公开(公告)号：US5370076A

公开(公告)日：1994-12-06

申请号：US056530

申请日：1993-05-05

申请人： Tsutomu Okamoto ,  Koji Watanabe ,  Tatsuo Fukui ,  Yasushi Minoya ,  Koichi Tatsuki ,  Shigeo Kubota

发明人： Tsutomu Okamoto ,  Koji Watanabe ,  Tatsuo Fukui ,  Yasushi Minoya ,  Koichi Tatsuki ,  Shigeo Kubota

IPC分类号： C30B15/00 ,  C30B9/00 ,  C30B29/22 ,  C30B29/32 ,  G02F1/35 ,  G02F1/355 ,  C30B9/12

CPC分类号： C30B9/00 ,  C30B29/14

摘要： A method of growing a single crystal of KTiOPO.sub.4 which is a nonlinear optical material is disclosed. Growth of the single crystal of KTiOPO.sub.4 is carried out by melting a KTiOPO.sub.4 material with a flux to produce a melt, then contacting a seed crystal to the melt, and by slowly cooling at a saturation temperature or below. At this time, molar fractions of K.sub.2 O, P.sub.2 O.sub.5 and TiO.sub.2 contained in the melt fall within a region surrounded by six point in a K.sub.2 O-P.sub.2 O.sub.5 -TiO.sub.2 ternary phase diagram of A (K.sub.2 O:0.4150, P.sub.2 O.sub.5 :0.3906, TiO.sub.2 : 0.1944), B (K.sub.2 O:0.3750, P.sub.2 O.sub.5 : 0.3565, TiO.sub.2 : 0.2685), C (K.sub.2 O: 0.3750, P.sub.2 O.sub.5 : 0.3438, TiO.sub.2 : 0.2813), D (K.sub.2 O: 0.3850, P.sub.2 O.sub.5 : 0.3260, TiO.sub.2 : 0.2890), E (K.sub.2 O: 0.4000, P.sub.2 O.sub.5 : 0.3344, TiO.sub.2 : 0.2656), and F (K.sub.2 O: 0.4158, P.sub.2 O.sub.5 : 0.3744, TiO.sub.2 : 0.2098). In addition, K.sub.15 P.sub.13 O.sub.40 or the same composition produced by melting is used as the flux, and the proportion of a KTiOPO.sub.4 element in a composition of the melt is prescribed to 83.5 to 90.0 mol %. The seed crystal is set so that a C axis is in a direction perpendicular to a melt surface. Then, the seed crystal contacted to the melt is rotated and slowly cooled. Thus, a single crystal of KTiOPO.sub.4 of single domain at the end of growth can be produced.

摘要翻译： 公开了一种生长作为非线性光学材料的KTiOPO4单晶的方法。 通过用助熔剂熔化KTiOPO 4材料以产生熔体，然后使晶种接触熔体，并通过在饱和温度或更低温度下缓慢冷却来进行KTiOPO4单晶的生长。 此时，K2O，P2O5和TiO 2的摩尔分数在A（K2O：0.4150，P2O5：0.3906，TiO 2：0.1944），K 2 O 3的K 2 O 5 - （K2O：0.3750，P2O5：0.3565，TiO2：0.2685），C（K2O：0.3750，P2O5：0.3438，TiO2：0.2813），D（K2O：0.3850，P2O5：0.3260，TiO2：0.2890），E（K2O： P 2 O 5：0.3344，TiO 2：0.2656）和F（K 2 O：0.4158，P 2 O 5：0.3744，TiO 2：0.2098）。 此外，将K15P13O40或通过熔融制造的相同组成用作助熔剂，并且将熔体组成中的KTiOPO 4元素的比例规定为83.5〜90.0mol％。 晶种被设定为使得C轴在垂直于熔体表面的方向上。 然后，将与熔体接触的晶种旋转并缓慢冷却。 因此，可以生产在生长结束时单畴KTiOPO4的单晶。

