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公开(公告)号：US4677301A
公开(公告)日：1987-06-30
申请号：US681843
申请日：1984-12-14
CPC分类号： G03F9/70
摘要： A position alignment apparatus aligns a photosensitive substrate and a mask (projection image) at high speed and with high precision. The apparatus has a projection optical system for projecting a pattern image on a mask or reticle onto a photosensitive substrate, a detector for detecting a two-dimensional misalignment of a projected pattern image and a wafer, and means for moving the wafer along orthogonal x- and y-axis directions and for rotating the wafer along a rotational direction within a plane defined by the x- and y-axis directions so as to eliminate the misalignment, wherein the detector has first detecting means with an optical system for detecting at least a misalignment of the wafer along the x-axis direction through the projection lens, and second detecting means with an optical system separate from the projection lens and for detecting at least a misalignment of the wafer along a rotational direction.
摘要翻译： 位置对准装置以高精度和高精度对准感光基片和掩模（投影图象）。 该装置具有用于将掩模或掩模版上的图案图像投影到感光基板上的投影光学系统，用于检测投影图案图像和晶片的二维未对准的检测器，以及用于沿正交x轴移动晶片的装置， 和y轴方向，并且用于在由x轴方向和y轴方向限定的平面内沿着旋转方向旋转晶片，以消除所述未对准，其中所述检测器具有第一检测装置，其具有用于检测至少一个 晶片沿着x轴方向通过投影透镜偏移，以及第二检测装置，其具有与投影透镜分离的光学系统，并用于至少检测晶片沿旋转方向的不对准。
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2.发明授权Process of transfer of mask pattern onto substrate and apparatus for alignment therebetween 失效将掩模图案转移到基板上的工艺和用于在其间对准的装置
公开(公告)号：US4699515A
公开(公告)日：1987-10-13
申请号：US705699
申请日：1985-02-26
申请人： Akikazu Tanimoto , Toshio Matsuura , Kyoichi Suwa
发明人： Akikazu Tanimoto , Toshio Matsuura , Kyoichi Suwa
CPC分类号： G03F9/70
摘要： In an exposure apparatus for manufacturing semiconductor devices, a pattern on a photomask is aligned with a plurality of patterns formed on a wafer in a manner that detects and corrects misalignment, including, inter alia, rotational errors, not only between a photomask and a wafer, but also between a photomask and individual chips formed on the wafer, so that pattern matching is attained with very high accuracy. Apparatus for achieving this result employs different arrangements of alignment marks together with optical systems and positional adjustment devices.
摘要翻译： 在用于制造半导体器件的曝光装置中，光掩模上的图案以形成在晶片上的多个图案与检测和校正不对准的方式对准，包括尤其是除了光掩模和晶片之间的旋转误差 ，而且在光掩模和形成在晶片上的单个芯片之间，使得以非常高的精度获得图案匹配。 用于实现该结果的装置与光学系统和位置调整装置一起使用对准标记的不同布置。
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公开(公告)号：US4566795A
公开(公告)日：1986-01-28
申请号：US586639
申请日：1984-03-06
申请人： Toshio Matsuura , Kyoichi Suwa
发明人： Toshio Matsuura , Kyoichi Suwa
CPC分类号： G03F9/7046 , G03F7/70358 , G03F9/7049
摘要： An alignment apparatus for aligning one of the substrates with the other by means of first and second reference marks comprises scanning means including a light beam generating means for reciprocally scanning first and second areas respectively by a light beam, discrimination means for generating a discrimination signal indicative of the scanning direction by the scanning means in synchronism with the scanning, first photoelectric means for generating a first signal when the first photoelectric means receives the light beam transmitted through a first area and separated by the first reference mark, second photoelectric means for generating a second signal when the second photoelectric means receives the light beam transmitted through the second area and separated by the second reference mark, operation means for determining the direction and amount of the relative deviation between the first and second reference marks from the first and second signals and from the discrimination signal, and means for moving one of the substrates relative to the other in response to the operation means. The alignment apparatus is simple in structure and can detect alignment marks with higher accuracy. The alignment apparatus enables the alignment of a wafer with a reticle or mask at higher speed and with higher preciseness.
