公开(公告)号：US08236109B2

公开(公告)日：2012-08-07

申请号：US12639586

申请日：2009-12-16

申请人： Tsuyoshi Moriya ,  Akitaka Shimizu

发明人： Tsuyoshi Moriya ,  Akitaka Shimizu

IPC分类号： B08B6/00

CPC分类号： H01L21/02057 ,  H01J37/32862 ,  Y10S438/905 ,  Y10S438/906

摘要： A method for cleaning a component in a substrate processing apparatus including a processing chamber, foreign materials being attached to the component, at least a part of the component being exposed inside the processing chamber, and the substrate processing apparatus being adapted to load and unload a foreign material adsorbing member into and from the processing chamber. The method includes loading the foreign material adsorbing member into the processing chamber; generating a plasma nearer the component than the foreign material adsorbing member; extinguishing the plasma; and unloading the foreign material adsorbing member from the processing chamber, wherein the generation and the extinguishment of the plasma are repeated alternately and the foreign material adsorbing member has a positive potential at least during the extinguishment of the plasma.

摘要翻译： 一种清洗基板处理装置中的部件的方法，所述基板处理装置包括处理室，异物附着在所述部件上，所述部件的至少一部分暴露在所述处理室内部，所述基板处理装置适于加载和卸载 异物吸附构件进出处理室。 该方法包括将异物吸附构件装载到处理室中; 产生比异物吸附部件更靠近部件的等离子体; 熄灭等离子体; 并且从所述处理室卸载所述异物吸附构件，其中所述等离子体的产生和熄灭交替地重复，并且所述异物吸附构件至少在所述等离子体熄灭期间具有正电位。

公开(公告)号：US20070227663A1

公开(公告)日：2007-10-04

申请号：US11691863

申请日：2007-03-27

申请人： Shosuke Endoh ,  Tsuyoshi Moriya ,  Akitaka Shimizu

发明人： Shosuke Endoh ,  Tsuyoshi Moriya ,  Akitaka Shimizu

IPC分类号： C23F1/00

CPC分类号： H01J37/32477

摘要： a substrate processing apparatus that enables abnormal electrical discharges and metal contamination to be prevented from occurring. A processing chamber is configured to house and carry out predetermined plasma processing on a substrate. A lower electrode is disposed on a bottom portion of the processing chamber and has the substrate mounted thereon. An upper electrode is disposed in a ceiling portion of the processing chamber. A side wall component covering a side wall of the processing chamber faces onto a processing space between the upper electrode and the lower electrode. The side wall component has at least one electrode layer to which a DC voltage is applied. An insulating portion made of an insulating material is present at least between the electrode layer and the processing space and covers the electrode layer. The insulating portion is formed by thermally spraying the insulating material.

摘要翻译： 能够防止发生异常放电和金属污染的基板处理装置。 处理室配置成容纳并执行衬底上的预定等离子体处理。 下电极设置在处理室的底部，并且其上安装有基板。 上电极设置在处理室的顶部。 覆盖处理室的侧壁的侧壁部件面向上电极和下电极之间的处理空间。 侧壁部件具有至少一个施加了直流电压的电极层。 至少在电极层和处理空间之间存在由绝缘材料制成的绝缘部分并且覆盖电极层。 绝缘部分通过热喷涂绝缘材料形成。

公开(公告)号：US20060207971A1

公开(公告)日：2006-09-21

申请号：US11376163

申请日：2006-03-16

申请人： Tsuyoshi Moriya ,  Takaaki Hirooka ,  Akitaka Shimizu ,  Satoshi Tanaka

发明人： Tsuyoshi Moriya ,  Takaaki Hirooka ,  Akitaka Shimizu ,  Satoshi Tanaka

IPC分类号： C23F1/00 ,  H01L21/306 ,  B44C1/22

CPC分类号： C23F1/12 ,  H01L21/02071 ,  H01L21/67017 ,  H01L21/67109 ,  H01L21/67775

摘要： An atmospheric transfer chamber, connected to an object processing chamber for processing a target object by using a plasma of a halogen-based gas, for transferring the target object therein, the atmospheric transfer chamber includes a dehumidifying unit for dehumidifying air in the atmospheric transfer chamber. The dehumidifying unit includes a desiccant filter, a cooling unit for cooling the air introduced into the atmospheric transfer chamber, and an air conditioner. The atmospheric transfer chamber is connected to a reaction product removal chamber for removing reaction products of a halogen-based gas attached to the target object, wherein halogen in reaction products attached to the target object is reduced.

