-
1.发明申请ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME AND PATTERN FORMING METHOD 有权化学敏感性或辐射敏感性树脂组合物，使用它们的抗静电膜和图案形成方法公开(公告)号：US20120003586A1
公开(公告)日：2012-01-05
申请号：US13257069
申请日：2010-03-23
申请人： Kana Fujii , Shuji Hirano , Shinki Yamada , Toru Fujimori
发明人： Kana Fujii , Shuji Hirano , Shinki Yamada , Toru Fujimori
CPC分类号： C08F212/14 , C08F8/12 , C08F220/20 , C08F2220/1825 , C08K5/375 , C08K5/41 , G03F7/0045 , G03F7/0046 , G03F7/0392 , C08F2220/281 , C08F220/30
摘要： Provided are an actinic ray-sensitive or radiation-sensitive resin composition; a resist film using the composition; and a pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing a repeating unit represented by formula (I), a repeating unit represented by formula (II) and a repeating unit represented by formula (III), and (B) a compound capable of generating a fluorine atom-containing acid upon irradiation with an actinic ray or radiation: wherein each of R1 and R11 independently represents a hydrogen atom or an alkyl group which may have a substituent, and R12 represents a phenyl group which may have a substituent.
摘要翻译： 提供光化射线敏感或辐射敏感性树脂组合物; 使用该组合物的抗蚀剂膜; 和图案形成方法。 光化射线敏感性或辐射敏感性树脂组合物包含（A）能够通过酸的作用增加在碱性显影剂中的溶解性的树脂，含有式（I）表示的重复单元的树脂，表示的重复单元 通过式（II）表示的重复单元和式（III）表示的重复单元，和（B）能够在用光化学射线或辐射照射时能够产生含氟原子的酸的化合物：其中R 1和R 11各自独立地表示氢 原子或可以具有取代基的烷基，R12表示可以具有取代基的苯基。
-
2.发明授权Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same 有权光敏性或辐射敏感性树脂组合物，以及使用其的抗蚀剂膜和图案形成方法公开(公告)号：US08795945B2
公开(公告)日：2014-08-05
申请号：US13521332
申请日：2011-03-04
申请人： Kana Fujii , Takamitsu Tomiga , Toru Fujimori
发明人： Kana Fujii , Takamitsu Tomiga , Toru Fujimori
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/16 , G03F7/2041
摘要： An actinic ray-sensitive or radiation-sensitive resin composition, and a resist film and a pattern forming method using the composition are provided, the composition including (A) a compound capable of decomposing by the action of an acid to increase the solubility of the resin (A) in an alkali developer; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a basic compound; and (D) a specific compound containing at least two specific alicyclic hydrocarbon groups each substituted with a hydroxyl group.
摘要翻译： 提供光化射线敏感性或辐射敏感性树脂组合物，以及使用该组合物的抗蚀剂膜和图案形成方法，该组合物包含（A）能够通过酸的作用分解以增加其溶解度的化合物 树脂（A）在碱性显影剂中; （B）能够在用光化射线或辐射照射时能产生酸的化合物; （C）碱性化合物; 和（D）含有至少两个各自被羟基取代的特定脂环族烃基的化合物。
-
3.发明授权Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same 有权光化射线敏感性或辐射敏感性树脂组合物和使用其的图案形成方法公开(公告)号：US08877423B2
公开(公告)日：2014-11-04
申请号：US13378387
申请日：2010-06-30
申请人： Kana Fujii , Toru Fujimori
发明人： Kana Fujii , Toru Fujimori
CPC分类号： G03F7/0048 , C08F8/02 , C08F12/22 , C08F12/24 , C08F12/32 , C08F212/14 , C09D125/14 , C09D125/18 , G03F7/0397 , C08F220/10 , C08F2220/1841
摘要： An actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin that contains a repeating unit represented by formula (I) as defined in the specification, a repeating unit represented by formula (II) as defined in the specification and a repeating unit represented by formula (III-a) or (III-b) as defined in the specification; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a solvent, wherein the solvent (C) contains ethyl lactate, and a film and a pattern forming method using the composition are provided.
摘要翻译： 一种光化射线敏感性或辐射敏感性树脂组合物，其包含：（A）含有本说明书中定义的式（I）表示的重复单元的树脂，由说明书中定义的式（II）表示的重复单元和 由本说明书中定义的式（III-a）或（III-b）表示的重复单元; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）溶剂，其中溶剂（C）含有乳酸乙酯，并且提供使用该组合物的膜和图案形成方法。
-
4.发明授权Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same 有权光化射线敏感或辐射敏感性树脂组合物，使用其组合物和图案形成方法形成的膜公开(公告)号：US08741542B2
公开(公告)日：2014-06-03
申请号：US13512633
申请日：2010-11-30
申请人： Tomotaka Tsuchimura , Takayuki Ito , Toru Fujimori , Kana Fujii
发明人： Tomotaka Tsuchimura , Takayuki Ito , Toru Fujimori , Kana Fujii
CPC分类号： G03F7/0045 , C09B69/101 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/091
摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a specific compound represented by a general formula, (B) a resin which is alkali-insoluble or sparingly alkali-soluble and becomes easily alkali-soluble in the presence of an acid, and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a film formed using the composition; and a pattern forming method using the same.
