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    Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
    3.
    发明授权
    Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition 有权
    光化学射线或辐射敏感性树脂组合物和使用该组合物形成图案的方法

    公开(公告)号：US09052590B2

    公开(公告)日：2015-06-09

    申请号：US13393173

    申请日：2010-08-31

    申请人： Hidenori Takahashi ,  Shuji Hirano ,  Takayuki Ito ,  Hideaki Tsubaki

    发明人： Hidenori Takahashi ,  Shuji Hirano ,  Takayuki Ito ,  Hideaki Tsubaki

    IPC分类号： G03F7/004 ,  G03F7/00 ,  G03F7/20 ,  G03F7/039

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20

    摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing not only at least one repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and is expressed by any of general formulae (I) to (III) below but also a repeating unit (B) containing at least an aromatic ring group provided that the repeating unit (B) does not include any of those of general formulae (I) to (III). (The characters used in general formulae (I) to (III) have the meanings mentioned in the description.)

    摘要翻译： 根据一个实施方案，光化射线或辐射敏感性树脂组合物包括不仅含有至少一个重复单元（A）的树脂（P），当暴露于光化射线或辐射时，其被分解，从而产生酸， 由下述通式（I）〜（III）中的任何一个表示，但也包含至少含有芳环基的重复单元（B），条件是重复单元（B）不包括通式（I） 至（III）。 （通式（I）〜（III）中使用的字符具有说明书中提及的含义。）

    ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION
    4.
    发明申请
    ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION 有权
    丙酰胺或辐射敏感性树脂组合物和使用组合物形成图案的方法

    公开(公告)号：US20120156618A1

    公开(公告)日：2012-06-21

    申请号：US13393173

    申请日：2010-08-31

    申请人： Hidenori Takahashi ,  Shuji Hirano ,  Takayuki Ito ,  Hideaki Tsubaki

    发明人： Hidenori Takahashi ,  Shuji Hirano ,  Takayuki Ito ,  Hideaki Tsubaki

    IPC分类号： G03F7/20 ,  G03F7/004 ,  C08F214/18

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20

    摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing not only at least one repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and is expressed by any of general formulae (I) to (III) below but also a repeating unit (B) containing at least an aromatic ring group provided that the repeating unit (B) does not include any of those of general formulae (I) to (III). (The characters used in general formulae (I) to (III) have the meanings mentioned in the description.)

    摘要翻译： 根据一个实施方案，光化射线或辐射敏感性树脂组合物包括不仅含有至少一个重复单元（A）的树脂（P），当暴露于光化射线或辐射时，其被分解，从而产生酸， 由下述通式（I）〜（III）中的任何一个表示，但也包含至少含有芳环基的重复单元（B），条件是重复单元（B）不包括通式（I） 至（III）。 （通式（I）〜（III）中使用的字符具有说明书中提及的含义。）

    ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION
    5.
    发明申请
    ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION 有权
    丙酰胺或辐射敏感性树脂组合物和使用组合物形成图案的方法

    公开(公告)号：US20110183263A1

    公开(公告)日：2011-07-28

    申请号：US13015169

    申请日：2011-01-27

    申请人： Hidenori TAKAHASHI ,  Shuji Hirano ,  Hideaki Tsubaki

    发明人： Hidenori TAKAHASHI ,  Shuji Hirano ,  Hideaki Tsubaki

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing a repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and at least two types of repeating units (B1), (B2) that when acted on by an acid, are decomposed to thereby generate an alkali-soluble group, wherein the alkali-soluble group generated by the repeating unit (B1) is different from the alkali-soluble group generated by the repeating unit (B2).