摘要翻译： 大气传送室，通过使用卤素系气体的等离子体连接到对象处理室，用于将目标物体转印到其中，大气传送室包括用于对大气传送室中的空气进行除湿的除湿单元 。 除湿单元包括干燥剂过滤器，用于冷却引入大气传送室的空气的冷却单元和空调。 大气转移室连接到反应产物去除室，用于除去附着到目标物体上的卤素系气体的反应产物，其中附着在目标物体上的反应产物中的卤素被还原。

公开(公告)号：US09022225B2

公开(公告)日：2015-05-05

申请号：US14006177

申请日：2012-03-13

申请人： Tsuyoshi Moriya ,  Asao Yamashita

发明人： Tsuyoshi Moriya ,  Asao Yamashita

IPC分类号： B01D25/00 ,  B01D29/62 ,  B01D29/46 ,  B01D63/08 ,  B01D39/16 ,  B01D39/20 ,  B01D61/02 ,  B01D61/04 ,  B01D69/10 ,  B01D29/00 ,  B01D61/24 ,  B01D65/02

CPC分类号： B01D29/62 ,  A61M2205/7563 ,  B01D29/46 ,  B01D39/16 ,  B01D39/1692 ,  B01D39/2003 ,  B01D39/2027 ,  B01D39/2055 ,  B01D39/2068 ,  B01D61/025 ,  B01D61/04 ,  B01D61/243 ,  B01D63/084 ,  B01D65/02 ,  B01D69/10 ,  B01D2311/04 ,  B01D2311/06 ,  B01D2313/02 ,  B01D2313/14 ,  B01D2321/04 ,  Y10T29/49826 ,  B01D2311/2642 ,  B01D2311/2626 ,  B01D2311/12 ,  B01D2311/2692

摘要： Provided is a filtration filer with which a stable opening size during filtration is obtained, and which can be easily regenerated when clogged and used repeatedly. The filtration filter (10) comprises: a substrate stack wherein substrates (11) that have a through hole that penetrates from front to back are stacked; stoppers (15) that define the spacing between the substrates (11); and pillars (16) with a larger thermal expansion coefficient than the stoppers (15). The spacing between the substrates (11) at normal temperature is defined at least by the stoppers (15), and the spacing when heated is defined by the thermally expanded pillars (16). The gaps between the substrates (11) form the filtration surface that traps contaminants contained in the liquid that is being treated A.

摘要翻译： 提供了一种过滤器，其在过滤期间具有稳定的开口尺寸，并且可以在被堵塞并重复使用时容易地再生。 过滤器（10）包括：基板叠层，其中具有从前到后穿透的通孔的基板（11）被堆叠; 限定基板（11）之间的间隔的止动件（15）; 和具有比止动件（15）更大的热膨胀系数的柱（16）。 在正常温度下，基板（11）之间的间隔至少由止挡件（15）限定，加热时的间隔由热膨胀的支柱（16）限定。 基板（11）之间的间隙形成了捕获正在处理的液体中的污染物的过滤表面。

公开(公告)号：US08854625B2

公开(公告)日：2014-10-07

申请号：US12985099

申请日：2011-01-05

申请人： Tsuyoshi Moriya ,  Hiroyuki Nakayama

发明人： Tsuyoshi Moriya ,  Hiroyuki Nakayama

IPC分类号： G01N21/00 ,  C23C14/00 ,  H01J37/32 ,  B08B9/08 ,  G01N15/02 ,  G01N15/06

CPC分类号： H01J37/32935 ,  B08B9/08 ,  G01N15/0272 ,  G01N15/06 ,  G01N2015/0693 ,  Y10T428/30 ,  Y10T428/315 ,  Y10T428/8305

摘要： A particle monitoring apparatus includes a housing disposed on a gas exhaust line, a laser beam source for emitting a laser beam to particles in the gas exhaust line, a window member disposed at the housing for monitoring the particles in the gas exhaust line. The window member has a transparent base which is formed of a transparent resin or glass containing silicon and has a gas contact surface which faces a gas within the gas exhaust line, and a surface treatment layer formed on the gas contact surface of the transparent base, wherein the surface treatment layer contains one material selected from the group consisting of yttrium and calcium fluoride.