公开(公告)号：US06248167B1

公开(公告)日：2001-06-19

申请号：US09238901

申请日：1999-01-28

申请人： Tsutomu Okamoto ,  Koichi Tatsuki ,  Shigeo Kubota

发明人： Tsutomu Okamoto ,  Koichi Tatsuki ,  Shigeo Kubota

IPC分类号： C30B708

CPC分类号： C30B15/00 ,  C30B29/10

摘要： Disclosed is a method for the growth of a single crystal having excellent crystallinity, uniform quality in the inside thereof and hence excellently uniform optical properties, the method enabling an improvement in yields. The invention resides in a method for the growth of a single crystal of &bgr;-type barium borate (&bgr;-BaB2O4), the method comprising heating a crucible 6 indirectly to grow a &bgr;-BaB2O4 single crystal 21 from a melt of barium borate (BaB2O4) contained in the crucible and using no flux by using a seed crystal 9 of &bgr;-BaB2O4.

摘要翻译： 公开了一种生长具有优异结晶性，在其内部质量均匀且因此具有优异均匀的光学性能的单晶的方法，该方法能够提高产量。 本发明涉及一种用于生长β型硼酸钡（β-BaB 2 O 4）的单晶的方法，该方法包括间接加热坩埚6以从硼酸钡（BaB 2 O 4）的熔体中生长β-BaB 2 O 4单晶21 ），并且通过使用β-BaB 2 O 4的晶种9不使用助熔剂。

公开(公告)号：US20050252894A1

公开(公告)日：2005-11-17

申请号：US11177574

申请日：2005-07-08

申请人： Yutaka Imai ,  Nobuhiko Umezu ,  Akihiko Asano ,  Shin Hotta ,  Koichi Tatsuki ,  Atsushi Fukumoto ,  Shigeo Kubota

发明人： Yutaka Imai ,  Nobuhiko Umezu ,  Akihiko Asano ,  Shin Hotta ,  Koichi Tatsuki ,  Atsushi Fukumoto ,  Shigeo Kubota

IPC分类号： B23K26/06 ,  B23K26/067 ,  H01L21/20 ,  H01L21/268 ,  B23K26/02

CPC分类号： B23K26/0613 ,  B23K26/0604 ,  B23K26/0622 ,  B23K26/067 ,  H01L21/02532 ,  H01L21/02678 ,  H01L21/02686 ,  H01L21/02691 ,  H01L21/268 ,  H01L27/1285

摘要： A laser annealing device (10) includes a laser oscillator (12), radiating a pulsed laser light beam of a preset period, and an illuminating optical system (15) for illuminating a pulsed laser light beam to an amorphous silicon film (1). The illuminating optical system (15) manages control for moving a laser spot so that a plural number of light pulses will be illuminated on the same location on the amorphous silicon film (1). The laser oscillator (12) radiates a laser light beam of a pulse generation period shorter than the reference period. The reference period is a time interval as from the radiation timing of illumination of a pulsed laser light beam on the surface of the film (1) until the timing of reversion of the substrate temperature raised due to the illumination of the laser light beam to the original substrate temperature.

摘要翻译： 激光退火装置（10）包括激光振荡器（12），辐射预设周期的脉冲激光束，以及用于将脉冲激光束照射到非晶硅膜（1）的照明光学系统（15）。 照明光学系统（15）管理用于移动激光光斑的控制，使得多个光脉冲将被照射在非晶硅膜（1）上的相同位置。 激光振荡器（12）辐射比参考周期短的脉冲发生时段的激光束。 参考周期是从在膜（1）的表面上的脉冲激光束的照射的辐射定时直到由于激光束照射到基板温度升高的定时的时间间隔 原始基板温度。

公开(公告)号：US06240111B1

公开(公告)日：2001-05-29

申请号：US09289244

申请日：1999-04-09

申请人： Shigeo Kubota ,  Nobuhiko Umezu ,  Tatsuo Fukui ,  Hisashi Masuda ,  Koichi Tatsuki

