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    Cluster valve for semiconductor wafer processing systems
    1.
    发明授权
    Cluster valve for semiconductor wafer processing systems 有权
    用于半导体晶圆处理系统的集束阀

    公开(公告)号：US06273140B1

    公开(公告)日：2001-08-14

    申请号：US09318231

    申请日：1999-05-25

    Applicant: Toan Q. Tran

    Inventor： Toan Q. Tran

    IPC: F16K1110

    CPC classification number: F16K51/02 ,  F16K27/065 ,  Y10T137/87909 ,  Y10T137/87917

    Abstract: A valve assembly comprises a valve body having an interior valve seat and a plurality of adapter ports. A non-metallic sealing material provides a vacuum seal between mating surfaces of adjacent vacuum components, and direct physical contact between mating surfaces ensures good thermal conduction within the valve assembly.

    Abstract translation: 阀组件包括具有内阀座和多个适配器端口的阀体。 非金属密封材料在相邻真空部件的配合表面之间提供真空密封，并且配合表面之间的直接物理接触确保阀组件内的良好的热传导。

    VARIABLE SEAL PRESSURE SLIT VALVE DOORS FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT
    4.
    发明申请
    VARIABLE SEAL PRESSURE SLIT VALVE DOORS FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT 审中-公开
    用于半导体制造设备的可变密封式压力阀门

    公开(公告)号：US20110120017A1

    公开(公告)日：2011-05-26

    申请号：US12949231

    申请日：2010-11-18

    Applicant: Won B. Bang ,  Toan Q. Tran ,  Yen-Kun Victor Wang

    Inventor： Won B. Bang ,  Toan Q. Tran ,  Yen-Kun Victor Wang

    IPC: E05F15/02

    CPC classification number: H01L21/67126 ,  E05F15/50 ,  E05F15/56 ,  E05Y2201/458 ,  E05Y2800/12

    Abstract: Techniques for a door system for sealing an opening between two chambers in a semiconductor processing system are described. A sealing member seals the opening when a door is in a closed position. To selectively open and close the opening, an actuator moves the door. A valve actuator switch provides a first or second pressure to the actuator depending on the pressure inside a first chamber. In one embodiment, a sensor monitors the pressure inside the first chamber.

    Abstract translation: 描述了用于密封半导体处理系统中的两个室之间的开口的门系统的技术。 当门处于关闭位置时，密封构件密封开口。 为了选择性地打开和关闭开口，执行器移动门。 阀致动器开关根据第一室内的压力向致动器提供第一或第二压力。 在一个实施例中，传感器监测第一室内的压力。

    FLOW CONTROL FEATURES OF CVD CHAMBERS
    5.
    发明申请
    FLOW CONTROL FEATURES OF CVD CHAMBERS 有权
    CVD气泡流量控制特征

    公开(公告)号：US20110011338A1

    公开(公告)日：2011-01-20

    申请号：US12836726

    申请日：2010-07-15

    Applicant: Kien N. Chuc ,  Qiwei Liang ,  Hanh D. Nguyen ,  Xinglong Chen ,  Matthew Miller ,  Soonam Park ,  Toan Q. Tran ,  Adib Khan ,  Jang-Gyoo Yang ,  Dmitry Lubomirsky ,  Shankar Venkataraman

    Inventor： Kien N. Chuc ,  Qiwei Liang ,  Hanh D. Nguyen ,  Xinglong Chen ,  Matthew Miller ,  Soonam Park ,  Toan Q. Tran ,  Adib Khan ,  Jang-Gyoo Yang ,  Dmitry Lubomirsky ,  Shankar Venkataraman

    IPC: C23C16/00

    CPC classification number: C23C16/45565 ,  C23C16/452 ,  C23C16/45574 ,  H01J37/3244 ,  H01J37/32449 ,  Y10T137/85938

