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17 条记录 (耗时 0.023 秒)

    Dynamic adaptive sampling rate for model prediction
    1.
    发明授权
    Dynamic adaptive sampling rate for model prediction 有权
    模型预测的动态自适应采样率

    公开(公告)号：US08017411B2

    公开(公告)日：2011-09-13

    申请号：US10323530

    申请日：2002-12-18

    申请人： Thomas J. Sonderman ,  Alexander J. Pasadyn ,  Gregory A. Cherry

    发明人： Thomas J. Sonderman ,  Alexander J. Pasadyn ,  Gregory A. Cherry

    IPC分类号： H01L21/00

    CPC分类号： H01L22/20 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A method and an apparatus for dynamically adjusting a sampling rate relating to wafer examination. A process step is performed upon a plurality of workpieces associated with a lot. A sample rate for acquiring metrology data relating to at least one of the processed workpiece is determined. A dynamic sampling rate adjustment process is performed to adaptively modify the sample rate. The dynamic sampling rate adjustment process includes comparing a predicted process outcome and an actual process outcome and modifying the sampling rate based upon the comparison.

    摘要翻译： 一种用于动态调整与晶片检查相关的采样率的方法和装置。 在与批次相关联的多个工件上执行处理步骤。 确定用于获取与所处理的工件中的至少一个相关的度量数据的采样率。 执行动态采样率调整过程以自适应地修改采样率。 动态采样率调整过程包括比较预测过程结果和实际过程结果，并根据比较修改采样率。

    Probability constrained optimization for electrical fabrication control
    2.
    发明授权
    Probability constrained optimization for electrical fabrication control 失效
    概率约束优化电气制造控制

    公开(公告)号：US06959224B2

    公开(公告)日：2005-10-25

    申请号：US10335748

    申请日：2003-01-02

    申请人： Richard P. Good ,  Gregory A. Cherry ,  Jin Wang

    发明人： Richard P. Good ,  Gregory A. Cherry ,  Jin Wang

    IPC分类号： G03F7/20 ,  G05B19/418 ,  H01L21/66 ,  G06F19/00

    CPC分类号： G03F7/705 ,  G05B19/41885 ,  G05B2219/32015 ,  G05B2219/50129 ,  H01L22/20 ,  Y02P90/26

    摘要： A method includes defining a model of a process for manufacturing a device, the process including a plurality of steps. A plurality of inline process targets are defined for at least a subset of the process steps. The model relates the inline process targets to a plurality of process output parameters. A first set of probabilistic constraints for the inline process targets is defined. A second set of probabilistic constraints for the process output parameters is defined. An objective function is defined based on the model and the plurality of process output parameters. A trajectory of the process output parameters is determined by optimizing the objective function subject to the first and second sets of probabilistic constraints for each process step to determine values for the inline process targets at each process step, the optimization being iterated after completion of each process step for the remaining process steps.

    摘要翻译： 一种方法包括定义用于制造设备的过程的模型，该过程包括多个步骤。 为进程步骤的至少一个子集定义了多个内联过程目标。 该模型将内联过程目标与多个过程输出参数相关联。 定义了内联流程目标的第一组概率约束。 定义了过程输出参数的第二组概率约束。 基于模型和多个过程输出参数定义目标函数。 过程输出参数的轨迹通过优化目标函数来确定，该目标函数受制于每个处理步骤的第一和第二组概率约束，以确定每个处理步骤中的内联过程目标的值，优化在每个过程完成之后重复 步骤剩下的过程步骤。

    Method and apparatus for multivariate fault detection and classification
    3.
    发明授权
    Method and apparatus for multivariate fault detection and classification 有权
    多变量故障检测和分类方法与装置

    公开(公告)号：US07248939B1

    公开(公告)日：2007-07-24

    申请号：US11035276

    申请日：2005-01-13

    申请人： Kevin Andrew Chamness ,  Daniel Kadosh ,  Gregory A. Cherry ,  Jason Williams

    发明人： Kevin Andrew Chamness ,  Daniel Kadosh ,  Gregory A. Cherry ,  Jason Williams

    IPC分类号： G06F19/00

    CPC分类号： H01L21/67288 ,  H01L21/67276

    摘要： The present invention provides a method and apparatus for multivariate fault identification and classification. The method includes accessing data indicative of a plurality of physical parameters associated with a plurality of processed semiconductor wafers and providing at least one summary report including information indicative of at least one univariate representation of the accessed data and at least one multivariate representation of the accessed data.