发明人： Shigeo Kubota ,  Nobuhiko Umezu ,  Tatsuo Fukui ,  Hisashi Masuda ,  Koichi Tatsuki

IPC分类号： H01S310

CPC分类号： G02F1/37

摘要： A laser beam generating apparatus comprising a first laser beam source oscillating in a near infrared-ray region of, for example, an Nd:YAG laser to generate a laser beam, a second higher harmonic wave generator for generating, from the laser beam emitted from the first laser beam source, a second higher harmonic wave having a half wavelength of the laser beam emitted from the first laser beam source, a splitter for splitting the second higher harmonic wave, a second laser beam source which is supplied with a part of the second higher harmonic wave thus split is input to a Ti:Sapphire laser to be excited and oscillated, thereby generating a laser beam of substantially 700 nm in wavelength, a fourth higher harmonic wave generator for generating a fourth higher harmonic wave from the remaining part of the second higher harmonic wave thus split, a sum frequency mixing composed of a BBO crystal device to which the laser beam of substantially 700 nm in wavelength and the fourth higher harmonic wave are input, and a controller for controlling the temperature of the BBO crystal device to substantially 100K or less, thereby generating a laser beam of substantially 193 nm in wavelength as an output of the sum frequency mixing.

摘要翻译： 一种激光束产生装置，包括：在例如Nd：YAG激光器的近红外线区域中振荡的第一激光束源，以产生激光束;第二高次谐波发生器，用于从从 第一激光束源，具有从第一激光束源发射的激光束的半波长的第二高次谐波，用于分离第二高次谐波的分离器，被提供有第一激光束的一部分的第二激光束源 将这样分割的第二高次谐波输入到激发和振荡的Ti：蓝宝石激光器中，从而产生大致为700nm的波长的激光束;第四高次谐波发生器，用于从剩余部分产生第四高次谐波 这样分裂的第二高次谐波，由BBO晶体器件组成的和频混频，其中波长大致为700nm的激光束和第四较高谐波 尼康波输入，以及用于将BBO晶体装置的温度控制在基本上为100K以下的控制器，由此产生大致193nm的波长的激光束作为和频混合的输出。

公开(公告)号：US06933185B2

公开(公告)日：2005-08-23

申请号：US10394223

申请日：2003-03-24

申请人： Hiroyuki Wada ,  Yoshimi Hirata ,  Ayumu Taguchi ,  Koichi Tatsuki ,  Nobuhiko Umezu ,  Shigeo Kubota ,  Tetsuo Abe ,  Akifumi Ooshima ,  Tadashi Hattori ,  Makoto Takatoku ,  Yukiyasu Sugano

发明人： Hiroyuki Wada ,  Yoshimi Hirata ,  Ayumu Taguchi ,  Koichi Tatsuki ,  Nobuhiko Umezu ,  Shigeo Kubota ,  Tetsuo Abe ,  Akifumi Ooshima ,  Tadashi Hattori ,  Makoto Takatoku ,  Yukiyasu Sugano

IPC分类号： H01L21/263 ,  H01L21/66 ,  C30B28/02 ,  H01L21/786

CPC分类号： H01L22/12

摘要： The state of a polysilicon film formed by excimer laser annealing an amorphous silicon film is to be evaluated. When the amorphous silicon film is annealed to form a polysilicon film, linearity or periodicity presents itself in the spatial structure of the film surface of the polysilicon film formed depending on the energy applied to the amorphous silicon during annealing. This linearity or periodicity is processed as an image and represented numerically from the image by exploiting the linearity or periodicity. The state of the polysilicon film is checked based on the numerical results.

