Wall-wash fixture for directional light sources
    1.
    发明授权
    Wall-wash fixture for directional light sources 有权
    定向光源洗墙灯

    公开(公告)号:US09234640B2

    公开(公告)日:2016-01-12

    申请号:US13599659

    申请日:2012-08-30

    CPC分类号: F21S8/026 F21V7/0033 F21V7/10

    摘要: A downlight reflector assembly for a light-emitting diode (LED) light source includes a kicker reflector and an upper scoop. The kicker reflector has a reflector wall extending between a small top opening and a large bottom opening along a transverse axis. The reflector wall has an internal surface with an illuminated area and a non-illuminated area. The upper scoop is mounted in the small top opening of the kicker reflector and has a reflective multi-faceted surface with a concave curvature relative to the LED light source. The upper scoop extends from the top opening in part along the transverse axis and covering a portion of the top opening. The multi-faceted surface faces both of the illuminated area of the kicker reflector and the top opening for reflecting light rays received through the top opening towards the illuminated area.

    摘要翻译: 用于发光二极管(LED)光源的筒灯反射器组件包括踢球反射器和上勺。 踢球反射器具有沿着横向轴线在小顶部开口和大的底部开口之间延伸的反射器壁。 反射器壁具有带有照明区域和非照明区域的内表面。 上勺安装在踢球反射器的小顶部开口中,并且具有相对于LED光源具有凹曲率的反射多面面。 上勺从顶部开口部分沿着横向轴线延伸并且覆盖顶部开口的一部分。 多面表面面对踢球反射器的照明区域和顶部开口,用于将通过顶部开口接收的光线反射到照明区域。

    Wall-Wash Fixture For Directional Light Sources
    2.
    发明申请
    Wall-Wash Fixture For Directional Light Sources 有权
    用于定向光源的洗墙灯

    公开(公告)号:US20140063812A1

    公开(公告)日:2014-03-06

    申请号:US13599659

    申请日:2012-08-30

    IPC分类号: F21V7/04

    CPC分类号: F21S8/026 F21V7/0033 F21V7/10

    摘要: A downlight reflector assembly for a light-emitting diode (LED) light source includes a kicker reflector and an upper scoop. The kicker reflector has a reflector wall extending between a small top opening and a large bottom opening along a transverse axis. The reflector wall has an internal surface with an illuminated area and a non-illuminated area. The upper scoop is mounted in the small top opening of the kicker reflector and has a reflective multi-faceted surface with a concave curvature relative to the LED light source. The upper scoop extends from the top opening in part along the transverse axis and covering a portion of the top opening. The multi-faceted surface faces both of the illuminated area of the kicker reflector and the top opening for reflecting light rays received through the top opening towards the illuminated area.

    摘要翻译: 用于发光二极管(LED)光源的筒灯反射器组件包括踢球反射器和上勺。 踢球反射器具有沿着横向轴线在小顶部开口和大的底部开口之间延伸的反射器壁。 反射器壁具有带有照明区域和非照明区域的内表面。 上勺安装在踢球反射器的小顶部开口中,并且具有相对于LED光源具有凹曲率的反射多面面。 上勺从顶部开口部分沿着横向轴线延伸并且覆盖顶部开口的一部分。 多面表面面对踢球反射器的照明区域和顶部开口,用于将通过顶部开口接收的光线反射到照明区域。

    THERMAL THERAPY SYSTEM AND METHOD OF USE
    3.
    发明申请
    THERMAL THERAPY SYSTEM AND METHOD OF USE 审中-公开
    热治疗系统及其使用方法

    公开(公告)号:US20130331914A1

    公开(公告)日:2013-12-12

    申请号:US13837958

    申请日:2013-03-15

    IPC分类号: A61F7/00

    摘要: A system that can be used to provide highly controlled thermal therapy and compression to both cool and heat a skin surface and a joint and surrounding tissue below the skin surface is provided. The system includes a joint conforming wrap; a power supply module for supply power to the joint conforming wrap and a cable operably coupling the wrap and the power supply module. The joint conforming wrap and power supply module include opposing thermoelectric modules. The joint conforming wrap is designed to provide heat transfer processes to the body of a patient to warm or cool the skin and a joint and surrounding tissue disposed under the skin.