摘要翻译： 粒子监测装置包括：设置在排气管上的壳体，用于向气体排出管线中的颗粒发射激光束的激光束源;设置在壳体处的用于监测排气管线中的颗粒的窗口部件。 窗构件具有由透明树脂或含硅的玻璃形成的透明基底，并且具有与气体排出管线内的气体相对的气体接触面，以及形成在透明基底的气体接触面上的表面处理层， 其中所述表面处理层含有选自钇和氟化钙的一种材料。

公开(公告)号：US08498911B2

公开(公告)日：2013-07-30

申请号：US12820692

申请日：2010-06-22

申请人： Tsuyoshi Moriya

发明人： Tsuyoshi Moriya

IPC分类号： G06Q40/00

CPC分类号： G06Q30/06 ,  G06Q30/0283 ,  G06Q30/04 ,  H01L22/12

摘要： Provided is a charging method capable of offering a user an incentive to use a particle generation factor determining system. In the particle generation factor determining system including a user interface device 11 through which a user inputs a particle map and a server 13, the server 13 calculates accuracy of each of multiple particle generation factors based on the particle map; the user interface device 11 displays the calculated accuracy or a title of generation-factor-relevant information 27 on each particle generation factor corresponding to this accuracy; the server 13 provides the generation-factor-relevant information 27 to the user interface device 11; a charged fee for providing particle generation-factor-relevant information 27 is determined based on accuracy of a particle generation factor corresponding to the provided generation-factor-relevant information 27.

摘要翻译： 提供了一种能够向用户提供使用粒子生成因子确定系统的激励的计费方法。 在包括用户通过其输入粒子映射的用户界面装置11和服务器13的粒子生成因子确定系统中，服务器13基于粒子图计算多个粒子生成因子中的每一个的精度; 用户界面装置11对与该精度对应的每个粒子生成因子显示计算出的生成因子相关信息27的精度或标题; 服务器13向用户接口设备11提供生成因子相关信息27; 基于与所提供的生成因子相关信息27相对应的粒子生成因子的精度，确定用于提供粒子生成因子相关信息27的收费。

公开(公告)号：US08243265B2

公开(公告)日：2012-08-14

申请号：US12617235

申请日：2009-11-12

申请人： Tsuyoshi Moriya ,  Hiroshi Nagaike ,  Hideaki Yakushiji

发明人： Tsuyoshi Moriya ,  Hiroshi Nagaike ,  Hideaki Yakushiji

IPC分类号： G01N21/00

CPC分类号： H01L21/67288 ,  G01N21/91 ,  G01N21/94 ,  G01N21/9501

摘要： A foreign material detecting method for detecting a foreign material attached to a substrate surface includes a spraying step of spraying an organic solvent or an oil-phase material containing a halogen element to the substrate surface, a condensing step of emphasizing the foreign material by condensing the sprayed organic solvent or oil-phase material around the foreign material attached to the substrate surface by controlling a temperature of the substrate surface, and a surface inspecting step of detecting the foreign material emphasized by the condensation of the organic solvent or the oil-phase material by a surface inspecting device.

摘要翻译： 用于检测附着在基板表面上的异物的异物检测方法包括：向基板表面喷射含有卤素元素的有机溶剂或油相材料的喷射步骤，通过冷凝来强调异物的冷凝步骤 通过控制基板表面的温度，附着于基板表面的异物附近的喷涂有机溶剂或油相材料，以及检测由有机溶剂或油相材料的冷凝强调的异物的表面检查步骤 通过表面检查装置。

公开(公告)号：US08208802B2

公开(公告)日：2012-06-26

申请号：US12548570

申请日：2009-08-27

申请人： Yuki Endo ,  Toshiyuki Tanaka ,  Toshihiro Hamamura ,  Tsuyoshi Moriya ,  Naoki Takafuji

发明人： Yuki Endo ,  Toshiyuki Tanaka ,  Toshihiro Hamamura ,  Tsuyoshi Moriya ,  Naoki Takafuji

IPC分类号： G03B3/00

CPC分类号： G03B13/00

摘要： Provided are a focusing position determining apparatus, an imaging apparatus, and a focusing position determining method, the method including setting an aperture to a first aperture value; driving a focus lens through a first range of positions as a first drive; during the first drive, obtaining images periodically, and calculating a first sampling of contrast values from the obtained images; calculating a first focus position from the first sampling of contrast values; setting the aperture to a second aperture value; driving a focus lens through a second range of positions as a second drive, the second range of positions being based on the first focus position; during the second drive, obtaining images periodically, and calculating a second sampling of contrast values from the obtained images; calculating a focusing position from the second sampling of contrast values; and driving the focus lens to the calculated focusing position.