    Abstract: Apparatus and methods for gas distribution assemblies are provided. In one aspect, a gas distribution assembly is provided comprising an annular body comprising an annular ring having an inner annular wall, an outer wall, an upper surface, and a bottom surface, an upper recess formed into the upper surface, and a seat formed into the inner annular wall, an upper plate positioned in the upper recess, comprising a disk-shaped body having a plurality of first apertures formed therethrough, and a bottom plate positioned on the seat, comprising a disk-shaped body having a plurality of second apertures formed therethrough which align with the first apertures, and a plurality of third apertures formed between the second apertures and through the bottom plate, the bottom plate sealingly coupled to the upper plate to fluidly isolate the plurality of first and second apertures from the plurality of third apertures.

    Abstract translation: 提供了用于气体分配组件的装置和方法。 一方面，提供了一种气体分配组件，包括环形体，该环形体包括具有内环形壁，外壁，上表面和底表面的环形环，形成在上表面中的上凹部，以及形成 位于所述内部环形壁中的位于所述上部凹部中的上板，包括具有穿过其形成的多个第一孔的盘状体和位于所述座上的底板，所述底板包括具有多个第二孔的盘状体 通过其形成的孔与第一孔对准，以及形成在第二孔之间并穿过底板的多个第三孔，底板密封地联接到上板，以将多个第一和第二孔与多个 第三孔。

    Variable seal pressure slit valve doors for semiconductor manufacturing equipment
    7.
    发明授权
    Variable seal pressure slit valve doors for semiconductor manufacturing equipment 有权
    用于半导体制造设备的可变密封压力狭缝阀门

    公开(公告)号：US07841582B2

    公开(公告)日：2010-11-30

    申请号：US10990125

    申请日：2004-11-16

    Applicant: Won B. Bang ,  Toan Q. Tran ,  Yen-Kun Victor Wang

    Inventor： Won B. Bang ,  Toan Q. Tran ,  Yen-Kun Victor Wang

    IPC: F16K25/00

    CPC classification number: H01L21/67126

    Abstract: Techniques for a door system for sealing an opening between two chambers in a semiconductor processing system are described. A sealing member seals the opening when a door is in a closed position. To selectively open and close the opening, an actuator moves the door. A valve actuator switch provides a first or second pressure to the actuator depending on the pressure inside a first chamber. In one embodiment, a sensor monitors the pressure inside the first chamber.

    Abstract translation: 描述了用于密封半导体处理系统中的两个室之间的开口的门系统的技术。 当门处于关闭位置时，密封构件密封开口。 为了选择性地打开和关闭开口，致动器移动门。 阀致动器开关根据第一室内的压力向致动器提供第一或第二压力。 在一个实施例中，传感器监测第一室内的压力。

    MANIFOLD ASSEMBLY
    8.
    发明申请
    MANIFOLD ASSEMBLY 审中-公开
    MANIFOLD装配

    公开(公告)号：US20090000550A1

    公开(公告)日：2009-01-01

    申请号：US11770737

    申请日：2007-06-29

    Applicant: Toan Q. Tran ,  Dimitry Lubormirsky ,  Lun Tsuei

    Inventor： Toan Q. Tran ,  Dimitry Lubormirsky ,  Lun Tsuei

    IPC: H01L21/02 ,  F16L25/00 ,  F17D1/02 ,  F28F1/00

    CPC classification number: F16L59/184 ,  Y10T137/87571 ,  Y10T137/9029

    Abstract: Embodiments of a manifold assembly are provided herein. In some embodiments, a manifold assembly includes a first manifold having a first inlet, for coupling to a high temperature fluid source, and a first outlet; a second manifold having a second inlet and a second outlet; and a connector portion coupling the first outlet of the first manifold to the second inlet of the second manifold, the connector portion includes a polymer block; and a thermal isolator disposed between the polymer block and the first manifold.

