻了对蚀刻停止层（206）的削波和/或损伤，从而有利于采用蚀刻停止层（206）的随后的平坦化工艺。 此外，形成的保护合金（310）的厚度和组成（1706）的选择产生施加到未成形晶体管器件的沟道区域的应力量和类型（1704），最终提供了沟道迁移率的改善。

公开(公告)号：US20050258500A1

公开(公告)日：2005-11-24

申请号：US10852523

申请日：2004-05-24

Applicant: Luigi Colombo ,  James Chambers ,  Mark Visokay

Inventor： Luigi Colombo ,  James Chambers ,  Mark Visokay

IPC: H01L21/3205 ,  H01L21/8234 ,  H01L21/8238 ,  H01L29/49 ,  H01L29/76 ,  H01L29/78

CPC classification number: H01L21/823842 ,  H01L29/4958

Abstract: The present invention provides, in one embodiment, a gate structure (100). The gate structure comprises a gate dielectric (105) and a gate (110). The gate dielectric includes a refractory metal and is located over a semiconductor substrate (115). The semiconductor substrate has a conduction band and a valence band. The gate is located over the gate dielectric and includes the refractory metal. The gate has a work function aligned toward the conduction band or the valence band. Other embodiments include an alternative gate structure (200), a method of forming a gate structure (300) for a semiconductor device (301) and a dual gate integrated circuit (400).

Abstract translation: 本发明在一个实施例中提供一种栅极结构（100）。 栅极结构包括栅极电介质（105）和栅极（110）。 栅极电介质包括难熔金属并且位于半导体衬底（115）之上。 半导体衬底具有导带和价带。 栅极位于栅极电介质上方并且包括难熔金属。 栅极具有与导带或价带对准的功函数。 其他实施例包括替代栅极结构（200），形成用于半导体器件（301）的栅极结构（300）和双栅极集成电路（400）的方法。