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公开(公告)号：US07977028B2
公开(公告)日：2011-07-12
申请号：US11994300
申请日：2006-04-18
申请人： Tomoyuki Yuba , Yoji Fujita , Masao Tomikawa
发明人： Tomoyuki Yuba , Yoji Fujita , Masao Tomikawa
CPC分类号： G03F7/0751 , C08K5/0025 , C08K5/544 , G03F7/0045 , G03F7/0226 , G03F7/0755 , Y10S430/106 , Y10S430/111 , Y10S430/115 , Y10S430/117
摘要： The present invention provides a photosensitive resin composition comprising (a) an alkali-soluble resin, (b) a silicon compound having a secondary aromatic amino group and an alkoxy group, and (c) at least one selected from a photopolymerization initiator, a photo acid generator and a photo base generator. According to the present invention, it is possible to obtain a photosensitive resin composition which remarkably enhances the adhesion property with a substrate after curing without deteriorating storage stability of a solution, and does not cause peeling of a fine pattern even upon development.
摘要翻译： 本发明提供一种感光性树脂组合物，其含有（a）碱溶性树脂，（b）具有仲芳香族氨基和烷氧基的硅化合物，和（c）选自光聚合引发剂，照片 酸发生器和光源发生器。 根据本发明，可以获得在固化后显着提高与基材的粘合性的感光性树脂组合物，而不会降低溶液的储存稳定性，并且即使在显影时也不会造成精细图案的剥离。
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公开(公告)号：US20090123867A1
公开(公告)日：2009-05-14
申请号：US11994300
申请日：2006-04-18
申请人： Tomoyuki Yuba , Yoji Fujita , Masao Tomikawa
发明人： Tomoyuki Yuba , Yoji Fujita , Masao Tomikawa
CPC分类号： G03F7/0751 , C08K5/0025 , C08K5/544 , G03F7/0045 , G03F7/0226 , G03F7/0755 , Y10S430/106 , Y10S430/111 , Y10S430/115 , Y10S430/117
摘要： The present invention provides a photosensitive resin composition comprising (a) an alkali-soluble resin, (b) a silicon compound having a secondary aromatic amino group and an alkoxy group, and (c) at least one selected from a photopolymerization initiator, a photo acid generator and a photo base generator. According to the present invention, it is possible to obtain a photosensitive resin composition which remarkably enhances the adhesion property with a substrate after curing without deteriorating storage stability of a solution, and does not cause peeling of a fine pattern even upon development.
摘要翻译： 本发明提供一种感光性树脂组合物，其含有（a）碱溶性树脂，（b）具有仲芳香族氨基和烷氧基的硅化合物，和（c）选自光聚合引发剂，照片 酸发生器和光源发生器。 根据本发明，可以获得在固化后显着提高与基材的粘合性的感光性树脂组合物，而不会降低溶液的储存稳定性，并且即使在显影时也不会造成精细图案的剥离。
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公开(公告)号：US09188860B2
公开(公告)日：2015-11-17
申请号：US12676448
申请日：2008-09-04
申请人： Tomoyuki Yuba , Masao Tomikawa
发明人： Tomoyuki Yuba , Masao Tomikawa
IPC分类号： G03F7/004 , C08G69/04 , C08L77/00 , G03F7/023 , C08G69/00 , C08L77/10 , C08G77/00 , G03F7/037
CPC分类号： G03F7/0233 , C08G69/00 , C08G77/70 , C08L77/10 , G03F7/037
摘要： Disclosed is a method for producing polyamide, wherein a diimidazolide compound represented by the general formula (1) shown below is reacted with a diamine compound represented by the general formula (2) shown below. The present invention provides a method for producing a chlorine-free high molecular weight alkali-soluble polyamide by simple process.