摘要翻译： 对通过非晶硅膜的准分子激光退火而形成的多晶硅膜的状态进行评价。 当非晶硅膜退火以形成多晶硅膜时，线性或周期性本身就取决于退火期间施加到非晶硅的能量而形成的多晶硅膜的膜表面的空间结构。 该线性或周期性被处理为图像并且通过利用线性或周期性从图像数字地表示。 基于数值结果检查多晶硅膜的状态。

公开(公告)号：US08693099B2

公开(公告)日：2014-04-08

申请号：US11782395

申请日：2007-07-24

申请人： Toshitaka Kawashima ,  Shigeo Kubota ,  Naoya Eguchi ,  Koichi Tatsuki ,  Junichi Ohsako

发明人： Toshitaka Kawashima ,  Shigeo Kubota ,  Naoya Eguchi ,  Koichi Tatsuki ,  Junichi Ohsako

IPC分类号： G02B1/10

CPC分类号： G02B1/115 ,  C03C17/36 ,  C03C17/3621 ,  C03C17/3628 ,  C03C17/3649 ,  C03C2217/734

摘要： An antireflection film capable of reliably preventing light (or laser light), which is incident on a glass substrate and which reaches a metal film, from being reflected by the metal film. The antireflection film provided between a metal film having a complex refractive index represented by NM=nM−i·km and a glass substrate having a refractive index NG includes, from the metal film side: (A) a first dielectric layer having a refractive index N1; (B) a second dielectric layer provided on the first dielectric layer and having a refractive index N2; and (C) a third dielectric layer provided on the second dielectric layer and having a refractive index N3, in which N1 NG, N2 NG hold. Accordingly, light which is incident on the glass substrate and which reaches the metal film is prevented from being reflected by the metal film.

摘要翻译： 能够可靠地防止入射到玻璃基板上并到达金属膜的光（或激光）被金属膜反射的防反射膜。 设置在具有由NM = nM-i·km表示的复折射率的金属膜和具有折射率NG的玻璃基板之间的抗反射膜包括从金属膜侧：（A）具有折射率的第一介电层 N1; （B）设置在第一电介质层上并具有折射率N2的第二电介质层; 和（C）设置在第二电介质层上并具有折射率N3的第三电介质层，其中N1 NG，N2 NG成立。 因此，防止入射到玻璃基板上并到达金属膜的光被金属膜反射。

公开(公告)号：US20080024867A1

公开(公告)日：2008-01-31

申请号：US11782395

申请日：2007-07-24

申请人： Toshitaka Kawashima ,  Shigeo Kubota ,  Naoya Eguchi ,  Koichi Tatsuki ,  Junichi Ohsako

发明人： Toshitaka Kawashima ,  Shigeo Kubota ,  Naoya Eguchi ,  Koichi Tatsuki ,  Junichi Ohsako

IPC分类号： G02B1/11

CPC分类号： G02B1/115 ,  C03C17/36 ,  C03C17/3621 ,  C03C17/3628 ,  C03C17/3649 ,  C03C2217/734

摘要： There is provided an antireflection film capable of reliably preventing light (or laser light), which is incident on a glass substrate and which reaches a metal film, from being reflected by the metal film. The antireflection film provided between a metal film having a complex refractive index represented by NM=nM−i·km and a glass substrate having a refractive index NG includes, from the metal film side: (A) a first dielectric layer having a refractive index N1; (B) a second dielectric layer provided on the first dielectric layer and having a refractive index N2; and (C) a third dielectric layer provided on the second dielectric layer and having a refractive index N3, in which N1 NG, N2 NG hold. Accordingly, light which is incident on the glass substrate and which reaches the metal film is prevented from being reflected by the metal film.

