公开(公告)号：US5425988A

公开(公告)日：1995-06-20

申请号：US127288

申请日：1993-09-27

申请人： Kazufumi Ogawa ,  Norihisa Mino ,  Toshinobu Ishihara ,  Mikio Endo ,  Tohru Kubota ,  Yasuhisa Tanaka

发明人： Kazufumi Ogawa ,  Norihisa Mino ,  Toshinobu Ishihara ,  Mikio Endo ,  Tohru Kubota ,  Yasuhisa Tanaka

IPC分类号： B05D1/18 ,  C10M105/76 ,  C10M107/50 ,  C10N40/18 ,  G11B5/187 ,  G11B5/255 ,  G11B5/64 ,  G11B5/72 ,  G11B5/725 ,  G11B5/00

CPC分类号： B82Y30/00 ,  B05D1/185 ,  B82Y10/00 ,  B82Y40/00 ,  G11B5/255 ,  G11B5/72 ,  G11B5/725 ,  Y10S428/90 ,  Y10T428/261 ,  Y10T428/268 ,  Y10T428/3154 ,  Y10T428/31544 ,  Y10T428/31663

摘要： A recording and reproducing device is provided. The device comprises a recording medium, a head giving and receiving recording signals to or from the recording medium, and a mechanism section and a circuit section giving and receiving the recording signals, wherein at least one protective film, and at least one fluorine-containing monomolecular film are formed in this order on the recording layer of the recording medium or on the surface of the head which comes into contact with said recording layer, wherein said protective film is a metal film, oxidized metal film, semi-conductor film, oxidized semi-conductor film, or organic monomolecular film, and wherein said fluorine-containing monomolecular film is formed by the chemical adsorption of a specific-type of silane compound that contains a perfluoroalkyl group at the molecular end on the surface of the protective film.

摘要翻译： 提供了一种记录和再现装置。 该装置包括记录介质，向记录介质提供和接收记录信号的磁头，以及提供和接收记录信号的机构部分和电路部分，其中至少一个保护膜和至少一个含氟 单分子膜依次形成在记录介质的记录层上或与记录层接触的头的表面上，其中所述保护膜是金属膜，氧化金属膜，半导体膜，氧化物 半导体膜或有机单分子膜，并且其中所述含氟单分子膜通过在保护膜的表面上的分子末端的含有全氟烷基的特定类型的硅烷化合物的化学吸附而形成。

公开(公告)号：US4921989A

公开(公告)日：1990-05-01

申请号：US359897

申请日：1989-06-01

申请人： Toshinobu Ishihara ,  Mikio Endo ,  Tohru Kubota ,  Yasuhisa Tanaka

发明人： Toshinobu Ishihara ,  Mikio Endo ,  Tohru Kubota ,  Yasuhisa Tanaka

IPC分类号： C07F7/12 ,  C07F7/18

CPC分类号： B82Y30/00 ,  B82Y40/00 ,  C07F7/12 ,  C07F7/1832 ,  C07F7/1836

摘要： The novel organosilicon compound of the invention is an .omega.-silylalkynyl silane compound represented by the general formula R.sub.3 SiC.tbd.C(CH.sub.2).sub.n Si(CH.sub.3).sub.m X.sub.3-m, in which each R is, independently from the others, a hydrogen atom, lower alkyl group or aryl group, X is a halogen atom or a lower alkoxy group, the subscript m is 0,1 or 2 and the subscript n is an integer in the range from 10 to 30 which forms a uniform monomolecular layer on a substrate surface with silyl ethynyl groups arranged in alignment. The compound can be prepared by a Grignard reaction starting form an .omega.-silylalkynyl halide represented by the general formula R.sub.3 SiC.tbd.C(CH.sub.2).sub.n Y, in which R and n each have the same meaning as defined above and Y is a halogen atom, and a methyl alkoxy or halosilane of the formula (CH.sub.3).sub.m SiX.sub.4-m, in which X and m each have the same meaning as defined before.