摘要翻译： 公开了一种聚酰胺的制造方法，其中由下述通式（1）表示的二咪唑化合物与下述通式（2）表示的二胺化合物反应。 本发明提供一种通过简单的方法生产无氯高分子量碱溶性聚酰胺的方法。
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4.发明申请BINDER FOR LITHIUM ION BATTERY ELECTRODE, PASTE FOR LITHIUM ION BATTERY NEGATIVE ELECTRODE, AND METHOD FOR PRODUCING LITHIUM ION BATTERY NEGATIVE ELECTRODE 有权用于锂离子电池电极的粘合剂，用于锂离子电池负极的电极，以及用于生产锂离子电池负极的方法公开(公告)号：US20130260020A1
公开(公告)日：2013-10-03
申请号：US13990106
申请日：2011-11-28
申请人： Masao Tomikawa , Tomoyuki Yuba , Natsuko Chayama
发明人： Masao Tomikawa , Tomoyuki Yuba , Natsuko Chayama
IPC分类号： H01M4/62
CPC分类号： H01M4/622 , H01M4/134 , H01M4/1395 , H01M4/386 , H01M4/387 , H01M10/0525 , Y02T10/7011
摘要： The present invention is directed to a binder for a lithium ion battery electrode, comprising a polyimide precursor having a tetracarboxylic acid residue and a diamine residue and/or a polyimide, the polyimide precursor having a residue of a tetracarboxylic dianhydride selected from those represented by the following general formulas (1) and (2) as the tetracarboxylic acid residue, and a residue of a diamine selected from those represented by the following general formulas (3) and (4) as the diamine residue, the content of the acid residue being from 0.90 to 0.95 moles based on 1 mole of the diamine residue.
摘要翻译： 本发明涉及一种用于锂离子电池电极的粘合剂，其包含具有四羧酸残基的聚酰亚胺前体和二胺残基和/或聚酰亚胺，所述聚酰亚胺前体具有选自以下的代表的四羧酸二酐的残基： 作为四羧酸残基的通式（1）和（2），作为二胺残基的选自下述通式（3）和（4）所示的二胺的残基，酸残基的含量为 基于1摩尔二胺残基的0.90至0.95摩尔。
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公开(公告)号：US20100285404A1
公开(公告)日：2010-11-11
申请号：US12676448
申请日：2008-09-04
申请人： Tomoyuki Yuba , Masao Tomikawa
发明人： Tomoyuki Yuba , Masao Tomikawa
CPC分类号： G03F7/0233 , C08G69/00 , C08G77/70 , C08L77/10 , G03F7/037
摘要： Disclosed is a method for producing polyamide, wherein a diimidazolide compound represented by the general formula (1) shown below is reacted with a diamine compound represented by the general formula (2) shown below. The present invention provides a method for producing a chlorine-free high molecular weight alkali-soluble polyamide by simple process.
摘要翻译： 公开了一种聚酰胺的制造方法，其中由下述通式（1）表示的二咪唑化合物与下述通式（2）表示的二胺化合物反应。 本发明提供一种通过简单的方法生产无氯高分子量碱溶性聚酰胺的方法。
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公开(公告)号：US07455948B2
公开(公告)日：2008-11-25
申请号：US11274222
申请日：2005-11-16
CPC分类号： G03F7/0392 , G03F7/38
摘要： This invention relates to a positive photosensitive resin composition allowing development with an alkaline aqueous solution and excellent in resolution, photosensitivity and pattern form even if the film formed from the resin is thick.Furthermore, this invention relates to a photosensitive resin composition comprising (a) a polymer having one or more phenolic hydroxyl groups, (b) a compound having a phenolic hydroxyl group and containing only one group selected from a methylol group and alkoxymethyl group, and (c) a photo acid generator.
摘要翻译： 本发明涉及使用碱性水溶液显影的正型感光性树脂组合物，即使由树脂形成的膜较厚，分辨率，感光度和图案形式也优异。 此外，本发明涉及一种感光性树脂组合物，其包含（a）具有一个或多个酚羟基的聚合物，（b）具有酚羟基并且仅含有一个选自羟甲基和烷氧基甲基的基团的化合物和（ c）光酸产生剂。
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公开(公告)号：US09865879B2
公开(公告)日：2018-01-09
申请号：US13990106
申请日：2011-11-28
申请人： Masao Tomikawa , Tomoyuki Yuba , Natsuko Chayama
发明人： Masao Tomikawa , Tomoyuki Yuba , Natsuko Chayama
IPC分类号： H01M4/62 , H01M4/02 , H01M4/04 , H01M4/134 , H01M4/1395 , H01M4/38 , H01M10/0525
CPC分类号： H01M4/622 , H01M4/134 , H01M4/1395 , H01M4/386 , H01M4/387 , H01M10/0525 , Y02T10/7011
摘要： The present invention is directed to a binder for a lithium ion battery electrode, comprising a polyimide precursor having a tetracarboxylic acid residue and a diamine residue and/or a polyimide, the polyimide precursor having a residue of a tetracarboxylic dianhydride selected from those represented by the following general formulas (1) and (2) as the tetracarboxylic acid residue, and a residue of a diamine selected from those represented by the following general formulas (3) and (4) as the diamine residue, the content of the acid residue being from 0.90 to 0.95 moles based on 1 mole of the diamine residue.
