摘要:
A chemical amplification resist composition that is used for preparation of a mold, and a mold preparation method and a resist film each using the composition are provided.
摘要:
In a method for sealing an insulating material for construction applications, the insulating material is sealed with a material sheet including an ionomer so as to provide a vapor retarder for the insulating material.
摘要:
A METHOD FOR MAKING HEAT-STABLE COPOLYMERS OF METHACRYLONITRILE AND METHACRYLIC ACID OPTIONALLY CONTAINING LESSER AMOUNTS OF OTHER COPOLYMERIZABLE OLEFINICALLY UNSATURATED COMONOMERS, PRINCIPALLY STYRENE OR A LOWER ACRYLATE, BY COPOLYMERIZING THE MONOMERS AND HEATING THE RESULTANT COPOLYMER AT 150*-250*C. IN THE PRESENCE OF A METAL SALT ADDITIVE TO IMPROVE OPTICAL CLARITY OF THE COPOLYMERS, SAID SALT BEING A SALT OF A POLYVALENT METAL AND AN UNSATURATED COPOLYMERIZABLE MONOCARBOXYLIC OR DICARBOXYLIC ACID.
摘要:
A terpolymer comprises, per 100 parts by weight, 5 to 85 parts by weight of units derived from 2,3-dichlorobutadiene-1,3, 10 to 60 parts by weight of units derived from an a -haloacrylonitrile, and from 5 to 35 parts by weight of units derived from at least one monofunctional ethylenically unsaturated compound. Monofunctional is defined as giving rise to a predominately linear homopolymer. Exemplified monomers are styrene, acrylonitrile, methacrylic acid, and chloroprene, and in Example III a mixture of a -chloro- and a -bromoacrylonitrile, which are also used as the a -haloacrylonitrile. The monomers are polymerized by conventional aqueous emulsion, suspension, or organic solution methods. The polymers, when mixed with a film-forming polymer-particularly chlorinated rubber, and applied to metal sheets as a solution, form adhesives for bonding rubber to metal without the need for incorporating curing agents in the adhesive layer.
摘要:
The present invention provides a curable composition for back-protecting material used in making shadow masks which gives a cured film excellent in all of etching resistance, alkali solubility or peelability, and pattern formability even when a second etching is carried out at high temperatures. That is, the present invention provides a curable composition for back-protecting material used at a second etching step in making shadow masks which comprises the following components (a), (b) and (c) and which gives a cured film having alkali solubility or alkali peelability:(a) a compound having one carboxyl group and one (meth)acryloyl group,(b) a tri(meth)acrylate of an alkylene oxide adduct of isocyanuric acid, and(c) (c1) a (meth)acrylate compound having two or more (meth)acryloyl groups, (c2) a chain transfer agent, or a combination of (c1) and (c2).
摘要:
Polymeric compositions having inherent electroconductive properties and unsaturated electron-donor and electron-receptor polymerizable monomers for producing such compositions in the form of blends of homopolymers of such monomers or as copolymers of such monomers.