摘要翻译： 用于通过第一和第二参考标记将一个基板与另一个基板对准的对准装置包括扫描装置，其包括用于分别由光束往复扫描第一和第二区域的光束产生装置，用于产生指示 所述第一光电装置用于当所述第一光电装置接收到透过第一区域并被所述第一参考标记分开的光束时产生第一信号;第二光电装置，用于产生第一信号， 第二信号，当第二光电装置接收到通过第二区域传输并被第二参考标记分隔的光束时，用于确定第一和第二参考标记与第一和第二信号之间的相对偏离的方向和量的操作装置，以及 从辨别信号 以及用于响应于操作装置移动基板之一相对于另一个的装置。 对准装置结构简单，可以更精确地检测对准标记。 对准装置使得能够以更高的速度和更高的精度将晶片与掩模版或掩模对准。
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公开(公告)号：USRE32795E
公开(公告)日：1988-12-06
申请号：US895132
申请日：1986-08-11
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70058 , H01L21/30
摘要： An exposure apparatus for production of ICs of the type that includes a stage on which is placed a semiconductor wafer to be exposed by illumination light projecting means, and means for two-dimensionally moving the stage within a plane intersecting the illumination light at substantially right angles. The improvement comprises illumination detection means provided with a photo reception surface, and means for mounting the illumination detection means on the stage in such a manner that the photo reception surface and the surface of the semiconductor wafer on the stage to be exposed are at substantially equal height relative to the stage.
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公开(公告)号：US4465368A
公开(公告)日：1984-08-14
申请号：US335733
申请日：1981-12-30
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30 , G01J1/42
CPC分类号： G03F7/70058 , H01L21/30
摘要： An exposure apparatus for production of ICs of the type that includes a stage on which is placed a semiconductor wafer to be exposed by illumination light projecting means, and means for two-dimensionally moving the stage within a plane intersecting the illumination light at substantially right angles. The improvement comprises illumination detection means provided with a photo reception surface, and means for mounting the illumination detection means on the stage in such a manner that the photo reception surface and the surface of the semiconductor wafer on the stage to be exposed are at substantially equal height relative to the stage.
摘要翻译： 一种用于制造IC的曝光装置，其包括：被放置在被照明光投射装置曝光的半导体晶片的台上;以及用于在与照明光以大致直角交叉的平面内二维地移动台的装置 。 该改进包括设置有光接收表面的照明检测装置，以及用于将照射检测装置安装在舞台上的装置，使得受光面和要暴露的舞台上的半导体晶片的表面基本相等 高度相对于舞台。
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公开(公告)号：US4734746A
公开(公告)日：1988-03-29
申请号：US51236
申请日：1987-05-12
申请人： Kazuo Ushida , Satoru Anzai , Kazuaki Suzuki , Toshio Matsuura , Kyoichi Suwa , Koichi Matsumoto
发明人： Kazuo Ushida , Satoru Anzai , Kazuaki Suzuki , Toshio Matsuura , Kyoichi Suwa , Koichi Matsumoto
CPC分类号： G03F7/70066 , G03F7/2022 , G03F7/70241 , G03F7/70458
摘要： An exposure method for photolithography comprises the steps of forming a pattern on a substrate by the use of a first exposure apparatus including a first imaging optical system having a reduction magnification 1/.beta.1 and an image circle of a diameter .phi.1, and forming a second pattern on the substrate on which the first pattern has been formed, by the use of a second exposure apparatus including a second imaging optical system having a reduction magnification 1/.beta.2 different from the reduction magnification 1/.beta.1 and an image circle of a diameter .phi.2, wherein when N is an integer, the conditions that .beta.1.times..phi.1=.beta.2.times..phi.2 and .phi.1=N.times..phi.2 are satisfied.
摘要翻译： 用于光刻的曝光方法包括以下步骤：通过使用包括具有缩小倍率1 /β1的第一成像光学系统和直径φ1的图像圆的第一曝光装置在基板上形成图案，并且形成 通过使用包括具有不同于缩小倍率1 /β1的缩小倍率1 /β2的第二成像光学系统的第二曝光装置和形成第一图案的图像圆的第二图案， 直径phi 2，其中当N是整数时，满足β1 phi 1 =β2 ph 2和ph 1 = N x ph 2的条件。
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7.发明申请GAS GENERATOR, GAS GENERATOR HOLDER AND METHOD FOR MANUFACTURING GAS GENERATOR HOLDER 有权气体发生器，气体发生器支架及制造气体发生器支架的方法公开(公告)号：US20130199400A1
公开(公告)日：2013-08-08
申请号：US13877826
申请日：2011-10-03
摘要： A gas generator includes a holder made of metal having assembled thereto a cup filled with a gas generating agent and an igniter for burning the gas generating agent. The holder includes a body part, and an igniter fixing engagement part and a cup fixing engagement part projecting from the body part. These engagement parts are bent, so that the igniter and the cup are fixed by crimping to the holder. The engagement parts are both finish shaped by forging processing. A metal flow appearing in superficial layers of the engagement parts extends continuously from the body part through the engagement parts to return to the body part, without being divided in surfaces of the engagement parts.
