Imaging compositions and methods
    4.
    发明授权
    Imaging compositions and methods 失效
    成像组合物和方法

    公开(公告)号:US08053160B2

    公开(公告)日:2011-11-08

    申请号:US11180184

    申请日:2005-07-13

    IPC分类号: G03C1/00

    CPC分类号: G03C1/73 G03C1/732

    摘要: An imaging composition, article and method of imaging are disclosed. The imaging composition is energy sensitive such that upon application of a sufficient amount of energy to the composition a color or shade change is affected. The imaging composition is coated on an article to form an energy sensitive article, which may be used in marking work pieces.

    摘要翻译: 公开了成像组合物,制品和成像方法。 成像组合物是能量敏感的,使得当对组合物施加足够量的能量时,颜色或阴影变化受到影响。 将成像组合物涂覆在制品上以形成可用于标记工件的能量敏感物品。

    I-line photoresist compositions
    9.
    发明授权
    I-line photoresist compositions 失效
    I线光致抗蚀剂组合物

    公开(公告)号:US06613495B2

    公开(公告)日:2003-09-02

    申请号:US09176867

    申请日:1998-10-22

    申请人: James G. Shelnut

    发明人: James G. Shelnut

    IPC分类号: G03F7038

    摘要: Negative photoimageable compositions are disclosed which contain a radiation sensitive component for producing an acid when subjected to radiation at wavelengths of 320 to 420 nanometers, a resin binder and a reactive oligomer. The compositions are useful in constructing printed circuits and integrated circuit packages.

    摘要翻译: 公开了负光学成像组合物,其含有当经受320至420纳米波长的辐射时产生酸的辐射敏感组分,树脂粘合剂和反应性低聚物。 该组合物可用于构建印刷电路和集成电路封装。