    摘要翻译： 本发明提供了一种用于多变量故障识别和分类的方法和装置。 该方法包括访问指示与多个处理的半导体晶片相关联的多个物理参数的数据，并且提供包括指示所访问数据的至少一个单变量表示的信息的至少一个概要报告和所访问数据的至少一个多变量表示 。

    Fault detection and classification based on calculating distances between data points
    4.
    发明授权
    Fault detection and classification based on calculating distances between data points 失效
    基于计算数据点之间的距离的故障检测和分类

    公开(公告)号：US07043403B1

    公开(公告)日：2006-05-09

    申请号：US10234755

    申请日：2002-09-04

    申请人： Jin Wang ,  Gregory A. Cherry

    发明人： Jin Wang ,  Gregory A. Cherry

    IPC分类号： G06F19/00

    CPC分类号： G05B23/024

    摘要： A method and apparatus is provided for fault detection and classification based on calculating distances between data points. The method comprises receiving a data sample representative of measurements of one or more variables associated with a process operation, determining a distance between the data sample and one or more data points of a history data of the process operation and detecting a fault associated with the process operation based on the distance between the data sample and the one or more data points of the history data.

    摘要翻译： 提供了一种基于计算数据点之间距离的故障检测和分类方法和装置。 该方法包括接收表示与过程操作相关联的一个或多个变量的测量的数据样本，确定数据样本与处理操作的历史数据的一个或多个数据点之间的距离并检测与该过程相关联的故障 基于数据样本与历史数据的一个或多个数据点之间的距离进行操作。

    Adjusting a sampling protocol in an adaptive control process
    6.
    发明授权
    Adjusting a sampling protocol in an adaptive control process 有权
    在自适应控制过程中调整采样协议

    公开(公告)号：US07050879B1

    公开(公告)日：2006-05-23

    申请号：US10406463

    申请日：2003-04-03

    申请人： Jin Wang ,  Gregory A. Cherry

    发明人： Jin Wang ,  Gregory A. Cherry

    IPC分类号： G06F19/00

    CPC分类号： G06Q10/00

    摘要： A method and an apparatus are provided for adjusting a sampling protocol in an adaptive control process. The method comprises determining a performance value based on a measurement associated with at least one or more previously processed workpieces, adjusting a sampling protocol for one or more processed workpieces based on the determined performance value, and measuring the one or more processed workpieces according to the sampling protocol to provide one or more measurements. The method further comprises adjusting at least one of a process model and a control parameter based on at least a portion of the one or more measurements.

    摘要翻译： 提供了一种用于在自适应控制过程中调整采样协议的方法和装置。 该方法包括基于与至少一个或多个先前处理的工件相关联的测量来确定性能值，基于所确定的性能值调整一个或多个经处理的工件的采样协议，以及根据所确定的性能值测量所述一个或多个经处理的工件 采样协议提供一个或多个测量。 该方法还包括基于一个或多个测量的至少一部分来调整过程模型和控制参数中的至少一个。

    Updating process controller based upon fault detection analysis
    7.
    发明授权
    Updating process controller based upon fault detection analysis 失效
    基于故障检测分析更新过程控制器

    公开(公告)号：US06871114B1

    公开(公告)日：2005-03-22

    申请号：US10231713

    申请日：2002-08-30

    申请人： Eric O. Green ,  Matthew A. Purdy ,  Elfido Coss, Jr. ,  Christopher A. Bode ,  Robert J. Chong ,  Gregory A. Cherry

    发明人： Eric O. Green ,  Matthew A. Purdy ,  Elfido Coss, Jr. ,  Christopher A. Bode ,  Robert J. Chong ,  Gregory A. Cherry

    IPC分类号： G05B19/404 ,  G06F19/00

    CPC分类号： G05B19/404 ,  G05B2219/37252 ,  G05B2219/37345 ,  G05B2219/45031

    摘要： A method and an apparatus for adjusting a process controller based upon a fault detection analysis. A process step upon a workpiece is performed using a processing tool. Manufacturing data relating to processing of the workpiece is acquired. The manufacturing data may include metrology data relating to the processed workpiece and/or tool state data relating to the tool state of a processing tool. A metrology/tool state data integration process is performed based upon the acquired manufacturing data. The metrology/tool state data integration process includes performing an assessment of a tool health related to the processing tool and adjusting an emphasis of the metrology data based upon the assessment of the tool health.

    摘要翻译： 一种基于故障检测分析调整过程控制器的方法和装置。 使用加工工具进行工件的加工步骤。 获取与工件的加工有关的制造数据。 制造数据可以包括与处理工具有关的计量学数据和/或与加工工具的工具状态有关的刀具状态数据。 基于获取的制造数据执行计量/工具状态数据集成处理。 计量/工具状态数据集成过程包括对与处理工具相关的工具健康进行评估，并且基于对工具健康的评估来调整计量数据的重点。