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    MASTER MOLD MANUFACTURING METHOD AND MOLD STRUCTURE MANUFACTURING METHOD
    1.
    发明申请
    MASTER MOLD MANUFACTURING METHOD AND MOLD STRUCTURE MANUFACTURING METHOD 审中-公开
    主模制造方法和模具结构制造方法

    公开(公告)号：US20110226625A1

    公开(公告)日：2011-09-22

    申请号：US13051621

    申请日：2011-03-18

    申请人： Katsuhiro NISHIMAKI

    发明人： Katsuhiro NISHIMAKI

    IPC分类号： C25D1/10 ,  C23F1/00

    CPC分类号： G11B5/865 ,  B82Y10/00 ,  B82Y40/00 ,  C25D1/10 ,  G03F7/0002 ,  G03F7/0017 ,  G11B5/855

    摘要： Disclosed is a method of manufacturing a master mold having an uneven pattern which includes wide and narrow concave portions using a reactive ion etching process. The method is capable of manufacturing a master mold improved in the uniformity of concave portions of the uneven pattern by performing a main etching step in which etching is performed, using an original plate which includes a processing target layer and a foundation layer, on the processing target layer using the foundation layer as an etch stop layer and an extra etching step in which etching is performed on the original plate degraded by the main etching step in the uniformity of concave portions in order to improve the uniformity using an etching gas which includes a first gas capable of etching the foundation layer and producing a deposit with a bias power of not greater than 15 W.

    摘要翻译： 公开了使用反应离子蚀刻工艺制造具有凹凸图案的主模具的方法，其包括宽而窄的凹部。 该方法能够通过进行蚀刻的主蚀刻步骤，使用包括处理对象层和基底层的原版进行处理，制造提高了凹凸图案的凹部均匀性的母模 使用基础层作为蚀刻停止层的目标层和额外的蚀刻步骤，其中对通过主蚀刻步骤退化的原始平板进行蚀刻以使凹部的均匀性为了提高使用包括 能够蚀刻基础层并产生具有不大于15W的偏压功率的沉积物的第一气体。

    MAGNETIC TRANSFER MASTER DISK AND METHOD FOR MANUFACTURING THE SAME
    3.
    发明申请
    MAGNETIC TRANSFER MASTER DISK AND METHOD FOR MANUFACTURING THE SAME 失效
    磁性传输主磁盘及其制造方法

    公开(公告)号：US20090141382A1

    公开(公告)日：2009-06-04

    申请号：US12274444

    申请日：2008-11-20

    申请人： Takeo KIDO ,  Katsuhiro Nishimaki

    发明人： Takeo KIDO ,  Katsuhiro Nishimaki

    IPC分类号： G11B5/86 ,  C25D1/00

    CPC分类号： G11B5/82 ,  B82Y10/00 ,  C23C28/023 ,  C25D1/10 ,  C25D1/20 ,  C25D5/02 ,  G11B5/743 ,  G11B5/855 ,  G11B5/865

    摘要： A magnetic transfer master disk including a magnetic layer and exhibiting excellent shape stability of a protrusion/recess pattern is provided. An initial layer formed of a conductive film is formed on a surface of a master on which a pattern of minute protrusions/recesses is formed, and then a magnetic layer (principal layer) is formed on the initial layer, and then, a metal layer is formed by means of electroforming. A duplicate in which the initial layer, the magnetic layer and the metal layer have been integrated is peeled off from the master, thereby obtaining a magnetic transfer master disk, which is a duplicate in which the magnetic layer and the initial layer are deposited on the protruded/recessed surface of the metal layer.

    摘要翻译： 提供了包括磁性层并且具有优异的突出/凹陷图案形状稳定性的磁转移母盘。 在形成有微细突起/凹部的图案的母版的表面上形成由导电膜形成的初始层，然后在初始层上形成磁性层（主层），然后，在金属层 通过电铸形成。 将初始层，磁性层和金属层整合在一起的副本从母版剥离，从而获得磁性传输母盘，其中磁性层和初始层沉积在其上 金属层的突出/凹陷表面。

    Etch amount detection method, etching method, and etching system
    4.
    发明授权
    Etch amount detection method, etching method, and etching system 有权
    蚀刻量检测方法，蚀刻方法和蚀刻系统

    公开(公告)号：US07481944B2

    公开(公告)日：2009-01-27

    申请号：US10860012

    申请日：2004-06-04

    申请人： Syuji Nozawa ,  Katsuhiro Nishimaki

    发明人： Syuji Nozawa ,  Katsuhiro Nishimaki

    IPC分类号： G01L21/30 ,  G01B9/02

    CPC分类号： H01J37/32935 ,  G01B11/0675 ,  H01J37/32972 ,  H01L21/32137

    摘要： This invention accurately detects an etch amount of an etching target layer irrespective of a type of a mask layer. A light La is reflected by an upper surface of a photoresist mask layer 316 and a bottom of a hole H. Thereby a reflected light La1 and a reflected light La2 are obtained. The reflected lights La1 and La2 interfere with each other, thereby generating an interference light Lai. A light Lb is reflected by an interface between the photoresist mask layer 316 and a polysilicon film 304, and the upper surface of the photoresist mask layer 316. Thereby a reflected light Lb1 and a reflected light Lb2 are obtained. The reflected lights Lb1 and Lb2 interfere with each other, thereby generating an interference light Lb1. Using the interference lights Lai and Lbi, an etch amount of the polysilicon film 304 is calculated.