摘要翻译： 提供了能够可靠地防止入射到玻璃基板上并且到达金属膜的光（或激光）被金属膜反射的抗反射膜。 该反射防止膜设置在具有由N M M = N M-M m N N表示的复折射率的金属膜和具有 折射率N＆lt; N＆gt;包括从金属膜侧：（A）具有折射率N 1的第一介电层; （B）设置在第一电介质层上并具有折射率N 2的第二电介质层; 和（C）设置在所述第二电介质层上并具有折射率N 3 N 3的第三电介质层，其中N 1 < N 1，N 2，N 3，N 3，N 3，N 3，N 3， >> N 保持。 因此，防止入射到玻璃基板上并到达金属膜的光被金属膜反射。

公开(公告)号：US20070178674A1

公开(公告)日：2007-08-02

申请号：US11690232

申请日：2007-03-23

申请人： Yutaka Imai ,  Nobuhito Umezu ,  Akihiko Asano ,  Shin Hotta ,  Koichi Tatsuki ,  Atsushi Fukumoto ,  Shigeo Kubota

发明人： Yutaka Imai ,  Nobuhito Umezu ,  Akihiko Asano ,  Shin Hotta ,  Koichi Tatsuki ,  Atsushi Fukumoto ,  Shigeo Kubota

IPC分类号： H01L21/268

CPC分类号： B23K26/0613 ,  B23K26/0604 ,  B23K26/0622 ,  B23K26/067 ,  H01L21/02532 ,  H01L21/02678 ,  H01L21/02686 ,  H01L21/02691 ,  H01L21/268 ,  H01L27/1285

摘要： A laser annealing device (10) includes a laser oscillator (12), radiating a pulsed laser light beam of a preset period, and an illuminating optical system (15) for illuminating a pulsed laser light beam to an amorphous silicon film (1). The illuminating optical system (15) manages control for moving a laser spot so that a plural number of light pulses will be illuminated on the same location on the amorphous silicon film (1). The laser oscillator (12) radiates a laser light beam of a pulse generation period shorter than the reference period. The reference period is a time interval as from the radiation timing of illumination of a pulsed laser light beam on the surface of the film (1) until the timing of reversion of the substrate temperature raised due to the illumination of the laser light beam to the original substrate temperature.

摘要翻译： 激光退火装置（10）包括激光振荡器（12），辐射预设周期的脉冲激光束，以及用于将脉冲激光束照射到非晶硅膜（1）的照明光学系统（15）。 照明光学系统（15）管理用于移动激光光斑的控制，使得多个光脉冲将被照射在非晶硅膜（1）上的相同位置。 激光振荡器（12）辐射比参考周期短的脉冲发生时段的激光束。 参考周期是从在膜（1）的表面上的脉冲激光束的照射的辐射定时直到由于激光束照射到基板温度升高的定时的时间间隔 原始基板温度。

公开(公告)号：US07885461B2

公开(公告)日：2011-02-08

申请号：US12586667

申请日：2009-09-25

申请人： Ko Ishimoto ,  Koichiro Kakinuma ,  Takehiro Nakatsue ,  Tatsuhiko Matsumoto ,  Shuichi Haga ,  Hiroshi Takizuka ,  Yoshiki Shirochi ,  Naoya Katoh ,  Hiroshi Yamashita ,  Koichi Oura ,  Yoshihiro Kosugi ,  Junichi Iwai ,  Kazuji Uemura ,  Shigeo Kubota ,  Hideo Morita

发明人： Ko Ishimoto ,  Koichiro Kakinuma ,  Takehiro Nakatsue ,  Tatsuhiko Matsumoto ,  Shuichi Haga ,  Hiroshi Takizuka ,  Yoshiki Shirochi ,  Naoya Katoh ,  Hiroshi Yamashita ,  Koichi Oura ,  Yoshihiro Kosugi ,  Junichi Iwai ,  Kazuji Uemura ,  Shigeo Kubota ,  Hideo Morita

IPC分类号： G06K9/00

CPC分类号： H04N9/77 ,  G06T5/001 ,  G09G5/02 ,  G09G2340/06 ,  H04N1/60 ,  H04N1/64 ,  H04N9/64 ,  H04N9/67 ,  H04N9/69 ,  H04N9/735