摘要翻译： 本发明的新型有机硅化合物是通式为R 3 SiC 3 CF（CH 2）n Si（CH 3）m X 3-m表示的ω-甲硅烷基炔基硅烷化合物，其中R各自独立地为氢原子，低级烷基 基团或芳基，X为卤素原子或低级烷氧基，下标m为0,1或2，下标n为10〜30的整数，在基材表面上形成均匀的单分子层， 甲硅烷基乙炔基排列成对齐。 该化合物可以通过由通式R3SiC 3BOND C（CH2）nY表示的ω-甲硅烷基炔基卤化物的格利雅反应制备，其中R和n各自具有与上述相同的含义，Y是卤素原子， 式（CH3）mSiX4-m的甲基烷氧基或卤代硅烷，其中X和m各自具有与上述相同的含义。

公开(公告)号：US5202452A

公开(公告)日：1993-04-13

申请号：US753522

申请日：1991-09-03

申请人： Kazufumi Ogawa ,  Norihisa Mino ,  Toshinobu Ishihara ,  Mikio Endo ,  Tohru Kubota ,  Yasuhisa Tanaka

发明人： Kazufumi Ogawa ,  Norihisa Mino ,  Toshinobu Ishihara ,  Mikio Endo ,  Tohru Kubota ,  Yasuhisa Tanaka

IPC分类号： B05D1/18 ,  C07F7/12 ,  C07F7/18

CPC分类号： B82Y30/00 ,  B05D1/185 ,  B82Y40/00 ,  C07F7/12 ,  C07F7/182

摘要： A silane compound represented by the following general Formula (I) is described: ##STR1## wherein R.sup.1 is an alkyl group with 1 to 4 carbon atoms;A is oxygen atom (--O--), carboxyl group ##STR2## or an alkylsilylene group ##STR3## wherein each R.sup.2 and R.sup.3 is an alkyl group with 1 to 4 carbon atoms;x is a halogen atom, or an alkoxyl group;m is an integer from 1 to 8;n is an integer from 0 to 2;p is an integer from 5 to 25; andq is an integer from 0 to 2.The silane compound is useful as a coating agent for various base materials, to provide lubricity, in addition to stain-proofing property.

摘要翻译： 描述由以下通式（I）表示的硅烷化合物：其中R 1是具有1至4个碳原子的烷基; A是氧原子（-O-），羧基基团或烷基亚甲硅基基团，其中每个R 2和R 3是具有1至4个碳原子的烷基; x是卤素原子或烷氧基; m是1至8的整数; n为0〜2的整数; p是5至25的整数; q为0〜2的整数。作为各种基材的涂布剂，除了防污性以外，还可以提供润滑性。

公开(公告)号：US5326895A

公开(公告)日：1994-07-05

申请号：US976845

申请日：1992-11-16

申请人： Tohru Kubota ,  Toshinobu Ishihara ,  Mikio Endo ,  Katsuhiro Uehara

发明人： Tohru Kubota ,  Toshinobu Ishihara ,  Mikio Endo ,  Katsuhiro Uehara

IPC分类号： C07F7/18 ,  C07F7/14 ,  C08F30/08 ,  C07F7/08

CPC分类号： C07F7/14 ,  C07F7/1832 ,  C08F30/08

摘要： 3-(Vinylbenzyloxy)propylsilane compounds represented by the general formula, CH.sub.2 CH.PHI. CH.sub.2 OCH.sub. CH.sub.2 CH.sub.2 SiR.sup.1.sub.n (OR.sup.2).sub.3-n (wherein R.sup.1 and R.sup.2 each represent a hydrocarbon residue containing 1 to 4 carbon atoms, and n represents an integer from 0 to 2) are provided as novel styrene skeleton-containing alkoxysilane compounds which are highly useful as silane coupling agent or polymerizing monomer.

摘要翻译： 由通式CH 2 CH PHI CH 2 OCHCH 2 CH 2 SiRnn（OR 2）3-n表示的3-（乙烯基苄氧基）丙基硅烷化合物（其中R 1和R 2各自表示含有1至4个碳原子的烃基，n表示0的整数 提供作为硅烷偶联剂或聚合单体非常有用的新型含苯乙烯骨架的烷氧基硅烷化合物。

公开(公告)号：US4883569A

公开(公告)日：1989-11-28

申请号：US154691

申请日：1988-02-11

申请人： Mikio Endo ,  Minoru Takamizawa ,  Toshinobu Ishihara ,  Tohru Kubota ,  Toshio Shinohara

发明人： Mikio Endo ,  Minoru Takamizawa ,  Toshinobu Ishihara ,  Tohru Kubota ,  Toshio Shinohara

IPC分类号： C07F7/12 ,  C07B61/00 ,  C07F7/08 ,  C07F7/14 ,  C07F7/18

CPC分类号： C07F7/0801 ,  C07F7/14 ,  C07F7/1876

摘要： Cycloalkyl silane compound such as cyclohexyl methyl dichlorosilane can be efficiently prepared by the photochemically induced hydrosilylation reaction. For example, an equimolar mixture of cyclohexene and methyl dichlorosilane with admixture of a catalytic amount of an alcoholic solution of, chloroplatinic acid, is irradiated at a temperature up to 70.degree. C. with ultraviolet light so that the hydrosilylation reaction takes place and proceeds almost to completeness without deactivation of the platinum catalyst to give the desired product in a yield of 90% or even higher.