    摘要翻译: 提供了可用于提供高度受控的热治疗和压缩以冷却和加热皮肤表面以及皮肤表面下方的关节和周围组织的系统。 该系统包括一个联合的包装; 电源模块,用于将电源供给到接合顺应的包裹件,以及电缆,其可操作地联接包裹件和电源模块。 联合贴合包装和电源模块包括相对的热电模块。 联合贴合包装被设计成为患者的身体提供热传递过程以加热或冷却皮肤,以及设置在皮肤下方的关节和周围组织。

    2D collimator and detector system employing a 2D collimator
    5.
    发明授权
    2D collimator and detector system employing a 2D collimator 有权
    2D准直仪和采用2D准直仪的检测器系统

    公开(公告)号:US07362849B2

    公开(公告)日:2008-04-22

    申请号:US11325023

    申请日:2006-01-04

    IPC分类号: G21K1/02

    摘要: A two dimensional (2D) collimator assembly and a detector system employing a 2D collimator assembly. More specifically, a collimator assembly is provided, having elements extending in the x and z-planes of a detector system. The 2D collimator assembly includes a number of blades arranged in parallel. Each of the blades includes fins extending from one or both sides of the body of the blade. The fins are coupled to each adjacent array to form the 2D collimator assembly.

    摘要翻译: 二维(2D)准直器组件和采用2D准直器组件的检测器系统。 更具体地,提供了准直器组件,其具有在检测器系统的x和z平面中延伸的元件。 2D准直器组件包括并联布置的多个叶片。 每个叶片包括从叶片的主体的一侧或两侧延伸的翅片。 翅片联接到每个相邻的阵列以形成2D准直器组件。

    Fabric with wave pattern
    6.
    外观设计
    Fabric with wave pattern 有权
    织物与波纹

    公开(公告)号:USD551457S1

    公开(公告)日:2007-09-25

    申请号:US29245517

    申请日:2005-12-23

    申请人: Martin Lee

    设计人: Martin Lee

    摘要: D 6608

    Low spring constant, pneumatic suspension with vacuum chamber, air bearing, active force compensation, and sectioned vacuum chambers
    7.
    发明申请
    Low spring constant, pneumatic suspension with vacuum chamber, air bearing, active force compensation, and sectioned vacuum chambers 审中-公开
    低弹簧常数,带真空室的气动悬架,空气轴承,主动力补偿和分段真空室

    公开(公告)号:US20070030462A1

    公开(公告)日:2007-02-08

    申请号:US11197576

    申请日:2005-08-03

    IPC分类号: F16M1/00 G03B27/00

    CPC分类号: G02B7/005

    摘要: Embodiments of the present invention are directed to an apparatus for providing a low spring constant, pneumatic suspension using vacuum for the lens in a projection system. In one embodiment, a pneumatic suspension system for a load comprises a frame; and a body movably disposed in the frame and spaced from a side wall of the frame by a gap to define a chamber in the frame above the body, the body being configured to be connected to the load. The frame includes an outlet to draw a gas from the chamber to lower the pressure in the chamber with respect to an ambient pressure outside the frame. An air bearing is formed in the gap between the body and the side wall of the frame to provide non-contact between the body and the frame. The pressure in the chamber is sufficiently lower than the ambient pressure to produce a lift force to lift the body and the load connected thereto with respect to the frame.