摘要翻译： 本发明提供一种光化射线敏感性或辐射敏感性树脂组合物，其包含（A）由通式表示的特定化合物，（B）在碱存在下碱不溶性或微溶碱性并易于碱溶解的树脂 的酸，和（C）能够在用光化射线或辐射照射时能够产生酸的化合物; 使用该组合物形成的膜; 以及使用该图案形成方法的图案形成方法。
-
5.发明授权Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same 有权光化学射线或辐射敏感性树脂组合物及其形成方法公开(公告)号：US08642245B2
公开(公告)日：2014-02-04
申请号：US13421684
申请日：2012-03-15
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0397 , G03F7/2041 , G03F7/30 , Y10S430/106 , Y10S430/111 , Y10S430/12
摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin that is decomposed when acted on by an acid to thereby increase its solubility in an alkali developer, a compound that generates an acid when exposed to actinic rays or radiation, and any of basic compounds of general formula (1) below.
摘要翻译： 根据一个实施方案，光化射线或辐射敏感性树脂组合物包括当被酸作用时分解的树脂，从而增加其在碱性显影剂中的溶解度，当暴露于光化射线时产生酸的化合物或 辐射和下述通式（1）的任何碱性化合物。
-
6.发明授权Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method 有权光化感光或辐射敏感性树脂组合物，抗蚀剂膜使用相同的图案形成方法公开(公告)号：US08541161B2
公开(公告)日：2013-09-24
申请号：US13257069
申请日：2010-03-23
申请人： Kana Fujii , Shuji Hirano , Shinki Yamada , Toru Fujimori
发明人： Kana Fujii , Shuji Hirano , Shinki Yamada , Toru Fujimori
CPC分类号： C08F212/14 , C08F8/12 , C08F220/20 , C08F2220/1825 , C08K5/375 , C08K5/41 , G03F7/0045 , G03F7/0046 , G03F7/0392 , C08F2220/281 , C08F220/30
摘要： Provided are an actinic ray-sensitive or radiation-sensitive resin composition; a resist film using the composition; and a pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing a repeating unit represented by formula (I), a repeating unit represented by formula (II) and a repeating unit represented by formula (III), and (B) a compound capable of generating a fluorine atom-containing acid upon irradiation with an actinic ray or radiation: wherein each of R1 and R11 independently represents a hydrogen atom or an alkyl group which may have a substituent, and R12 represents a phenyl group which may have a substituent.
摘要翻译： 提供光化射线敏感或辐射敏感性树脂组合物; 使用该组合物的抗蚀剂膜; 和图案形成方法。 光化射线敏感性或辐射敏感性树脂组合物包含（A）能够通过酸的作用增加在碱性显影剂中的溶解性的树脂，含有式（I）表示的重复单元的树脂，表示的重复单元 通过式（II）表示的重复单元和式（III）表示的重复单元，和（B）能够在用光化学射线或辐射照射时能够产生含氟原子的酸的化合物：其中R 1和R 11各自独立地表示氢 原子或可以具有取代基的烷基，R12表示可以具有取代基的苯基。
-
7.发明授权Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewith 有权光化射线敏感或辐射敏感性树脂组合物及其形成图案的方法公开(公告)号：US08349535B2
公开(公告)日：2013-01-08
申请号：US12895504
申请日：2010-09-30
申请人： Kana Fujii , Takamitsu Tomiga , Toru Tsuchihashi , Kazuyoshi Mizutani , Jiro Yokoyama , Shinichi Sugiyama , Shuji Hirano , Toru Fujimori
发明人： Kana Fujii , Takamitsu Tomiga , Toru Tsuchihashi , Kazuyoshi Mizutani , Jiro Yokoyama , Shinichi Sugiyama , Shuji Hirano , Toru Fujimori
CPC分类号： G03F7/0392 , C08F8/12 , C08F12/22 , C08F214/18 , C08F220/18 , C08F220/22 , C08F220/32 , C08F2220/282 , C08K5/375 , C08K5/42 , C08L33/068 , C08L51/04 , C08L67/02 , C09D125/14 , C09D125/18 , G03F7/0045 , G03F7/0046 , C08F212/14 , C08F2220/1825 , C08F2220/185 , C08F220/14
摘要： According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of R1 independently represents a hydrogen atom or an optionally substituted methyl group, R2 represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple R2s may be identical to or different from each other.