摘要翻译： 提供了一种聚焦位置确定装置，成像装置和聚焦位置确定方法，该方法包括将光圈设置为第一光圈值; 通过第一范围的位置驱动聚焦透镜作为第一驱动; 在第一驱动期间，周期性地获得图像，并从所获得的图像中计算对比度值的第一采样; 从对比度值的第一取样计算第一焦点位置; 将光圈设置为第二光圈值; 通过第二范围的位置驱动聚焦透镜作为第二驱动，所述第二位置范围基于所述第一对焦位置; 在第二驱动期间，周期性地获取图像，并且从所获得的图像中计算对比度值的第二采样; 从对比度值的第二取样计算聚焦位置; 并将聚焦透镜驱动到计算出的聚焦位置。

公开(公告)号：US08132580B2

公开(公告)日：2012-03-13

申请号：US12057807

申请日：2008-03-28

申请人： Tsuyoshi Moriya ,  Tadashi Onishi ,  Ryo Nonaka ,  Eiichi Nishimura

发明人： Tsuyoshi Moriya ,  Tadashi Onishi ,  Ryo Nonaka ,  Eiichi Nishimura

IPC分类号： B08B3/00

CPC分类号： H01L21/67051 ,  H01L21/6708

摘要： A substrate processing system that enables foreign matter adhered to a rear surface or a periphery of a substrate to be completely removed. A substrate processing apparatus performs predetermined processing on the substrate. A substrate cleaning apparatus cleans the substrate at least one of before and after the predetermined processing. A jetting apparatus jets a cleaning substance in two phases of a gas phase and a liquid phase and a high-temperature gas towards the rear surface or the periphery of the substrate.

摘要翻译： 能够完全除去附着在基板的背面或周围的异物的基板处理系统。 基板处理装置对基板进行规定的处理。 基板清洁装置在预定处理之前和之后清洁基板。 喷射装置将气相和液相以及高温气体的两相中的清洗物质喷射到基板的后表面或周边。

公开(公告)号：US08113757B2

公开(公告)日：2012-02-14

申请号：US11831361

申请日：2007-07-31

申请人： Tsuyoshi Moriya ,  Hiroyuki Nakayama ,  Keisuke Kondoh ,  Hiroki Oka

发明人： Tsuyoshi Moriya ,  Hiroyuki Nakayama ,  Keisuke Kondoh ,  Hiroki Oka

IPC分类号： B65G65/34

CPC分类号： H01L21/67201 ,  Y10S414/135

摘要： An intermediate transfer chamber that can prevent formation of defects in substrates. The intermediate transfer chamber is provided between a loader module being in a first environment where the interior thereof is at a first pressure and contains moisture, and a chamber of a process module being in a second environment where the interior thereof is at a second pressure lower than the first pressure. The intermediate transfer chamber comprises a transfer arm comprising a pick that bidirectionally transfers a substrate between the loader module and the chamber and supports the substrate, a load-lock module exhaust system that exhausts the interior of the intermediate transfer chamber so as to reduce pressure in the intermediate transfer chamber from the first pressure to the second pressure, and a plate-like member that controls the conductance of exhaust on at least a principal surface of the substrate opposite to the pick when the interior of the intermediate transfer chamber is exhausted.

摘要翻译： 可以防止在基板中形成缺陷的中间转印室。 中间转移室设置在处于第一环境中的第一环境中的装载器模块和处于第二环境中的处于第二环境的第二环境中的第二环境中的处理模块室， 比第一个压力。 中间传送室包括传送臂，传送臂包括在装载器模块和室之间双向传送衬底并支撑衬底的拾取器，负载锁定模块排气系统，其排出中间转印室的内部，以便减少 所述中间转印室从所述第一压力到所述第二压力，以及板状构件，其在所述中间转印室的内部被耗尽时控制与所述拾取器相对的所述基板的至少主表面上的排气的电导。