摘要： Signals are provided which allow colors in a wider color range than predetermined standards, which can be handled by apparatus according to such predetermined standards. A primary color converter converts first color signals having primary color points in a wider color range than the primary color points according to BT.709 into second color signals based on the primary colors according to BT.709. A photoelectric transducer converts the second color signals into third color signals according to photoelectric transducer characteristics defined in a numerical range wider than a range from 0 to 1.0 of color signals corresponding to a luminance signal and color difference signals according to BT.709. A color signal converter converts the third color signals into a luminance signal and color difference signals. A corrector incorporated in the color signal converter corrects the color difference signals into color difference signals.

摘要翻译： 提供信号，其允许比预定标准更宽的颜色范围的颜色，其可以根据这样的预定标准由设备处理。 原色转换器根据BT.709将具有比根据BT.709的原色色更宽的颜色范围的原色点转换成基于根据BT.709的原色的第二颜色信号的第一颜色信号。 根据BT.709，光电传感器根据光电转换器特性将第二颜色信号转换为第三颜色信号，该光电转换器特征在对应于亮度信号和色差信号的0至1.0范围内的数值范围内定义。 彩色信号转换器将第三颜色信号转换成亮度信号和色差信号。 结合在彩色信号转换器中的校正器将色差信号校正为色差信号。

公开(公告)号：US20090273727A1

公开(公告)日：2009-11-05

申请号：US11720712

申请日：2005-12-02

申请人： Shigeo Kubota ,  Junichi Osako ,  Satoshi Tomioko ,  Mitsunori Ueda ,  Tetsuyuki Yoshida ,  Naoji Nada

发明人： Shigeo Kubota ,  Junichi Osako ,  Satoshi Tomioko ,  Mitsunori Ueda ,  Tetsuyuki Yoshida ,  Naoji Nada

IPC分类号： G02F1/13357 ,  F21V7/06 ,  F21V13/04 ,  F21K7/00

CPC分类号： G02B17/0856 ,  G02B5/265 ,  G02F1/133603 ,  H01L33/58 ,  H01L2224/16225 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2924/13091 ,  H01L2924/00014 ,  H01L2924/00

摘要： There is provided a lens formed from a circular bottom face (11), lateral face (14) and top face (15) and having a surface light source (13) of a finite size disposed at the center of the bottom face (11). The top face (15) is an aspheric surface rotational symmetric with respect to a z-axis and which totally reflects a part of a component, whose polar angle is smaller than a polar angle Θ0 at the intersection between the lateral face (14) and top face (15), of light emitted from the surface light source (13). The lateral face (14) is an aspheric surface rotational symmetric with respect to the z-axis and pervious to a component, whose polar angle is larger than the polar angle Θ0, and component, totally reflected at the top face (15), of the light emitted from the surface light source (13). A function r=fS(z) where z is a variable representing the lateral face (14) increases monotonously as the variable z decreases in a closed zone defined by 0≦z≦z1 (z-coordinate of an intersection between the lateral face (14) and top face (15)), and has at least one point where a absolute value |d2r/dz2| is maximum in the closed zone.

摘要翻译： 提供了由圆形底面（11），侧面（14）和顶面（15）形成并具有设置在底面（11）的中心处的有限尺寸的表面光源（13）的透镜， 。 顶面（15）是相对于z轴旋转对称的非球面，其全部反射部分的一部分，其极角小于侧面（14）与侧面（14）的交点处的极角θta 从表面光源（13）发射的光的顶面（15）。 侧面（14）是相对于z轴旋转对称的非球面，并且可以透视其极角大于极角（θ）的部分，并且在顶面（15）处全反射的分量 从表面光源（13）发射的光。 函数r = fS（z）其中z是表示横向面（14）的变量随着变量z在由0 <= z <= z1定义的关闭区域中减小而单调增加（横向 面（14）和顶面（15）），并且具有至少一个绝对值| d2r / dz2 | 在封闭区域最大。