摘要翻译： 根据一个实施方案，光化射线敏感或辐射敏感性树脂组合物包含（A）含有式（I），（II）和（III）的重复单元的树脂，当被酸作用时，其变得可溶于 碱显影剂和（B）当用光化射线或辐射照射时产生含氟酸的化合物，其中R 1各自独立地表示氢原子或任选取代的甲基，R 2表示卤素原子，任选地 取代的烷基，任选取代的环烷基，任选取代的芳基或任选取代的芳烷基，n为0至5的整数，条件是当n为2或更大时，多个R 2可以相同或不同 彼此。
-
8.发明申请ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME 有权丙烯酸类敏感性或辐射敏感性树脂组合物，耐蚀膜和使用其的图案形成方法公开(公告)号：US20120301831A1
公开(公告)日：2012-11-29
申请号：US13521332
申请日：2011-03-04
申请人： Kana Fujii , Takamitsu Tomica , Toru Fujimori
发明人： Kana Fujii , Takamitsu Tomica , Toru Fujimori
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/16 , G03F7/2041
摘要： An actinic ray-sensitive or radiation-sensitive resin composition, and a resist film and a pattern forming method using the composition are provided, the composition including (A) a compound capable of decomposing by the action of an acid to increase the solubility of the resin (A) in an alkali developer; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a basic compound; and (D) a specific compound containing at least two specific alicyclic hydrocarbon groups each substituted with a hydroxyl group.
摘要翻译： 提供光化射线敏感性或辐射敏感性树脂组合物，以及使用该组合物的抗蚀剂膜和图案形成方法，该组合物包含（A）能够通过酸的作用分解以增加其溶解度的化合物 树脂（A）在碱性显影剂中; （B）能够在用光化射线或辐射照射时能产生酸的化合物; （C）碱性化合物; 和（D）含有至少两个各自被羟基取代的特定脂环族烃基的化合物。
-
9.发明申请ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, FILM FORMED USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权化学敏感性或辐射敏感性树脂组合物，使用组合物形成的膜和使用其的图案形成方法公开(公告)号：US20120244472A1
公开(公告)日：2012-09-27
申请号：US13512633
申请日：2010-11-30
申请人： Tomotaka Tsuchimura , Takayuki Ito , Toru Fujimori , Kana Fujii
发明人： Tomotaka Tsuchimura , Takayuki Ito , Toru Fujimori , Kana Fujii
CPC分类号： G03F7/0045 , C09B69/101 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/091
摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a specific compound represented by a general formula, (B) a resin which is alkali-insoluble or sparingly alkali-soluble and becomes easily alkali-soluble in the presence of an acid, and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a film formed using the composition; and a pattern forming method using the same.
摘要翻译： 本发明提供一种光化射线敏感性或辐射敏感性树脂组合物，其包含（A）由通式表示的特定化合物，（B）在碱存在下碱不溶性或微溶碱性并易于碱溶解的树脂 的酸，和（C）能够在用光化射线或辐射照射时能够产生酸的化合物; 使用该组合物形成的膜; 以及使用该图案形成方法的图案形成方法。
-
10.发明申请ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权化学敏感性或辐射敏感性树脂组合物和使用其的图案形成方法公开(公告)号：US20120094237A1
公开(公告)日：2012-04-19
申请号：US13378387
申请日：2010-06-30
申请人： Kana Fujii , Toru Fujimori
发明人： Kana Fujii , Toru Fujimori
CPC分类号： G03F7/0048 , C08F8/02 , C08F12/22 , C08F12/24 , C08F12/32 , C08F212/14 , C09D125/14 , C09D125/18 , G03F7/0397 , C08F220/10 , C08F2220/1841
摘要： An actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin that contains a repeating unit represented by formula (I) as defined in the specification, a repeating unit represented by formula (II) as defined in the specification and a repeating unit represented by formula (III-a) or (III-b) as defined in the specification; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a solvent, wherein the solvent (C) contains ethyl lactate, and a film and a pattern forming method using the composition are provided.
摘要翻译： 一种光化射线敏感性或辐射敏感性树脂组合物，其包含：（A）含有本说明书中定义的式（I）表示的重复单元的树脂，由说明书中定义的式（II）表示的重复单元和 由本说明书中定义的式（III-a）或（III-b）表示的重复单元; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）溶剂，其中溶剂（C）含有乳酸乙酯，并且提供使用该组合物的膜和图案形成方法。
-
-
-
-
-
-
-
-
-
搜索结果
22 条记录 (耗时 0.026 秒)