公开(公告)号：US5258537A

公开(公告)日：1993-11-02

申请号：US16289

申请日：1993-02-11

申请人： Masaki Takeuchi ,  Toshinobu Ishihara ,  Tohru Kubota ,  Mikio Endo

发明人： Masaki Takeuchi ,  Toshinobu Ishihara ,  Tohru Kubota ,  Mikio Endo

IPC分类号： B01J31/02 ,  C07B61/00 ,  C07F7/12 ,  C07F7/08

CPC分类号： C07F7/123

摘要： An organodisiloxane represented by the general formula: R.sup.1 R.sup.2 R.sup.3 SiOSiR.sup.4 R.sup.5 R.sup.6 is reacted with thionyl chloride in the presence of an ammonium salt represented by the general formula: R.sup.7 R.sup.8 R.sup.9 R.sup.10 NX wherein R.sup.1 to R.sup.5 and R.sup.10 may be the same or different and each represents a monovalent hydrocarbon group or a hydrogen atom; R.sup.7 to R.sup.9 may be the same or different and each represents a monovalent hydrocarbon group; and X represents a monovalent anion. Thus, organomonochlorosilanes represented by R.sup.1 R.sup.2 R.sup.3 SiCl and R.sup.4 R.sup.5 R.sup.6 SiCl can be obtained.

公开(公告)号：US5081260A

公开(公告)日：1992-01-14

申请号：US508570

申请日：1990-04-13

申请人： Tohru Kubota ,  Toshinobu Ishihara ,  Mikio Endo

发明人： Tohru Kubota ,  Toshinobu Ishihara ,  Mikio Endo

IPC分类号： C07F7/18 ,  C09K3/18

CPC分类号： C07F7/1824 ,  C09K3/18

摘要： 3-(2-oxo-1-pyrrolidinyl)-propylsilane compounds represented by the following general formula (I) are herein disclosed: ##STR1## wherein R.sup.1 and R.sup.2 may be the same or different and each represents a hydrocarbon group having 1 to 4 carbon atoms; and n is an integer ranging from 0 to 2. The propylsilane compounds may be prepared by, for instance, reacting 1-allyl-2-oxopyrrolidine with a hydrogen silane such as trimethoxysilane or trichlorosilane in the presence of a platinum catalyst or further optionally reacting the resulting 3-(2-oxo-1-pyrrolidinyl)-propyl halogenosilane (in the case where a halogenosilane is used) with an alcohol such as methanol. These propylsilane compounds are effective as anti-clouding agent for treating the surface of a variety of substrate.

公开(公告)号：US5254439A

公开(公告)日：1993-10-19

申请号：US854696

申请日：1992-03-20

申请人： Yoshiyuki Tani ,  Masayuki Endou ,  Kazufumi Ogawa ,  Yasuhisa Tanaka ,  Toshinobu Ishihara ,  Tohru Kubota

发明人： Yoshiyuki Tani ,  Masayuki Endou ,  Kazufumi Ogawa ,  Yasuhisa Tanaka ,  Toshinobu Ishihara ,  Tohru Kubota

IPC分类号： C08G77/48 ,  C08G77/60 ,  G03F7/075 ,  G03F7/30

CPC分类号： C08G77/48 ,  C08G77/60 ,  G03F7/0754 ,  G03F7/0757 ,  Y10S430/146

摘要： There is disclosed a polymer having linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds that are greater than trisilane bonds, sensitive to far ultraviolet rays. The polymer is prepared by polymerizing a dichlorosiloxane alone or with at least one dichlorosilane in an inert solvent in the presence of sodium. The polymer undergoes oxidation with oxygen plasma to form SiO.sub.2 resistant to oxygen dry etching, exhibits absorption peaks only in far ultraviolet, and is suitable for preparing a single layered resist or an upper resist of a two-layered system.