    摘要翻译： 根据一个实施方案，光化射线或辐射敏感性树脂组合物包括含有重复单元（A）的树脂（P），其在暴露于光化射线或辐射时被分解，从而产生酸和至少两种类型 通过酸作用的重复单元（B1），（B2）分解，从而产生碱溶性基团，其中由重复单元（B1）产生的碱溶性基团不同于碱溶性 基团由重复单元（B2）生成。

    Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
    6.
    发明授权
    Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition 有权
    光化学射线或辐射敏感性树脂组合物和使用该组合物形成图案的方法

    公开(公告)号：US09005870B2

    公开(公告)日：2015-04-14

    申请号：US13015169

    申请日：2011-01-27

    申请人： Hidenori Takahashi ,  Shuji Hirano ,  Hideaki Tsubaki

    发明人： Hidenori Takahashi ,  Shuji Hirano ,  Hideaki Tsubaki

    IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/20

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing a repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and at least two types of repeating units B1), (B2) that when acted on by an acid, are decomposed to thereby generate an alkali-soluble group, wherein the alkali-soluble group generated by the repeating unit (B1) is different from the alkali-soluble group generated by the repeating unit (B2).

    摘要翻译： 根据一个实施方案，光化射线或辐射敏感性树脂组合物包括含有重复单元（A）的树脂（P），其在暴露于光化射线或辐射时被分解，从而产生酸和至少两种类型 重复单元B1），（B2），当被酸作用时分解，从而产生碱溶性基团，其中由重复单元（B1）产生的碱溶性基团不同于碱溶性基团 由重复单元（B2）生成。

    Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern
    8.
    发明授权
    Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern 有权
    光化学射线或辐射敏感性树脂组合物，其光化学射线或辐射敏感膜及其形成图案的方法

    公开(公告)号：US08865389B2

    公开(公告)日：2014-10-21

    申请号：US13246618

    申请日：2011-09-27

    申请人： Shuji Hirano ,  Hidenori Takahashi ,  Hideaki Tsubaki

    发明人： Shuji Hirano ,  Hidenori Takahashi ,  Hideaki Tsubaki

    IPC分类号： G03F7/00 ,  G03F7/004

    CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0397

    摘要： Provided is an actinic-ray- or radiation-sensitive resin composition, including a resin comprising a repeating unit (A), the a repeating unit (A) containing a structural moiety (S1) that when acted on by an acid, is decomposed to thereby generate an alkali-soluble group and a structural moiety (S2) that when acted on by an alkali developer, is decomposed to thereby increase its rate of dissolution in the alkali developer, and a repeating unit (B) that when exposed to actinic rays or radiation, generates an acid.

    摘要翻译： 本发明提供一种光化学射线或辐射敏感性树脂组合物，其包含含有重复单元（A）的树脂，含有结构部分（S1）的重复单元（A），其在被酸作用时分解成 从而产生碱溶性基团和结构部分（S2），当被碱显影剂作用时，其分解，从而增加其在碱性显影剂中的溶解速率，以及当暴露于光化射线时的重复单元（B） 或辐射，产生酸。

    Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device
    10.
    发明授权
    Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device 有权
    图案形成方法，电子束敏感或极紫外敏感组合物，抗蚀膜，电子器件的制造方法和电子器件

    公开(公告)号：US08822129B2

    公开(公告)日：2014-09-02

    申请号：US13613437

    申请日：2012-09-13

    申请人： Kaoru Iwato ,  Hideaki Tsubaki ,  Shuji Hirano

    发明人： Kaoru Iwato ,  Hideaki Tsubaki ,  Shuji Hirano

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/11 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/2059 ,  G03F7/325 ,  G03F7/40

    摘要： There is provided a pattern forming method comprising (1) a step of forming a film by using an electron beam-sensitive or extreme ultraviolet-sensitive resin composition containing (A) a resin that contains a repeating unit having a partial structure represented by the specific formula and can decrease the solubility for a developer containing an organic solvent by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an electron beam or an extreme ultraviolet ray, (2) a step of exposing the film by using an electron beam or an extreme ultraviolet ray, and (4) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.

    摘要翻译： 提供一种图案形成方法，其包括（1）通过使用电子束敏感或极紫外线敏感性树脂组合物形成膜的步骤，所述树脂组合物含有（A）含有具有由具体的 并且可以通过酸的作用降低含有有机溶剂的显影剂的溶解度，和（B）在用电子束或极紫外线照射时能够产生酸的化合物，（2）曝光步骤 通过使用电子束或极紫外线的膜，以及（4）通过使用含有机溶剂的显影剂显影曝光的膜以形成负图案的步骤。