    摘要翻译: 本发明的实施例涉及一种用于在投影系统中为透镜提供使用真空的低弹簧常数气动悬架的装置。 在一个实施例中,用于负载的气动悬挂系统包括框架; 以及主体,其可移动地设置在所述框架中并且通过间隙与所述框架的侧壁间隔开以在所述主体中的所述框架中限定室,所述主体被配置为连接到所述负载。 该框架包括从腔室抽出气体的出口,以相对于框架外部的环境压力降低腔室中的压力。 空气轴承形成在主体和框架的侧壁之间的间隙中,以在主体和框架之间提供非接触。 室内的压力足够低于环境压力,以产生升高力以提升主体和相对于框架连接到其上的负载。

    Apparatus for processing a fluid sample
    8.
    发明申请
    Apparatus for processing a fluid sample 审中-公开
    用于处理流体样品的装置

    公开(公告)号:US20060011539A1

    公开(公告)日:2006-01-19

    申请号:US10536574

    申请日:2003-11-28

    IPC分类号: C02F3/00

    摘要: This invention relates to an apparatus for an apparatus for processing a fluid sample comprising: (i) a sample processing chamber comprising a fluid inlet and a fluid outlet; (ii) a waste chamber downstream from the sample processing chamber and in fluid communication with the sample processing chamber fluid outlet and wherein the fluid communication between the sample processing chamber outlet and the waste chamber comprises a divergent analyte flow path; (iii) at least two further chambers up stream from the sample processing chamber both of which are in fluid communication with the sample processing chamber fluid inlet; (iv) a means for moving fluid from each of the at least two further chambers through the sample processing chamber and into the waste chamber or into the divergent analyte flow path as desired by applying positive or negative pressure to the desired flow path; and (v) a passive means for restricting the flow of fluid. This invention also relates to a method and use of the same.

    摘要翻译: 本发明涉及一种用于处理流体样品的设备的装置,包括:(i)样品处理室,其包括流体入口和流体出口; (ii)在样品处理室下游并与样品处理室流体出口流体连通的废物室,并且其中样品处理室出口和废物室之间的流体连通包括发散的分析物流动路径; (iii)从样品处理室向上游的至少两个另外的室,二者都与样品处理室流体入口流体连通; (iv)用于通过向期望的流动路径施加正压或负压将流体从所述至少两个另外的室中的每一个移动通过样品处理室并进入废物室或发散分析物流动路径的装置, 和(v)用于限制流体流动的被动装置。 本发明还涉及其方法和用途。

    Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
    9.
    发明申请
    Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device 失效
    具有动态隔离框架的定位装置以及设置有这种定位装置的光刻设备

    公开(公告)号:US20050002009A1

    公开(公告)日:2005-01-06

    申请号:US10840373

    申请日:2004-05-07

    申请人: Martin Lee

    发明人: Martin Lee

    IPC分类号: G03F7/20 H01L21/68 G03B27/58

    摘要: A lithographic device and an exposure method utilize mask and substrate tables, and a projection system. A mask having a mask pattern is provided on the mask table. A substrate having a radiation-sensitive layer is provided on the substrate table. The mask is irradiated to project an image of at least a portion of the mask pattern onto the radiation-sensitive layer of the substrate using the projection system. Before or during the projecting, at least one of the mask and substrate tables is positioned using a drive unit that includes a stationary part coupled to a reaction frame of the lithographic device. A position of at least one of the mask and substrate tables is measured using a measuring system having a plurality of measurement sensors that have a stationary part and a movable part. The movable part of one of the sensors is coupled to the one of the mask table and the substrate table whose position is measured, and the stationary parts of the sensors are coupled to a support frame mechanically isolated from the reaction frame.

    摘要翻译: 光刻设备和曝光方法利用掩模和基板台,以及投影系统。 具有掩模图案的掩模设置在掩模台上。 具有辐射敏感层的基板设置在基板台上。 照射掩模以使用投影系统将至少一部分掩模图案的图像投影到基板的辐射敏感层上。 在投影之前或期间,使用包括耦合到光刻设备的反应框架的固定部分的驱动单元来定位掩模和基板台中的至少一个。 使用具有多个测量传感器的测量系统来测量掩模和衬底台中的至少一个的位置,该测量系统具有静止部分和可移动部分。 传感器之一的可移动部分耦合到掩模台和测量位置的基板台之一,并且传感器的固定部分联接到与反应框架机械隔离的支撑框架上。