    摘要翻译： 本发明可以精确地检测蚀刻目标层的蚀刻量，而与掩模层的类型无关。 光La被光致抗蚀剂掩模层316的上表面和孔H的底部反射。从而获得反射光La1和反射光La2。 反射光La1和La2彼此干涉，从而产生干涉光Lai。 光Lb被光致抗蚀剂掩模层316和多晶硅膜304之间的界面以及光致抗蚀剂掩模层316的上表面反射。从而获得反射光Lb1和反射光Lb2。 反射光Lb1和Lb2彼此干涉，从而产生干涉光Lb1。 使用干涉光Lai和Lbi，计算多晶硅膜304的蚀刻量。

    METHOD FOR PRODUCING ORIGINAL MASTER USED TO PRODUCE MOLD STRUCTURE, ORIGINAL MASTER AND METHOD FOR PRODUCING MOLD STRUCTURE
    5.
    发明申请
    METHOD FOR PRODUCING ORIGINAL MASTER USED TO PRODUCE MOLD STRUCTURE, ORIGINAL MASTER AND METHOD FOR PRODUCING MOLD STRUCTURE 审中-公开
    用于生产用于生产模具结构的原始主体的方法，原始主体和用于生产模具结构的方法

    公开(公告)号：US20100003473A1

    公开(公告)日：2010-01-07

    申请号：US12497100

    申请日：2009-07-02

    申请人： Katsuhiro NISHIMAKI

    发明人： Katsuhiro NISHIMAKI

    IPC分类号： B32B5/00 ,  G03F7/20

    CPC分类号： G03F7/0017 ,  G11B7/261 ,  Y10T428/24802

    摘要： A method for producing an original master used to produce a mold structure, the method including: forming a resist layer on a surface of an original master substrate, and exposing and developing the resist layer so as to form on the surface of the substrate an original master resist pattern substantially in the shape of concentric arcs utilized to form an original master concavo-convex pattern; selectively etching the resist pattern, under one of a condition that the resist pattern on an inner circumferential side is etched to a greater extent than the resist pattern on an outer circumferential side and a condition that the resist pattern on the outer circumferential side is etched to a greater extent than the resist pattern on the inner circumferential side; and etching the substrate with the selectively etched resist pattern serving as a mask so as to form the original master concavo-convex pattern.

    摘要翻译： 一种用于生产模具结构的原始母模的制造方法，该方法包括：在原始母基板的表面上形成抗蚀剂层，并且使抗蚀剂层曝光和显影，以在基板的表面上形成原件 主抗蚀剂图案基本上为同心圆弧形状，用于形成原始的主凹凸图案; 在蚀刻内周侧的抗蚀剂图案比外周侧的抗蚀剂图案更大程度蚀刻的条件和外周侧的抗蚀剂图案被蚀刻的条件之一下，选择性地蚀刻抗蚀剂图案 比内周侧的抗蚀剂图案大的程度; 并用选择性蚀刻的抗蚀剂图案作为掩模蚀刻基板，以便形成原始的主凹凸图案。

    Etch amount detection method, etching method, and etching system
    6.
    发明申请
    Etch amount detection method, etching method, and etching system 审中-公开
    蚀刻量检测方法，蚀刻方法和蚀刻系统

    公开(公告)号：US20090095421A1

    公开(公告)日：2009-04-16

    申请号：US12314083

    申请日：2008-12-03

    申请人： Syuji Nozawa ,  Katsuhiro Nishimaki

    发明人： Syuji Nozawa ,  Katsuhiro Nishimaki

    IPC分类号： C23F1/08

    CPC分类号： H01J37/32935 ,  G01B11/0675 ,  H01J37/32972 ,  H01L21/32137

    摘要： This invention accurately detects an etch amount of an etching target layer irrespective of a type of a mask layer. A light La is reflected by an upper surface of a photoresist mask layer 316 and a bottom of a hole H. Thereby a reflected light La1 and a reflected light La2 are obtained. The reflected lights La1 and La2 interfere with each other, thereby generating an interference light Lai. A light Lb is reflected by an interface between the photoresist mask layer 316 and a polysilicon film 304, and the upper surface of the photoresist mask layer 316. Thereby a reflected light Lb1 and a reflected light Lb2 are obtained. The reflected lights Lb1 and Lb2 interfere with each other, thereby generating an interference light Lbi. Using the interference lights Lai and Lbi, an etch amount of the polysilicon film 304 is calculated.