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公开(公告)号：US20060110680A1
公开(公告)日：2006-05-25
申请号：US11274222
申请日：2005-11-16
IPC分类号： G03C1/76
CPC分类号： G03F7/0392 , G03F7/38
摘要： This invention relates to a positive photosensitive resin composition allowing development with an alkaline aqueous solution and excellent in resolution, photosensitivity and pattern form even if the film formed from the resin is thick. Furthermore, this invention relates to a photosensitive resin composition comprising (a) a polymer having one or more phenolic hydroxyl groups, (b) a compound having a phenolic hydroxyl group and containing only one group selected from a methylol group and alkoxymethyl group, and (c) a photo acid generator.
摘要翻译： 本发明涉及使用碱性水溶液显影的正型感光性树脂组合物，即使由树脂形成的膜较厚，分辨率，感光度和图案形式也优异。 此外，本发明涉及一种感光性树脂组合物，其包含（a）具有一个或多个酚羟基的聚合物，（b）具有酚羟基并且仅含有一个选自羟甲基和烷氧基甲基的基团的化合物和（ c）光酸产生剂。
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公开(公告)号：US07507518B2
公开(公告)日：2009-03-24
申请号：US10885100
申请日：2004-07-07
申请人： Yoji Fujita , Tomoyuki Yuba , Mitsuhito Suwa
发明人： Yoji Fujita , Tomoyuki Yuba , Mitsuhito Suwa
CPC分类号： G03F7/0233 , G03F7/0045 , G03F7/0751
摘要： The present invention relates to a positive photosensitive resin precursor composition which exhibits good storage stability after exposure.A photosensitive resin precursor composition comprises (a) a polymer essentially composed of a structural unit expressed by formula (1); (b) at least two photo acid generators; and (c) a compound having an alkoxymethyl group: wherein R1 represents an organic group with a valence of 2 to 8, having at least two carbon atoms; R2 represents an organic group with a valence of 2 to 6, having at least two carbon atoms; R3 represents hydrogen or an organic group having a carbon number in the range of 1 to 20; n represents a number ranging from 10 to 100,000; m represents an integer in the range of 0 to 2; and p and q represent integers in the range of 0 to 4 and satisfy p+q>0.
摘要翻译： 本发明涉及曝光后显示良好的储存稳定性的正型感光性树脂前体组合物。 光敏树脂前体组合物包含（a）基本上由式（1）表示的结构单元组成的聚合物; （b）至少两个光酸产生剂; 和（c）具有烷氧基甲基的化合物：其中R1表示具有至少两个碳原子的价数为2至8的有机基团; R2表示具有至少2个碳原子的2价至6价的有机基团; R3表示氢或碳数为1〜20的有机基团; n表示10〜100,000的数; m表示0〜2的整数， p和q表示0〜4的整数，满足p + q> 0。
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公开(公告)号：US20050014876A1
公开(公告)日：2005-01-20
申请号：US10885100
申请日：2004-07-07
申请人： Yoji Fujita , Tomoyuki Yuba , Mitsuhito Suwa
发明人： Yoji Fujita , Tomoyuki Yuba , Mitsuhito Suwa
CPC分类号： G03F7/0233 , G03F7/0045 , G03F7/0751
摘要： The present invention relates to a positive photosensitive resin precursor composition which exhibits good storage stability after exposure. A photosensitive resin precursor composition comprises (a) a polymer essentially composed of a structural unit expressed by formula (1); (b) at least two photo acid generators; and (c) a compound having an alkoxymethyl group: wherein R1 represents an organic group with a valence of 2 to 8, having at least two carbon atoms; R2 represents an organic group with a valence of 2 to 6, having at least two carbon atoms; R3 represents hydrogen or an organic group having a carbon number in the range of 1 to 20; n represents a number ranging from 10 to 100,000; m represents an integer in the range of 0 to 2; and p and q represent integers in the range of 0 to 4 and satisfy p+q>0.
摘要翻译： 本发明涉及曝光后显示良好的储存稳定性的正型感光性树脂前体组合物。 光敏树脂前体组合物包含（a）基本上由式（1）表示的结构单元组成的聚合物; （b）至少两个光酸产生剂; 和（c）具有烷氧基甲基的化合物：其中R 1表示具有至少两个碳原子的价数为2至8的有机基团; R 2表示具有至少两个碳原子的价数为2至6的有机基团; R 3表示氢或碳数为1〜20的有机基团; n表示10〜100,000的数; m表示0〜2的整数， p和q表示0〜4的整数，满足p + q> 0。
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