    Abstract translation: 本文提供了歧管组件的实施例。 在一些实施例中，歧管组件包括具有用于联接到高温流体源的第一入口和第一出口的第一歧管; 具有第二入口和第二出口的第二歧管; 以及将第一歧管的第一出口连接到第二歧管的第二入口的连接器部分，连接器部分包括聚合物块; 以及设置在聚合物块和第一歧管之间的热隔离器。

    SLIT VALVE
    9.
    发明申请
    SLIT VALVE 有权

    公开(公告)号：US20080296304A1

    公开(公告)日：2008-12-04

    申请号：US11756632

    申请日：2007-06-01

    Applicant: Toan Q. Tran ,  Dimitry Lubormirsky ,  Lun Tsuei ,  Won Bang

    Inventor： Toan Q. Tran ,  Dimitry Lubormirsky ,  Lun Tsuei ,  Won Bang

    IPC: B65D43/00

    CPC classification number: H01L21/67126

    Abstract: Embodiments of a valve assembly for a process chamber having improved seal performance are provided herein. In some embodiments, a valve assembly for a process chamber includes a housing having an opening disposed in a wall thereof and through which a substrate may be transferred; a door movably coupled to the housing in a plane substantially parallel to the wall of the housing for selectively sealing the opening; a compressible sealing member disposed at least partly between an upper surface of the door and a corresponding surface of the housing for forming a seal therebetween by compression of the compressible sealing member in a direction substantially perpendicular to the wall when the door is in a closed position; and a mechanism for restricting the exposure of the compressible sealing member to an environment on a process chamber side of the housing.

    Abstract translation: 本文提供了具有改进的密封性能的用于处理室的阀组件的实施例。 在一些实施例中，用于处理室的阀组件包括壳体，该壳体具有设置在其壁中的开口，并且基板可以通过该开口传送; 门，其基本上平行于壳体的壁可移动地联接到壳体，用于选择性地密封开口; 至少部分地设置在所述门的上表面和所述壳体的相应表面之间的可压缩的密封构件，用于通过当所述门处于关闭位置时在基本上垂直于所述壁的方向上压缩所述可压缩密封构件来形成密封件 ; 以及用于限制可压缩密封构件暴露于壳体的处理室侧的环境的机构。

    Slit valve
    10.
    发明授权
    Slit valve 有权
    狭缝阀

    公开(公告)号：US07806383B2

    公开(公告)日：2010-10-05

    申请号：US11756632

    申请日：2007-06-01

    Applicant: Toan Q. Tran ,  Dimitry Lubormirsky ,  Lun Tsuei ,  Won Bang

    Inventor： Toan Q. Tran ,  Dimitry Lubormirsky ,  Lun Tsuei ,  Won Bang

    IPC: F16K25/00

    CPC classification number: H01L21/67126

    Abstract: Embodiments of a valve assembly for a process chamber having improved seal performance are provided herein. In some embodiments, a valve assembly for a process chamber includes a housing having an opening disposed in a wall thereof and through which a substrate may be transferred; a door movably coupled to the housing in a plane substantially parallel to the wall of the housing for selectively sealing the opening; a compressible sealing member disposed at least partly between an upper surface of the door and a corresponding surface of the housing for forming a seal therebetween by compression of the compressible sealing member in a direction substantially perpendicular to the wall when the door is in a closed position; and a mechanism for restricting the exposure of the compressible sealing member to an environment on a process chamber side of the housing.

    Abstract translation: 本文提供了具有改进的密封性能的用于处理室的阀组件的实施例。 在一些实施例中，用于处理室的阀组件包括壳体，该壳体具有设置在其壁中的开口，并且基板可以通过该壳体被转移; 门，其基本上平行于壳体的壁可移动地联接到壳体，用于选择性地密封开口; 至少部分地设置在所述门的上表面和所述壳体的相应表面之间的可压缩密封构件，用于通过在所述门处于关闭位置时沿着基本上垂直于所述壁的方向压缩所述可压缩密封构件来形成密封 ; 以及用于限制可压缩密封构件暴露于壳体的处理室侧的环境的机构。

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