    摘要翻译： 本发明可以精确地检测蚀刻目标层的蚀刻量，而与掩模层的类型无关。 光La被光致抗蚀剂掩模层316的上表面和孔H的底部反射。从而获得反射光La1和反射光La2。 反射光La1和La2彼此干涉，从而产生干涉光Lai。 光Lb被光致抗蚀剂掩模层316和多晶硅膜304之间的界面以及光致抗蚀剂掩模层316的上表面反射。从而获得反射光Lb1和反射光Lb2。 反射光Lb1和Lb2彼此干涉，从而产生干涉光Lbi。 使用干涉光Lai和Lbi，计算多晶硅膜304的蚀刻量。

    Etch amount detection method, etching method, and etching system
    7.
    发明申请
    Etch amount detection method, etching method, and etching system 有权
    蚀刻量检测方法，蚀刻方法和蚀刻系统

    公开(公告)号：US20050029228A1

    公开(公告)日：2005-02-10

    申请号：US10860012

    申请日：2004-06-04

    申请人： Syuji Nozawa ,  Katsuhiro Nishimaki

    发明人： Syuji Nozawa ,  Katsuhiro Nishimaki

    IPC分类号： H01L21/3065 ,  C23F1/00 ,  G01B11/06 ,  H01J37/32 ,  H01L21/3213 ,  H01L21/66

    CPC分类号： H01J37/32935 ,  G01B11/0675 ,  H01J37/32972 ,  H01L21/32137

    摘要： This invention accurately detects an etch amount of an etching target layer irrespective of a type of a mask layer. A light La is reflected by an upper surface of a photoresist mask layer 316 and a bottom of a hole H. Thereby a reflected light La1 and a reflected light La2 are obtained. The reflected lights La1 and La2 interfere with each other, thereby generating an interference light Lai. A light Lb is reflected by an interface between the photoresist mask layer 316 and a polysilicon film 304, and the upper surface of the photoresist mask layer 316. Thereby a reflected light Lb1 and a reflected light Lb2 are obtained. The reflected lights Lb1 and Lb2 interfere with each other, thereby generating an interference light Lb1. Using the interference lights Lai and Lbi, an etch amount of the polysilicon film 304 is calculated.

    摘要翻译： 本发明可以精确地检测蚀刻目标层的蚀刻量，而与掩模层的类型无关。 光La被光致抗蚀剂掩模层316的上表面和孔H的底部反射。从而获得反射光La1和反射光La2。 反射光La1和La2彼此干涉，从而产生干涉光Lai。 光Lb被光致抗蚀剂掩模层316和多晶硅膜304之间的界面以及光致抗蚀剂掩模层316的上表面反射。从而获得反射光Lb1和反射光Lb2。 反射光Lb1和Lb2彼此干涉，从而产生干涉光Lb1。 使用干涉光Lai和Lbi，计算多晶硅膜304的蚀刻量。

    Magnetic transfer master disk and method for manufacturing the same
    9.
    发明授权
    Magnetic transfer master disk and method for manufacturing the same 失效
    磁性传输母盘及其制造方法

    公开(公告)号：US07972490B2

    公开(公告)日：2011-07-05

    申请号：US12274444

    申请日：2008-11-20

    申请人： Takeo Kido ,  Katsuhiro Nishimaki

    发明人： Takeo Kido ,  Katsuhiro Nishimaki

    IPC分类号： C25D1/10

    CPC分类号： G11B5/82 ,  B82Y10/00 ,  C23C28/023 ,  C25D1/10 ,  C25D1/20 ,  C25D5/02 ,  G11B5/743 ,  G11B5/855 ,  G11B5/865

    摘要： A magnetic transfer master disk including a magnetic layer and exhibiting excellent shape stability of a protrusion/recess pattern is provided. An initial layer formed of a conductive film is formed on a surface of a master on which a pattern of minute protrusions/recesses is formed, and then a magnetic layer (principal layer) is formed on the initial layer, and then, a metal layer is formed by electroforming. A duplicate in which the initial layer, the magnetic layer and the metal layer have been integrated is peeled off from the master, thereby obtaining a magnetic transfer master disk, which is a duplicate in which the magnetic layer and the initial layer are deposited on the protruded/recessed surface of the metal layer.

    摘要翻译： 提供了包括磁性层并且具有优异的突出/凹陷图案形状稳定性的磁转移母盘。 在形成有微细突起/凹部的图案的母版的表面上形成由导电膜形成的初始层，然后在初始层上形成磁性层（主层），然后，在金属层 由电铸形成。 将初始层，磁性层和金属层整合在一起的副本从母版剥离，从而获得磁性传输母盘，其中磁性层和初始层沉积在其上 金属层的突出/凹陷表面。