摘要翻译： 气体发生器包括由金属制成的保持器，其上装有填充有气体发生剂的杯子和用于燃烧气体发生剂的点火器。 保持器包括主体部分和点火器固定接合部分以及从主体部分突出的杯子固定接合部分。 这些接合部分被弯曲，使得点火器和杯子通过卷曲固定到支架上。 接合部分均通过锻造加工成型。 出现在接合部件的表面层中的金属流动通过接合部分从主体部分连续地延伸以返回到主体部分，而不被划分在接合部分的表面中。
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公开(公告)号：US07876118B2
公开(公告)日：2011-01-25
申请号：US12365900
申请日：2009-02-05
IPC分类号： G01R31/26
CPC分类号： G01R31/31919 , G01R31/31922
摘要： Provided is a test apparatus that tests a device under test, comprising a pattern generating section that generates a test pattern for testing the device under test; a signal supplying section that supplies the device under test with a test signal corresponding to the test pattern; a trigger generating section that supplies a trigger signal to an external instrument connected to the device under test; and a synchronization control section that outputs, to the trigger generating section, a synchronization signal instructing generation of the trigger signal, based on at least a portion of the test pattern generated by the pattern generating section.
摘要翻译： 提供了一种测试被测设备的测试装置，包括产生用于测试被测设备的测试图案的模式产生部分; 信号提供部分，向所述被测器件供给与所述测试图案相对应的测试信号; 触发生成部，其将触发信号提供给与被测设备连接的外部仪器; 以及同步控制部，其基于由所述图案生成部生成的所述测试图案的至少一部分，向所述触发生成部输出指示所述触发信号的生成的同步信号。
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公开(公告)号：US5985496A
公开(公告)日：1999-11-16
申请号：US837277
申请日：1997-04-11
申请人： Kei Nara , Toshio Matsuura
发明人： Kei Nara , Toshio Matsuura
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70275 , G03F7/2002 , G03F7/70358 , G03F7/70475 , G03F7/70791
摘要： An exposure apparatus for exposing a photomask pattern onto a photosensitive substrate via a plurality of optical systems includes a source of illumination for irradiating the photomask pattern with beams of light adapted to pass through the pattern and optical systems onto the substrate. A scanning mechanism for synchronously scanning the photomask pattern with the beams of light is included to transfer the pattern to the substrate. A plurality of illumination intensity measuring devices is provided for substantially simultaneously measuring the illumination intensities of the beams of light passing through the optical systems.
摘要翻译： 用于通过多个光学系统将光掩模图案曝光到感光基板上的曝光装置包括用于将适合于穿过图案的光束照射到光掩模图案和光学系统到基板上的照明源。 包括用于将光束同时扫描光掩模图案的扫描机构，以将图案转移到基板。 提供了多个照明强度测量装置，用于基本上同时测量通过光学系统的光束的照明强度。
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公开(公告)号：US5504596A
公开(公告)日：1996-04-02
申请号：US169055
申请日：1993-12-20
申请人： Akihiro Goto , Takashi Gemma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Hiroshi Shirasu , Toshio Matsuura
发明人： Akihiro Goto , Takashi Gemma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Hiroshi Shirasu , Toshio Matsuura
CPC分类号： G03F7/70558 , G03F7/70625 , G03H1/00
摘要： An exposure apparatus is used for reproducing a mask pattern of a semiconductor device or the like onto a photosensitive substrate using a holography. The holography is utilized also in a process for alignment between a mask pattern hologram and an exposure region of the substrate. The pattern hologram is recorded to a recording medium by interference between an object wave from the pattern and a reference wave, and a second hologram is formed to the medium by diffraction light from an alignment mark formed on the mask. Prior to reconstruction of the pattern image, reconstruction light from the second hologram, illuminated with a reconstruction wave, is irradiated onto the substrate arranged in place of the mask. A reproduction image of the alignment mark on the substrate surface illuminated with the reconstruction light is measured, and relative displacement between the medium and the substrate is detected from a result of the measurement. The relative positional relationship between the medium and the substrate is corrected in accordance with the displacement information, and, thereafter, the surface is exposed with a reconstruction image of the pattern hologram.
摘要翻译： 使用曝光装置将半导体装置等的掩模图案再现到使用全息术的感光基板上。 全息术也用于掩模图案全息图和衬底的曝光区域之间的对准的过程。 图案全息图通过来自图案的对象波与参考波之间的干涉而被记录到记录介质上，并且通过衍射光从形成在掩模上的对准标记的衍射光形成第二全息图。 在图案图像重建之前，用重建波照射的来自第二全息图的重建光被照射到布置在掩模上的衬底上。 测量用重建光照射的基板表面上的对准标记的再现图像，并且从测量结果检测介质和基板之间的相对位移。 根据位移信息来校正介质和基板之间的相对位置关系，然后用图案全息图的重构图像曝光表面。
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