摘要翻译： 公开了具有对远紫外线敏感的线性-Si-O-Si键和-Si-Si-Si键或大于丙硅烷键的聚硅烷键的聚合物。 聚合物是通过在惰性溶剂中在钠的存在下单独或与至少一种二氯硅烷聚合二氯硅烷来制备的。 聚合物用氧等离子体进行氧化以形成耐氧干蚀刻的SiO 2，仅在远紫外线下显示吸收峰，并且适用于制备双层系统的单层抗蚀剂或上抗蚀剂。

公开(公告)号：US5126419A

公开(公告)日：1992-06-30

申请号：US622152

申请日：1990-12-03

申请人： Yoshiyuki Tani ,  Masayuki Endou ,  Kazufumi Ogawa ,  Yasuhisa Tanaka ,  Toshinobu Ishihara ,  Tohru Kubota

发明人： Yoshiyuki Tani ,  Masayuki Endou ,  Kazufumi Ogawa ,  Yasuhisa Tanaka ,  Toshinobu Ishihara ,  Tohru Kubota

IPC分类号： C08G77/48 ,  C08G77/60 ,  G03F7/075

CPC分类号： G03F7/0754 ,  C08G77/48 ,  C08G77/60 ,  G03F7/0757

摘要： A polymer having linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds more than trisilane bonds, sensitive to far ultraviolet rays. The light-sensitive polymer can be prepared by copolymerizing a dichlorodisiloxane and a dichlorosilane in an inert solvent in the presence of sodium. The polymer undergoes oxidation with oxygen plasma to form SiO.sub.2 resistant to oxygen dry etching, exhibits absorption peaks only in far ultraviolet and is suitable for preparing a single layered resist or an upper resist of a two layered resist system.

摘要翻译： 具有线性-Si-O-Si-键和-Si-Si-Si-键的聚合物，或聚硅烷键多于丙硅烷键，对远紫外线敏感。 感光性聚合物可以通过在惰性溶剂中在钠的存在下使二氯二硅氧烷和二氯硅烷共聚来制备。 聚合物用氧等离子体进行氧化以形成耐氧干蚀刻的SiO 2，仅在远紫外线下表现出吸收峰，并且适用于制备双层抗蚀剂体系的单层抗蚀剂或上抗蚀剂。

公开(公告)号：US5455360A

公开(公告)日：1995-10-03

申请号：US107886

申请日：1993-08-18

申请人： Norihisa Mino ,  Kazufumi Ogawa ,  Toshinobu Ishihara ,  Mikio Endo ,  Tohru Kubota ,  Katsuya Takemura

发明人： Norihisa Mino ,  Kazufumi Ogawa ,  Toshinobu Ishihara ,  Mikio Endo ,  Tohru Kubota ,  Katsuya Takemura

IPC分类号： C08G77/26 ,  B05D1/18 ,  C07F7/12 ,  C07F7/18 ,  C08G77/28 ,  C08J5/18 ,  C09K3/16 ,  H01B1/12 ,  C07F7/10 ,  C07D207/323

CPC分类号： B82Y30/00 ,  B05D1/185 ,  B82Y10/00 ,  B82Y40/00 ,  C07F7/12 ,  C07F7/182 ,  C07F7/1836 ,  C07F7/1868

摘要： Disclosed are a conductive pyrrole derivative monomolecular film covalently bonded to a substrate surface and method of manufacturing the same, and a monomer used for forming the conductive pyrrole derivative monomolecular film and method of manufacturing the same. The invention relates to a monomolecular ultrathin film comprising 1-pyrrolyl groups and silicon groups. The monomer used for forming the film is provided by reacting .omega.-(1-pyrrolyl)-1-alkene compound to a monosilane derivative compound, in which three out of four hydrogen atoms of monosilane are replaced with halogen or alkoxy groups, in the presence of a transition metal catalyst. A substrate is dipped and held in a nonaqueous solution of the above-noted monomer, thus chemically bonding a monomolecular film to a substrate surface. Furthermore, a polypyrrole derivative ultrathin film is formed by the electrolytic or catalytic polymerization of the monomolecular film.

摘要翻译： 公开了共价键合到基材表面的导电吡咯衍生物单分子膜及其制备方法，以及用于形成导电吡咯衍生物单分子膜的单体及其制造方法。 本发明涉及包含1-吡咯基和硅基团的单分子超薄膜。 用于形成膜的单体是通过使ω-（1-吡咯基）-1-烯烃化合物与甲硅烷衍生物化合物反应而得到的，其中甲硅烷的四个氢原子中的三个被卤素或烷氧基取代， 的过渡金属催化剂。 将基材浸渍并保持在上述单体的非水溶液中，从而将单分子膜化学键合到基材表面。 此外，通过单分子膜的电解或催化聚合形成聚吡咯衍生物超薄膜。